The thermal conductivity of UO2 vapor

The thermal conductivity, λ of a saturated vapor over UO_1.96 is calculated in the temperature range 3000–6000 K. The calculation shows that the contribution to λ from the transport of reaction enthalpy dominates all other contributions. All possible reactions of the gaseous species UO₃, UO₂, UO, U, O, and O₂ are included in the calculation. We fit the total thermal conductivity to the empirical equation λ = exp(a+ b/T+cT+dT² + eT³), with λ in cal/(cm s K), T in kelvins, a = 268.90, B = − 3.1919 × 10⁵, C = −8.9673 × 10⁻², d = 1.2861 × 10⁻⁵, and E = −6.7917 × 10⁻¹⁰.     

Formation of uranium mononitride by the reaction of uranium dioxide with carbon in ammonia and a mixture of hydrogen and nitrogen: II. Reaction rates

Kinetics of the carbothermic synthesis of UN from UO₂ in an NH₃ stream and a mixed 75% H₂ + 25% N₂ stream were studied in the temperature range of 1400–1600°C by X-ray analysis and weight change measurement of the sample. The weight change was divided into two parts; i.e. weight loss due to carbothermic reduction of UO₂ and weight loss due to removal of carbon by hydrogen. The former followed the first-order rate equation −1n(1 − ₀) = k₀t, and the latter the rate equation of phase boundary reaction 1 − (1 − _c)^1/3 = k_ct. The apparent activation energy of the former was in the range of 320–380 kJ/mol. The value of the latter in an NH₃ stream was 175–185 kJ/mol, which was smaller than that in a mixed 75% H₂ + 25% N₂stream (285 kJ/mol). In this method, the rate of the removal of carbon by hydrogen determines that of the formation of high purity UN.     

The diffusivities of fission-created or thermally-doped tritium in UO2

The diffusion behavior of tritium in UO₂ was studied. Two methods were adopted for the introduction of tntium into UO₂: one via ternary fission of ²³⁵U and the other via thermal doping. In the former, the diffusion constants decreased with increase in sample weight. The diffusion constants obtained from the pellet with the same specification (9 mm in diameter, 5 mm high) were D″_bulk = 3.03 × 10⁻³(^+0.369_−0.003) exp[−163±43(kJ/mol)/RT](cm²/s) for fission-created tritium and D′_bulk = 0.15(^{+ 0.94}_−0.13) exp[−76±13 (kJ/mol)/RT](cm²/s) for thermally-doped tritium. The difference of the diffusion constants between two systems was discussed in terms of the effects associated with the recoil processes of energetic tritium.     

Thermochemical study of vaporization of LiTiO by a mass spectrometric Knudsen effusion method

The vaporization of Li₄TiO₄ has been studied by a mass spectrometric Knudsen effusion method in the temperature range 1082–1582 K. Identified vapors are Li(g), LiO(g), Li₂O(g) and Li₃O(g). When the vaporization proceeds, the content of Li₂O in the Li₄TiO₄ sample decreases and the condensed phase of the sample changes to β-Li₄TiO₄ plus l-Li₂TiO₃ below 1323 K, to β-Li₄TiO₄ plus h-Li₂TiO₃ in the range 1323–1473 K and to h-Li₂TiO₃ plus liquid above 1473 K. On the basis of the partial pressure data, the enthalpies of formation for β-Li₄TiO₄ from elements and from constituent oxides have been determined to be ΔH_f,298^°(β-Li₄TiO₄,s) = −2247.8 ± 14.3 kJ mol⁻¹ and Δ_fox,298^°(β-Li₄TiO₄, s) = −107.3 ± 14.3 kJ mol⁻¹, respectively.     

