Origin of residual semiconductor-laser linewidth in high-powerlimit

The FM noise spectrum and the spectral width of semiconductor lasers are measured in the high-power state up to 20 mW. The FM noise spectrum consists of the white noise and the 1/f noise. The spectral density of the white noise is suppressed by the increase in the output power, whereas that of the 1/f noise is kept constant. This fact means that the residual linewidth in the high-power limit is caused by the 1/f noise rather than the white noise     

1/f frequency noise effects on self-heterodyne linewidthmeasurements

The effects of a 1/f frequency noise on self-heterodyne detection are described, and the results are applied to the problem of laser diode linewidth measurement. The self-heterodyne autocorrelation function and power spectrum are evaluated for both the white and the 1/ f components of the frequency noise. From numerical analysis, the power spectrum resulting from the 1/f frequency noise is shown to be approximately Gaussian, and an empirical expression is given for its linewidth. These results are applied to the problem of self-heterodyne linewidth measurements for coherent optical communications, and the amount of broadening due to 1/f frequency noise is predicted     

1/f noise in n-p-n GaAs/AlGaAs heterojunction bipolartransistors:iImpact of intrinsic transistor and parasitic seriesresistances

1/f noise experiments were performed for n-p-n GaAs/AlGaAs HBTs as a function of forward bias at room temperature. The experimental data are discussed with the help of new expressions for the 1/f noise in bipolar transistors where the influence of internal parasitic series resistances has been taken into account. At low forward currents the 1/f noise is determined by spontaneous fluctuations in the base and collector currents. At fixed bias, the collector current noise exceeds the base current noise. At higher forward currents the parasitic series resistances and their 1/f noise become important. Experimental results from the literature are compared with the results     

Correlation between 1/f noise and hFElong-term instability in silicon bipolar devices

Accelerated life tests with high-temperature storage and electric aging for n⁺-p-n silicon planar transistors were carried out. Current gain h_FE increases monotonously with time during the tests, and the h_FE drift is correlated with initial measured 1/f noise in the transistors, i.e. the drift amount significantly increases with the increase of noise level. The correlation coefficient of relative drift Δh_FE /h_FE and 1/f noise spectral density S_iB(f) is far larger than that of Δ h_FE/h_FE and initial DC parameters of the transistors. A quantitative theory model for the h _FE drift has been developed and explains the h _FE drift behavior in the tests, which suggests that the h _FE drift and 1/f noise can be attributed to the same physical origin, and both are caused by the modulation of the oxide traps near the Si-SiO₂ interface to Si surface recombination. 1/f noise measurement, therefore, may be used as a fast and nondestructive means to predict the long-term instability in bipolar transistors     

Factors limiting the spectral linewidth of CPM-MQW-DFB lasers

A spectral linewidth of 56 kHz is achieved by a CPM-MQW-DFB (corrugation-pitch-modulated multiquantum-well distributed feedback) laser at an output power of 25 mW. To separate effects of the white noise and 1/f noise in limiting the linewidth, the authors measured the delayed-heterodyne lineshape by using a short delay-fiber. The minimum spectral linewidth is shown to be limited by white noise     

On 1/f trapping noise in MOSTs

New calculations are given for the 1/f noise in metal-oxide-semiconductor transistors (MOSTs) based on the McWhorter model (number fluctuations). Particular attention is paid to two regions of the drain current-voltage characteristic: weak inversion and near saturation. The results are at variance with previous theories, where some errors have been made. The gravest error was the violation of the physical law whereby the variance of the number of carriers N in the channel is ⩽N. The calculations do not give a divergent noise power at current saturation, as found by other authors. In the ohmic region, the relation between the spectral density of the drain current fluctuations and the number of carriers is determined. The Langevin method and the Klaassen-Prins method for calculating the 1/f noise in MOSTs are discussed and shown to have been used incorrectly when the mobility and the Hooge 1/f noise parameter depend on position in the channel     

Wavelength dependence of 1/f noise in the light output oflaser diodes: an experimental study

