Current transport studies of amorphous n/p junctions and its application in a‐Si:H/HIT‐type tandem cells

This paper presents an understanding of the fundamental carrier transport mechanism in hydrogenated amorphous silicon (a‐Si:H)‐based n/p junctions. These n/p junctions are, then, used as tunneling and recombination junctions (TRJ) in tandem solar cells, which were constructed by stacking the a‐Si:H‐based solar cell on the heterojunction with intrinsic thin layer (HIT) cell. First, the effect of activation energy (E_a) and Urbach parameter (E_u) of n‐type hydrogenated amorphous silicon (a‐Si:H(n)) on current transport in an a‐Si:H‐based n/p TRJ has been investigated. The photoluminescence spectra and temperature‐dependent current–voltage characteristics in dark condition indicates that the tunneling is the dominant carrier transport mechanism in our a‐Si:H‐based n/p‐type TRJ. The fabrication of a tandem cell structure consists of an a‐Si:H‐based top cell and an HIT‐type bottom cell with the a‐Si:H‐based n/p junction developed as a TRJ in between. The development of a‐Si:H‐based n/p junction as a TRJ leads to an improved a‐Si:H/HIT‐type tandem cell with a better open circuit voltage (V_oc), fill factor (FF), and efficiency. The improvements in the cell performance was attributed to the wider band‐tail states in the a‐Si:H(n) layer that helps to an enhanced tunneling and recombination process in the TRJ. The best photovoltage parameters of the tandem cell were found to be V_oc = 1430 mV, short circuit current density = 10.51 mA/cm², FF = 0.65, and efficiency = 9.75%. Copyright © 2015 John Wiley & Sons, Ltd.     

Preparation and measurement of highly efficient a‐Si:H single junction solar cells and the advantages of μc‐SiOx:H n‐layers

Reducing the optical losses and increasing the reflection while maintaining the function of doped layers at the back contact in solar cells are important issues for many photovoltaic applications. One approach is to use doped microcrystalline silicon oxide (μc‐SiO_x:H) with lower optical absorption in the spectral range of interest (300 nm to 1100 nm). To investigate the advantages, we applied the μc‐SiO_x:H n‐layers to a‐Si:H single junction solar cells. We report on the comparison between amorphous silicon (a‐Si:H) single junction solar cells with either μc‐SiO_x:H n‐layers or non‐alloyed silicon n‐layers. The origin of the improved performance of a‐Si:H single junction solar cells with the μc‐SiO_x:H n‐layer is identified by distinguishing the contributions because of the increased transparency and the reduced refractive index of the μc‐SiO_x:H material. The solar cell parameters of a‐Si:H solar cells with both types of n‐layers were compared in the initial state and after 1000 h of light soaking in a series of solar cells with various absorber layer thicknesses. The measurement procedure for the determination of the solar cell performance is described in detail, and the measurement accuracy is evaluated and discussed. For an a‐Si:H single junction solar cell with a μc‐SiO_x:H n‐layer, a stabilized efficiency of 10.3% after 1000 h light soaking is demonstrated. Copyright © 2015 John Wiley & Sons, Ltd.     

H2 plasma treatment at the p/i interface of a hydrogenated amorphous Si absorption layer for high‐performance Si thin film solar cells

Plasma treatment (PT) of the buffer layer for highly H₂‐diluted hydrogenated amorphous silicon (a‐Si:H) absorption layers is proposed as a technique to improve efficiency and mitigate light‐induced degradation (LID) in a‐Si:H thin film solar modules. The method was verified for a‐Si:H single‐junction and a‐Si:H/microcrystalline silicon (µc‐Si:H) tandem modules with a size of 200 × 200 mm² (aperture area of 382.5 cm²) under long‐term light exposure. H₂ PT at the p/i interface was found to eliminate non‐radiative recombination centers in the buffer layer, and plasma‐enhanced chemical vapor deposition at low radio‐frequency power was found to suppress the generation of defects during the growth of a‐Si:H absorption layers on the treated buffer layers. With optimized H₂ PT of the a‐Si:H single‐junction module, the stabilized short circuit current and fill factor increased, and the stabilized open circuit voltage moves beyond its initial value. The results demonstrate 7.7% stabilized efficiency and 10.5% LID for the a‐Si:H single‐junction module and 10.82% stabilized efficiency and 7.76% LID for the a‐Si:H/µc‐Si:H tandem module. Thus, the growth of an a‐Si:H absorption layer on a H₂ PT buffer layer can be considered as a practical method for producing high‐performance Si thin film modules. Copyright © 2012 John Wiley & Sons, Ltd.     

