2 MeV Si ion implantation damage in relaxed Si1−xGex

The damage produced by implanting, at room temperature, 3 μm thick relaxed Si_1−xGe_x layers with 2 MeV Si⁺ ions has been measured as a function of Ge content (x = 0.04, 0.13, 0.24 or 0.36) and Si dose in the dose range 10¹⁰–10¹⁵ cm⁻². The accumulation of damage with increasing dose has been studied as a function of Ge content by Rutherford Backscattering Spectrometry, Optical Reflectivity Depth Profiling and Transmission Electron Microscopy and an increased damage efficiency in Si_1−xGe_x with increasing x is observed. The characteristics of implantation-induced defects have been investigated by Electron Paramagnetic Resonance. The results are discussed in the context of a model of the damage process in SiGe.     

Release of nitrogen from SiOxNy films during RBS measurement

We have found that nitrogen atoms are released very rapidly from ultrathin SiO_xN_y films (2.6 nm) during RBS measurement with 500 keV He⁺ ions. The release behavior strongly depends on the preparation technique of the SiO_xN_y films. There is no release from the film prepared by thermal nitridation of SiO₂, while 80% of the nitrogen atoms are released from the film prepared by plasma nitridation at a fluence of 1×10¹⁶ cm⁻². The release cross-section for plasma SiO_xN_y films is of the order of 10⁻¹⁶ cm². This large cross-section cannot be explained by a simple recoil mechanism. The nitrogen release is also observed under irradiation with 5–10 keV electrons though the cross-section is of the order of 10⁻¹⁹ cm². These findings suggest that the observed nitrogen release is an electronic excitation induced process.     

Ion beam synthesis and recrystallization of amorphous SiGe/SiC structures

Si_1−xGe_x amorphous layers implanted with different doses of carbon (between 5 × 10¹⁵ and 2 × 10¹⁷ cm⁻² and annealed at 700°C and 900°C have been analyzed by Raman and Infrared spectroscopies, electron microscopy and Auger electron spectroscopy. The obtained data show the synthesis of amorphous SiC by implanting at the highest doses. In these cases, recrystallization only occurs at the highest annealing temperature (900°C). The structure of the synthesized SiC strongly depends on the implantation dose, in addition to the anneal temperature. For the highest dose (2 × 10¹⁷ cm⁻²), crystalline β-SiC is formed. Finally, a strong migration of Ge towards the Si substrate is observed from the region where SiC precipitation occurs.     

RBS investigations of buffer layers between YBa2Cu3O7−x and silicon

The deposition of high-quality high-T_c superconducting films on silicon wafers for future hybrid electronic devices is strongly hampered by the interdiffusion between films and substrate. This effect degrades the superconducting properties seriously and is a strong function of temperature. Since high processing temperatures are inevitable for good films, suitable buffer layers are needed to reduce the interdiffusion. We have investigated the combinations ZrO₂/Si(100), BaF₂/Si(100), and noble-metal/TiN/Si(100) at temperatures up to 780°C in oxidizing ambient. YBa₂Cu₃O_7−x films have been deposited onto the buffer layers by laser ablation. Thereafter the interfaces have been analyzed by Rutherford backscattering. So far only ZrO₂ has demonstrated sufficient stability to serve as a buffer layer for the laser-ablated YBa₂Cu₃O_7−x films. All other combinations suffer from interdiffusion or oxidation.     

Carbon clustering in Si1−xCx formed by ion implantation

Silicon-carbon alloys were formed by multiple energy implantation of C⁺ ions in silicon and in Silicon on Sapphire (SOS). The ion fluence ranged between 5 × 10¹⁶ − 3 × 10¹⁷ ions/cm² and the energy between 10–30 keV in order to obtain constant carbon concentration into a depth of 100 nm. The carbon atomic fraction (x) was in the range 0.22–0.59 as tested by Rutherford backscattering spectrometry (RBS). Thermal annealing of the implanted films induced a transition from amorphous to a polycrystalline structure at temperatures above 850°C as detected by Infrared spectrometry (IR) in the wavenumber range 600–900 cm⁻¹. The optical energy gap and the intensity of the infrared signal after annealing at 1000°C depended on the film composition: they both increased linearly with carbon concentration reaching a maximum at the stoichiometric composition (x = 0.5). At higher carbon concentration the IR intensity saturated and the optical energy gap decreased from the maximum value of 2.2 to 1.8 eV. The behaviour at the high carbon content has been related to the formation of graphitic clusters as detected by Raman spectroscopy.     

