Electronic excited states in bilayer graphene double quantum dots

We report tunneling spectroscopy experiments on a bilayer graphene double quantum dot device that can be tuned by all-graphene lateral gates. The diameter of the two quantum dots are around 50 nm and the constrictions acting as tunneling barriers are 30 nm in width. The double quantum dot features additional energies on the order of 20 meV. Charge stability diagrams allow us to study the tunable interdot coupling energy as well as the spectrum of the electronic excited states on a number of individual triple points over a large energy range. The obtained constant level spacing of 1.75 meV over a wide energy range is in good agreement with the expected single-particle energy spacing in bilayer graphene quantum dots. Finally, we investigate the evolution of the electronic excited states in a parallel magnetic field.     

Nanoelectromechanical switch operating by tunneling of an entire C60 molecule

We present a solid state single molecule electronic device where switching between two states with different conductance happens predominantly by tunneling of an entire C60 molecule. This conclusion is based on a novel statistical analysis of approximately 10(5) switching events. The analysis yields (i) the relative contribution of tunneling, current induced heating and thermal fluctuations to the switching mechanism, (ii) the voltage dependent energy barrier (approximately 100-200 meV) separating the two states of the switch and (iii) the switching attempt frequency, omega0, corresponding to a 2.8 meV mode, which is most likely rotational.     

Topological insulator quantum dot with tunable barriers

Thin (6-7 quintuple layer) topological insulator Bi(2)Se(3) quantum dot devices are demonstrated using ultrathin (2-4 quintuple layer) Bi(2)Se(3) regions to realize semiconducting barriers which may be tuned from ohmic to tunneling conduction via gate voltage. Transport spectroscopy shows Coulomb blockade with large charging energy >5 meV and additional features implying excited states.     

Graphene gate electrode for MOS structure-based electronic devices

We demonstrate that the use of a monolayer graphene as a gate electrode on top of a high-κ gate dielectric eliminates mechanical-stress-induced-gate dielectric degradation, resulting in a quantum leap of gate dielectric reliability. The high work function of hole-doped graphene also helps reduce the quantum mechanical tunneling current from the gate electrode. This concept is applied to nonvolatile Flash memory devices, whose performance is critically affected by the quality of the gate dielectric. Charge-trap flash (CTF) memory with a graphene gate electrode shows superior data retention and program/erase performance that current CTF devices cannot achieve. The findings of this study can lead to new applications of graphene, not only for Flash memory devices but also for other high-performance and mass-producible electronic devices based on MOS structure which is the mainstream of the electronic device industry.     

Manipulation of periodic Coulomb blockade oscillations in ultra-scaled memories by single electron charging of silicon nanocrystal floating gates

Ultra-scaled silicon nanocrystal memories fabricated on a silicon-on-insulator substrate exhibit very periodic Coulomb blockade oscillations at 4.2 K. We control the phase of those oscillations by charging and discharging the floating gate with a single electron. We can distinguish between resonances due to the whole channel area covered by the gate and impurity levels localized in the access regions and less coupled to the gate. Comparison with a reference device without nanocrystals is also reported.     

Electrical Noise and Transport Properties of Graphene

We present a study of the noise properties of single-layer exfoliated graphene as a function of gate bias. A tunnel/trap model is presented based on the interaction of graphene electrons with the underlying substrate. The model incorporates trap position, energy, and barrier height for tunneling into a given trap—along with the band-structure of the graphene—and is in good accord with the general characteristics of the data.     

Gate‐Dependent Tunnelling Current Modulation of Graphene/hBN Vertical Heterostructures

Combining with layered thin crystalline films, graphene has expanded its application scope beyond the regime where a gapless semimetal cannot serve. Here, we report the modulation of tunneling characteristics in graphene/hexagonal boron nitride (hBN) vertical heterostructure at different interlayer hBN thickness. These results signify an upshift in threshold voltages with hBN layer thickness. Furthermore, the gate‐dependent tunneling characteristics of the device has been demonstrated. The back‐gate voltages are used to adjust the fermi level of bottom graphene layer, which in turns tune the threshold voltages and tunneling current through ultrathin hBN layer. Our findings offer an effective tool to modulate the tunneling characteristics of vertical transistors for their potential applications in high frequency logic and tunnel devices.

