PSf对提高PVDF/PSf/TiO_2共混膜抗污染性的作用

采用相转化法制备了PVDF/PSf/TiO2共混膜,重点考察了加入少量PSf对共混膜结构和性能变化的影响,用扫描电镜(SEM)、接触角仪和拉伸强度仪等对膜的形态、亲水性和机械性能等进行表征.结果表明,加入PSf后TiO2在整个膜断面分散更均匀,膜整体亲水性增强,不可逆污染减少.在膜配比PVDF/PSf/TiO2为90/10/3时,共混膜的通量恢复率由64.0%增大至93.2%,膜的抗污染性明显增加.     

PSf/SPES共混相容性及其对膜形态结构和性能的影响规律

针对聚砜(PSf)和磺化聚醚砜(SPES)聚合物共混体系相容性,首先通过混合焓法计算预测并用差示扫描量热法(DSC)进行了分析.结果表明,二者为部分相容体系,且相容性随共混比的增大呈下降趋势.此外,以N,N-二甲基乙酰胺(DMAc)为溶剂,采用浸没沉淀相转化法制备出PSf/SPES共混平板超滤膜,系统研究了共混相容性对膜形态结构及性能的影响规律.结果表明,当PSf/SPES共混比小于90/10(质量比)时,聚合物共混具有较好的相容性,所制备共混膜的断面为梯度分布的海绵网络孔结构,且亲水性、表面孔孔径、孔隙率和纯水通量等均随着共混比的增大而增大.其中,当PSf/SPES=92/8时,膜的纯水通量达到1 397L/(m2·h),对牛血清蛋白(BSA)截留率为85%.随着PSf/SPES共混比进一步增加,共混体系相容性变差,膜的断面出现指状孔结构,BSA截留率显著下降.     

PSf/PPESK共混超滤膜制备及性能研究

将聚砜(PSf)和聚醚砜酮(PPESK)按比例共混,采用L-S相转化法制备超滤膜,考察共混比、固含量、添加剂等对膜水通量和截留率的影响.实验结果表明:当聚合物的固含量为12%,PSf/PPESK共混比为7/3,NMP作溶剂,PEG4000作添加剂,凝胶浴温度50℃,挥发时间为10 s时,所制得的PSf/PPESK共混膜性能较好,其水通量为1 930 L/(m2.h),对牛血清蛋白的截留率为58.2%.     

纳米无机小分子物质对PVC/PVDF/PMMA共混膜性能的影响

讨论了纳米无机小分子物质TiO2、SiO2、Al2O3对PVC/PVDF/PMMA共混溶液的剪切黏度及其共混膜形态结构、水通量及机械性能等性能的影响,结果表明,无机小分子TiO2、SiO2、Al2O3的加入均能使PVC/PVDF/PMMA共混溶液的剪切粘度增加,但TiO2增加的程度最大,SiO2、Al2 O3增加的程度相当;纳米TiO2、SiO2、Al2O3对使PVC/PVDF/PMMA共混膜的水通量和韧性有较大程度的提高,且加入量为2％时,提高程度最大;SiO2、Al2O3对共混膜的结构有一定程度的影响,并使共混膜的拉伸强度略有降低,TiO2的加入对膜的结构没有太大的影响,但能使共混膜的拉伸强度略有提高.     

CA/PSf共混超滤膜的制备及性能研究

以聚砜(PSf)为基膜材料,醋酸纤维素(CA)为共混膜材料,N,N-二甲基乙酰胺(DMAc)为溶剂,去离子水为凝固浴,采用非溶剂致相分离法(NIPS法)制备CA/PSf共混平板超滤膜.综合考察了共混膜有机物溶出量,铸膜液聚合物浓度和共混比以及不同凝固浴组成对膜结构、水通量、水接触角、孔隙率、蛋白质截留率的影响.结果表明:相对于传统的以聚乙烯吡咯烷酮(PVP)作为添加剂的共混膜,使用CA作为添加剂,共混膜有机物溶出量大幅降低.随着CA含量的增加,共混膜孔隙率逐渐增大,亲水性增加.另外,随着凝胶浴中溶剂含量的增大,共混膜纯水通量不断降低,BSA截留率逐渐升高,膜形态结构变得更加致密.     

