New trends to grow the n-CdZn (S1−xSex)2/p-CuIn(S1−xSex)2 heterojunction thin films for solar cell applications

The n-CdZn(S_1−xSe_x) and p-CuIn(S_1−xSe_x)₂ thin films have been grown by the solution growth technique (SGT) on glass substrates. Also the heterojunction (p–n) based on n-CdZn (S_1−xSe_x)₂ and p-CuIn (S_1−xSe_x)₂ thin films fabricated by same technique. The n-CdZn(S_1−xSe_x)₂ thin film has been used as a window material which reduced the lattice mismatch problem at the junction with CuIn (S_1−xSe_x)₂ thin film as an absorber layer for stable solar cell preparation. Elemental analysis of the n-CdZn (S_1−xSe_x)₂ and p-CuIn(S_1−xSe_x)₂ thin films was confirmed by energy-dispersive analysis of X-ray (EDAX). The structural and optical properties were changed with respect to composition ‘x’ values. The best results of these parameters were obtained at x=0.5 composition. The uniform morphology of each film as well as the continuous smooth thickness deposition onto the glass substrates was confirmed by SEM study. The optical band gaps were determined from transmittance spectra in the range of 350–1000 nm. These values are 1.22 and 2.39 eV for CuIn(S_0.5Se_0.5)₂ and CdZn(S_0.5Se_0.5)₂ thin films, respectively. J–V characteristic was measured for the n-CdZn(S_1−xSe_x)₂/p-CuIn(S_1−xSe_x)₂ heterojunction thin films under light illumination. The device parameters V_oc=474.4 mV, J_sc=13.21 mA/cm², FF=47.8% and η=3.5% under an illumination of 85 mW/cm² on a cell active area of 1 cm² have been calculated for solar cell fabrication. The J–V characteristic of the device under dark condition was also studied and the ideality factor was calculated which is equal to 1.9 for n-CdZn(S_0.5Se_0.5)₂/p-CuIn(S_0.5Se_0.5)₂ heterojunction thin films.     

CuInxGa1−xSe2 thin films prepared by electron beam evaporation

CuIn_xGa_1−xSe₂ bulk compound of three different compositions x=0.75, 0.80 and 0.85 have been prepared using individual elements of copper, indium, gallium and selenium. Thin films of CuIn_xGa_1−xSe₂ have been deposited using the prepared bulk by electron beam evaporation method. The structural studies carried on the deposited films revealed that films annealed at 400 °C are crystalline in nature exhibiting chalcopyrite phase. The position of the (1 1 2) peak in the X-ray diffractogram corresponding to the chalcopyrite phase has been found to be dependent on the percentage of gallium in the films. The composition of the prepared bulk and thin films has been identified using energy dispersive X-ray analysis. The photoluminescence spectra of the CuIn_xGa_1−xSe₂ films exhibited sharp luminescence peaks corresponding to the band gap of the material.     

Sputtered Cd1−xZnxTe films for top junctions in tandem solar cells

Cd_1−xZn_xTe alloy films with 1.6 and 1.7 eV band gaps were deposited by RF magnetron sputtering from targets made either of mixed powders or alloys of CdTe and ZnTe (25% and 40%). High-quality polycrystalline films with the (1 1 1) preferred orientation were obtained. The films were characterized using X-ray diffraction (XRD), scanning electron microscopy, resistivity, optical absorption, Raman, and photoluminescence. The EDS, XRD, and optical absorption analysis indicated that the x-value of the as-grown films were typically 0.20 and 0.30 for films sputtered from 25% and 40% ZnTe containing targets, respectively. The as-deposited alloy films exhibit quite low photovoltaic performance when used to make cells with CdS as the hetero-junction partner. Therefore, we have studied various post-deposition treatments with vapors of chlorine-containing materials, CdCl₂ and ZnCl₂, in dry air or H₂/Ar ambient at 390 °C. The best performance of a Cd_1−xZn_xTe cell (, ) was found for treatment with vapors of the mixed CdCl₂+0.5%ZnCl₂ in an H₂/Ar ambient after pre-annealing at 520 °C in pure H₂/Ar.     