     

Fabrication and Characteristics of Self-Aligned Dual-Gate Single-Electron Transistors

Single-electron transistors that have electrical tunneling barriers are fabricated, and Coulomb oscillation peaks and negative differential transconductance are observed at room temperature (300 K). Operation characteristics and multioscillation peaks are further investigated at low temperature (80 K). The period of Coulomb oscillation is 2.3 V due to an ultrasmall control gate capacitance, and oscillation peaks are shifted through the side gate bias, which is explained by the derived stability plot for dual-gate structures. Even with the side gates electrically floating, the device still operates as a single-electron transistor since the p-n junction barrier plays a role of tunneling barrier. In addition, by changing the bias condition, double dots are formed along the channel and peak splitting is observed.     

UV induced zener diode characteristic in a single n-ZnO/p++-Si nanoheterojunction

Rectification is observed in a single n-ZnO/p++-Si nanoheterojunction using ultra high vacuum compatible scanning tunneling microscope. The nanohetrojunctions have been grown using catalyst free vapor-solid growth of ZnO nanorods on p++-Si substarte. A high rectification ratio approximately 100 at 2 V is observed in the current voltage measurements. Temperature dependent study in these nanohetero-junctions showed activation energy for carrier conduction approximately 66 meV, which is primarily associated to the presence of heterojunction induced interface states. Role of ultra violet excitation on these finite sized (approximately 500 nm) nanoheterojunction is also studied with photo-generated electron-hole pairs. A Zener breakdown is observed in this photo-excitation process. Increase in the concentration of minority carriers and corresponding decrease in barrier width and height at the junction have been identified for the observed tunneling behavior under UV illumination. The large carrier concentration in the finite sized device with large diffusion length of electron (approximately 2 microm) is made responsible for the observed voltage regulation.     

Ambipolar Coulomb blockade characteristics in a two-dimensional Si multidot device

A two-dimensional Si multidot channel field-effect transistor is fabricated from a silicon-on-insulator material and the electrical characteristics are studied. The multidots are formed using a nanometer-scale local oxidation of Si process developed in our laboratory. The device shows ambipolar characteristics because of Schottky source and drain, i.e., the carriers are electrons for positive gate voltage and holes for the negative one. It is shown that Coulomb blockade (CB) oscillations are clearly observed for both of the electrons and holes at measurement temperatures up to 60 K. Both CB characteristics show nonperiodic oscillation and an open Coulomb diamond. These features are ascribed to the single electron/hole tunneling in the Si multidot channel.     

Fabrication and Characterization of Sidewall Defined Silicon-on-Insulator Single-Electron Transistor

We reported the fabrication and characterization of a new type of silicon-on-insulator (SOI) single-electron transistor utilizing usual CMOS sidewall gate structures. We used oxide sidewall spacer layers as well as two poly-Si finger gates on an SOI wire mesa as implantation masks, to form tunnel barriers and thus a quantum dot (QD) that is smaller than the spacing between polygates. Characterization results exhibited clear Coulomb oscillations persisting up to 30 K. The Coulomb energy and the size of the QD extracted from three devices were consistent with the spacing between two poly-Si gates of each device. Furthermore, the junction capacitance of each device was almost constant and only the gate capacitance varied. These analyses suggested that the size of the QD was fully controlled by the process.      

