Crystal orientation changes of Ag thin films on the Si(111) substrate due to tribo-assisted recrystallization

Crystal orientation changes of Ag thin films due to the tribo-assisted recrystallization have been studied using grazing incidence X-ray diffraction with synchrotron radiation. After preparation of an Si(111) √3 × √3-Ag surface, a 5-nm-thick Ag film was deposited on the surface at the substrate temperature of 303 K in an ultra-high vacuum chamber. The friction experiments were carried out using a diamond pin-on-plate type tribometer just after the Ag deposition in the same UHV chamber. We found that the coefficient of friction of the Ag films on the Si(111) √3 × √3-Ag surface decreases from 0.07 to 0.03, with increasing reciprocal sliding cycles. In synchronization with the coefficient change, Ag{100} grains are gradually disappearing. As a result, the Ag{111} grains cover the entire surface after 50 sliding cycles. Moreover, we found that the domain size of the Ag{111} grains increases with increasing reciprocal sliding cycles by measuring the rocking curve width. These results directly show that the Ag(111) plane is the sliding plane of friction and the coefficient of friction of Ag films is determined by the fraction of the Ag(111) grains in the Ag films. Moreover, to clarify the reaction between the Ag film and the Si substrate due to the tribo-assisted recrystallization, the substrate strain has been studied by an extremely asymmetric X-ray diffraction technique using synchrotron radiation.     

Electronic structure of Co islands grown on the √3 × √3-Ag/Ge(111) surface

By means of room temperature scanning tunneling spectroscopy (RT STS), we have studied the electronic structure of two different Ag/Ge(111) phases as well as Co islands grown on the √3 × √3-Ag/Ge (111) forming either √13 × √13 or 2 × 2 patterns. The spectrum obtained from 4 × 4-Ag/Ge(111) structure shows the existence of a shoulder at 0.7 V which is also present in the electronic structure of the Ge(111)-c2 × 8 and indicates donation of Ge electrons to electronic states of the Ag-driven phase. However, this fact is not supported by the electronic spectrum taken from the √3 × √3-Ag/Ge (111). The complexity of the Co-√13 × √13 islands bonding with the substrate is mirrored by a large number of peaks in their electronic spectra. The spectra obtained from the Co-2 × 2 islands which had grown on the step differ from those taken from Co-2 × 2 islands located along the edge of the terrace by a number of peaks at negative sample bias. This discrepancy is elucidated in terms of dissimilarities of Co-substrate interaction accompanying Co islands growth on different areas of the stepped surface.     

Thermal evolution of the morphology of Ni/Ag/Si(111)-√3 × √3 surface

The temperature-driven changes in morphology of the interface formed by room temperature (RT) deposition of Ni atoms onto an Ag/Si(111)-√3 × √3 surface were investigated by scanning tunneling microscopy. Roughly 70% of Ni deposition diffused into bulk substrate within the temperature range between RT and 573 K. The images as obtained after annealing up to 670 K correspond to the formation of nano-sized islands of nickel silicides. Two types of islands, large triangular islands typical of the whole range of applied coverage, and smaller islands of different shapes, coexist at Ni coverage higher than 1 monolayer. Annealing above 870 K led to the formation of a 7 × 7 phase in coexistence with small 5 × 5 domains at the expense of a complete disappearance of the √3 × √3 phase. Also, formation of Ni,Si alloy was observed at the temperature, along with segregation of bulk-dissolved Ni species onto the surface.     