High efficiency triple junction thin film silicon solar cells with optimized electrical structure

We report on improving the performance of pin‐type a‐Si:H/a‐SiGe:H/µc‐Si:H triple‐junction solar cells and corresponding single‐junction solar cells in this paper. Based on wet‐etching sputtered aluminum‐doped zinc oxide (ZnO:Al) substrates with optimized surface morphologies and photo‐electrical material properties, after adjusting individual single‐junction solar cells utilized in triple‐junction solar cells with various optimization techniques, we pay close attention to the optimization of tunnel recombination junctions (TRJs). By means of the optimization of individual a‐Si:H/a‐SiGe:H and a‐SiGe:H/µc‐Si:H double‐junction solar cells, we compensated for the open circuit voltage (V_oc) loss at the a‐Si:H/a‐SiGe:H TRJ by adopting a p‐type µc‐Si:H layer with a low activation energy. By combining the optimized single‐junction solar cells and top/middle, middle/bottom TRJs with little electrical losses, an initial efficiency of 15.06% was achieved for pin‐type a‐Si:H/a‐SiGe:H/µc‐Si:H triple‐junction solar cells. Copyright © 2014 John Wiley & Sons, Ltd.     

Full‐wave optoelectrical modeling of optimized flattened light‐scattering substrate for high efficiency thin‐film silicon solar cells

The flattened light‐scattering substrate (FLiSS) is formed by a combination of two materials with a high refractive index mismatch, and it has a flat surface. A specific realization of this concept is a flattened two‐dimensional grating. When applied as a substrate for thin‐film silicon solar cells in the nip configuration, it is capable to reflect light with a high fraction of diffused component. Furthermore, the FLiSS is an ideal substrate for growing high‐quality microcrystalline silicon (µc‐Si:H), used as bottom cell absorber layer in most of multijunction solar cell architectures. FLiSS is a three‐dimensional structure; therefore, a full‐wave analysis of the electromagnetic field is necessary for its optimal implementation. Using finite element method, different shapes, materials, and geometrical parameters were investigated to obtain an optimized FLiSS. The application of the optimized FLiSS in µc‐Si:H single junction nip cell (1‐µm‐thick i‐layer) resulted in a 27.4‐mA/cm² implied photocurrent density. The absorptance of µc‐Si:H absorber exceeded the theoretical Yablonovitch limit for wavelengths larger than 750 nm. Double and triple junction nip solar cells on optimal FLiSS and with thin absorber layers were simulated. Results were in line with state‐of‐the‐art optical performance typical of solar cells with rough interfaces. After the optical optimization, a study of electrical performance was carried out by simulating current–voltage characteristics of nip solar cells on optimized FLiSS. Potential conversion efficiencies of 11.6%, 14.2%, and 16.0% for single, double, and triple junction solar cells with flat interfaces, respectively, were achieved. Copyright © 2012 John Wiley & Sons, Ltd.     

Thin film solar cells incorporating microcrystalline Si1–xGex as efficient infrared absorber: an application to double junction tandem solar cells

We have fabricated efficient (∼7–8%) hydrogenated microcrystalline Si_1–xGe_x (µc‐Si_1–xGe_x:H, x ∼ 0.1–0.17) single junction p‐i‐n solar cells with markedly higher short‐circuit current densities than for µc‐Si:H (x = 0) solar cells due to enhanced infrared absorption. By replacing the conventional µc‐Si:H with the µc‐Si_1–xGe_x:H as infrared absorber in double junction tandem solar cells, the bottom cell thickness can be reduced by more than half while preserving the current matching with hydrogenated amorphous silicon (a‐Si:H) top cell. An initial efficiency of 11.2% is obtained for a‐Si:H/µc‐Si₀.₉Ge₀.₁:H solar cell with bottom cell thickness less than 1 µm. Copyright © 2009 John Wiley & Sons, Ltd.     

