An experimental 1-Mbit BiCMOS DRAM

Three developments are proposed for high-performance DRAMs: a bipolar complementary MOS (BiCMOS) DRAM device structure featuring high soft-error immunity due to a p/SUP +/ buried layer; a high-speed circuit configuration of eight NMOS subarrays combined with BiCMOS peripheral drivers and BiCMOS data output circuitry; and BiCMOS voltage and current limiters lowering power dissipation as well as peak current. A 1.3 /spl mu/m 1-Mb DRAM is designed and fabricated to verify the usefulness of these BiCMOS DRAM technologies. Features of this chip include a typical access time of 32 ns, a typical power dissipation of 450 mW at a 60-ns cycle time, and chip size of 5.0/spl times/14.9 mm/SUP 2/.     

Process integration and device performance of a submicrometerBiCMOS with 16-GHz ft double poly-bipolar devices

Submicrometer-channel CMOS devices have been integrated with self-aligned double-polysilicon bipolar devices showing a cutoff frequency of 16 GHz. n-p-n bipolar transistors and p-channel MOSFETs were built in an n-type epitaxial layer on an n⁺ buried layer, and n-channel MOSFETs were built in a p-well on a p⁺ buried layer. Deep trenches with depths of 4 μm and widths of 1 μm isolated the n-p-n bipolar transistors and the n- and p-channel MOSFETs from each other. CMOS, BiCMOS, and bipolar ECL circuits were characterized and compared with each other in terms of circuit speed as a function of loading capacitance, power dissipation, and power supply voltage. The BiCMOS circuit showed a significant speed degradation and became slower than the CMOS circuit when the power supply voltage was reduced below 3.3 V. The bipolar ECL circuit maintained the highest speed, with a propagation delay time of 65 ps for C_L=0 pF and 300 ps for C_L=1.0 pF with a power dissipation of 8 mW per gate. The circuit speed improvements in the CMOS circuits as the effective channel lengths of the MOS devices were scaled from 0.8 to 0.4 μm were maintained at almost the same ratio     

A 0.65-ns, 72-kb ECL-CMOS RAM macro for a 1-Mb SRAM

An ultrahigh-speed 72-kb ECL-CMOS RAM macro for a 1-Mb SRAM with 0.65-ns address-access time, 0.80-ns write-pulse width, and 30.24-μm ² memory cells has been developed using 0.3-μm BiCMOS technology. Two key techniques for achieving ultrahigh speed are an ECL decoder/driver circuit with a BiCMOS inverter and a write-pulse generator with a replica memory cell. These circuit techniques can reduce access time and write-pulse width of the 72-kb RAM macro to 71% and 58% of those of RAM macros with conventional circuits. In order to reduce crosstalk noise for CMOS memory-cell arrays driven at extremely high speeds, a twisted bit-line structure with a normally on MOS equalizer is proposed. These techniques are especially useful for realizing ultrahigh-speed, high-density SRAM's, which have been used as cache and control storages in mainframe computers     

An accurate analytical BiCMOS delay expression and its applicationto optimizing high-speed BiCMOS circuits

A scheme for optimizing the overall delay of BiCMOS driver circuits is proposed in this paper. Using this optimization scheme, it is found that the delay is minimized when the maximum collector current of the bipolar transistors is equal to the onset of high current effects. Using this assumption, an accurate BiCMOS delay expression is derived in terms of the bipolar and MOS device parameters. The critical device parameters are then identified and their influence on the circuit speed discussed. An overall circuit delay expression for optimizing BiCMOS buffers is derived and a comparison made with CMOS buffers. It is shown that BiCMOS circuits have a speed advantage of 1.7 or an area advantage of about 5 for 2-μm feature sizes. In order to predict the future performance of BiCMOS circuits, a figure of merit is derived from the delay expression. Using the figure-of-merit expression, it is seen that future BiCMOS circuits can keep the speed advantage over CMOS circuits down to submicrometer dimensions under constant load capacitance assumption     