A comparative EPR study of ion implantation induced damage in Si, Si1−xGex (x ≠ 0) and SiC

Electron Paramagnetic Resonance (EPR) measurements have been made to investigate the build up of damage in silicon in relaxed crystalline Si_1−xGe_x (x = 0.04, 0.13, 0.24, 0.36) and in 6H-SiC as a result of increasing the ion dose from low levels (10¹² cm⁻²) up to values (10¹⁵ cm⁻²) sufficient to produce an amorphous layer. Si, Si_1−xGe_x (x ≠ 0) and SiC were implanted at room temperature with 1.5 MeV Si, 2 MeV Si and 0.2 MeV Ge ions respectively. A comparison is made between the ways in which the type and population of paramagnetic defects depend on ion dose for each material.     

Density measurement of amorphous SixGe1 − x alloys

The atomic density of amorphous Si_xGe_{1 − x} alloys (x = 1, 0.85, 0.67, 0.50, 0.20 and 0) has been measured. Mono-crystalline Si_xGe_1−x layers Were implanted with 1.50–2.75 MeV Si²⁺ and Ge²⁺ ions to produce the amorphous material. Using surface profilometry and RBS/channeling, it was found that amorphous alloys are less dense than the crystalline alloys, and that Vegard's law underestimates the a-Si_xGe_1−x density.     

Characterization of Si/GexSi1 − x heterojunction bipolar transistors formed by Ge ion implantation in Si

Epitaxial Si/Ge_xSi_{1 − x} heterojunctions were formed by high dose Ge ion implantation in Si followed by rapid thermal annealing at 1000°C for 10 s. This technique was adopted to fabricate Si/Ge_xSi_{1 − x} heterojunction n-p-n bipolar transistors (HBT) using a self-aligned, double polycrystalline silicon process commonly used for fast Si bipolar transistors. The devices are characterized by a 60 nm wide neutral base with a Ge concentration peak of ≈ 7 at.% at the base-collector junction. Good static and dynamic electrical characteristics are demonstrated and discussed.     

Thermal removal of gallium from gallia-doped ceria

The potential for removing gallium from Ga-doped CeO_2−x by thermal means was studied for the purpose of assessing gallium removal from PuO_2−x. The latter is of interest to those considering the storage or use of weapon-grade Pu, for example as a mixed oxide fuel component. Experiments were done by varying temperature, gas composition, exposure time, sample size, particle size, and gas flow rate. The kinetics of gallium removal were assessed through measurements of weight change, scanning electron microscopy, and chemical analyses. Results suggest that the gallium level can be reduced significantly by thermal treatments in Ar–6% H₂. Gallium species segregate to grain boundaries because of the low solubility of Ga₂O₃ in CeO₂. The kinetics and microstructural observations suggest that both gaseous and solid-state diffusion of gallium species are important for the removal of gallium.     

Li4SiO4 pebbles reduction in He + 0.1% H2 purge gas and effects on tritium release properties

Lithium orthosilicate reduction was examined by Temperature Programmed Reaction (TPR) and Temperature Programmed Desorption (TPD) methods performed in He (or Ar) + H₂ purge gas flowing through pebble bed specimens. The parameters governing the kinetics and the steady-state of the reduction process to Li₄SiO_4−x were determined at 800°C. The level x of the O-vacancy concentration at steady-state (of the order of 1.5×10⁻³ mole fraction) was found to be compatible with the impurities content in the specimens. Pebble pre-annealing treatments were found to affect the microstructure and the reduction mechanism. Post-irradiation tritium release by TPD tests were performed on both stoichiometric and reduced pebbles with similar results. Tritium release properties of this breeder system seem to be independent from the material reduction state (x).     