CuOx/a‐Si:H heterojunction thin‐film solar cell with an n‐type µc‐Si:H depletion‐assisting layer

We showed that thin n‐type CuO_x films can be deposited by radio‐frequency magnetron reactive sputtering and demonstrated the fabrication of n‐CuO_x/intrinsic hydrogenated amorphous silicon (i‐a‐Si:H) heterojunction solar cells (HSCs) for the first time. A highly n‐doped hydrogenated microcrystalline Si (n‐µc‐Si:H) layer was introduced as a depletion‐assisting layer to further improve the performance of n‐CuO_x/i‐a‐Si:H HSCs. An analysis of the external quantum efficiency and energy‐band diagram showed that the thin depletion‐assisting layer helped establish sufficient depletion and increased the built‐in potential in the n‐CuO_x layer. The fabricated HSC exhibited a high open‐circuit voltage of 0.715 V and an efficiency of 4.79%. Copyright © 2015 John Wiley & Sons, Ltd.     

DC‐sputtered ZnO:Al as transparent conductive oxide for silicon heterojunction solar cells with µc‐Si:H emitter

Silicon heterojunction (SHJ) solar cells are highly interesting, because of their high efficiency and low cost fabrication. So far, the most applied transparent conductive oxide (TCO) is indium tin oxide (ITO). The replacement of ITO with cheaper, more abundant and environmental friendly material with texturing capability is a promising way to reduce the production cost of the future SHJ solar cells. Here, we report on the fabrication of the SHJ solar cells with direct current‐sputtered aluminum‐doped zinc oxide (ZnO:Al) as an alternative TCO. Furthermore, we address several important differences between ITO and the ZnO:Al layers including a high Schottky barrier at the emitter/ZnO:Al interface and a high intrinsic resistivity of the ZnO:Al layers. To overcome the high Schottky barrier, we suggest employing micro‐crystalline silicon (µc‐Si:H) emitter, which also improves temperature threshold and passivation of the solar cell precursor. In addition, we report on the extensive studies of the effect of the ZnO:Al deposition parameters including layer thickness, oxygen flow, power density and temperature on the electrical properties of the fabricated SHJ solar cells. Finally, the results of our study indicate that the ZnO:Al deposition parameters significantly affect the electrical properties of the obtained solar cell. By understanding and fine‐tuning all these parameters, a high conversion efficiency of 19.2% on flat wafer (small area (5 × 5 mm²) and without any front metal grid) is achieved. Copyright © 2014 John Wiley & Sons, Ltd.     

Optimal design of periodic surface texture for thin‐film a‐Si:H solar cells

Optical analysis of hydrogenated amorphous silicon (a‐Si:H) solar cells with a periodic texture applied to the interfaces was carried out by two‐dimensional optical simulator. The optical simulator solves the electromagnetic wave equations by means of finite element method using triangular elements for the discretization of space. The periodic texture with rectangular‐like shape acts as a diffraction grating which scatters light into selective angles and thus gives a potential for significant prolongation of optical paths in thin absorber layers of the cells. Optimization of the geometrical parameters (period, height and duty‐cycle) of the periodic texture was carried out in order to obtain the highest photocurrent from a‐Si:H solar cells. The a‐Si:H solar cell with the optimal periodic texture parameters (period of 300 nm, height of 300 nm and duty cycle of 50%) and the absorber layer thickness of 300 nm generates up to 35% more photocurrent in comparison to the cell with flat interfaces. The optical analysis demonstrates that the optimal periodic texture in the a‐Si:H solar cell results in the best trade‐off between the antireflection effect at front interfaces, light scattering efficiency and the absorption losses at realistic metal back contact. Copyright © 2010 John Wiley & Sons, Ltd.     