Structural properties of the formation of yttrium germanides thin films on the Si(111) surface

We have performed first principles total energy calculations to investigate the deposit of yttrium digermanide on the Si(111) surface. We have used the periodic density functional theory as implemented in the Quantum-ESPRESSO package. For the adsorption of a monolayer of yttrium digermanide on the Si(111)-(1 × 1) surface, we have found that the most stable geometry corresponds to a configuration with Y atoms occupying the T4 site above a second layer Si atom, and with a Ge bilayer on top of the structure. The atomic structure of the Ge bilayer is similar to that of Si (Ge) in the bulk but rotated 180° with respect to the crystal. For the three dimensional growth of a few layers of yttrium digermanide on Si(111) we have considered a hexagonal structure with (√3 × √3) periodicity, similar to the one found in the growth of few layers of YSi₂ on Si(111): graphite-like Ge planes (with vacancies) intercalated with yttrium planes. As in the case of a single layer of YGe₂, there is a formation of a Ge bilayer on top of the structure. In this case, the Ge_down atoms of the bilayer, which are on top the vacancies, move down towards the vacancy, while Ge atoms in the graphitic layer, which are below the Ge_up atoms of the bilayer, are displaced towards the vacancy.     

Ordered mixed surface structures formed by coadsorption of dissimilar metal atoms on Cu(0 0 1)

We have found that various ordered mixed surface structures are formed by coadsorption of two dissimilar metal atoms on Cu(0 0 1) at room tepmerature, using low-energy electron diffraction (LEED) I-V analysis. As coadsorbates, we employed Mg, Bi, Li and K, and surface structures formed by the coadsorption systems of (Mg, Li), (Mg, K) and (Mg, Bi) are presented. A tensor LEED analysis provided detailed geometries of the coadsorbates and the substrate surface. It was found that the surface structures in the above three coadsorption sytems exhibit the restructuring of the Cu(0 0 1) surface. The phase separation into individual adsorbates does not take place, implying that some additional stabilization arises. We demonstrate two origins for the stabilization of the ordered mixed surface structures on Cu(0 0 1). Structures and features formed by the individual adsorption of Mg, Bi, Li and K atoms on Cu(0 0 1) are described first, then those of (2√2×√2)R45°-Mg,Li, (√5×√5)R26.7°-Mg,K, c(2×2)-Mg,Bi, and c(6×4)-Mg,Bi structures formed by the coadsorption are presented. We consider on the basis of the determined structural parameters the question why ordered mixed surface structures are formed instead of the phase separation.     

Intermediate structural phases in rare-earth substituted BiFeO3

The room-temperature crystal structure and local ferroelectric properties of Bi_0.85RE_0.15FeO₃ (RE = Sm, Gd, Dy) polycrystalline samples have been investigated by X-ray diffraction (XRD) and piezoresponse force microscopy (PFM) techniques. XRD measurements show that the rare-earth substitution causes the transformation of R3c structure typical of BiFeO₃ to yield orthorhombic phases with √2a × 2√2a × 2a and √2a × 2a × √2a superlattices (a is the parameter of the cubic perovskite subcell). Results of PFM investigations imply that both the orthorhombic phases are polar. The models describing crystal structure of the phases are discussed.     

Investigations of surface structure for thermally evaporated silicon on a Cu(111) surface

The surface structure and composition of semiconductor/Cu(111) films prepared by thermal evaporation in an ultrahigh vacuum condition have been investigated. As Si atoms were deposited on a Cu(111) surface, diffused spots were observed up to 2 monolayers while 1 × 1 spots become dimmer as revealed using low-energy electron diffraction technique. Because of a larger electron affinity of Si than that of Cu, the Cu L₃M₄₅M₄₅ Auger line shifts to a lower kinetic energy. Annealing treatments at 425 K causes a splitting of the Cu L₃M₄₅M₄₅ line. This shows the interdiffusion at the Si/Cu interface and the formation of a Cu-rich surface layer. After annealing treatments, the domains grow and aggregate to form larger domains as revealed by the decreasing full-width at half maximum of diffraction spots. Ge/Cu(111) shows 1 × 1 structure as annealing up to 500 K. Lack of a dominant structure and a large valence diameter of Ge result in different structures as compared to Si/Cu(111).     

