| 热处理对SiO2薄膜折射率和吸收特性的影响分析 |
| |
| 引用本文： | 姜玉刚,王利栓,刘华松,刘丹丹,姜承慧,羊亚平,季一勤.热处理对SiO2薄膜折射率和吸收特性的影响分析[J].红外与激光工程,2014,43(10):3334-3337. |
| |
| 作者姓名： | 姜玉刚 王利栓 刘华松 刘丹丹 姜承慧 羊亚平 季一勤 |
| |
| 作者单位： | 1.同济大学 物理科学与工程学院 先进微结构材料教育部重点实验室,上海 200092; |
| |
| 基金项目： | 国家自然科学基金(61235011)；国家重大科学仪器专项子项目(2012YQ04016405)；天津市科委项目 |
| |
| 摘 要： | 采用离子束溅射技术,在熔融石英基底上制备了SiO2薄膜,并通过椭偏光谱法和表面热透镜技术研究了热处理对其光学特性的影响。热处理对离子束溅射SiO2薄膜折射率影响较大,随着热处理温度增加,SiO2薄膜折射率先减小后增大,当热处理温度为550 ℃时,折射率达到最小。经过热处理后,SiO2薄膜的弱吸收均得到了降低,在2 ppm(1 ppm=10-6)左右,当热处理温度为550 ℃时,获得的SiO2薄膜弱吸收最小仅为1.1 ppm。实验结果表明:采用合适的热处理温度,能大大改善离子束溅射SiO2薄膜的折射率和吸收特性。
|
| 关 键 词： | SiO2薄膜 光学特性 热处理 折射率 弱吸收 |
| 收稿时间： | 2014-02-05 |
Analysis on effects of thermal treatment on refractive index and absorption properties of SiO2 film |
| |
| Jiang Yugang,Wang Lishuan,Liu Huasong,Liu Dandan,Jiang Chenghui,Yang Yaping,Ji Yiqin.Analysis on effects of thermal treatment on refractive index and absorption properties of SiO2 film[J].Infrared and Laser Engineering,2014,43(10):3334-3337. |
| |
| Authors: | Jiang Yugang Wang Lishuan Liu Huasong Liu Dandan Jiang Chenghui Yang Yaping Ji Yiqin |
| |
| Affiliation: | 1.Key Laboratory of Advanced Micro-structure Materials,Ministry of Education,School of Physics Science and Engineening,Tongji University,Shanghai 200092,China;2.Tianjin Key Laboratory of Optical Thin Film,Tianjin Jinhang Institute of Technical Physics,Tianjin 300192,China |
| |
| Abstract: | SiO2 films were deposited on fused silica substrates by ion beam sputtering technology and the effects of thermal treatment on optical properties were studied by ellipsometry technology and surface thermal lens technology. The effects of thermal treatment temperature on refractive index of IBS-SiO2 films were very large, as the increase of thermal treatment temperature, refractive index of SiO2 films first decrease and then increased, when the thermal treatment temperature was 550 ℃, the refractive index was the minimum. After thermal treatment, the weak absorption of SiO2 films were all reduced, the value of weak absorption was about 2 ppm. When the thermal treatment temperature was 550 ℃, the least weak absorption of 1.1 ppm was obtained. The results show that refractive index and absorption properties of IBS-SiO2 films can be largest improved by the proper thermal treatment temperature. |
| |
| Keywords: | SiO2 film optical properties thermal treatment refractive index weak absorption |
| 本文献已被 CNKI 万方数据 等数据库收录！ |
| 点击此处可从《红外与激光工程》浏览原始摘要信息 |
|
点击此处可从《红外与激光工程》下载全文 |
|