Highly conducting transparent nanocrystalline Cd1−xSnxS thin film synthesized by RF magnetron sputtering and studies on its optical, electrical and field emission properties

Transparent conducting Cd_1−xSn_xS thin films have been synthesized by radio frequency magnetron sputtering technique on glass and Si substrates for various tin concentrations in the films. X-ray diffraction studies showed broadening of peaks due to smaller crystal size of the Cd_1−xSn_xS films, and SEM micrographs showed fine particles with average size of 100 nm. Sn concentration in the films was varied from 0% to 12.6% as determined from energy-dispersive X-ray analysis. The room-temperature electrical conductivity was found to vary from 8.086 to 939.7 S cm⁻¹ and corresponding activation energy varied from 0.226 to 0.076 eV. The optimum Sn concentration for obtaining maximum conductivity was found to be 9.3%. The corresponding electrical conductivity was found to be 939.7 S cm⁻¹, and the mobility 49.7 cm² V⁻¹ s⁻¹. Hall measurement showed very high carrier concentrations in the films lying in the range of 8.0218×10¹⁸–1.7225×10²⁰ cm⁻³. The conducting Cd_1−xSn_xS thin films also showed good field emission properties with a turn on field 4.74–7.86 V μm⁻¹ with variation of electrode distance 60–100 μm. UV–Vis–NIR spectrophotometric studies of the films showed not needed the optical band gap energy increased from 2.62 to 2.80 eV with increase of Sn concentration in the range 0–12.6%. The optical band gap was Burstein–Moss shifted, and the corresponding carrier concentration obtained from the shift also well matched with that obtained from Hall measurement.     

Deposition of highly photoconductive wide band gap a-SiOx:H thin films at a high temperature without H2-dilution

Electrical and optical characterisation of hydrogenated amorphous silicon–oxygen alloy thin films (a-SiO_x:H, x<2) grown in a single chamber radio frequency plasma enhanced chemical vapour deposition (PECVD) system at a high substrate temperature of 300 °C is presented. The samples were investigated by Fourier transform infrared spectroscopy (FTIR), optical transmission, the constant photocurrent method (CPM), conductivity and steady-state photoconductivity measurements. With increasing oxygen concentration, the Tauc gap increases from 1.69 to 2.73 eV. The sample with an oxygen concentration of 26.2 at% and a reasonably high bandgap of 2.18 eV shows photoconductivity comparable to that of pure a-Si:H films. The Urbach parameter (E₀) increases almost linearly with oxygen concentration whereas the dangling bond defect density is found to be saturating at a value of about 7.1×10¹⁶ cm⁻³. One of the highly alloyed samples with exhibited a detectable photosensitivity.     

Low cost surface passivation for p-type mc-Si based on pseudobinary alloys (Al2O3)x(TiO2)1−x

The conventional process for back side passivation with full face Al screen printing layer is not suitable for very thin multicrystalline (mc-Si) solar cells and approaches to new technological processes are searched for. More investigations have been concentrated on local aluminum contacts and passivation coatings with different layers on mc-Si wafers. The aim of this work is to prove that (Al₂O₃)_x(TiO₂)_1−x is one promising candidate to be applied as passivation layer on multicrystalline Si. Investigations were performed on dielectric films of pseudobinary alloy (PBA) (Al₂O₃)_x(TiO₂)_1−x, prepared by chemical solution deposition known initially as sol–gel method. It was determined that their optical, dielectric and electrophysical properties are suitable for applications of these layers as back side surface passivation for thin multicrystalline silicon cells.     

Preparation of In2O3:F thin films grown by spray pyrolysis technique

Transparent conducting fluorine doped indium oxide (In₂O₃:F) thin films have been deposited on Corning 7059 glass substrates by the spray pyrolysis technique. The structural, electrical, and optical properties of these films were investigated as a function of substrate temperature. The X-ray diffraction pattern of the films deposited at lower substrate temperature (T_s=300 °C) showed no peaks of In₂O₃:F. In the useful range for deposition (i.e. 425–600 °C), the orientation of the films was predominantly [400]. For the 4500 Å thick In₂O₃:F deposited with an F content of 10-wt%, the minimum sheet resistance was 120 Ω and average transmission in the visible wavelength rang (400–700 nm) was 88%.     