A 2.125-Gb/s BiCMOS fiber channel transmitter for serial datacommunications

A 2.125-Gb/s transmitter meeting the specifications of the emerging ANSI Fiber Channel standard has been developed using BiCMOS technology. This transmitter features (1) a fully bipolar 10:1 multiplexer (MUX) and a 2.125-GHz retimer for high-accuracy transmission of data, (2) an emitter-coupled logic (ECL) CMOS analog phase-locked loop, (3) pure ECL-level output for direct connection to the currently available optical modules, and (4) BiCMOS process technology that includes 0.25-μm CMOS devices and 20-GHz bipolar devices. The LSI serializes 32-bit-wide, 53.125-Mb/s data into 2.125-Gb/s data through a CMOS 8B10B encoder. The chip area is 3×2 mm², and the power dissipation is 860 mW     

A 1-Mbit BiCMOS DRAM using temperature-compensation circuittechniques

A temperature-compensation circuit technique for a dynamic random-access memory (DRAM) with an on-chip voltage limiter is evaluated using a 1-Mb BiCMOS DRAM. It was found that a BiCMOS bandgap reference generator scheme yields an internal voltage immune from temperature and V_cc variation. Also, bipolar-transistor-oriented memory circuits, such as a static BiCMOS word driver, improve delay time at high temperatures. Furthermore, the BiCMOS driver proves to have better temperature characteristics than the CMOS driver. Finally, a 1-Mb BiCMOS DRAM using the proposed technique was found to have better temperature characteristics than the 1-Mb CMOS DRAM which uses similar techniques, as was expected. Thus, BiCMOS DRAMs have improved access time at high temperatures compared with CMOS DRAMs     

Nonoverlapping super self-aligned device structure forhigh-performance VLSI

The nonoverlapping super self-aligned structure (NOVA) is reported. Because of its nonoverlapping nature, this structure can be applied equally well to bipolar, CMOS, or BiCMOS processes. This structure effectively minimizes parasitic capacitance and resistance for both the MOS and bipolar devices. CMOS and bipolar devices are integrated into a high-performance BiCMOS technology. CMOS and emitter-coupled logic (ECL) ring oscillators with 1.5-μm lithography are reported to have delays of 128 and 87 ps/stage, respectively     

An ultra-high-speed ECL-BiCMOS technology with silicon filletself-aligned contacts

We have developed a half-micron super self-aligned BiCMOS technology for high speed application. A new SIlicon Fillet self-aligned conTact (SIFT) process is integrated in this BiCMOS technology enabling high speed performances for both CMOS and ECL bipolar circuits. In this paper, we describe the process design, device characteristics and circuit performance of this BiCMOS technology. The minimum CMOS gate delay is 38 ps on 0.5 μm gate and 50 ps on 0.6 μm gate ring oscillators at 5 V. Bipolar ECL gate delay is 24 ps on 0.6 μm emitter ring oscillators with collector current density of 40 kA/cm². A single phase decision circuit operating error free over 8 Gb/s and a static frequency divider operating at 13.5 GHz is demonstrated in our BiCMOS technology     

Influence of device parameters on the switching speed of BiCMOSbuffers

The influence of different MOS and bipolar device parameters on the switching speed of a BiCMOS buffer is described. This influence is studied by looking at the response of a BiCMOS inverter to a step input. Using suitable approximations for the high-level injection effects in the bipolar transistor, mathematical approximations for the response are derived. The approximate responses are compared to those determined by SPICE simulations and the agreement is satisfactory. High-current effects in the bipolar transistor strongly affect the performance. The effects of different bipolar transistor parasitic resistors are investigated, and it is found that only the collector resistance is important. The influence of different emitter sizes on the delay time is studied, and it is shown that for a given area, there is one optimal size ratio for the MOS and bipolar transistors for which the delay is minimum     

A 6-ns, 1.5-V, 4-Mb BiCMOS SRAM

A 0.3-μm 4-Mb BiCMOS SRAM with a 6-ns access time at a minimum supply voltage of 1.5 V has been developed. Circuit technologies contributing to the low-voltage, high-speed operations include: (1) boost-BiNMOS gates for address decoding circuits; (2) an optimized word-boost technique for a highly-resistive-load memory cell; (3) a stepped-down CML cascoded bipolar sense amplifier; (4) optimum boost-voltage detection circuits with dummies for boost-voltage generators     

