0.85-/spl mu/m vertical-cavity surface-emitting laser diode arrays grown on p-type GaAs substrate

We have fabricated the first room-temperature (RT) continuous-wave (CW) 0.85-/spl mu/m 8/spl times/8 bottom-emitting vertical-cavity surface-emitting AlGaAs-GaAs DBR QW laser diode (VCSEL) arrays on a p-type GaAs substrate, which are applicable to optical interconnection. The laser characteristics are slightly inferior to those of VCSEL arrays made on n-type GaAs substrate with the same reflectivity, but exhibit for better array uniformity of threshold current density than previously reported. Such devices are applicable to N-MOS integration.     

1.3 /spl mu/m quantum dot vertical-cavity surface-emitting laser with external light injection

A 1.3 /spl mu/m quantum dot vertical-cavity surface-emitting laser (QD VCSEL) with external light injection is presented, having been experimentally demonstrated. The QD VCSEL is fabricated on GaAs substrate. The 3 dB frequency response of the QD VCSEL based on the TO-Can package is enhanced from the free-running 1.75 to 7.44 GHz with the light injection technique.     

A monolithic GaInAsN vertical-cavity surface-emitting laser for the 1.3-/spl mu/m regime

An all-epitaxial GaInAsN vertical-cavity surface-emitting laser for room-temperature (RT) emission at 1.3 /spl mu/m was developed by solid-source molecular beam epitaxy using a plasma source for nitrogen activation. RT photopumped operation is demonstrated at a wavelength of 1283 nm. Stimulated emission was observed up to a record high temperature of 143/spl deg/C, resulting in an emission wavelength of 1294 nm.     

Modeling of the threshold operation of 1.3-/spl mu/m GaAs-based oxide-confined (InGa)As-GaAs quantum-dot vertical-cavity surface-emitting lasers

In the paper, the self-consistent optical-electrical-thermal-gain threshold model of the oxide-confined (OC) quantum-dot (QD) (InGa)As-GaAs vertical-cavity surface-emitting diode laser (VCSEL) is demonstrated. The model has been developed to enable better understanding of physics of an operation of GaAs-based OC QD VCSELs in a full complexity of many interactions in its volume between individual physical phenomena. In addition, the model has been applied to design and optimize the low-threshold long-wavelength 1.3-/spl mu/m GaAs-based OC QD VCSELs for the second-generation optical-fiber communication systems and to examine their anticipated room-temperature (RT) performance. An influence of many construction parameters on device RT lasing thresholds and mode selectivity has been investigated. Some essential design guidelines have been proposed to support efforts of technological centers in producing low-threshold single-mode RT devices.     

Design and fabrication of 1.3-/spl mu/m vertical-cavity surface-emitting lasers using dielectric reflectors

A novel vertical-cavity surface-emitting laser structure has been fabricated with low loss and high reflectivity a-Al/sub 2/O/sub 3//a-Si distributed Bragg reflectors. The active region consists of AlGaInAs multiple quantum wells and a tunnel junction and has been grown by a single-step metal-organic chemical vapor deposition. Laser emission at 1.3 /spl mu/m was achieved under continuous-wave operation at room temperature.     

1.3 /spl mu/m InAs/GaAs multilayer quantum-dot laser with extremely low room-temperature threshold current density

A high growth temperature step used for the GaAs spacer layer is shown to significantly improve the performance of 1.3 /spl mu/m multilayer InAs/GaAs quantum-dot lasers. Extremely low room-temperature continuous-wave threshold current densities of 32.5 and 17 A/cm/sup 2/ are achieved for a three-layer device with as-cleaved facets and high-reflectivity coated facets, respectively.     

Low-threshold CW GaInNAsSb/GaAs laser at 1.49 /spl mu/m

Low-threshold room temperature continuous wave 1.49 /spl mu/m GaInNAsSb lasers are presented. Room temperature threshold current density of 1.1 kA/cm/sup 2/ was observed with a high external quantum efficiency of 40% and maximum output power of 30 mW from both facets.     