Influence of CdCl2 treatment on structural and optical properties of vacuum evaporated CdTe thin films

In this article we have discussed the structural, optical properties of vacuum evaporated CdTe thin films before and after CdCl₂ treatment. The CdTe thin films were prepared by vacuum evaporation. Films were prepared under the vacuum of 10⁻⁶ Torr. The structural studies have been performed by the X-ray diffraction (XRD) technique. The XRD analysis of vacuum evaporated CdTe films reveals that the structure of films is polycrystalline in nature. However, the crystallinity has been improved after the CdCl₂ treatment as shown by an increase of the diffraction peak intensities. This is due to the enhancement in the atomic mobility of CdTe. The optical properties of the CdTe thin films have been studied by the spectrophotometer in the 300–800 nm wavelength range. It is observed that the optical band gap energy is highly dependent on CdCl₂ treatments. The optical transitions in these films are found to be direct and allowed.     

Electrodeposition of CuInxGa1−xSe2 thin films

CuIn_xGa_1−xSe₂ (CIGS) polycrystalline thin films with various Ga to In ratios were grown using a new two-step electrodeposition process. This process involves the electrodeposition of a Cu–Ga precursor film onto a molybdenum substrate, followed by the electrodeposition of a Cu–In–Se thin film. The resulting CuGa/CuInSe bilayer is then annealed at 600°C for 60 min in flowing Argon to form a CIGS thin film. The individual precursor films and subsequent CIGS films were characterized by X-ray diffraction, scanning electron microscopy, energy dispersive spectroscopy and Auger electron spectroscopy. The as-deposited precursor films were found to be crystalline with a crystal structure matching that of CuGa₂. The annealed bi-layers were found to have the same basic chalcopyrite structure of CuInSe₂, but with peak shifts due to the Ga incorporation. Energy dispersive spectroscopy results show that the observed shifts correlate to the composition of the films.     

Characterization of Ti1−xAlxN coatings with selective IR reflectivity

Ti_1−xAl_xN thin films were deposited by reactive magnetron sputtering. The obtained different stoichiometries give rise to different optical properties as the films change from metallic to dielectric. In this work the IR reflectivity of these coatings is investigated taking into account different application fields for IR selective Ti_1−xAl_xN thin films.Low Al content coatings present high reflectivity, high absorptance and low thermal emittance. High Al compositions give raise to coatings with high absorptance and high thermal emittance.The composition of the coatings was evaluated combining electron energy loss spectroscopy (EELS) and energy dispersive spectroscopy. Scanning electron microscopy (SEM) revealed a columnar structure. Reflectance spectra for the visible and infrared spectral ranges were used to obtain the solar absorptance and thermal emittance values, used to calculate the equilibrium temperature of the coatings.The thermal stability in air from 300 to 600 °C was also evaluated.     

Synthesis and characterization of one-step electrodeposited CuIn(1−x)GaxSe2/Mo/glass films at atmospheric conditions

CuIn_(1−x)Ga_xSe₂ (CIGS) thin films were prepared by one-step electro-deposition technique from a salt bath coupled with thiocyanate complex electrolytes followed by annealing in argon atmosphere at 300 °C. The influence of deposition reduction potentials as well as the salt concentrations on the structure, morphology, composition and the optical properties were performed. A reproducible Cu-In-Ga-Se precursor layer deposition with consistent composition control was demonstrated. The as-deposited films exhibit an amorphous behavior; however the films displayed good crystallization after annealing. The films show very uniform and dense grain formation with platelet-like nanostructures. The optical properties of the films are modified due to annealing. The electrical conductivity measurements demonstrate that the transport mechanism is influenced by three different temperature regions: the ionization, extrinsic and intrinsic regions, respectively, as found in other semiconductors. However, the annealed films display downturn in conductivity at low temperature indicating that there may be trapping at localized sites or scattering of the free carriers, which may be attributed to the over growth and defect sites. The electro-deposition technique demonstrates promise of growing high-quality CIGS thin films.     

Electrical conduction studies of hot wall deposited CdSexTe1−x thin films

CdSe_xTe_1−x thin films of different compositions have been deposited on cleaned glass substrates using the hot wall deposition technique under conditions very close to thermodynamical equilibrium with minimum loss of material. The electrical conductivity of the deposited films has been studied as a function of temperature. All the films showed a transition from phonon-assisted hopping conduction through the impurity band to grain-boundary-limited conduction in the conduction/valence band at temperature around 325 K. The conductivity has been found to vary with composition; it varied from 0.0027 to 0.0198 Ω⁻¹ cm⁻¹ when x changed from 0 to 1. The activation energies of the films of different compositions determined at 225 and 400 K have been observed to lie in the range 0.0031–0.0098 and 0.0285–0.0750 eV, respectively. The Hall-effect studies carried out on the deposited films revealed that the nature of conductivity (p or n-type) was dependent on film composition; films with composition x=0 and 0.15 have been found to be p-type and the ones with composition x=0.4, 0.6, 0.7, 0.85 and 1 have been observed to exhibit n-type conductivity. The carrier concentration has been determined and is of the order of 10¹⁷ cm⁻³. The majority of carrier mobilities of the films have been observed to vary from 0.032 to 0.183 cm² V⁻¹ s⁻¹ depending on film composition. The study of the mobility of the charge carriers with temperature in the range of 300–450 K showed that the mobility increased with power of temperature indicating that the type of scattering mechanism in the studied temperature range is the ionized impurity scattering mechanism.     