A simulation study towards a new concept for realization of thin film triple junction solar cells based on group IV elements

In this paper, the theoretical efficiency of multi‐junction solar cells based on group IV elements has been investigated. The effects of different absorbing layer numbers, different band gap combinations, and temperature changes have been reviewed for multi‐spectral solar cells. Several simulations were done to identify the ideal band gap combination for triple‐junction solar cells. Based on these results and under consideration of actual material parameters, a new promising triple‐junction solar cell concept with a‐Si:H/µc‐Si:H/ and µc‐Ge:H has been found for developing high efficiency thin film solar cells. Additionally, advanced simulations were performed in order to evaluate the feasibility of this new concept. The photocurrent, the external quantum efficiency, and the layer thicknesses were simulated and evaluated. All parameters deliver promising results for a new triple‐junction solar cell concept with an intermediate reflector between the middle‐ and bottom structure. Copyright © 2011 John Wiley & Sons, Ltd.     

Improved conversion efficiency of a‐Si:H/µc‐Si:H thin‐film solar cells by using annealed Al‐doped zinc oxide as front electrode material

In recent years, zinc oxide has been investigated as a front electrode material in hydrogenated amorphous silicon/hydrogenated microcrystalline silicon (a‐Si:H/µc‐Si:H) tandem solar cells. Such as for other transparent conducting oxide materials and applications, a proper balancing of transparency and conductivity is necessary. The latter is directly related to the density and the mobility of charge carriers. A high density of charge carriers increases conductivity but leads to a higher absorption of light in the near‐infrared part of the spectrum due to increased free‐carrier absorption. Hence, the only way to achieve high conductivity while keeping the transparency as high as possible relies on an increase of carrier mobility. The carrier density and the mobility of sputtered Al‐doped zinc oxide (ZnO:Al) can be tailored by a sequence of different annealing steps. In this work, we implemented such annealed ZnO:Al films as a front electrode in a‐Si:H/µc‐Si:H tandem solar cells and compared the results with those of reference cells grown on as‐deposited ZnO:Al. We observed an improvement of short‐circuit current density as well as open‐circuit voltage and fill factor. The gain in current density could be attributed to a reduction of both sub‐band‐gap absorption and free‐carrier absorption in the ZnO:Al. The higher open‐circuit voltage and fill factor are indicators of a better device quality of the silicon for cells grown on annealed ZnO:Al. Altogether, the annealing led to an improved initial conversion efficiency of 12.1%, which was a gain of +0.7% in absolute terms. Copyright © 2013 John Wiley & Sons, Ltd.     

Recent progress of high efficiency Si thin‐film solar cells in large area

Si thin‐film solar cells are suitable to the sunbelt region due to a low temperature coefficient and to building integrated photovoltaics owing to flexible size, easily controllable transmittance, and an aesthetic design. Nevertheless, the application is limited until now due to their low conversion efficiency. We have developed a triple junction cell (a‐Si:H/a‐SiGe:H/µc‐Si:H) providing efficient light utilization. For the high efficiency, we have focused on the smoothing of high haze TCO, a low absorption window layer, a low refractive index interlayer, uniformity control of the thickness and crystalline volume fraction in the microcrystalline silicon layer, and a low absorption back reflector. Through these activities, we have achieved a world record of 13.4% stabilized efficiency in the small size cell (1 cm²) and 10.5% stabilized efficiency in the large area module (1.1 × 1.3 m²), certificated by the National Renewable Energy Laboratory and Advanced Industrial Science and Technology, respectively. This result was presented in solar cell efficiency tables (Version 41). At this moment, we have increased a stabilized efficiency of 11.2% (Output power 160 W) in the large area module. We will report on the advanced materials in detail for high efficiency. Copyright © 2014 John Wiley & Sons, Ltd.     

InGaP//GaAs//c‐Si 3‐junction solar cells employing spectrum‐splitting system

In this work, we practically demonstrated spectrum‐splitting approach for advances in efficiency of photovoltaic cells. Firstly, a‐Si:H//c‐Si 2‐junction configuration was designed, which exhibited 24.4% efficiency with the spectrum splitting at 620 nm. Then, we improved the top cell property by employing InGaP cells instead of the a‐Si:H, resulting in an achievement of efficiency about 28.8%. In addition, we constructed 3‐junction spectrum‐splitting system with two optical splitters, and GaAs solar cells as middle cell. This InGaP//GaAs//c‐Si architecture was found to deliver 30.9% conversion efficiency. Our splitting system includes convex lenses for light concentration about 10 suns, which provided concentrated efficiency exceeding 33.0%. These results suggest that our demonstration of 3‐junction spectrum‐splitting approach can be a promising candidate for highly efficient photovoltaic technologies. Copyright © 2016 John Wiley & Sons, Ltd.     

