基于引导滤波的红外图像非均匀性校正

由于制作工艺的限制和器件材料的不均匀性,红外图像在一定程度上存在非均匀性,导致目标探测和识别能力下降,严重的情况下甚至无法探测目标,因此,红外图像必须经过校正才能发挥出红外探测器对温度的高灵敏度性能。基于神经网络的非均匀性校正技术是校正非均匀性的有效方法,但在去除非均匀性噪声的同时,会弱化图像信息边缘,导致图像模糊,甚至出现严重的鬼影。为了改善红外图像的非均匀性校正性能,以神经网络模型为架构基础,利用引导滤波算子作为期望真值模板,替代传统的神经网络模型中的均值滤波模板,同时增加鬼影抑制算法,在去除非均匀性噪声的同时,达到抑制鬼影、边缘保真的效果。实验结果表明,提出的非均匀性校正算法能够在保留图像细节特征、抑制鬼影的同时,很好地校正了红外图像的非均匀性。     

时空域自适应滤波非均匀性校正算法

由于红外焦平面探测器受到制造工艺等限制,图像不可避免地会存在非均匀性。传统神经网络算法会留下“鬼影”的问题,本文改进传统神经网络算法,利用引导滤波图像作为期望模板,防止图像的边缘被滤波器平滑。当场景运动时,通过时域迭代的策略来不断进行非均匀性校正参数的更新。为了抑制算法中常见的鬼影现象,设计了基于空域局部方差和时域场景变化率相结合的自适应学习率,利用前后的校正参数自适应调整阈值。实验仿真表明,本文所提的算法相比于传统算法均方根误差下降45.45%左右,可以在校正图像非均匀性的同时很好地抑制“鬼影”现象。     

红外焦平面阵列非均匀性自适应校正方法

分析基于场景的红外焦平面阵列非均匀性校正方法中的景物退化和鬼影现象,提出了一种基于边缘约束高斯滤波的红外焦平面阵列非均匀性自适应校正方法。该方法设计了一个边缘约束高斯滤波器来获取理想的估计图像,利用最陡下降法得到计算增益校正因子和偏移量校正因子的迭代公式,并通过迭代步长的自适应控制来增快算法的收敛速度。通过仿真实验和真实红外图像处理对比实验表明:相较于目前已有的方法,该方法在有效抑制景物退化和鬼影现象的同时,较好地去除原始红外图像的固定图案噪声,保留了图像细节信息,提高了图像质量。     

一种红外导引头成像自适应非均匀性校正方法

在红外成像制导应用中,为满足长周期免拆卸贮存的应用需求,红外导引头非均匀性的研究越来越多的集中于采用自适应的校正方法来代替传统的参考源的非均匀性校正方法。针对传统基于神经网络的自适应非均匀性校正算法容易造成"鬼影"的问题,提出了一种改进的红外导引头成像自适应非均匀性校正算法。该方法在传统神经网络非均匀性校正的基础上,进行了4点实用化的改进:首先,通过对图像运动判断,避免场景静止时的过学习;其次,采用自适应学习率,避免细节丰富区域的过学习;然后,利用双边滤波求期望目标的评估,减少细节的损失;最后,通过判断误差函数的波动量来决定是否对偏置进行更新。实验结果表明,该方法在校正精度、收敛速度和稳定性方面均优于传统的神经网络校正算法。     

基于亚像素配准的神经网络非均匀性校正

红外焦平面存在严重影响成像质量的非均匀性,本文使用基于亚像素配准算法和动量项BP神经网络的非均匀性校正算法进行校正。对短波红外相机成像过程中,由于相机视轴与成像目标位置的相对偏移(由相机安装平台晃动所致),使用基于矩阵乘法的亚像素配准算法进行配准;为了加速算法收敛,采用两点法来对校正系数进行初始化;为了改善BP神经网络容易陷入局部最优值,采用增加动量项的方法来改善校正效果。通过仿真实验可以看出提出的算法消除了传统神经网络校正方法存在的鬼影和边缘模糊等问题,获得了良好的校正效果,同时提高了算法的收敛速度。为短波红外图像数据后期处理提供了良好的基础。     