PPTA/PSf原位共混合成过程中PPTA分子量的控制

采用原位共混合成法在聚砜(PSf)/N-甲基吡咯烷酮(NMP)体系中合成刚性高分子聚对苯二甲酰对苯二胺(PPTA),制备出PPTA/PSf原位共混铸膜液.FT-IR结果表明,在PSf/NMP体系中成功合成了PPTA.通过考察PPTA/PSf共混比、聚合物含量、助溶剂浓度和酸吸收剂浓度对在PSf/NMP体系中合成的PPTA分子量的影响,确定了一系列提高PPTA分子量的影响因素.     

GO/PVDF共混超滤膜的制备及其抗生物污染性能研究

将氧化石墨烯(GO)加入PVDF铸膜液中,通过浸没沉淀法制备不同GO含量的PVDF共混超滤膜,考察了GO掺杂对PVDF超滤膜亲水性和膜孔道结构的影响,并以铜绿假单胞菌进行共混膜的抑菌性能和抗生物污染性能测试.研究结果表明,共混GO可以降低PVDF膜的接触角,提高其亲水性,增大支撑层指状孔比例,提高纯水通量.当GO质量分数为0.5%时,PVDF膜接触角降低至64°,纯水通量提高64%.共混GO也大大提高了PVDF膜的抑菌性和抗生物污染性,在过滤铜绿假单胞菌溶液时,PVDF膜的不可逆阻力为5.4×10~(12) m~(-1),PVDF/0.5%GO共混膜的不可逆阻力为1.8×10~(12) m~(-1),减小了66.7%.     

Al2O3/TiO2/PVDF杂化超滤膜的制备及其性能研究

为提高聚偏氟乙烯(PVDF)超滤膜的亲水性,增强其在水处理中的抗污染能力,用无机纳米二氧化钛(TiO2)、氧化铝(Al2O3)与聚偏氟乙烯共混,采用相转化法制得无机改性有机高分子杂化超滤膜。采用杯式超滤装置考察了无机纳米颗粒的含量对杂化膜水通量的影响;测定了膜的纯水接触角、机械性能、截留效率和膜的孔径及孔径分布;采用扫描电子显微镜对膜表面进行观察。结果表明,纳米颗粒加入量为3%,TiO2与Al2O3的加入比为1∶1时,杂化膜的水通量较有机膜提高了79.5%,但截留率保持不变;杂化膜的机械强度最大增加41.6%;杂化膜的纯水接触角由未改性前的78.68°降至50.54°,亲水性得到明显改善;杂化膜的平均孔径增大,孔径分布更加均匀;纳米颗粒的加入增加了膜表面的孔密度,但没有改变膜断面的微观结构。杂化超滤膜不仅保持了PVDF膜的优良性能,而且增强了其强度、亲水性和抗污染性能。     

PVDF/PMMA/CA共混膜的制备及性能研究

主要讨论了PVDF(聚偏氟乙烯)／PMMA(聚甲基丙烯酸甲酯)／CA(醋酸纤维素)三元共混膜的制备及性能,并研究了影响膜性能的主要因素．正交实验结果表明：在PVDF／PMMA／CA体系中,PVDF同亲水性物质PMMA和CA的共混比是影响共混膜的水通量的首要因素;而PMMA与CA的共混比则对共混膜强度影响最大,当PMMA与CA的质量共混比为1：1时,膜强度最大;PMMA对膜的亲水性有较大的贡献,共混膜中只要有PMMA加入,其润湿角就变得同纯PMMA膜的润湿角相接近,通过采用红外衰减全反射法和干膜撕裂法,分别从微观和宏观上证明了PVDF／PMMA/CA气制膜体系在自来水中将会发生分层凝胶现象;综合考虑膜的各种性能,针对PVDF／PMMA／CA体系,较佳的制膜条件定为A883C2D12,也就是PVDF/CA/PMMA的质量共混比为12：2：1,以质量溶剂比为8：2的二甲基甲酰胺(DMF)／冰乙酸混合溶剂溶解,制得的膜的性能较好．     