Manifestations of strain-relaxation in the structure of nano-sized Co-2 × 2 islands grown on Ag/Ge(111)-√3 × √3 surface

We have examined strain-relaxation of Co-2 × 2 islands grown on the Ag/Ge(111)-√3 × √3 surface by analyzing scanning tunneling microscopy images. We have found that the Co-2 × 2 islands commonly adopt a more compact arrangement as compared to that of the Ge(111) substrate, however they differ in a degree of an atomic compactness. We have not found a distinct relation between strain-relaxation and the island height. Three groups of islands have been identified upon analyzing a correspondence between strain-relaxation and the island size: (i) small islands (not bigger than 80 nm²) with a high atomic compactness, displaying fixed inter-row distances, (ii) small islands with unfixed distances between atomic rows, and (iii) big islands (bigger than 80 nm²) with fixed inter-row distances, but with a less compact atomic arrangement compared to that of the first two groups. We propose a model to account for the relation between the relaxation and the island size.     

Characterization of bimetallic Au-Pt(111) surfaces

Structural and electronic properties of ultrathin Au films deposited on Pt(111) and annealed at different temperatures have been studied by ultraviolet photoelectron spectroscopy (UPS), photoemission of adsorbed xenon (PAX) and low energy electron diffraction (LEED). The LEED measurements indicate an initial pseudomorphic growth of the Au films. The UPS and PAX experiments show a strong temperature dependence of the surface morphology. The surface covered with Au at 150 K is quite rough but smoothens significantly above room temperature. At a temperature of 750 K intermixing and the formation of an Au-Pt surface alloy start at the interface. The electronic properties of this surface alloy seem to be nearly independent from the originally deposited Au amount in the investigated range of 1-10 monolayers. The removal of Au from the surface regions has also been verified by scanning tunneling microscopy. Adsorption experiments with CO as a titration agent show a significantly lower affinity of the Au-Pt surface alloy in comparison with the clean Pt surface.     

Effects of preparation temperature on optical and electrical characteristics of (111)-oriented Cu2O films electrodeposited on (111)-Au film

The (111)-oriented Cu₂O films with a 2.0-eV-bandgap energy were prepared by electrodeposition on a (111)-oriented Au/Si wafer substrate at the preparation temperatures from 298 to 323 K, and the structural, optical, and electrical characterizations were carried out by X-ray absorption spectra measurements, X-ray diffraction, scanning electron microscopic observations, optical absorption spectra, photoluminescence spectra measurements, and Hall effect measurements. The photoluminescence spectra and electrical characteristics changed depending on the temperature. The 1.52-eV-visible light that originated from the copper vacancies weakened with a decrease in the preparation temperature, and the emission of the slight 2.0-eV-visible light due to the recombination of excitons was observed for the Cu₂O film prepared at 298 K. The hole density related to the copper vacancies decreased and the mobility increased with a decrease in the preparation temperature, and the maximum mobility of 21 cm² V⁻¹ s⁻¹ could be obtained at 303 K.     

Quantum size effect in absorption of low energy electrons in Pb layers

Absorption of low-energy electrons in Pb ultrathin layers grown on a Si(1 1 1)-(6×6)Au substrate has been measured as a function of the incident electron energy and of the film thickness. The thickness-dependent curves of the current revealed two distinct features. One of them is associated with the quantum size effect and showed the characteristic oscillatory behavior with the periodicity determined by the film thickness. The other, independent of the film thickness, was attributed to the bulk band structure of Pb.On the basis of the changes in the quantum size oscillations peak position as a function of the transmitted electron energy, and of the layer thickness, the electronic band structure of Pb 8-20 eV above the vacuum level has been determined in the ΓL direction.     

Effects of periodicity and oxygen partial pressure on the crystallinity and dielectric property of artificial SrTiO3/BaTiO3 superlattices integrated on Si substrates by pulsed laser deposition method

