非共轴掠入射X射线显微镜参数的误差分析

设计了一套由4个反射镜组成的非共轴掠入射X射线显微镜,分析了该系统的像差和成像质量。为了研制出高质量的设备,需要制定合理的加工和装配公差。研究了由于元件和结构参数(反射镜的半径,物距,掠入射角等)的误差而引起的高斯参数和像差的变化。首次用点列图和调制传递函数来定量评价图像质量降低的程度,并在此基础上制定了合理的加工和装配公差。在这些公差的约束下,研制成一套非共轴掠入射X射线显微镜,在激光引爆的惯性约束聚变的诊断实验中,用该系统获得了高质量的图像。     

Manufacturing and testing of X-ray imaging components with high precision

1Introduction X rayimagingtechnologyhasbeenoneof themostimportantresearchcontentssince RoentgendiscoveredX rayin1895.Initially,X raywasusedtostudytheinternalstructureof substancesbycontactradiography.Thespeci menisplacedincontactwithaphotographicfilm duringtheX rayexposure.Theimageofthe specimenisdisplayedafterdeveloping.The methodhasbeenuseduntilnow,anditiswidely appliedinmedicaltreatmentandinnerflawsde tectionofindustrialmaterials.Sincetherefractiveindicesofmaterialsin X rayrangearelowert…     

大型X射线光学仪器:单层镜和多层镜的制造与表征

150~500 mm长度的各种X射线光学元件可用于光束导引,光束调整,以及单色化。本文介绍了两种不同的大型X射线反射镜。第一种为单层反射镜,这种反射镜以2°掠入射角在软X射线区(50~200 eV)起全反射镜作用,可用于自由电子激光器,如德国汉堡的FLASH。第二种是多层镜,由于它的布喇格反射特性,适于作为反射镜以0.4~1°的入射角用于硬X射线区(20~50 keV),如层析光束线的同步辐射存储环中。两种反射镜都用最新物理汽相淀积法制备,并用磁控溅射来实现X射线光学应用所需要的优良光学品质。这一淀积工艺使不同批次的镀膜稳定性良好,有利于实际反射镜在优质衬底上的最后淀积。单层镜和多层镜在它们的相关能量范围内都有很高的反射率,表面粗糙度也很低,且在整个光学波长区这些特性表现均匀。文中所叙相关研究都是借助X射线反射计量(XRR)法,透射电子显微镜(TEM)、光学轮廓仪(OP),以及原子力显微镜(AFM)完成的。     

Development of optics for x-ray phase-contrast imaging of high energy density plasmas

Phase-contrast or refraction-enhanced x-ray radiography can be useful for the diagnostic of low-Z high energy density plasmas, such as imploding inertial confinement fusion (ICF) pellets, due to its sensitivity to density gradients. To separate and quantify the absorption and refraction contributions to x-ray images, methods based on microperiodic optics, such as shearing interferometry, can be used. To enable applying such methods with the energetic x rays needed for ICF radiography, we investigate a new type of optics consisting of grazing incidence microperiodic mirrors. Using such mirrors, efficient phase-contrast imaging systems could be built for energies up to ～100?keV. In addition, a simple lithographic method is proposed for the production of the microperiodic x-ray mirrors based on the difference in the total reflection between a low-Z substrate and a high-Z film. Prototype mirrors fabricated with this method show promising characteristics in laboratory tests.     

A method for the formation of ultrathin X-ray beams

It is demonstrated that ultrathin beams with an effective cross sectionh≲100 nm and an angular divergence Δϕ≲2′ below the diffraction limit can be obtained. This is achieved by irradiating the edge of an optically polished face by an X-ray beam with a wavelength of ∼0.1 nm at a grazing angle close to the critical angle of total external reflection and subsequent transmission of the refracted beam through an adjacent side face. Under conditions ensuring effectiveh values of 81 and 96 nm, the values of Δϕ observed experimentally for GaAs and Si samples at wavelengths of 0.154 and 0.139 nm are much smaller than the diffraction limit calculated according to the theory of prism spectrometers. This allows for the formation of an X-ray probe that can be used for local analysis, for example, and layer-by-layer investigations of thin film structures.     