The optical power emitted by a monomode GaAlAs laser is filtered with a monochromator. The 1/f noise in the filtered emission is found to be directly dependent on the noncoherent emission, such as S_pαP_nc^m. Here s_p is the spectral density of the 1/f fluctuations, P_nc is the average noncoherent power, m=3/2 under spontaneous emission, and m=4 in the superradiation and laser regions. Study of the 1/f noise in the optical power in a band centered at the laser wavelength and with variable bandwidth shows three operating regions. (1) LED region (at low currents): the fluctuations with a 1/f spectrum are uncorrelated in wavelength. (2) Superradiation region (at currents close to the threshold): the fluctuations are correlated. (3) Laser region: the 1/f noise apparently is dominated by noncoherent emission within a small optical band around the laser wavelength     

1/f noise in MODFETs at low drain bias

The 1/f noise in normally-on MODFETs biased at low drain voltages is investigated. The experimentally observed relative noise in the drain current S_I/I² versus the effective gate voltage V_G=V_GS-V_off shows three regions which are explained. The observed dependencies are S_I/I²∝V_G ^m with the exponents m=-1, -3, 0 with increasing values of V_G. The model explains m =-1 as the region where the resistance and the 1/f noise stem from the 2-D electron gas under the gate electrode; the region with m=0 at large V_G or V_GS≅0 is due to the dominant contribution of the series resistance. In the region at intermediate V_G , m=-3, the 1/f noise stems from the channel under the gate electrode, and the drain-source resistance is already dominated by the series resistance     

1/f noise in hot-carrier damaged MOSFET's: effects ofoxide charge and interface traps

The 1/f noise in the drain current of hot-carrier damaged MOSFETs biased in weak inversion has been studied. By the use of a biased annealing treatment to simultaneously decrease the density of oxide trapped charge (N_ot) and increase the density of interface traps (D_it), the authors have separated the contributions of these two kinds of defects. The results clearly indicate that, while the low-frequency 1/f noise is correlated with N_ot, the high-frequency 1/f noise is correlated with D_it     

Absence of quantum 1/f noise in the photoelectric currentof junction of MIS photodetectors

Quantum 1/f noise is given by a simple engineering formula. It affects photodetectors through mobility and recombination speed fluctuations. The former are also in the diffusion constant, and all affect the dark current. However, there is no quantum 1/f noise in the photogeneration of carriers, as is shown     

1/f noise in GaAs filaments

A typical 1/f noise is excited in GaAs filament with the Hooge noise parameter of about α_H=2×10^-3 . The noise level increases in proportion to the square of the terminal voltage, and decreases approximately in inverse proportion to the total number of carriers within the device. A transition from the typical 1/f noise characteristics to the diffusion noise characteristics of MESFETs was observed when the electric field was increased above 1 kV/cm. The noise parameters were also investigated as a function of the device width between 2 and 200 μm. Deep levels within the n-GaAs active layer and the high electric field are the main factors of the nonideal 1/f characteristics     

Low-frequency noise in p-channel heterostructure insulated-gatefield-effect transistors (HIGFETs) at 77 K and drain current 1μA

Measurements of the low-frequency spectral intensity of the current fluctuations in p-channel GaAs/AlGaAs heterostructure insulated-gate field-effect transistors are discussed. The measurements were performed at 77 K and a drain current of 1 μA. The spectra of two types of devices are compared, one grown directly on the substrate and the other embedded in an n-well. The latter type produced markedly less noise, its spectrum being almost perfect 1/f noise. The former type exhibited, in addition to the 1/f noise, a significant generation-recombination noise component in the spectrum     

Wavelet-based representations for the 1/f family offractal processes

It is demonstrated that 1/f fractal processes are, in a broad sense, optimally represented in terms of orthonormal wavelet bases. Specifically, via a useful frequency-domain characterization for 1/f processes, the wavelet expansion's role as a Karhunen-Loeve-type expansion for 1/f processes is developed. As an illustration of potential, it is shown that wavelet-based representations naturally lead to highly efficient solutions to some fundamental detection and estimation problems involving 1/f processes     

Bulk and surface 1/f noise

The 1/f noise of an n-type silicon MOSFET has been studied under conditions ranging from accumulation to depletion at 300 K. The experimental results are interpreted in terms of a bulk phenomenon and are characterized by Hooge's empirical 1/f noise parameter α with values between 10^-7 and 10^-5. The α value for surface conduction at strong accumulation can be at least one order of magnitude larger than the value for bulk conduction     