Investigation of in-reactor creep and irradiation growth of zirconium-2.5 wt% niobium channel tubes

We summarize the diametral creep results obtained in the MR reactor of the Kurchatov Institute of Atomic Energy on zirconium-2.5 wt% niobium pressure tubes of the type used in RBMK-1000 power reactors. The experiments that lasted up to 30 000 h cover a temperature range of 270 to 350°C, neutron fluxes between 0.6 and 4.0 ×10¹³ n/cm² · s (E > 1 MeV) and stresses of up to 16 kgf/mm². Diametral strains of up to 4.8% have been measured. In-reactor creep results have been analyzed in terms of thermal and irradiation creep components assuming them to be additive. The thermal creep rate is given by a relationship of the type ε_th = A₁ exp [(A₂ + A _3σt) T] and the irradiation component by ε_rad = A_4σtø(T − A₅), where T = temperature, σ_t = hoop stress, ø = neutron flux and a₁ to A₅ are constants. Irradiation growth experiments carried out at 280° C on specimens machined from pressure tubes showed a non-linear dependence of growth strain on neutron fluence up to neutron fluences of 5 × 10²⁰ n/cm². The significance of these results to the elongation of RBMK reactor pressure tubes is discussed.     

A comparative EPR study of ion implantation induced damage in Si, Si1−xGex (x ≠ 0) and SiC

Electron Paramagnetic Resonance (EPR) measurements have been made to investigate the build up of damage in silicon in relaxed crystalline Si_1−xGe_x (x = 0.04, 0.13, 0.24, 0.36) and in 6H-SiC as a result of increasing the ion dose from low levels (10¹² cm⁻²) up to values (10¹⁵ cm⁻²) sufficient to produce an amorphous layer. Si, Si_1−xGe_x (x ≠ 0) and SiC were implanted at room temperature with 1.5 MeV Si, 2 MeV Si and 0.2 MeV Ge ions respectively. A comparison is made between the ways in which the type and population of paramagnetic defects depend on ion dose for each material.     

Surface excitation parameter for semiconducting III–V compounds

In the rapid development of mesoscopic science, the study of surface excitations in solids and overlayer systems plays a crucial role. The surface excitation parameter which describes the total probability of surface plasmon excitations by an electron traveling in vacuum before impinging on or after escaping from a semiconducting III–V compound has been calculated for 200–2000 eV electrons crossing the compound surface. These calculations were performed using the dielectric response theory with sum-rule-constrained extended Drude dielectric functions established by the fits of these functions to optical data. Surface excitation parameters calculated for InSb, InAs, GaP, GaSb or GaAs III–V compounds were found to follow to a simple formula, i.e. P_s = aE^−b, where P_s is the surface excitation parameter and E is the electron energy. These surface excitation parameters were then applied to determine the elastic reflection coefficient for electrons elastically backscattered from III–V compounds using the Monte Carlo simulations. Good agreement was found for the electron elastic reflection coefficient between calculated results and experimental data.     

Density measurement of amorphous SixGe1 − x alloys

The atomic density of amorphous Si_xGe_{1 − x} alloys (x = 1, 0.85, 0.67, 0.50, 0.20 and 0) has been measured. Mono-crystalline Si_xGe_1−x layers Were implanted with 1.50–2.75 MeV Si²⁺ and Ge²⁺ ions to produce the amorphous material. Using surface profilometry and RBS/channeling, it was found that amorphous alloys are less dense than the crystalline alloys, and that Vegard's law underestimates the a-Si_xGe_1−x density.     

2 MeV Si ion implantation damage in relaxed Si1−xGex

The damage produced by implanting, at room temperature, 3 μm thick relaxed Si_1−xGe_x layers with 2 MeV Si⁺ ions has been measured as a function of Ge content (x = 0.04, 0.13, 0.24 or 0.36) and Si dose in the dose range 10¹⁰–10¹⁵ cm⁻². The accumulation of damage with increasing dose has been studied as a function of Ge content by Rutherford Backscattering Spectrometry, Optical Reflectivity Depth Profiling and Transmission Electron Microscopy and an increased damage efficiency in Si_1−xGe_x with increasing x is observed. The characteristics of implantation-induced defects have been investigated by Electron Paramagnetic Resonance. The results are discussed in the context of a model of the damage process in SiGe.     