大口径传输反射镜的研究进展

针对我国惯性约束聚变装置(ICF)对高性能传输反射镜元件的性能要求,探索了大口径传输反射镜制备涉及的关键技术与工艺。深入开展了K9玻璃坯片研制、光学冷加工、传输反射镜镀膜和激光预处理等方面的研究工作。提出了400mm口径K9反射类坯片精密退火工艺,形成了高精度平面加工技术路线;制备了低缺陷薄膜,并且建立了大口径光学元件预处理装置。最后,综述了大口径高性能传输反射镜研制方面的主要成果。研制的400mm口径传输反射镜在1053nm处以45°入射时,其表面粗糙度优于99.8%,面形PV值小于λ/3(λ=1 053nm),损伤阈值大于30J/cm2(5ns)。基于提出的技术研制的大口径传输反射镜已成功应用于我国神光系列高功率激光装置,有力支撑了我国大型激光装置的稳定运行。     

Optimization of a Wolter type I mirror for a soft X-ray microscope

The demand for an X-ray microscope has received much attention because of the desire to study living cells under high resolution. A Wolter type I mirror used for soft X-ray microscope optics has a number of advantages. Although much progress has been made, it is still not easy to fabricate this mirror and satisfy the surface roughness and figure error requirements. From the mirror fabrication point of view, it is necessary to see the mirror design and the tolerance budget, especially with respect to the surface roughness and the figure errors. This paper deals with the design and optimization of a Wolter type I microscope mirror. The optimization was carried out by choosing an optimum central grazing incidence angle for which a merit function had the maximum value. The image quality of the mirror was also examined. A smaller diameter gave better image quality because of the Abbe sine condition. Finally, the figure errors for the axial and the radial directions were simulated by sinusoidal deformation waves, and the figure tolerance was obtained.     

Correlation analysis of couple optical paths for microstereovision with stereo light microscope

A micro stereovision system with a stereo light microscope (SLM) has been applied in micromanipulation systems. There is a coupling connection between two optical paths of a stereo light microscope. The coupling intension corresponds with two factors: the structure of an SLM and the position of an object point in the view of an SLM. In this paper, a correlation function is proposed to describe the coupling intension between the couple optical paths of an SLM. The quantified results are applied to the error analysis of the imaging model. Experiments show that the correlation of the optical paths of a common main objective of stereo light microscope (CMO-SLM) is little more than that of a G-SLM, and the error must be considered when a pinhole imaging model is used to analyze its correlation. __________ Translated from Journal of Beijing University of Technology, 2006, 32(8): 724–729 [译自: 北京工业大学学报]     

软X射线掠入射金属光栅闪耀特性的 校正傅里叶展开微分法分析

在有限电导率光栅的微分理论中引入校正傅里叶展开方法,改善了计算收敛性。运用改进后的微分理论对软X射线波段掠入射金属光栅的闪耀特性做了数值分析,通过详细考察三角槽形、正弦槽形和矩形镀金光栅的软X射线-1级衍射效率对光栅结构参数和入射光状态参数的响应程度,给出了一种在使用和制作工艺上都能够接受的光栅技术指标。结果表明,作为闪耀波长为10.33 nm的软X射线波段掠入射镀金光栅,采用81°入射的刻线密度为1 200 l/mm,倾斜角为2°,顶角大于120°的三角槽形光栅较为合适,其效率可达到50%以上。同时,得到了一些优化软X射线波段掠入射金属光栅设计的新结论。     

长春光机所软X射线-极紫外波段光学研究

综述了我所软X射线-极紫外波段关键技术的研究进展。描述了软X射线-极紫外波段光源技术,研制了工作波段为6~22 nm的微流靶激光等离子体光源;介绍了光子计数成像探测器技术,研制出了有效直径为25 mm,等效像元分辨率为0.3 mm的极紫外波段探测器;开展了超光滑表面加工、检测技术的研究,研制了超光滑表面抛光机,加工出高面形精度的超光滑表面,面形精度为6 nm(RMS值),表面粗糙度达0.6 nm(RMS值);进行了软X射线-极紫外波段多层膜技术的研究,研制出13 nm处反射率为60%的多层膜反射镜,150 mm口径反射镜的反射率均匀性优于±2.5%;最后,讨论了软X射线-极紫外波段测量技术研究,研制出该波段反射率计,其测量范围为5~50 nm,光谱分辨率好于0.2 nm,测量重复性好于±1%。在上述关键技术研究基础上,研制出了极紫外波段成像仪和空间极紫外波段太阳望远镜,这些仪器在我国空间科学研究项目中发挥了作用。     