A vertical-cavity surface-emitting laser appliqued to a 0.8-/spl mu/m NMOS driver

An optoelectronic integrated circuit (OEIC) composed of a vertical-cavity surface-emitting laser (VCSEL) appliqued to an NMOS drive circuit was fabricated to form an optical link from the CMOS chip. A custom NMOS circuit was designed and fabricated through the MOSIS foundry service in a standard 0.8-/spl mu/m CMOS process. InGaAs quantum-well VCSELs were grown, fabricated and tested on an n-type GaAs substrate. Next, the VCSELs underwent a substrate removal technique and were appliqued to the NMOS circuitry. The OEIC was tested at the chip level and showed an electrical to optical conversion efficiency of 1.09 mW/V. Modulation results are also discussed.     

Continuous-wave operation up to 36/spl deg/C of 1.3-/spl mu/m GaInAsP-InP vertical-cavity surface-emitting lasers

We introduced ion-beam assisted deposition in order to improve the quality of Al/sub 2/O/sub 3/ and SiO/sub 2/, which were used as part of the mirrors of 1.3-/spl mu/m GaInAsP-InP vertical-cavity surface-emitting lasers (VCSELs). The refractive index of Al/sub 2/O/sub 3/ was improved to 1.63 from 1.56 and the one of SiO/sub 2/ increased to 1.47 from 1.45. Low-threshold room-temperature continuous-wave (CW) operation of 1.3-/spl mu/m VCSEL with the improved mirrors was demonstrated. The threshold current was 2.4 mA at 20/spl deg/C. The CW operating temperature was raised to 36/spl deg/C, which is a record high temperature for 1.3-/spl mu/m VCSEL.     

Novel hemispherical vertical cavity 1.3 mu m surface-emitting laser on semi-insulating substrate

A vertical cavity GaInAsP/InP surface-emitting laser at 1.3 mu m wavelength is demonstrated with a hemispherical cavity structure. The laser consists of a circular mesa buried (passivated) in polyimide and is made on a semi-insulating InP substrate. CW operation was obtained at 77 K with a threshold current density of 90 kA/cm/sup 2/.<>     

Recombination mechanisms in 1.3-/spl mu/m InAs quantum-dot lasers

We measure, in real units, the radiative and total current density in high performance 1.3-/spl mu/m InAs quantum-dot-laser structures. Despite very low threshold current densities, significant nonradiative recombination (/spl sim/80% of the total recombination) occurs at 300 K with an increasing fraction at higher current density and higher temperature. Two nonradiative processes are identified; the first increases approximately linearly with the radiative recombination while the second increases at a faster rate and is associated with the loss of carriers to either excited dot states or the wetting layer.     

Free-carrier effect on index change in 1.3 /spl mu/m quantum-dot lasers

Below threshold measurements of the carrier induced refractive index change in 1.3 /spl mu/m quantum-dot lasers at resonance and also below bandgap were carried out. It is demonstrated that free-carrier absorption contributes approximately half the total index change, and that its relative contribution is a function of device length. This result gives a lower bound to phase-amplitude coupling in quantum-dot lasers.     

Enhanced spontaneous emission in hydrogen-plasma-passivatedAlGaAs/GaAs vertical-cavity surface-emitting laser structures grown onSi substrate

The effect of hydrogen (H) plasma passivation on a vertical-cavity surface-emitting laser (VCSEL) structure consisting of an active layer of Al_0.3Ga_0.7As/GaAs multi-quantum-well (MQW) grown on an Si substrate is investigated by photoluminescence (PL) measurement. Significant spontaneous emission enhancement is observed at the cavity mode for the H-plasma-passivated sample. This is attributed to the increased MQW PL emission resulting from the incorporation of hydrogen atoms which passivated the electrical activity of the defects-related nonradiative deep centres and increased the minority carrier lifetime     

1.3-/spl mu/m InAs quantum-dot laser with high dot density and high uniformity

We realized a triple-stacked 1.3-/spl mu/m InAs quantum dot (QD) with a high density of 2.4/spl times/10/sup 11/ cm/sup -2/ and a high uniformity of below 24 meV that employs an As/sub 2/ source and a gradient composition (GC) strain-reducing layer (SRL) grown on a GaAs substrate. We demonstrated the 1.3-/spl mu/m wavelength emission of this triple-stacked QD laser with a 0.92-mm cavity length and a cleaved facet at room temperature. In addition, we realized the highest maximum modal gain yet reported of 8.1 cm/sup -1/ per QD layer at beyond 1.28 /spl mu/m by using our high-density and high-uniformity QD.     