Pressure dependence of extraction behavior of plutonium(IV) and uranium(VI) from nitric acid solution to supercritical carbon dioxide containing tributylphosphate

Plutonium(IV) and uranium(VI) were extracted into supercritical CO₂ fluid phase (SF-CO₂) containing tributylphosphate (TBP) with equilibrium distribution ratios, D, e. g., D_Pu(IV) = 3.1 and D_U(IV) = 2.0, for the extraction of 2 × 10⁻³ M Pu(IV) and U(VI) from 3 M HNO₃ into SF-CO₂ containing 0.3 M TBP at 60 °C and 15 MPa. A simple linear relation between D and density of CO₂; long D = a log + b (a,b; constants), was observed, which was explained theoretically by the formulation of the extraction equilibrium taking into account the phase distribution behavior of extractant TBP and extracted species, i.e. Pu(IV)- and U(VI)-TBP complexes involved in the extraction reaction. The slopes a of the log D vs. log plots were −(1.6 ± 0.1) and −(2.7 ± 0.5) for the extraction of Pu(IV) and U(VI), respectively. The differences in D as well as the slope a between Pu(IV) and U(IV) make it possible to design the U and Pu separation method by which one can achieve an enhancement of the extraction efficiency and selectivity by tuning the operation pressure.     

Ion-induced electron emission – monitoring the structure transitions in graphite

The temperature dependence of ion-induced electron emission yield γ under 30 keV Ar⁺ ion impacts at incidence angles θ = 0−80° under dynamically steady-state conditions has been measured for polygranular graphite POCO-AXF-5Q. The fluencies were 10¹⁸–10¹⁹ ion/cm², the temperatures varied from the room temperature (RT) to 400 °C. The RHEED has shown that same diffraction patterns correspond to a high degree of disorder at RT. At high temperature (HT), some patterns have been found similar to those for the initial graphite surfaces. The dependence γ(T) has been found to be non-monotonic and for normal and near normal ion incidence manifests a step-like increase typical for a radiation induced phase transition. At oblique and grazing incidence (θ > 30°), a broad peak was found at T_p = 100 °C. An analysis based on the theory of kinetic ion-induced electron emission connects the behavior of γ(θ,T) to the dependence of both secondary electron path length λ and primary ion ionizing path length R_e on lattice structure that drastically changes due to damage annealing.     

Sputtering yield of Ti1−xBx films by 2 keV deuterium bombardment

We deposited titanium borides (Ti_1−xB_x; 0.40 < x < 0.77) by the co-sputter coating method and measured their sputtering yield by 2 keV deuterium ion bombardment as a function of their chemical composition at room temperature. The total sputtering yield is found to increase with increase of the boron content in Ti_1−xB_x. The total sputtering yield of stoichiometric TiB₂ is estimated to be 2.8 × 10⁻², about the same as those reported previously. Concerning the partial sputtering yield, that of the titanium does not depend on the chemical composition, but that of the boron increases with increase of the boron content. These experimental results could be explained by assuming that the partial sputtering yield is proportional to the spatial concentration of each atom in the Ti_1−xB_x matrix.     

Phase transitions in U3O8−z: I, heat capacity measurements

The heat capacity of U₃O_8−z with various O/U ratios was measured in the range from 250 to 750 K, and λ-type heat capacity anomalies were found in each sample. The transition temperatures were 487 and 573 K for UO_2.663, 490 and 576 K for UO_2.656 and 508, 562 and 618 K for UO_2.640. The entropy changes of the transitions were 0.44 and 0.39 J K⁻¹mol⁻¹ for UO_2.663, 0.58 and 0.47 J K⁻¹mol⁻¹ for UO_2.656 and 0.62, 0.51 and 0.25 J K⁻¹mol⁻¹ for UO_2.640, increasing as O/U decreases. The enthalpy change due to the transition varied linearly with the transition temperature except for UO_2.640, showing the presence of the same mechanism of phase transition among the samples with various O/U ratios. The mechanism of the phase transition was discussed on the assumption that the transition is originated from the order-disorder rearrangement of U⁵⁺ and U⁶⁺ with a consequent displacement of atoms, similarly to the case of U₄O_9−y.     