PVDF/PDA共混膜的制备及其性能研究

采用多巴胺自聚合原理生成聚多巴胺,通过聚多巴胺对PVDF膜进行共混改性,制得聚偏氟乙烯/多巴胺(PVDF/PDA)共混膜.采用SEM、纯水和酵母悬浊液超滤杯恒压过滤测试以及抗污染能力测试等对共混膜的结构和性质进行考察,同时探讨了不同共混浓度及不同PDA添加量对膜抗污染能力的影响.PDA添加量为0.3%(质量分数)时,纯水通量从PVDF对照膜的56.19L/(m2·h)提高至69.63L/(m2·h).通过重复过滤实验考察共混膜的抗污染能力,结果表明,加入PDA后共混膜的抗污能力有很大提高,PVDF对照膜的一次和二次通量恢复率仅为68.5%和56.4%,而PDA改性后的共混膜通量恢复率均在90%以上.     

SiO2/PSf杂化超滤膜制备和性能研究

分别以粉末和溶胶-凝胶的方式向聚砜铸膜液中添加不同含量的SiO2,通过L-S相转换法制备SiO2/PSf杂化超滤膜.比较两种体系在不同SiO2含量下铸膜液的稳定性、黏度,及膜的微观结构、平均孔径、孔隙率、渗透性能和机械性能.结果表明,以溶胶-凝胶方式添加SiO2的铸膜液更加稳定,各方面性能更好.粉末添加下SiO2含量为2%时效果较好,水接触角为62°,纯水通量为141 L/(m2·h),对腐殖酸(Mr=370 000)的截留率为83.7%;溶胶-凝胶添加下SiO2含量为8%～10%时效果较好,水接触角为40°,纯水通量为182 L/(m2·h),对腐殖酸(Mr=370 000)的截留率为92%.     

双层刮膜法中聚砜膜结构的控制和性能研究

同时刮膜法是一种利用涂层与支撑层分离来制备高表面开孔率微孔膜的方法.本文采用同时刮膜法制备PSf微孔膜,考察了底层制膜液中聚砜的浓度、添加剂PVPK-90含量、凝胶浴温度以及PEI涂层厚度等参数对膜结构和性能的影响.结果表明,PSf溶液中聚合物浓度增大使溶液的黏度明显增大,同时膜表面凹洞数目减少,孔径减小,且水通量减少...     

低临界共溶温度PSf-DMAc-PEG体系微孔膜及其性能表征

讨论了聚砜(PSf)-N,N-二甲基乙酰胺(DMAc)-聚乙二醇(PEG200、PEG400和PEG600)低临界共溶温度(LCST)体系;通过理论和实验验证了其LCST体系的存在,利用LCST的热致相分离(LCST-TIPS或Reverse thermally induced phase separation,简称RTIPS)法制备了PSf微孔膜,讨论了凝胶浴温度、制膜方法、铸膜液组成对PSf微孔膜的结构及性能影响.通过RTIPS机理所成膜综合力学性能优于非溶剂致相分离(NIPS)法所制备的膜,当PEG400:DMAc质量比为1.1:1,成膜水浴温度60℃时,膜渗透性能和机械性能较好,其膜通量670 L/(m~2·h·bar)(1 bar=0.1 MPa),平均孔径0.060μm,断裂强度5.62MPa.     