Optical and electrical studies on molybdenum sulphoselenide [Mo(S1−xSex)2] thin films prepared by arrested precipitation technique (APT)

Nanocrystalline stoichiometric [Mo(S_1−xSe_x)₂] thin films were deposited by using arrested precipitation technique (APT) developed in our laboratory. The precursors used for this are namely, molybdenum triethanolamine complex, thioacetamide and sodium selenosulphite; and various preparative conditions are finalised at the initial stages of deposition. Formation of [Mo(S_1−xSe_x)₂] semiconducting thin films are confirmed by studying growth mechanism, optical and electrical properties. X-ray diffraction analysis showed that the composites are nanocrystalline being mixed ternary chalcogenides of the general formula [Mo(S_1−xSe_x)₂]. The optical studies revealed that the films are highly absorptive (α×10⁴ cm⁻¹) with a band-to-band direct type of transitions and the energy gap decreased typically from 1.86 eV for pure MoS₂ down to 1.42 eV for MoSe₂. The thermoelectrical power measurement shows negative polarity for the generated voltage across the two ends of semiconductor thin films. This indicate that the [Mo(S_1−xSe_x)₂] thin film samples show n-type conduction.     

WO3−x nanowires based electrochromic devices

A simple method was developed to fabricate tungsten oxide (WO_3−x) nanowires based electrochromic devices. The WO_3−x nanowires are grown directly from tungsten oxide powders in a tube furnace. The WO_3−x nanowires have diameters ranging from 30 to 70 nm and lengths up to several micrometers. The WO_3−x nanowires based device has short bleach-coloration transition time and can be grown on a large scale directly onto an ITO-coated glass that makes it potential in many electrochromic applications. The structure, morphology, and composition of the WO_3−x nanowires were characterized using the scanning electron microscopy, transmission electron microscopy, X-ray diffraction, and energy-dispersive spectrometer. The optical and electrochromic performance of the nanowires layer under lithium intercalation was studied in detail by UV–VIS–NIR spectroscope and cyclic voltameter.     

Optical, electrical and structural investigations on Cd1−xZnxSe sintered films for photovoltaic applications

II–VI polycrystalline semiconducting materials have come under increased scrutiny because of their wide use in the cost reduction of devices for photovoltaic applications. Cd_1−xZn_xSe is an important semiconducting alloy because of the tunability of its physical parameters such as band gap and lattice parameters by controlling its stoichiometry. Many more material characteristics of it would be altered and excellently controlled by controlling system composition x.Polycrystalline thin films of Cd_1−xZn_xSe with variable composition (0x1) have been deposited onto ultra-clean glass substrates by sintering process. The optical, structural and electrical transport properties of Cd_1−xZn_xSe thin films have been examined. The optical band gap and optical constants of these films were determined by using double beam spectrophotometer. The DC conductivity and activation energy of the films were measured in vacuum by two-probe technique. The Schottky junction of Cd_1−xZn_xSe with indium was made and the barrier height and ideality factor were determined using current–voltage characteristics. The nature of sample, crystal structure and lattice parameters were determined from X-ray diffraction patterns. The films were polycrystalline in nature having cubic zinc-blende structure over the whole range studied.Sintering is very simple and viable compared to other cost intensive methods. The results of the present investigation will be useful in characterizing the material, Cd_1−xZn_xSe, for its applications in photovoltaics.     