Epitaxial SrTiO₃(STO)/BaTiO₃(BTO) artificial superlattices have been grown on TiN buffered Si (001) substrates by pulsed laser deposition method and the effects of stacking periodicity and processing oxygen partial pressure on their crystallinity and dielectric properties were studied. The crystal orientation, epitaxy nature, and microstructure of STO/BTO superlattices were investigated using X-ray diffraction and transmission electron microscopy. The TiN buffer layer and superlattice thin films were grown with cube-on-cube epitaxial orientation relationship of [110](001)_films∣∣[110](001)_TiN∣∣[110](001)_Si. The c-axis lattice parameter of the STO/BTO superlattice decreased from 0.412 nm to 0.406 nm with increasing oxygen partial pressure and the dielectric constants, measured at the frequency of 100 kHz at room temperature, of the superlattices with 2 nm/2 nm periodicity increased from 312 at 1 × 10^− 5 Torr to 596 at 1 × 10^− 3 Torr. The dielectric constants of superlattices grown at oxygen partial pressure of 1 × 10^− 3 Torr increased from 264 to 678 with decreasing periodicity of the superlattices from 10 nm/10 nm to 1 nm/1 nm.     

STM/STS investigations of titanium oxide nanostructures on au substrate

Au substrate was prepared by Au evaporation on Si(111) surface. Au surface was composed of Au grains with typical diameter of about 50 nm with atomically flat terraces. TiO₂ nanostructures were created by electron gun evaporation of Ti while simultaneous dosing of high purity O₂ gas. The pressure of oxygen was kept at 5 · 10^− 8 mbar and controlled by means of residual gas analyzer (RGA). Scanning tunneling microscopy (STM) images showed that TiO₂ nanocrystallites had grown between Au grains in cavities between them. This may suggest that such spots are preferred TiO₂ nucleation sites. I-V curves measured above Au showed metallic properties while those measured above TiO₂ exhibit energy gap characteristics for semiconducting material.     

Preliminary studies of In surface diffusion on the W(1 1 0) surface

The growth of In onto W(1 1 0) was observed at room temperature by means of low-energy electron diffraction and photoemission from core levels and valence levels. Surface diffusion of In onto the W(1 1 0) surface was studied by using ESCA imaging property of SCIENTA ESCA200 instrument at the temperature range of 400-550 K.     

Stability of electric characteristics of Au films on Si(111)5.55 × 5.55-Cu surface exposed to oxygen

Dependence of the surface electric conductivity of the layered Au/Si(111)5.55 × 5.55-Cu structure on the thickness of Au film and exposure in oxygen has been studied using low-energy electron diffraction, Auger electron spectroscopy, and four-point-probe conductivity measurements. The samples were obtained by depositing Au (1–5 monolayers, ML) in vacuum at room temperature onto preliminary prepared Si(111)5.55 × 5.55-Cu surface, after which the structure was kept in oxygen (to a total exposure varied within 0–14000 L) at room temperature. It is established that the increasing oxygen exposure of both the initial and Si(111)5.55 × 5.55-Cu surface and that coated with gold to 1–3 ML leads to a significant decrease in the surface conductivity of samples. In contrast, the conductivity of samples coated with more than 3 ML of gold remains almost unchanged, which is explained by the fact that a continuous Au film is formed in this case on the Si(111)5.55 × 5.55-Cu surface.     

Growth of 3C-SiC on Si(111) using the four-step non-cooling process

A modified four-step method was applied to grow a 3C-SiC thin film of high quality on the off-axis 1.5° Si(111) substrate in a mixed gas of C₃H₈, SiH₄ and H₂ using low pressure chemical vapor deposition. The modified four-step method adds a diffusion step after the carburization step and removes the cooling from the traditional three-step method (clean, carburization, and growth). The X-ray intensity of the 3C-SiC(111) peak is enhanced from 5 × 10⁴ counts/s (the modified three steps) to 1.1 × 10⁵ counts/s (the modified four steps). The better crystal quality of 3C-SiC is confirmed by the X-ray rocking curves of 3C-SiC(111). 3C-SiC is epitaxially grown on Si(111) supported by the selected area electron diffraction patterns taken at the 3C-SiC/Si(111) interface. Some {111} stacking faults and twins appear inside the 3C-SiC, which may result from the stress induced in the 3C-SiC thin film due to lattice mismatch. The diffusion step plays roles in enhancing the formation of Si-C bonds and in reducing the void density at the 3C-SiC/Si(111) interface.     