Lattice location and electrical conductivity in ion implanted TiO2 single crystals

Single crystals of TiO₂ (rutile) were implanted at room temperature with Ar, Sn and W ions applying fluences of 10¹⁵/cm² to 10¹⁶/cm² at 300 keV. The lattice location, together with ion range and damage distribution was measured with Rutherford Backscattering and Channeling (RBS-C). The conductivity, σ, was measured as a function of temperature. The implanted Sn and W atoms were entirely substitutional on Ti sites in the applied fluence region, where the radiation damage did not yet reach the random level. A large σ increase was observed for all implants at displacement per atom values (dpa) below 1. Above dpa = 1, σ reveals a saturation value of 0.3 Ω⁻¹ cm⁻¹ for Ar implants, while for W and Sn implants a further increase of σ up to 30 Ω⁻¹ cm⁻¹ was measured. Between 70 K and 293 K ln σ was proportional to T^−1/2, (Ar,W) and T^−1/4 (Sn), indicating that the transport mechanism is due to variable range hopping.     

Defect evolution during ion bombardment of amorphous Si probed by in situ conductivity measurements

In this work we use in-situ conductivity measurements during ion irradiation as a sensitive probe of the defect structure of amorphous Si. Electronic transport in amorphous Si occurs by hopping at the high density ( 10²⁰ cm⁻³ eV⁻¹) of deep lying localized states introduced by the defects in the band gap. In-situ conductivity measurements allow to follow directly the defect generation and annihilation kinetics during and after ion bombardment of the material. Amorphous Si layers, patterned to perform conductivity measurements, were annealed at 500°C in order to reduce the defect density by about a factor of 5. Defects were subsequently reintroduced by high energy ion irradiation at different temperatures (77–300 K). During irradiation the conductivity of the layer increases by several orders of magnitude and eventually saturates. Turning off the beam results in a decrease of the conductivity by a factor of 2 in times as long as a few hours even at 77 K. The effects of different ions (He, C, Si, Cu, and Au) and different ion fluxes (10⁹–10¹² ions/cm² s) on these phenomena have been explored. These data give a hint on the mechanisms of defect production and annihilation and demonstrate a strong correlation between electrical and structural defects in amorphous silicon.     

Enthalpy and heat capacity of LiAlO2 between 298 and 1700 K by drop calorimetry

The enthalpy of γ-LiAlO₂ was measured between 403 and 1673 K by isothermal drop calorimetry. The smoothed enthalpy curve between 298 and 1700 K results in H⁰(T) − H⁰(298 K)=−37 396 + 93.143 · T + 0.00557 · T² + 2 725 221 · T⁻¹ J/mol. The standard deviation is 2.2%. The heat capacity was derived by differentiation of the enthalpy curve. The value extrapolated to 298 K is C_p,298=(65.8 ± 2.0) J/K mol.     

Range distribution of fluorine in F-implanted LiNbO3

Depth profiles of fluorine in ¹⁹F⁺implanted LiNbO³ have been accurately measured using the ₁₉F(p, γ)¹⁶O resonant nuclear reaction at E_R = 872.1 keV, with Γ = 4.2 keV. A proper convolution calculation method was used to extract the true distribution of fluorine from the experimental excitation yield curves. The experimental range distribution parameters, R_p and ΔR_p, were compared with those obtained by Monte Carlo simulation using a computer code developed recently in this group and with results obtained using the TRIM90 code. It shows that the experimental R_p values agree with the Monte Carlo simulation values very well, while the experimental ΔR_p values are larger than those obtained from the simulations. The simulation with our computer code improves the agreement between the experimental and calculated range straggling, ΔR_p.     