BiMOS transistors: merged bipolar/sidewall MOS transistors

The concept and feasibility of merged bipolar/sidewall MOS transistors (BiMOS transistors) are demonstrated by fabricating and characterizing the structures. The NMOS-input Darlington pair was merged into an NMOS-input BiMOS Darlington transistor which occupies 1.2 times the area of a single n-p-n bipolar transistor. It should be possible to form other BiCMOS subcircuit elements such as the PMOS-input BiMOS Darlington transistor and BiCMOS static memory cell. An initial analysis of the doping requirements for the base of the n-p-n bipolar transistor and the channel of the sidewall MOS transistors suggests that the requirements are compatible     

基于0．5μmCMOS工艺的一款新型BiCMOS集成运算放大器设计

为了提高运算放大器的驱动能力,依据现有CMOS集成电路生产线,介绍一款新型BiCMOS集成运算放大电路设计,探讨BiCMOS工艺的特点。在s_Edit中进行“BiCMOS运放设计”电路设计,并对其电路各个器件参数进行调整,包括M0s器件的宽长比和电客电阻的值。完成电路设计后,在Tspice中进行电路的瞬态仿真,插入CMOS,PNP和NPN的工艺库,对电路所需的电源电压和输入信号幅度和频率进行设定调整,最终在W—Edit输出波形图。在MCNC0．5μm工艺平台上完成由MOs、双极型晶体管和电容构成的运算放大器版图设计。根据设计的版图,设计出BiCMOS相应的工艺流程,并提取各光刻工艺的掩模版。     

High speed submicron BiCMOS memory

This paper reviews device and circuit technologies for submicron BiCMOS memories, especially for high speed and large capacity SRAM's with 0.8 μm, 0.55 μm and 0.4 μm design rules. First, poly-silicon emitter structure and triple-well structure are described as key submicron BiCMOS device technologies for achieving high transistor performance and minimized process complexity, as well as high reliability. Next, submicron CMOS and BiCMOS inverter gate delays are compared. In addition, memory circuit techniques including BinMOS logic gates and bipolar sense amplifiers are discussed, respectively for ECL I/O asynchronous, TTL I/O asynchronous and super high speed synchronous submicron BiCMOS SRAM's. Future prospects for submicron BiCMOS memories are also forecasted     

Design and fabrication of multiple-valued multiplexer using negative differential resistance circuits and standard SiGe process

The design of a four-valued multiplexer using the negative differential resistance (NDR) circuit is demonstrated. The NDR circuit used in this work is made of the Si-based metal–oxide–semiconductor field-effect-transistor (MOS) and the SiGe-based heterojunction bipolar transistor (HBT). However we can obtain the NDR characteristic in its combined I–V curve by suitably arranging the MOS parameters. This novel multiplexer is made of MOS–HBT–NDR-based decoders and inverters. The fabrication is based on the standard 0.35 μm SiGe BiCMOS process.     

A 100-MHz 4-mW four-quadrant BiCMOS analog multiplier

A four-quadrant analog multiplier based on a simple, very linear, and fast BiCMOS transconductor using MOS transistors operating in the triode region and NPN bipolar devices is presented. The four quadrant operation is obtained by crosscoupling-in a Gilbert-cell fashion-two transconductors with a third stage used to modulate the transconductances of the former two. A chip prototype of the multiplier has been integrated in a 1.2-μm BiCMOS process to validate the idea. It has been designed to achieve high linearity on both inputs: measured results show a total harmonic distortion (THD) of less than -40 dB with a 3-V peak-to-peak input signal at 5 MHz from a 5-V supply and an output -3 dB bandwidth of 100 MHz while dissipating 4 mW from a 3-V supply. The integrated chip prototype active area is 1 mm²     