Structural and optical properties of AlxOy/Pt/AlxOy multilayer absorber

We report on the microstructure and optical properties of Al_xO_y–Pt–Al_xO_y interference-type multilayer films, deposited by electron beam (e-beam) deposition onto corning 1737 glass, silicon (1 1 1) and copper substrates. The structural properties were investigated by Rutherford backscattering spectrometry, X-ray diffraction, scanning electron microscopy, energy dispersive X-ray spectroscopy and atomic force microscopy. The optical properties were extracted from specular reflection/transmission, diffuse reflectance and emissometer measurements. The stratification of the coatings consists of a semi-transparent middle Pt layer sandwiched between two layers of Al_xO_y. The top and bottom Al_xO_y layers were non-stoichiometric with no crystalline phases present. The Pt layer is in the fcc crystalline phase with a broad size distribution and spheroidal shape in and between the rims of Al_xO_y. The surface roughness of the stack was found to be comparable to the inter-particle distance. The optical calculations confirm a high solar absorptance of ∼0.94 and a low thermal emittance of ∼0.06 for the multilayer stack, which is attributed not only to the optimized nature of the multilayer interference stacks, but also to the specific surface morphology and texture of the coatings. These optical characteristics validate the spectral selectivity of the Al_xO_y–Pt–Al_xO_y interference-type multilayer stack for use in high temperature solar-thermal applications.     

Optimization of AlxOy/Pt/AlxOy multilayer spectrally selective coatings for solar-thermal applications

Spectrally selective Al_xO_y/Pt/Al_xO_y multilayer absorber coatings were deposited onto corning 1737 glass, Si (111) and copper substrates using electron beam (e-beam) vacuum evaporator at room temperature. The employment of ellipsometric measurements and optical simulation was proposed as an effective method to optimize and deposit multilayer solar absorber coatings. The optical constants (n and k) measured using spectroscopic ellipsometry, showed that both Al_xO_y layers, which used in the coatings, were dielectric in nature and the Pt layer was semi-transparent. The optimized multilayer coatings exhibited high solar absorptance α ∼ 0.94 ± 0.01 and low thermal emittance ? ∼ 0.06 ± 0.01 at 82 °C. The Rutherford backscattering spectroscopy (RBS) data of Al_xO_y/Pt/Al_xO_y multilayer absorber indicated the Al_xO_y layers present in the coating were nearly stoichiometry. The scanning electron microscope analysis (SEM) result indicated that the average diameter and inter-particles distance of Pt grains were statistically about 146 ± 0.17 nm and 6-10 ± 0.2 nm respectively.     

Interfacial microstructure of NiSix/HfO2/SiOx/Si gate stacks

Integration of NiSi_x based fully silicided metal gates with HfO₂ high-k gate dielectrics offers promise for further scaling of complementary metal-oxide- semiconductor devices. A combination of high resolution transmission electron microscopy and small probe electron energy loss spectroscopy (EELS) and energy dispersive X-ray analysis has been applied to study interfacial reactions in the undoped gate stack. NiSi was found to be polycrystalline with the grain size decreasing from top to bottom of NiSi_x film. Ni content varies near the NiSi/HfO_x interface whereby both Ni-rich and monosilicide phases were observed. Spatially non-uniform distribution of oxygen along NiSi_x/HfO₂ interface was observed by dark field Scanning Transmission Electron Microscopy and EELS. Interfacial roughness of NiSi_x/HfO_x was found higher than that of poly-Si/HfO₂, likely due to compositional non-uniformity of NiSi_x. No intermixing between Hf, Ni and Si beyond interfacial roughness was observed.     

Properties of CdxPb1−xTe thin films

Thin films of Cd_xPb_1?xTe have been grown on mica substrates using a flash evaporation technique and isothermal substrate heaters. The Cd concentration of the films was found to increase with decreasing substrate temperature and increasing deposition rates. The Hall coefficient changed from positive to negative with increasing substrate temperature, as did the Seebeck coefficient. Both these changes were associated with an increase in the rate of re-evaporation of Te and an improvement in the crystallinity of the films. Carrier mobilities less than bulk values were obtained; scattering mechanisms are discussed.     

Bibliography of high-Tcsuperconductivity

Bibliography of high-T _c superconductivity