MD simulation of cluster formation during sputtering

The cluster ejection due to cluster impact on a solid surface is studied through molecular dynamics (MD) simulations. Simulations are performed for Cu cluster impacts on the Cu(1 1 1) surface for cluster energy 100 eV/atom, and for clusters of 6, 13, 28 and 55 atoms. Interatomic interactions are described by the AMLJ–EAM potential. The vibration energy spectrum is independent of the incident cluster size and energy. This comes from the fact that sputtered clusters become stable through the successive fragmentation of nascent large sputtered clusters. The vibration energy spectra for large sputtered clusters have a peak, whose energy corresponds to the melting temperature of Cu. The exponent of the power-law fit of the abundance distribution and the total sputtering yield for the cluster impacts are higher than that for the monatomic ion impacts with the same total energy, where the exponent δ is given by Y_n∝n^δ and Y_n is the yield of sputtered n-atom cluster. The exponent δ follows a unified function of the total sputtering yield, which is a monotonic increase function, and it is nearly equal to δ −3 for larger yield.     

Evaluation on chemical state of irradiated rock-like oxide fuels by nuclear and chemical modeling

Chemical forms of fission products in irradiated ROX fuels were calculated by the SOLGASMX-PV code, and the resultant phase equilibrium and the oxygen potential in the fuel were evaluated in order to assess the irradiation behavior of the ROX fuels. For the ROX fuel with reactor grade Pu, the oxygen potential increased to about −140 kJ mol⁻¹ at EOL when all the Pu in the fresh fuel was tetravalent. In the case of fresh fuel which was partially reduced with the [Pu⁺³]/[Pu⁺⁴]=10/90, the oxygen potential increase was suppressed to about −400 kJ mol⁻¹. On the other hand, the oxygen potential of the ROX fuel with weapon grade Pu never exceeded the value of about −400 kJ mol⁻¹. The difference of oxygen potentials was caused by difference of Am amount produced by Pu conversion. The oxygen potential of the irradiated fuel was controlled by the phase equilibria among FPs. The equilibrium between metallic Mo and MoO₂ controlled the oxygen potential to about −400 kJ mol⁻¹.     

Thermodynamic studies on Cs4U5O17(s) and Cs2U2O7(s) by emf and calorimetric measurements

The oxygen potentials over the phase field: Cs₄U₅O₁₇(s)+Cs₂U₂O₇(s)+Cs₂U₄O₁₂(s) was determined by measuring the emf values between 1048 and 1206 K using a solid oxide electrolyte galvanic cell. The oxygen potential existing over the phase field for a given temperature can be represented by: Δμ(O₂) (kJ/mol) (±0.5)=−272.0+0.207T (K). The differential thermal analysis showed that Cs₄U₅O₁₇(s) is stable in air up to 1273 K. The molar Gibbs energy formation of Cs₄U₅O₁₇(s) was calculated from the above oxygen potentials and can be given by, Δ_fG⁰ (kJ/mol)±6=−7729+1.681T (K). The enthalpy measurements on Cs₄U₅O₁₇(s) and Cs₂U₂O₇(s) were carried out from 368.3 to 905 K and 430 to 852 K respectively, using a high temperature Calvet calorimeter. The enthalpy increments, (H⁰_T−H⁰₂₉₈), in J/mol for Cs₄U₅O₁₇(s) and Cs₂U₂O₇(s) can be represented by, H⁰_T−H⁰_298.15 (Cs₄U₅O₁₇) kJ/mol±0.9=−188.221+0.518T (K)+0.433×10⁻³T² (K)−2.052×10⁻⁵T³ (K) (368 to 905 K) and H⁰_T−H⁰_298.15 (Cs₂U₂O₇) kJ/mol±0.5=−164.210+0.390T (K)+0.104×10⁻⁴T² (K)+0.140×10⁵(1/T (K)) (411 to 860 K). The thermal properties of Cs₄U₅O₁₇(s) and Cs₂U₂O₇(s) were derived from the experimental values. The enthalpy of formation of (Cs₄U₅O₁₇, s) at 298.15 K was calculated by the second law method and is: Δ_fH⁰_298.15=−7645.0±4.2 kJ/mol.