13·9%‐efficient CdTe polycrystalline thin‐film solar cells with an infrared transmission of ∼50%

To fabricate a high‐efficiency polycrystalline thin‐film tandem cell, the most critical work is to make a high‐efficiency top cell ( > 15%) with high bandgap (E_g = 1·5–1·8 eV) and high transmission (T > 70%) in the near‐infrared (NIR) wavelength region. The CdTe cell is one of the candidates for the top cell, because CdTe state‐of‐the‐art single‐junction devices with efficiencies of more than 16% are available, although its bandgap (1·48 eV) is slightly lower for a top cell in a current‐matched dual‐junction device. In this paper, we focus on the development of a: (1) thin, low‐bandgap Cu_xTe transparent back‐contact; and (2) modified CdTe device structure, including three novel materials: cadmium stannate transparent conducting oxide (TCO), ZnSnO_x buffer layer, and nanocrystalline CdS:O window layer developed at NREL, as well as the high‐quality CdTe film, to improve transmission in the NIR region while maintaining high device efficiency. We have achieved an NREL‐confirmed 13·9%‐efficient CdTe transparent solar cell with an infrared transmission of ∼50% and a CdTe/CIS polycrystalline mechanically stacked thin‐film tandem cell with an NREL‐confirmed efficiency of 15·3%. Copyright © 2005 John Wiley & Sons, Ltd.     

19%‐efficient and 43 µm‐thick crystalline Si solar cell from layer transfer using porous silicon

We present a both‐sides‐contacted thin‐film crystalline silicon (c‐Si) solar cell with a confirmed AM1.5 efficiency of 19.1% using the porous silicon layer transfer process. The aperture area of the cell is 3.98 cm². This is the highest efficiency ever reported for transferred Si cells. The efficiency improvement over the prior state of the art (16.9%) is achieved by implementing recent developments for Si wafer cells such as surface passivation with aluminum oxide and laser ablation for contacting. The cell has a short‐circuit current density of 37.8 mA cm⁻², an open‐circuit voltage of 650 mV, and a fill factor of 77.6%. Copyright © 2011 John Wiley & Sons, Ltd.     

High‐rate deposition of a‐Si:H thin layers for high‐performance silicon heterojunction solar cells

In this paper, we describe a technique for high‐quality interface passivation of n‐type crystalline silicon wafers through the growth of hydrogenated amorphous Si (a‐Si:H) thin layers using conventional plasma‐enhanced chemical vapor deposition. We investigated the onset of crystallization of the a‐Si:H layers at various deposition rates and its effect on the surface passivation properties. Epitaxial growth occurred, even at a low substrate temperature of 90 °C, when the deposition rate was as low as 0·5 Å/s; amorphous growth occurred at temperatures up to 150 °C at a higher deposition rate of 4·2 Å/s. After optimizing the intrinsic a‐Si:H layer deposition conditions and then subjecting the sample to post‐annealing treatment, we achieved a very low surface recombination velocity (7·6 cm/s) for a double‐sided intrinsic a‐Si:H coating on an n‐type crystalline silicon wafer. Under the optimized conditions, we achieved an untextured heterojunction cell efficiency of 16·7%, with a high open‐circuit voltage (694 mV) on an n‐type float‐zone Si substrate. On a textured wafer, the cell efficiency was further enhanced to 19·6%. Copyright © 2011 John Wiley & Sons, Ltd.     