Improving range of SPR tunability and extinction efficiency of spheroidal silver nanostructures in graphene environment

In photovoltaics, the materials having ability to manipulate the optical fields and coupling of energy flow inside the device play a crucial role. In this article, we report the role of graphene environment on spheroid-shaped Ag nanoparticles (NPs) with various shapes and sizes. This study confirms the tunability of surface plasmon resonances (SPRs) and an enhancement in extinction efficiency, derived numerically using discrete dipole approximation (DDA). We have chosen oblate- and prolate-shaped Ag NPs for the numerical experiment and analysed their optical signatures in terms of extinction efficiency and SPR tunability against the quasi-static approximation. The excitation of longitudinal and transversal resonances was also observed because of the asymmetric shape of Ag NPs. All optical responses have been analysed by varying the effective radii and aspect ratio of Ag NPs, and the thickness of graphene monolayer (from 0.1 to 0.5 nm). Tunability of longitudinal resonances has been observed in the 600–833 nm wavelength region, while for transversal resonances, the tunability is in the 450–505 nm wavelength range. The results represent the effect of graphene environment on the tunability of SPRs with enhanced extinction efficiency. This study could lead to the development of a photovoltaic device with wide range of tunability and enhanced efficiency.     

Reconfigurable Diodes Based on Vertical WSe2 Transistors with van der Waals Bonded Contacts

New device concepts can increase the functionality of scaled electronic devices, with reconfigurable diodes allowing the design of more compact logic gates being one of the examples. In recent years, there has been significant interest in creating reconfigurable diodes based on ultrathin transition metal dichalcogenide crystals due to their unique combination of gate‐tunable charge carriers, high mobility, and sizeable band gap. Thanks to their large surface areas, these devices are constructed under planar geometry and the device characteristics are controlled by electrostatic gating through rather complex two independent local gates or ionic‐liquid gating. In this work, similar reconfigurable diode action is demonstrated in a WSe₂ transistor by only utilizing van der Waals bonded graphene and Co/h‐BN contacts. Toward this, first the charge injection efficiencies into WSe₂ by graphene and Co/h‐BN contacts are characterized. While Co/h‐BN contact results in nearly Schottky‐barrier‐free charge injection, graphene/WSe₂ interface has an average barrier height of ≈80 meV. By taking the advantage of the electrostatic transparency of graphene and the different work‐function values of graphene and Co/h‐BN, vertical devices are constructed where different gate‐tunable diode actions are demonstrated. This architecture reveals the opportunities for exploring new device concepts.     

Observation of negative differential resistance and single-electron tunneling in electromigrated break junctions

We observed a negative differential resistance (NDR) along with single-electron tunneling (SET) in the electron transport of electromigrated break junctions with metal-free tetraphenylporphyrin (H₂BSTBPP) at a temperature of 11 K. The NDR strongly depended on the applied gate voltages, and appeared only in the electron tunneling region of the Coulomb diamond. We could explain the mechanism of this new type of electron transport by a model assuming a molecular Coulomb island and local density of states of the source and the drain electrodes.     

Graphene–Graphene Oxide Floating Gate Transistor Memory

A novel transparent, flexible, graphene channel floating‐gate transistor memory (FGTM) device is fabricated using a graphene oxide (GO) charge trapping layer on a plastic substrate. The GO layer, which bears ammonium groups (NH₃⁺), is prepared at the interface between the crosslinked PVP (cPVP) tunneling dielectric and the Al₂O₃ blocking dielectric layers. Important design rules are proposed for a high‐performance graphene memory device: i) precise doping of the graphene channel, and ii) chemical functionalization of the GO charge trapping layer. How to control memory characteristics by graphene doping is systematically explained, and the optimal conditions for the best performance of the memory devices are found. Note that precise control over the doping of the graphene channel maximizes the conductance difference at a zero gate voltage, which reduces the device power consumption. The proposed optimization via graphene doping can be applied to any graphene channel transistor‐type memory device. Additionally, the positively charged GO (GO–NH₃⁺) interacts electrostatically with hydroxyl groups of both UV‐treated Al₂O₃ and PVP layers, which enhances the interfacial adhesion, and thus the mechanical stability of the device during bending. The resulting graphene–graphene oxide FGTMs exhibit excellent memory characteristics, including a large memory window (11.7 V), fast switching speed (1 μs), cyclic endurance (200 cycles), stable retention (10⁵ s), and good mechanical stability (1000 cycles).     