Structure of Pt3Co(1 1 0)c(2×4)-O surface studied by scanning tunneling microscopy

A Pt₃Co(1 1 0)c(2×4)-O surface has been investigated by scanning tunneling microscopy (STM), low-energy electron diffraction, and Auger electron spectroscopy. At a very initial oxidation stage exposed at 500°C, creation of missing and/or added row structures running to the [0 0 1] direction on clean Pt₃Co(1 1 0)2×1 surface was imaged from the steps. The surface is fully covered by a well-ordered c(2×4) structure at 2 L oxygen exposure. Atomic-resolution STM image shows the added row-type anti-phase Co-O zigzag chains along the [0 0 1] direction. Based on the images, the structure model for the c(2×4) surface was suggested as a first oxidized layer, which comes from the chemical reaction forming stoichiometric Co monoxide. Further oxygen exposure above 5 L, Co-O clusters imaged to large dots were formed on the surface with the size of about 5-7 Å.     

The behavior of Co atoms on Si (111)-7 × 7 surfaces at low temperatures

The behavior of Co atoms on Si (111)-7 × 7 surfaces at low temperatures was studied by using a variable-temperature scanning tunneling microscopy (VT-STM). Co atoms deposited on Si (111)-7 × 7 surfaces are randomly adsorbed at 100 K. Co atoms start to react with adatoms of Si (111)-7 × 7 surfaces at temperatures between 126 K and 130 K. The reaction transfers the bright dots of Co atoms to dark dots under the STM observation of negative bias. Analysis of the reaction occurrence sites and comparing with the results of room temperature deposition shows that the Co atoms tend to diffuse and react with the adatoms of Si (111)-7 × 7 surfaces at the center sites of unfaulted half unit cell (UHUC) at higher temperatures.     

Superconductivity of p-type diamond (001) and (111) thin films: Ab initio calculations

The surface structure, electronic properties, lattice dynamics, and the electron-phonon coupling for p-doped diamond (001)-(2 × 1) and (111)-(2 × 1) thin films have been extensively investigated using ab initio methods within the virtual crystal approximation. The calculations of p-doped diamond thin films strongly favor dimer reconstruction of diamond surfaces. The physical origin of superconductivity of diamond (001)-(2 × 1), respectively, and (111)-(2 × 1) thin films which is higher than that of bulk diamond is systematically studied. It is showed that surface vibrational modes of diamond (001)-(2 × 1) surfaces give main contributions to superconducting transition temperature T_c, while T_c of diamond (111)-(2 × 1) surfaces is attributed to the combined action of surface and bulk vibrational modes. Therefore, at the highest concentration (13.98 × 10²¹ cm^− 3) T_c ≈ 56.5 K of diamond (111)-(2 × 1) surfaces is about twice as high as that of bulk and diamond (001)-(2 × 1) surfaces.     

Effect of crystallographic orientations on electrical properties of sputter-deposited nickel oxide thin films

Nickel oxide thin films of various preferred orientations were deposited by radio-frequency (RF) magnetron sputtering process in different gas ratios of oxygen atmosphere at RF power 200 W on unheated and heated for (673 K) substrates. The relationships among substrate temperature, preferred orientation and electrical properties of the NiO films were investigated. The resulting films were analyzed by grazing-incidence X-ray diffraction, high-resolution transmission electron microscopy (HR-TEM), and ultrahigh resolution scanning electron microscopy (HR-SEM). The electrical properties were measured using four probe and Hall effects measurements. The results show that films deposited at room temperature with the ratio of oxygen varying from 0 to 100% develop a (111) preferred orientation. At temperature of 673 K, while the (111)-orientated film was obtained under a low ratio of oxygen (<50% O₂), a (200) preferred orientation was developed under 100% oxygen. The lowest sheet resistance 0.01 MΩ/□, resistivity 0.83 Ω-cm and higher carrier density 7.35 × 10¹⁸ cm⁻³ could be obtained on (111) preferred orientation samples prepared on unheated substrates in pure oxygen atmosphere. The relationship between preferred orientation and electrical properties was proposed in this paper.