共查询到18条相似文献,搜索用时 156 毫秒
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电化学制备亚微米氧化铝有序多孔膜方法研究 总被引:1,自引:0,他引:1
采用电化学阳极氧化法制备亚微米氧化铝有序多孔膜 ,研究了铝电极预处理过程、扩孔时间、阳极氧化时间和阳极氧化电压对亚微米氧化铝有序多孔膜孔径、孔密度以及孔排列有序性的影响规律 ,并且建立了一个理想模型来探讨亚微米氧化铝多孔膜的生长过程 相似文献
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采用电化学阳极氧化法制备亚微米氧化铝有序多孔膜,研究了铝电极预处理过程、扩孔时间、阳极氧化时间和阳极氧化电压对亚微米氧化铝有序多孔膜孔径、孔密度以及孔排列有序性的影响规律,并且建立了一个理想模型来探讨亚微米氧化铝多孔膜的生长过程. 相似文献
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电化学制备亚微米氧化铝有序多孔膜方法研究 总被引:4,自引:0,他引:4
采用电化学阳极氧化法制备亚微米氧化铝有序多孔膜,研究了铝电极预处理过程、扩孔时间、阳极氧化时间和阳极氧化电压对亚微米氧化铝有序多孔膜孔径、孔密度以及孔排列有序性的影响规律,并且建立了一个理想模型来探讨亚微米氧化铝多孔膜的生长过程。 相似文献
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《电子元件与材料》2018,(4):44-48
二次阳极氧化法制备纳米多孔氧化铝由于其应用范围广、制备工艺简单、制备成本低廉等因素被广泛采用,但对制备过程中纳米有序多孔结构的形成机理研究存在较多分歧。根据电解液在电场和温差作用下内部出现的有序环流,结合二次阳极氧化法制备多孔氧化铝的实验过程和样品的形貌表征,对有序多孔结构的形成机理进行了研究。结果表明:在阳极氧化铝形成初期,致密氧化铝膜表面导电离子浓度在外电场作用下发生变化,电解液中形成有序分布的粒子环流,是该阶段影响一次阳极氧化铝膜有序结构形成的主要因素;阳极氧化后期,电解液作为远离平衡态的开放系统,在达到临界温度时进入有序的耗散结构状态,即电解液中出现了自组织的热对流,是二次阳极氧化能够形成大孔径、高度有序多孔结构的主导因素。 相似文献
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多孔氧化铝由于具有规则的纳米多孔结构,是制备各种纳米材料的良好模板,因此,研究多孔氧化铝的制备和物理性质具有重要的意义.采用阳极氧化方法制备了多孔氧化铝有序孔洞阵列,通过场发射扫描电镜(SEM)和X射线衍射(XRD)观测了样品的表面、截面的形貌和晶态结构,分析了样品的透射光谱性质.结果表明,制备的多孔氧化铝模板的孔洞分布有序,孔径大小均匀,严格垂直底面;模板具有非晶态结构,在可见光和红外波长范围内具有较高的透射性能. 相似文献
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研究了硅衬底上电子束蒸发铝膜,在H2SO4水溶液中阳极氧化形成硅衬底多孔氧化铝复合结构的过程.硅衬底电子束蒸发铝膜的阳极氧化过程主要由多孔氧化铝的生长、氧化铝生长向氧化硅生长的过渡和氧化硅生长三个阶段构成.硅衬底多孔氧化铝复合结构的透射电子显微镜观察表明,在硅衬底上形成了垂直于硅表面的氧化铝纳米孔,而孔底可形成SiO2层.有序结构多孔氧化铝的形成不依赖于铝膜的结晶状态,而是由阳极氧化过程的自组织作用所决定的.实验表明将多孔氧化铝制备工艺移植到硅基衬底上直接形成硅基衬底多孔氧化铝复合结构是可行的,它也为硅基纳米材料的制备提供了一种新的自组织模板. 相似文献
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We demonstrate a “soft‐imprinting” method for the fabrication of highly ordered porous anodic alumina (HOPAA) templates on different substrates (such as Si, glass slides, and flexible polyimide films) over large areas (> 1.5 cm2). In this process, Ar plasma etching is employed to soft imprint an evaporated Al film on the substrates using a free‐standing HOPAA template as a mask, thus creating ordered nanoindentations on the Al surface. The ordered nanoindentations in turn guide the subsequent anodization of Al to generate HOPAA templates on the substrates (HOPAA–substrates), which inherit the pattern of the free‐standing HOPAA mask. This soft‐imprinting technique is also applicable to the fabrication of HOPAA on flexible polymer films. To demonstrate the potential uses of the HOPAA–substrates in nanofabrication, highly ordered Au nanowire arrays are fabricated on a Si substrate and TiO2 nanotube arrays are prepared on a glass substrate via solution‐ and vapor‐based fabrication processes, respectively. 相似文献
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O. Rabin P.R. Herz Y.‐M. Lin A.I. Akinwande S.B. Cronin M.S. Dresselhaus 《Advanced functional materials》2003,13(8):631-638
A method for the fabrication of thick films of porous anodic alumina on rigid substrates is described. The anodic alumina film was generated by the anodization of an aluminum film evaporated on the substrate. The morphology of the barrier layer between the porous film and the substrate was different from that of anodic films grown on aluminum substrates. The removal of the barrier layer and the electrochemical growth of nanowires within the ordered pores were accomplished without the need to remove the anodic film from the substrate. We fabricated porous anodic alumina samples over large areas (up to 70 cm2), and deposited in them nanowire arrays of various materials. Long nanowires were obtained with lengths of at least 9 μm and aspect ratios as high as 300. Due to their mechanical robustness and the built‐in contact between the conducting substrate and the nanowires, the structures were useful for electrical transport measurements on the arrays. The method was also demonstrated on patterned and non‐planar substrates, further expanding the range of applications of these porous alumina and nanowire assemblies. 相似文献