Simulation of double junction In0.46Ga0.54N/Si tandem solar cell

A comprehensive study of high efficiency In_0.46Ga_0.54N/Si tandem solar cell is presented. A tunnel junction (TJ) was needed to interconnect the top and bottom sub-cells. Two TJ designs, integrated within this tandem: GaAs(n⁺)/GaAs(p⁺) and In_0.5Ga_0.5N(n⁺)/Si(p⁺) were considered. Simulations of GaAs(n⁺)/GaAs(p⁺) and In_0.5Ga_0.5N (n⁺)/Si(p⁺) TJ I-V characteristics were studied for integration into the proposed tandem solar cell. A comparison of the simulated solar cell I-V characteristics under 1 sun AM1.5 spectrum was discussed in terms of short circuit current density (J_sc), open circuit voltage (V_OC), fill factor (FF) and efficiency (η) for both tunnel junction designs. Using GaAs(n⁺)/GaAs(p⁺) tunnel junction, the obtained values of J_sc = 21.74 mA/cm², V_OC= 1.81 V, FF = 0.87 and η = 34.28%, whereas the solar cell with the In_0.5Ga_0.5N/Si tunnel junction reported values of J_sc = 21.92 mA/cm², V_OC = 1.81 V, FF = 0.88 and η = 35.01%. The results found that required thicknesses for GaAs(n⁺)/GaAs(p⁺) and In_0.5Ga_0.5N (n⁺)/Si(p⁺) tunnel junctions are around 20 nm, the total thickness of the top InGaN can be very small due to its high optical absorption coefficient and the use of a relatively thick bottom cell is necessary to increase the conversion efficiency.     

Stability of sub‐micron‐thick CdTe solar cells

Sputtered CdS/CdTe cells with only 0.75 µm of CdTe have reached AM1.5 efficiencies over 12.5%. But the use of very thin absorber layers of CdTe raises questions about the possible impact on long‐term stability when the back contact is very close to the main junction. In this study, we have performed accelerated life testing (ALT) on unencapsulated CdTe dot cells with absorber thickness ranging from 0.7 to 2.1 µm. After 900 h of ALT at 85°C under continuous one‐sun illumination, with open circuit biasing and no encapsulation, we find that any decrease in stability as CdTe thickness decreases is within the ~10% statistical uncertainty shown by the sample sets of more than 20 cells each. Cells of all thicknesses exhibited some decrease in performance under these stress conditions, and open‐circuit voltage appears to be the key factor in decreased efficiency. These changes in performance under ALT at 85°C are found to be consistent with a projected field lifetime of about 40 years in typical conditions. Secondary ion mass spectroscopy depth profiles of several elements including Cu showed no evidence of ALT‐driven diffusion in these sputtered CdTe cells. Copyright © 2013 John Wiley & Sons, Ltd.     

Low‐temperature formation of local Al contacts to a‐Si:H‐passivated Si wafers

We have passivated boron‐doped, low‐resistivity crystalline silicon wafers on both sides by a layer of intrinsic, amorphous silicon (a‐Si:H). Local aluminum contacts were subsequently evaporated through a shadow mask. Annealing at 210°C in air dissolved the a‐Si:H underneath the Al layer and reduces the contact resistivity from above 1 Ω cm² to 14·9 m Ω cm². The average surface recombination velocity is 124 cm/s for the annealed samples with 6% metallization fraction. In contrast to the metallized regions, no structural change is observed in the non‐metallized regions of the annealed a‐Si:H film, which has a recombination velocity of 48 cm/s before and after annealing. Copyright © 2004 John Wiley & Sons, Ltd.     

Electron‐beam crystallized large grained silicon solar cell on glass substrate

Thin film hetero‐emitter solar cells with large‐grained poly‐silicon absorbers of around 10 µm thickness have been prepared on glass. The basis of the cell concept is electron‐beam‐crystallization of an amorphous or nanocrystalline silicon layer deposited onto a SiC:B layer. The SiC:B layer covers a commercially well available glass substrate, serving as diffusion barrier, contact layer and dopand source. For silicon absorber deposition a low pressure chemical vapour deposition was used. The successively applied e‐beam crystallization process creates poly‐silicon layers with grain sizes up to 1 × 10 mm² with low defect densities. The high electronic quality of the absorber is reflected in open circuit voltages as high as 545 mV, which are realized making use of the well‐developed a‐Si:H hetero‐emitter technology. Copyright © 2011 John Wiley & Sons, Ltd.