软X射线光学技术的某些进展

本文主要介绍软X射线等离子体光源、多层膜软X射线反射镜和软X射线显微镜。高强度的实验室用软X射线等离子体光源较之同步辐射具有体积小、造价低、光束大和单位脉冲光通量高等优点。最近发展的多层镀膜用于软X射线正入射光学元件,可以得到比掠入射光学元件好得多的分辨率。软X射线显微镜提供了生物样品分析的一种新工具,它填补了常用的光学显微镜和电子显微镜之间的空隙。     

An extra-bright X-ray source

A bremsstrahlung X-ray source based on deceleration of electrons in the target is described. Its overall dimensions and cost are typical of bremsstrahlung sources, and the main parameters of its X-ray beam are similar to those of synchrotron sources. In a range of Δλ/λ = 10⁻³, the spectral radiant power of CuKα is at least 100 mW/mrad with a divergence angle of 1 mrad. The direction of the X-ray beam at the outlet is arbitrary, depending on the source head holder design. The source can be embedded into existing nanolithography systems and used in medical and industrial introscopes and tomographs, in scientific instruments, etc.     

Optimal Parameter and Tolerance Design with a Complete Inspection Plan

The need to remain competitive has led manufacturing sectors to consider tolerances as the key to achieving low cost and high quality. To produce quality products at low cost in today’s manufacturing industry, an integration of product design and process planning is essential. Process tolerance is one of the most important parameters that link product design and process planning. The process mean is also a critical parameter for further quality improvement and cost reduction under the permissible process setting adjustment within design tolerance limits. This study discusses an approach to integrate the product and process design via the optimisation of process mean and process tolerance.     

Computer Controlled Polishing of the Off-axis Aspheric Mirrors

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Inspection Allocation Planning for a Multiple Quality Characteristic Advanced Manufacturing System

Producing products with multiple quality characteristics is always one of the concerns for an advanced manufacturing system. To assure product quality, finite automatic inspection systems should be used. Inspection planning to allocate inspection stations should then be performed to manage the limited inspection resource. Except for finite inspection station classes, in this work, the limited number of inspection stations, of each inspection station class, is considered for solving the inspection allocation problem in a multiple quality characteristic advanced manufacturing system. Since the product variety in batch production or job shop production increases to satisfy the changing requirements of the various customers, the tolerances specified will vary from time to time. This inspection allocation problem is solved using a unit cost model in which the manufacturing capability, inspection capability, and tolerance specified are concurrently considered for a multiple quality characteristic product. The situation of unbalanced tolerance design is also considered. The inspection allocation problem can then be solved according to customer requirements. Since determining the optimal inspection allocation plan seems to be impractical, as the problem size becomes large, two decision criteria (i.e. sequence order of workstation and tolerance interval) are employed separately to develop two different heuristic solution methods in this work. The performance of each method is measured in comparison with the enumeration method that generates the optimal solution. The result shows that a feasible inspection allocation plan can be determined efficiently. ID="A1"Correspondance and offprint requests to: Dr Yau-Ren Shiau, Department of Industrial Engineering, Feng-Chia University, 100 Wenhwa Road, Seatwen, PO Box 25–097, Taichung 407, Taiwan     

Inexpensive, high-quality optical relay for use in confocal scanning beam imaging

An inexpensive, high optical-quality relay lens made up of two eyepieces arranged in an afocal assembly for use in confocal scanning laser imaging is described. In the past we have used relays, within our confocal microscopes, made up of achromats with long focal lengths (> or = 10 cm), which take up large optical tracks and suffer from significant amounts of astigmatism and curvature of field. We quantify aberrations associated with achromat and eyepiece relays using CODE V optical design and analysis software. The eyepiece relay is found to be more compact, better corrected, and not significantly more expensive than its achromat counterpart. In addition to being used to interconnect two scanning mirrors optically as well as scanning mirrors with microscope objectives, it can form part of the optics in a confocal scanning laser MACROscope-Microscope system (Biomedical Photometrics, Inc., Waterloo, Ontario, Canada). Due to design constraints, the MACROscope-Microscope system cannot incorporate a conventional wide-field microscope into its structure such as is done in most commercial confocal microscopes. The eyepiece relay is used as a stand-alone, compact optical link between the scanning mirrors and the microscope objective. This consequently makes the MACROscope-Microscope system more compact and easier to commercialize.     