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将Al片在较高的电压下进行阳极氧化,制备了氧化铝纳米线。其形成机制主要是多孔氧化铝膜生长的同时,其微结构单元阵列在薄膜应力作用下沿薄壁处破裂,从而生成了氧化铝纳米线。扫描电镜和透射电镜观测表明,所得产物结构外形基本一致,呈凹柱面正三棱柱形,表观直径约30~300nm,长度为几微米至数十微米。采用BET法对产物的比表面积进行测量,实验值为5.8×104m2/kg,接近于理论计算值6.2×104m2/kg。实验表明,这种氧化铝一维纳米结构材料对超小Ag和CdS纳米颗粒具有较强的吸附能力,对很难用传统的过滤和离心沉淀法去除的超小纳米颗粒(直径小于10nm)也能做到有效吸附,有望成为超级吸附与过滤材料。 相似文献
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S.‐Z. Chu S. Inoue K. Wada S. Hishita K. Kurashima 《Advanced functional materials》2005,15(8):1343-1349
We report a new method to fabricate self‐organized nanoporous titania films (pore diameter ≈ 30 nm; ≈ 1100 nm thick) and ordered titania nanorod arrays (rod diameter ≈ 30–60 nm; 70–260 nm high) by combined anodizing of superimposed Al/Ti layers sputter‐deposited on glass substrates. The titania nanostructures mimic the ordered nanoporous anodic alumina films via a through‐mask anodization. We propose a new anodizing electrolyte, i.e., a diluted nitric acid solution, for fabricating uniform, self‐organized, ordered nanoporous titania films with parallel cylindrical pores and without any thickness limit. More significantly, the nanoporous titania films contain a small amount of titanium nitride and dissociated nitrogen, and exhibit a moderate transparency and an enhanced absorption throughout the UV and visible light regions of the electromagnetic spectrum. After heating at 600 °C for 2 h, the nanoporous titania films develop a small absorption red‐shift and exhibit high photocatalytic activity under UV illumination. 相似文献
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在醇基介质中采用阳极氧化方法成功在Ti6Al4V合金表面制备出大面积的α和β相均为纳米管结构阵列。通过扫描电子显微镜(SEM)和X射线能谱仪(EDXA)对纳米管阵列的表面形貌、微结构和热稳定性进行了表征。实验结果表明:在醇基溶液中采用阳极氧化方法制备大面积纳米管阵列时,外加电压的增加有利于合金表面多孔纳米结构的形成。在外加电压为30V时,Ti6Al4V合金表面的双相区均获得较为均匀的纳米管阵列。Ti-Al-V-O纳米管阵列管长约900nm、管径约90nm、壁厚约7.4nm。EDXA结果表明:在阳极氧化后,表面Al和V含量降低。Ti-Al-V-O纳米管阵列在550℃下晶化后,其表面形貌可保持规则的纳米阵列结构,而在更高温度下热处理可导致纳米管阵列局部坍塌并发生表面烧结致密化现象。 相似文献
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Highly ordered nickel nanowire (50 and 12 nm in diameter) arrays were successfully deposited into the nanoporous alumina template film on a gold-coated silicon wafer. The electrodeposited nickel nanowires have a preferred (220) fibre texture, that is the [110] direction parallel to the wire axis. With electropolishing, nanoporous alumina template with ordered and uniform pores was prepared by anodisation. By complete removal of the barrier layer and careful control of electrodeposition procedures, nearly 100% pore filling of uniform nanowires can be directly deposited onto the Au-coated silicon substrate, therefore no pattern transfer is necessary and incorporation of these nanowires into silicon-based devices is readily possible 相似文献
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硅基底电子束蒸发铝膜阳极氧化特性 总被引:3,自引:0,他引:3
研究了硅衬底上电子束蒸发铝膜 ,在 H2 SO4 水溶液中阳极氧化形成硅衬底多孔氧化铝复合结构的过程 .硅衬底电子束蒸发铝膜的阳极氧化过程主要由多孔氧化铝的生长、氧化铝生长向氧化硅生长的过渡和氧化硅生长三个阶段构成 .硅衬底多孔氧化铝复合结构的透射电子显微镜观察表明 ,在硅衬底上形成了垂直于硅表面的氧化铝纳米孔 ,而孔底可形成 Si O2 层 .有序结构多孔氧化铝的形成不依赖于铝膜的结晶状态 ,而是由阳极氧化过程的自组织作用所决定的 .实验表明将多孔氧化铝制备工艺移植到硅基衬底上直接形成硅基衬底多孔氧化铝复合结构是可行的 相似文献