Flip-chip bonded 0.85-/spl mu/m bottom-emitting vertical-cavity laser array on an AlGaAs substrate

We report high-performance 0.85-/spl mu/m bottom-emitting vertical-cavity surface-emitting lasers (VCSELs) on an AlGaAs substrate with 2.1 mA threshold current density 4.2 mW maximum output power, 11.7% power conversion efficiency and a maximum operating temperature of 130/spl deg/C. We also demonstrate a flip-chip bonded 0.85-/spl mu/m bottom-emitting VCSEL array, and confirm all pixels across the 8/spl times/8 VCSEL array operate at a f/sub 3/ dB bandwidth of 2.6 GHz at only 4.2 mA.     

Photopumped lasing at 1.25 /spl mu/m of GaInNAs-GaAs multiple-quantum-well vertical-cavity surface-emitting lasers

We report room-temperature (RT) continuous-wave (CW) photopumped operation of long-wavelength vertical-cavity surface-emitting lasers (VCSELs) employing a Ga/sub 0.7/In/sub 0.3/N/sub 0.007/As/sub 0.993/-GaAs multiple-quantum-well (MQW) active layer grown directly on a GaAs-AlAs distributed Bragg reflector (DBR). Evidence for laser oscillation includes spectral linewidth narrowing, clamping of spontaneous emission, and a distinct increase in slope efficiency at threshold. By taking advantage of lateral growth rate nonuniformity, we obtained laser emission over an extremely broad 110-nm wavelength range, from 1.146-1.256 /spl mu/m. Equivalent threshold current density over this range was estimated at 3.3-10 kA/cm/sup 2/.     

10-Gb/s error-free transmission under optical reflection using isolator-free 1.3- /spl mu/m InP-based vertical-cavity surface-emitting lasers

Error-free transmission through 10-km single-mode fiber at 10 Gb/s under -13-dB optical reflections has been demonstrated for the first time using a directly modulated 1.3-/spl mu/m InP-based VCSEL without any optical isolator. The 13-GHz relaxation oscillation frequency and stable polarization suppresses relative intensity noise degradation under optical reflection. Only 1-dB error-free power penalty has been observed with optical reflection set with the worst polarization direction.     

90/spl deg/C continuous-wave operation of 1.83-/spl mu/m vertical-cavity surface-emitting lasers

Excellent lasing performance is demonstrated for a 1.83-/spl mu/m InGaAlAs-InP vertical-cavity surface-emitting laser (VCSEL) utilizing the buried tunnel junction technology. Threshold currents as low as 190 /spl mu/A at 20/spl deg/C and operating temperatures as high as 90/spl deg/C have been measured. These values are the best ones reported so far for long-wavelength VCSELs.     

High-speed Modulation of InGaAs: Sb-GaAs-GaAsP quantum-well vertical-cavity surface-emitting lasers with 1.27-/spl mu/m emission wavelength

1.27-/spl mu/m InGaAs: Sb-GaAs-GaAsP vertical-cavity surface-emitting lasers (VCSELs) were grown by metal-organic chemical vapor deposition and exhibited excellent performance and temperature stability. The threshold current changes from 1.8 to 1.1 mA and the slope efficiency falls less than /spl sim/35% as the temperature raised from room temperature to 70/spl deg/C. With a bias current of only 5 mA, the 3-dB modulation frequency response was measured to be 8.36 GHz, which is appropriate for 10-Gb/s operation. The maximal bandwidth is measured to be 10.7 GHz with modulation current efficiency factor (MCEF) of /spl sim/5.25 GHz/(mA)/sup 1/2/. These VCSELs also demonstrate high-speed modulation up to 10 Gb/s from 25/spl deg/C to 70/spl deg/C.