Electrical conductivity and non-stoichiometry in the (U,Gd)O2±x system

The isothermal electrical conductivity and oxygen potential of the (U,Gd)O_2±x solid solution were measured in various oxygen partial pressure regions at 1200 °C and 1300 °C. The electrical conductivity gradually decreased with decreasing oxygen partial pressure even in the hypo-stoichiometric region. These findings were in contrast to the implication of a hypo-stoichiometry where the electrical conductivity is increased through the formation of oxygen vacancies. The (U_1−yGd_y)O_2−y/2 was defined as a new stoichiometric composition to determine the relationship between the deviation of the oxygen composition from stoichiometry and oxygen partial pressure. The dependence of the new oxygen deviation, z in (U_1−yGd_y)O_2−y/2+z, on the oxygen partial pressure corresponds to the dependence of the electrical conductivity, and thus a consistent defect structure model can be deduced from both the dependence curves. It suggests that the defect type is oxygen interstitial even below the oxygen composition of 2.     

Radiation damage effects in CMR manganite materials

Polycrystalline La_0.5Pb_0.5Mn_1−xCr_xO₃ (x = 0.075 and 0.15) samples have been irradiated with 50 MeV Li³⁺ ions with different fluences and the effects on the transport properties have been studied by means of the temperature and magnetic field dependent resistivity measurements. Due to Li³⁺ ion irradiation, the resistivity increases and the metal–insulator transition temperature (T_mi) decreases. At low temperatures (below T_mi), a dominant contribution of the electron–magnon scattering process is observed for all the irradiated and unirradiated samples. The low temperature resistivity behavior as well as the magnetoresistance is modified due to irradiation. The changes in the magnetotransport properties due to irradiation have been compared with the changes caused due to Mn site substitution.     

Chemical thermodynamic representation of AmO2−x

The AmO_2−x solid solution data set for the dependence of the oxygen potential on the composition, x, and temperature was retrieved from the literature and represented by a thermodynamic model. The data set was analysed by least-squares using equations derived from the classical thermodynamic theory for the solid solution of a solute in a solvent. Two representations of the AmO_2−x data were used, namely the Am_5/4O₂–AmO₂ and AmO_3/2–AmO₂ solid solution. No significant difference was found between the two, and the Am_5/4O₂–AmO₂ solution was preferred on the basis of the phase diagram. From the results the Gibbs energy of formation of Am_5/4O₂ has been derived.     

Micro-RBS characterisation of the chemical composition and particulate deposition on pulsed laser deposited Si1−xGex thin films

The formation and deposition of particulates by pulsed laser deposition of Si_1−xGe_x semiconductor alloy thin films are discussed. Using Rutherford backscattering spectrometry with micrometer lateral resolution (micro-RBS) the film composition was measured with high accuracy, even in the presence of particulates with a high areal density of 20,000–30,000 particulates per mm². We show that on impact of a particulate, the part of the thin film which is already deposited probably melts and its Ge content segregates to the surface.     

Large conductivity enhancement in polycrystalline 12CaO · 7Al2O3 thin films induced by extrusion of clathrated O ions by hot Au implantation and ultraviolet light illumination

Large enhancement in electrical conductivity from <10⁻¹⁰ S cm⁻¹ to 4 × 10⁻² S cm⁻¹ was achieved in polycrystalline 12CaO · 7Al₂O₃ (p-C12A7) thin films by hot Au⁺ implantation at 600 °C and subsequent ultraviolet (UV) light illumination. Although the as-implanted films were transparent and insulating, the subsequent UV-light illumination induced persistent electronic conduction and coloration. A good correlation was found between the concentration of photo-induced F⁺-like centers (a cage trapping an electron) and calculated displacements per atom, indicating that the hot Au⁺ implantation extruded free O²⁻ ions from the cages in the p-C12A7 films by kick-out effects and left electrons in the cages. These results suggest that H⁻ ions are formed by the Au⁺ implantation through the decomposition of preexisting OH⁻ ions. Subsequent UV-light illumination produced F⁺-like centers via photoionization of the H⁻ ions, which leads to the electronic conduction and coloration.     