Structural and optical properties of MgyNi1–yHx gradient thin films in relation to the as-deposited metallic state

Thin Mg_yNi_1−yH_x films with a gradient in chemical composition are investigated by optical spectrophotometry, dc resistivity and X-ray diffraction measurements before and after exposure to hydrogen. In the metallic state crystalline Mg₂Ni is present for 0.6 ≤ y ≤ 0.8 and coexists with amorphous Mg and/or Ni. The hydride state is mainly characterized by the presence of Mg₂NiH₄ around the stoichiometric [Mg]/[Ni] = 2 composition and some MgH₂ on the Mg-rich side. The abrupt microstructural changes found in the as-deposited metallic state around the Mg–Mg₂Ni eutectic point correlate well with the compositional dependence of the optical properties in the hydride state. We conclude that the formation of the hydride depends directly on the detailed nature of the metallic parent phase. Furthermore, we demonstrate that high-throughput compositional screening via fiber-optic spectrophotometry is useful for hydride identification. When no structural long-range order is present, this provides a new tool for the search for hydrogen storage materials.     

A note on fast protonic solid state electrochromic device: NiOx/Ta2O5/WO3−x

In the present investigation, the electrochromic properties of a fast protonic solid state device: NiO_x/Ta₂O₅/WO_3−x prepared at room temperature (300 K) is reported. The non-stoichiometric tungsten oxide thin film is prepared by reactive DC magnetron sputtering technique on ITO coated glass; the oxides of tantalum (300 nm) and nickel (100 nm) are prepared by electron beam evaporation. This proton device has a coloration efficiency of 82.4 cm²/C and coloration and bleaching time of 6 and 5 s, respectively, and a transmittance variation of 60%. The work function of WO_3−x thin films by Kelvin probe in uncolored and colored states are 4.73 and 4.30 eV, respectively.     

Kinetics and thermodynamic behavior of WO3 and WO3:P thin films

 There is a considerable interest in the research and development of materials and devices, that can be used for optical switching of large-scale glazings. Several potential switching technologies are available for glazings, including those based on electrochromic, thermochromic and photochromic phenomena. One of the most promising technologies for optical switching devices is electrochromism (EC). In order to improve the electrochromic properties of tungsten oxide, we have investigated the effect of phosphorous insertion on the electrochromic behavior of oxide films prepared by the sol–gel process.The kinetics and thermodynamics of electrochemical intercalation of lithium into Li_xWO₃ and Li_xWO₃:P films prepared by the sol–gel process were investigated. The standard Gibbs energy for lithium intercalation was calculated. The chemical diffusion coefficients, D, of lithium intercalation into oxide, were measured by galvanostatic intermittent titration technique (GITT), as functions of the depth of lithium intercalation.     

Preparation and study of structural and optical properties of CSVT deposited CuInSe2 thin films

A simple close-spaced vapour transport (CSVT) system has been designed and fabricated. Copper indium diselenide (CuInSe₂) thin films of wide range of thickness (4000–60000 Å) have been prepared using the fabricated CSVT system at source temperatures 713, 758 and 843 K. A detailed study on the deposition temperature has been made and the temperature profile along with the reaction kinetics is reported. The composition of the chemical constituents of the films has been determined by energy dispersive X-ray analysis. The structural characterization of the as-deposited CuInSe₂ films of various thicknesses has been carried out by X-ray diffraction method. The diffractogram revealed that the CuInSe₂ films are polycrystalline in nature with chalcopyrite structure. The structural parameters such as lattice constants, axial ratio, tetragonal distortion, crystallite size, dislocation density and strain have been evaluated and the results are discussed. The surface morphology of the as-deposited CuInSe₂ thin films has been studied using scanning electron microscope. The transmittance characteristics of the CuInSe₂ films have been studied using double beam spectrophotometer in the wavelength range 4000–15000 Å and the optical constants n and k are evaluated. The absorption coefficient has been found to be very high and is of the order of 10⁵–10⁶ m⁻¹. CuInSe₂ films are found to have a direct allowed transition and the optical band gap is found to be in the range 0.85–1.05 eV.     

Thin films of CuInSe2 prepared by RF sputtering from various compositional powder targets

CuInSe₂ thin films were prepared in the temperature range of 300–500°C by RF sputtering from powder targets, which were previously synthesized by reacting Cu, In, and Se in various ratios. The peaks from X-ray diffraction analyses were assigned to the planes of the CuInSe₂ chalcopyrite structure. The full width at half maximum of the (112) diffraction peak decreased with an increase in Cu/In ratio in the thin films. The photoelectron energies of the prepared thin films agreed with those reported for single crystalline CuInSe₂ from X-ray photoelectron spectroscopy measurements. The electronic conduction type and optical properties were found to change according to the Cu/In ratio in the thin films.