| 钼及钼合金溅射靶材的研究现状与发展趋势 |
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| 引用本文： | 陈艳芳,谢敬佩,王爱琴,马窦琴,杨康,郭惠丹.钼及钼合金溅射靶材的研究现状与发展趋势[J].粉末冶金技术,2018,36(5):393-398. |
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| 作者姓名： | 陈艳芳 谢敬佩 王爱琴 马窦琴 杨康 郭惠丹 |
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| 作者单位： | 1.河南科技大学材料科学与工程学院, 洛阳 471023 |
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| 基金项目： | 河南省教育厅重点项目资助项目17A430018河南省高等学校重点科研项目资助项目18B430008 |
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| 摘 要： | 钼及钼合金具有熔点高、导电导热性好、热膨胀系数低、耐腐蚀性能好及环境友好等优点，利用钼及钼合金加工制备的溅射靶材已广泛应用于电子电器、太阳能电池及玻璃镀膜等领域。本文介绍了对钼及钼合金溅射靶材的基本要求及制备方法，系统综述了目前国内外对钼、钼钛、钼钠、钼铌合金靶材的研究现状，并对钼及钼合金溅射靶材未来的发展趋势进行了展望。
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| 关 键 词： | 钼 钼合金 溅射靶材 研究现状 发展趋势 |
| 收稿时间： | 2017-12-12 |
Research status and development trend of molybdenum and molybdenum alloy sputtering target materials |
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| Affiliation: | 1.School of Materials Science and Engineering, Henan University of Science and Technology, Luoyang 471023, China2.Collaborative Innovation Center of Nonferrous Metals, Henan Province, Luoyang 471023, China |
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| Abstract: | Molybdenum and molybdenum alloy sputtering target materials have been widely used in the fields of electronic industry, solar cell, and glass coating because of their high melting point, good thermal and electric conductivity, low thermal expansion coefficient, good corrosion resistance, and environmentally friendly performance. The basic requirements and preparing methods were introduced in this paper firstly. The main research status of Mo, Mo-Ti, Mo-Na, and Mo-Nb at home and abroad was systematically reviewed, and the development trend of molybdenum and molybdenum alloy sputtering target materials was presented. |
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