一种基于核回归插值的自适应非均匀性校正算法

针对基于神经网络的场景自适应非均匀性校正(Non-Uniformity Correction, NUC)算法在消除红外成像系统输出图像噪声时容易产生的“鬼影”现象,提出了一种改进的自适应非均匀性校正算法,将核回归插值技术应用到神经网络算法中,有效降低了自适应非均匀性算法产生“鬼影”现象的概率。实验结果表明,与传统的神经网络算法相比,本文算法在相同条件下既能有效消除非均匀噪声,又能大大抑制“鬼影”现象的产生。     

基于神经网络的红外焦平面非均匀性自适应校正算法

由于材料、工艺等原因,红外焦平面阵列(IRFPA)各单元普遍存在响应不一致的现象,从而导致IRFPA都存在非均匀性.非均匀性校正(NUC)是红外图像处理系统中的重要环节.本文在研究了传统的基于神经网络的NUC算法的基础上,提出了一种改进的基于神经网络的非均匀性自适应校正算法,并对比了传统的基于神经网络的算法和本文算法的校正效果和收敛速度,实验表明本文提出的算法校正效果好,收敛速度快.     

基于图像梯度的神经网络红外焦平面非均匀校正算法

红外焦平面阵列固有的非均匀性导致叠加在图像上的固定图形噪声严重影响了红外系统的成像质量。传统的神经网络非均匀校正算法存在待处理像素的期望值求解固有缺陷、收敛速度慢和学习速度过大，容易造成算法不收敛。提出了基于图像梯度的神经网络非均匀校正算法，通过对处理像素的期望值求解、改进和调整学习速度、改善图像校正效果,提高了算法收敛速度。通过对真实的红外图像序列实验表明,新算法相对传统的神经网络算法收敛速度提高了50%以上，红外图像校正效果也得到了提高。     

（英）采用贝叶斯框架的非均匀性校正方法

收敛速度和鬼影是基于场景非均匀性校正技术的一对共性矛盾,两者无法同时达到最优。而本文提出了一种在基于场景非均匀性校正和定标非均匀性校正之间建立桥梁的思路,利用定标法提供的大量先验信息解决收敛速度和鬼影的矛盾问题。贝叶斯框架则是建立该桥梁的最佳工具,本文利用贝叶斯方法计算非均匀性参数的正确概率,用参数正确概率来决定是否使用该组参数进行校正,从而在源头上抑制鬼影。非均匀性参数正确概率由先验概率和观测概率两部分组成。对于先验概率,本文定义了非均匀性的局部同分布约束,并通过定标统计的策略利用该约束构建了先验概率;对于观测概率,本文发现并详细分析了红外焦平面阵列固有的非均匀增益参数空间相关性,利用空间相关性构建了观测概率。最终,通过本文算法对真实和仿真的红外图像序列进行处理,表明该算法在保证高收敛速度前提下,其参数正确概率有效抑制了鬼影,取得了好的处理效果。     

对红外焦平面非均匀性自适应校正算法的研究

研究红外焦平面的非均匀校正对监控系统和军事有着特殊的意义.针对传统神经网络法非均匀校正算法存在收敛速度慢和不稳定的缺点,提出了一种新的基于场景的IRFPA非均匀性校正算法.该算法先将焦平面上的各像素点值和他周围的8个像素点值做一次排序,选择排在中间的5个像素值求平均作为该点的新像素值.再利用一种改进的神经网络法对红外图像再做一次非均匀校正.实验结果表明,新算法的非均匀校正效果比原来的神经网络算法和均值滤波算法都有明显的提高.还引用了一种新的收敛因子的估算方法,计算结果得出该方法能较准确地估算出收敛因子在自适应迭代公式中收敛时的范围,提高了校正算法的收敛速度.     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.