Magnetic ordering in superconducting YBa2(Cu1−xFex)3Oy oxide

Magnetic susceptibility measurement and the zero-field muon-spin-relaxation experiment have been made for the YBa₂(Cu_1−xFe_x)₃O_y system. The susceptibility has been measured in the field strong enough for the magnetic flux to penetrate the superconductor and the resultant temperature dependence has demonstrated the field cooled effect and a cusp at low temperatures below T_c. The cusp has been observed when the high field has been applied. The dynamical depolarization rate of the muon obtained by the muon-spin-relaxation experiment has shown the maximum at the same temperature as the cusp. The results suggest that the spin glass freezing of localized magnetic moment takes place at the temperature of the cusp, which is consistent with the previous Mössbauer effect experiments. The magnetic phase diagram for the system has been obtained.     

Sputtering yield of Ti1−xBx films by 2 keV deuterium bombardment

We deposited titanium borides (Ti_1−xB_x; 0.40 < x < 0.77) by the co-sputter coating method and measured their sputtering yield by 2 keV deuterium ion bombardment as a function of their chemical composition at room temperature. The total sputtering yield is found to increase with increase of the boron content in Ti_1−xB_x. The total sputtering yield of stoichiometric TiB₂ is estimated to be 2.8 × 10⁻², about the same as those reported previously. Concerning the partial sputtering yield, that of the titanium does not depend on the chemical composition, but that of the boron increases with increase of the boron content. These experimental results could be explained by assuming that the partial sputtering yield is proportional to the spatial concentration of each atom in the Ti_1−xB_x matrix.     

Analysis of Cu and O in high-Tc superconductors by 7–9 MeV protons

The use of proton-induced γ-ray emission for the simultaneous analysis of Cu and O in high-T_c superconductors is demonstrated. Utilizing 7–9 MeV protons, the ratio of O relative to Cu can be determined reliably to a few percent accuracy in homogeneous bulk samples and films thicker than 130 μm using standard bulk samples of O and Cu. Results of the present method are compared with those of the analysis of YBa₂Cu₃O_7xdone by the Rutherford scattering of particles and the non-Rutherford scattering through the ¹⁶O(p,p₀)¹⁶O reaction.     

Rapid thermal annealing of arsenic implanted relaxed Si1−xGex

The electrical activity and redistribution during rapid thermal annealing (RTA) of high concentrations of As implanted into epitaxially grown, relaxed Si_1−xGe_x for x≤0.5 have been studied as a function of composition x and RTA parameters. At a given RTA temperature the maximum carrier concentration decreases and the redistribution increases with increasing x. Maximum carrier concentrations and junction depths as a function of composition and RTA parameters are given.     

Threshold oxygen levels in sodium necessary for the formation of NaCrO2 in sodium-steel systems

A knowledge of the threshold oxygen level in liquid sodium necessary for the formation of NaCrO₂ in sodium-steel systems is useful in the operation of fast breeder reactors. There is considerable discrepancy in the data reported in the literature. In order to resolve this, the problem was approached from two sides. Direct measurement of oxygen potential in the Na(l)-Cr(s)-NaCrO₂(s) phase field using the galvanic cell In, In₂O₃/YDT/Na, Cr, NaCrO₂ yielded: _o2 = −800847 + 147.85 T J/mol O₂ (657–825 K). Knudsen cell-mass spectrometric measurements were carried out in the phase field NaCrO₂(s)-Cr₂O₃(s)-Cr(s) to obtain the Gibbs energy of formation of NaCrO₂ as: ΔG^o_f,T(NaCrO₂) = −870773 + 193.171 T J/mol (825–1025 K). The threshold oxygen levels deduced from G^o_f,T (NaCrO₂) data were an order of magnitude lower than the directly measured values. The difference between the two sets of data as well as differing experimental observations from operating liquid sodium systems are explained on the basis of the influence of dissolved carbon.