A versatile half-micron complementary BiCMOS technology formicroprocessor-based smart power applications

A modular, high density 0.5 μm Complementary BiCMOS technology with integrated high-voltage Lateral Diffused MOS (LDMOS) and conductivity modulated Lateral Insulated Gate Bipolar Transistor (LIGBT) structures designed for high performance, multi-functional integrated circuit applications is described. The advantages of VLSI processing and 0.5 μm compatible layout rules have been applied to the design and fabrication of the tight-pitch high-voltage devices without sacrificing the performance of 0.5 μm dual-poly (N+/P+) gate CMOS and complementary vertical bipolar transistors. Single chip integration of VLSI microprocessors with high-voltage and/or high-current input and output functions for “Smart Power” applications can be achieved using this technology     

Power reduction techniques for a 1-Mb ECL-CMOS SRAM with an accesstime of 550 ps and an operating frequency of 900 MHz

This paper describes power reduction circuit techniques in an ultra-high-speed emitter-coupled logic (ECL)-CMOS SRAM. Introduction of a 0.25-μm MOS transistor allows a Y decoder and a bit-line driver to be composed of CMOS circuits, resulting in a power reduction of 34%. Moreover, a variable-impedance load has been proposed to reduce cycle time. A 1-Mb ECL-CMOS SRAM was developed by using these circuit techniques and 0.2-μm BiCMOS technology. The fabricated SRAM has an ultrafast access time of 550 ps and a high operating frequency of 900 MHz with a power dissipation of 43 W     

A BiCMOS process utilizing selective epitaxy for analog/digitalapplications

A 2-μm BiCMOS process that has been designed for 10-V analog/digital applications is described. This process utilizes selective epitaxial growth to integrate a vertical n-p-n bipolar with an f_T of 3.0 GHz, and a nonoptimized vertical p-n-p structure into a 2-μm CMOS process with poly-to-n⁺ capacitors. The insertion of the bipolar structures is accomplished with only two added masking steps, and with no changes to the critical process parameters that determine the performance of the MOS transistors. The circuit worthiness of the process is demonstrated by fabricating CMOS, vertical n-p-n RTL, and vertical p-n-p RTL ring oscillators, and demonstrating high yields for these circuits     

A 550-ps access 900-MHz 1-Mb ECL-CMOS SRAM

An ultrahigh-speed 1-Mb emitter-coupled logic (ECL)-CMOS SRAM with 550-ps clock-access time, 900-MHz operating frequency, and 12-μm² memory cells has been developed using 0.2-μm BiCMOS technology. Three key techniques for achieving the ultrahigh speed are a BiCMOS word decoder/driver with an nMOS level-shift circuit, a sense amplifier with a voltage-clamp circuit, and a BiCMOS write circuit with a variable-impedance bitline load. The proposed word decoder/driver and sense amplifier can reduce the delay times of the circuits to 54% and 53% of those of conventional circuits. The BiCMOS write circuit can reduce the power dissipation of the circuit by 74% without sacrificing writing speed. These techniques are especially useful for realizing ultrahigh-spaced high-density SRAMs, which will be used as cache and control memories in mainframe computers     

A 6-ns ECL 100 K I/O and 8-ns 3.3-V TTL I/O 4-Mb BiCMOS SRAM

The authors report a 4 M word×1 b/1 M word×4 b BiCMOS SRAM that can be metal mask programmed as either a 6-ns access time for an ECL 100 K I/O interface to an 8-ns access time for a 3.3-V TTL I/O interface. Die size is 18.87 mm×8.77 mm. Memory cell size is 5.8 μm×3.2 μm. In order to achieve such high-speed address access times the following technologies were developed: (1) a BiCMOS level converter that directly connects the ECL signal level to the CMOS level; (2) a high-speed BiCMOS circuit with low threshold voltage nMOSFETs; (3) a design method for determining the optimum number of decoder gate stages and the optimum size of gate transistors; (4) high-speed bipolar sensing circuits used at 3.3-V supply voltage; and (5) 0.55-μm BiCMOS process technology with a triple-well structure