Noise sources across a normal-to-superconducting boundary in bulkYBa2Cu3O7-x

Experiments in which a normal-to-superconducting (NS) boundary is created in an originally superconducting bar of bulk YBa₂Cu ₃O_7-x is described. The first noise measurements associated with such a boundary are presented. A high-density (5.20 g-cm ^-3) sample (sample A) and a low density (4.23 g-cm^-3 ) sample (sample B) have been investigated. Common to both samples is 1/f² noise observed in the frequency region between about 15 and 50 Hz that can be associated with the NS boundary itself. Sample A also exhibits conventional 1/f noise as expected for the normal part of the boundary, below about 15 Hz. In contrast, sample B shows 1/f^1.5 noise in this region; since the sample contains considerably fewer small grains than sample A, any 1/f noise is presumably masked in B. It is suggested that the 1/f² noise might be associated with flux-flow noise     

Comments, with reply, on `Modeling of the 1/f noiseovershoot in short-channel MOSFETs locally degraded by hot-carrierinjection' by B. Boukriss et al

It is pointed out that a letter by Boukriss et al. (see ibid., vol.10, p.433-6, 1989) contains no reference to the actual value of the characteristic exponent of the noise spectrum (γ). This omission may result from the assumption that γ is equal to one. Similar measurements by the present author indicate that γ varies strongly following hot-carrier injection near the drain. The change in the characteristic component is caused by the injected carriers present in the oxide near the interface, rather than the increased number of traps. This injected charge has an effect on noise provided the channel is not pinched off. It is argued that to study only the amplitude of the noise and not γ misses critical information, the scaling properties, and that if one is to measure noise amplitude, one should measure the characteristic exponent as well. In a reply, the original authors state that the 1/f noise was studied for a nonhomogeneous MOSFET. The 1/f noise level was investigated from weak to strong inversion     

Transversal and longitudinal noise and their coherence in MOST

The thermal and 1/f noise have been studied in MOSTs with side contacts along the channel. In difference biasing conditions, the distribution of the transversal noise in the channel has been explained in terms of the local values, including surface concentration, noise parameter, and mobility. Below saturation, the calculations are in good agreement with the observed experimental data. At saturation, the 1/f noise source strength seems to be nonuniform, along the channel, and the simple model deviates from experimental results. Possible reasons for this are discussed. The observed transversal noise and the coherence of longitudinal noise indicate that 1/f noise is uniformly generated through the channel in the ohmic region. However, there is no proof of the hypothesis that temperature fluctuation is the origin of the 1/f noise. A simple expression is derived to estimate the ratio of transversal to longitudinal noise in terms of channel geometric parameters. For MOSTs biased in the ohmic region at high gate voltage there is good agreement between experimental and calculated results     

Importance of source and drain resistance to the maximum fT of millimeter-wave MODFETs

The usual approximate expression for measured f_T =[g_m/2π (C_gs+C _gd)] is inadequate. At low drain voltages just beyond the knee of the DC I-V curves, where intrinsic f _t is a maximum for millimeter-wave MODFETs, the high values of C_gd and G_ds combine with the high g_m to make terms involving the source and drain resistance significant. It is shown that these resistances can degrade the measured f_T of a 0.30-μm GaAs-AlGaAs MODFET from an intrinsic maximum f_T value of 73 GHz to a measured maximum value of 59 GHz. The correct extraction of maximum f_T is essential for determining electron velocity and optimizing low-noise performance     

Theory and experiments of 1/f noise in Schottky-barrierdiodes operating in the thermionic-emission mode

A 1/f noise model for diodes operating in the thermionic-emission mode under forward-bias conditions has been developed. The model is based on mobility and diffusivity fluctuations occurring in the space-charge region and accounts for the current-limiting role of the metal-semiconductor interface The bias dependence of the 1/f noise spectral density calculated from this model is in excellent agreement with the results of the authors' experiments but is at variance with the predictions of a model developed by T.G.M. Kleinpenning (1979). From the experimental data, a value of 4.2×10^-9 for the Hooge parameter is derived. This value is in good agreement with theoretical calculation for electrons in silicon     

Digital system for 1/f fluctuation-speed control of asmall-fan motor

To produce a comfortable breeze similar to a natural one, a digital open-loop control system was utilized to control the speed of a small fan motor with 1/f fluctuation. The system was modeled as a first-order lag element with a time constant of 1.1 s. The output was controlled by commands and produced 1/f fluctuations, even though it was an open-loop system when the holding time of the data for 1/f fluctuation was set at more than 2 s