Distribution of the Impurity Resonance Energy in Bi2Sr2CaCu2O8+δ Observed by Scanning Tunneling Spectroscopy

Using scanning tunneling microscopy and spectroscopy (STM/STS) at 4.2 K, we observed Zn impurity resonance states in single crystals of Zn substituted Bi₂Sr₂Ca(Cu_1?x Zn _x )₂O_8+δ . Zn impurity resonances were characterized by the peak structure in the local density of states (LDOS). The peaks were appeared near the E _F on each of Zn impurity sites. The peak energy showed a wide distribution from ?7 to 5 meV. The average peak energy was ?1.5 meV and the variance was 1.8 meV. We investigated the correlation between the peak energy at a Zn site and the energy gap value in the region where the Zn site is embedded. Although we observed about hundred Zn sites, no correlation between the local energy gap and the peak energy was observed.     

Large intrinsic energy bandgaps in annealed nanotube-derived graphene nanoribbons

The usefulness of graphene for electronics has been limited because it does not have an energy bandgap. Although graphene nanoribbons have non-zero bandgaps, lithographic fabrication methods introduce defects that decouple the bandgap from electronic properties, compromising performance. Here we report direct measurements of a large intrinsic energy bandgap of approximately 50 meV in nanoribbons (width, approximately 100 nm) fabricated by high-temperature hydrogen-annealing of unzipped carbon nanotubes. The thermal energy required to promote a charge to the conduction band (the activation energy) is measured to be seven times greater than in lithographically defined nanoribbons, and is close to the width of the voltage range over which differential conductance is zero (the transport gap). This similarity suggests that the activation energy is in fact the intrinsic energy bandgap. High-resolution transmission electron and Raman microscopy, in combination with an absence of hopping conductance and stochastic charging effects, suggest a low defect density.     

Quality assessment of graphene: Continuity,uniformity, and accuracy of mobility measurements

With the increasing availability of large-area graphene,the ability to rapidly and accurately assess the quality of the electrical properties has become critically important.For practical applications,spatial variability in carrier density and carrier mobility must be controlled and minimized.We present a simple framework for assessing the quality and homogeneity of large-area graphene devices.The field effect in both exfoliated graphene devices encapsulated in hexagonal boron nitride and chemical vapor-deposited (CVD) devices was measured in dual current-voltage configurations and used to derive a single,gate-dependent effective shape factor,β,for each device.β is a sensitive indicator of spatial homogeneity that can be obtained from samples of arbitrary shape.All 50 devices investigated in this study show a variation (up to tenfold) inβ as a function of the gate bias.Finite element simulations suggest that spatial doping inhomogeneity,rather than mobility inhomogeneity,is the primary cause of the gate dependence ofβ,and that measurable variations ofβ can be caused by doping variations as small as 1010 cm-2.Our results suggest that local variations in the position of the Dirac point alter the current flow and thus the effective sample shape as a function of the gate bias.We also found that such variations lead to systematic errors in carrier mobility calculations,which can be revealed by inspecting the correspondingβ factor.     

Ultrashort SONOS memories

We report the operational characteristics of ultrashort SONOS memories down to /spl sim/30-nm effective gate length. Good sub-threshold swing, good drain-induced barrier lowering (/spl sim/120 mV/decade), and /spl sim/2.4 V of memory window down to the smallest dimensions demonstrate the improvements that result from a thin tunneling oxide and a large trapping center density. The use of distributed defects and thin tunneling oxide is reflected in a memory window that is stable up to at least 10/sup 5/ cycles for the smallest devices. The smallest structures tested employ /spl sim/75 electrons for memory storage, which allows for device to device reproducibility. The capture and emission processes asymmetries point to the differences in the energy parameters of the two processes. The smallest structures, however, do show loss of retention time compared to the larger structures, for the same oxide-nitride-oxide stack thickness, and this is believed to arise from higher leakage due to higher defects distribution in the gate insulators from process-induced damage. All tested devices, down to /spl sim/30-nm effective gate length, show very good endurance characteristics.