Optimization of exit-plane waves restored from HRTEM through-focal series

Atomic-resolution transmission electron microscopy has largely benefited from the implementation of aberration correctors in the imaging part of the microscope. Though the dominant geometrical axial aberrations can in principle be corrected or suitably adjusted, the impact of higher-order aberrations, which are mainly due to the implementation of non-round electron optical elements, on the imaging process remains unclear. Based on a semi-empirical criterion, we analyze the impact of residual aperture aberrations on the quality of exit-plane waves that are retrieved from through-focal series recorded using an aberration-corrected and monochromated instrument which was operated at 300 kV and enabled for an information transfer of ∼0.05 nm. We show that the impact of some of the higher-order aberrations in retrieved exit-plane waves can be balanced by a suitable adjustment of symmetry equivalent lower-order aberrations. We find that proper compensation and correction of 1st and 2nd order aberrations is critical, and that the required accuracy is difficult to achieve. This results in an apparent insensitivity towards residual higher-order aberrations. We also investigate the influence of the detector characteristics on the image contrast. We find that correction for the modulation transfer function results in a contrast gain of up to 40%.     

鱼眼镜头光学系统的优化方法

在鱼眼镜头成像系统中,光线以很大的入射角打在前组透镜表面时往往会造成严重的像差,为了压缩超大视场角,提出应用非球面前组负弯月型透镜来控制鱼眼镜头系统的像差。基于光学前组具有平面对称的成像特性,应用平面对称光学系统像差理论发展的评价函数,对非球面系数及其他的系统结构参数进行优化设计。应用评价函数及Zemax光线追迹成像模拟对优化系统进行评估。研究表明,应用非球面组负弯月型透镜能够显著地提高鱼眼镜头的成像质量。     

A compact Schwarzschild soft X-ray microscope with a laser-produced plasma source

A compact Schwarzschild soft X-ray microscope using a laser-produced plasma soft X-ray source has been developed. The laser-produced plasma source, which is small but of high brilliance, has made it possible to use the soft X-ray microscope in a small laboratory. The microscope is composed of a Schwarzschild objective and a grazing incidence mirror condenser. Image contrast for biological specimens in soft X-ray regions is investigated briefly. It is possible to observe the fine structures of a thin specimen at a wavelength of 15 nm; at this wavelength high-contrast images of biological specimens have been obtained with a single laser shot of pulse width of 8 ns at a resolution of 0·3 μm. The resolution of the system is limited by the detector.     

The effect of large solid angles of collection on quantitative X-ray microanalysis in the AEM

Increasing the solid angle of X-ray collection is a major factor in improving the analytical sensitivity of X-ray energy-dispersive spectrometry (XEDS) in the analytical electron microscope (AEM). A new scanning transmission electron microscope, the VG HB 603, is equipped with two XEDS detectors with the largest collection angles (0.30 and 0.17 sr) available in commercial AEMs. However, large collection angles result in a large range of take-off angles, from ~ 4° to 36°, and the low angles can cause strong X-ray absorption. In order to investigate possible detrimental effects of the low (and of the range of) take-off angles on quantitative microanalysis of specimens exhibiting significant absorption, a stoichiometric Ni₃Al thin-film, in which the Al Kα line is significantly absorbed, was analysed. Furthermore, the effect of different values of the collection angle on X-ray intensities was theoretically evaluated by numerical calculations and spectral simulation. These theoretical approaches permitted correlation of changes in the X-ray take-off angle (and hence X-ray absorption) with changes in the collection angle. It is demonstrated that ~ 0.30 sr detectors, with minimum take-off angles as small as 4°, only result in maximum errors of 4% in the quantification of Al in Ni₃Al and, therefore, further increases in collection angle can be pursued while maintaining current levels of accuracy of quantification.