Determination of Optical Constants of Solgel-Derived Inhomogeneous TiO(2) Thin Films by Spectroscopic Ellipsometry and Transmission Spectroscopy

Amorphous and nanocrystalline TiO(2) thin films coated on a vitreous silica substrate by a solgel dip coating method are investigated for optical properties by spectroscopic ellipsometry (SE) together with transmission spectroscopy. A method of analysis of SE data to determine the degree of inhomogeneity of TiO(2) films has also been presented. Instead of the refractive index, the volume fraction of void has been assumed to vary along the thickness of the films and an excellent agreement between the experimental and calculated data of SE below the fundamental band gap has been obtained. The transmission spectrum of these samples is inverted to obtain the extinction coefficient k spectrum in the wavelength range of 300-1600 nm by using the refractive indices and parameters of structure determined by SE. The nonzero extinction coefficient below the fundamental band-gap energy (3.2 eV) has been obtained for the nanocrystalline TiO(2) and shows the presence of optical scattering in the film.     

Optical study of zinc blend SnS and cubic In2S3:Al thin films prepared by chemical bath deposition

Multilayers of zinc blend SnS crystalline thin film have been deposited onto glass substrates by a chemical bath deposition (CBD) method. The envelope method, based on the optical transmission spectrum taken at normal incidence, has been successfully applied to determine the layer thickness and to characterize optical properties of thin films having low surface roughness. Optical constants such as refractive index n, extinction coefficient k, as well as the real (??_r) and imaginary (??_i) parts of the dielectric constant were determined from transmittance spectrum using this method. Obtained low value of the extinction coefficient in the transparency domain is a good indication of film surface smoothness and homogeneity. To perform the heterojunction structure based on SnS absorber material, cubic In₂S₃:Al was deposited on SnO₂:F/glass as window layer using CBD with different aluminum content. Optical properties of these films were evaluated.     

Optical and microstructural characterization of sol/gel derived cerium-doped PZT thin films

Optical properties of cerium-doped PZT thin films on sapphire prepared by a sol-gel technique are investigated using both transmission and reflection spectra in the wavelength range 200 to 900 nm. The refractive index, extinction coefficient and thickness of the film are determined from the measured transmission spectra. The packing density of the film is calculated from its refractive index using the effective medium approximation (EMA), and average oscillator strength and wavelength are estimated using a Sellmeir-type dispersion equation. Absorption coefficient (α) and the band gap energy (E_g) of each film composition are also calculated. Possible correlations of microstructure and phase formation behaviour with changes in band gap energy and other optical properties are discussed. This revised version was published online in November 2006 with corrections to the Cover Date.     

Optical and mechanical characteristics of zinc sulphide-thorium fluoride mixed composition thin films for use in the near infrared region (1–10µm)

Mixed composition thin films of zinc sulphide-thorium fluoride have been deposited on glass and silicon substrates by thermal evaporation of mixtures of these materials in different proportions, from a single resistively heated source. The films are characterized for their optical properties (refractive index and extinction coefficient), mechanical properties (intrinsic stress), surface morphology and chemical composition. It is found that these films have tailorable refractive indices and low losses, and that films with certain compositions have low intrinsic stress and smooth surface morphology, making them suitable for incorporation in thin film multilayers for use in the near infrared region up to at least 10μm.     

Investigations on the optical properties of sol–gel derived lanthanum doped lead titanate thin films

In the present work we studied the optical properties of undoped and La doped lead titanate thin films, and also demonstrated that the optical characterization of thin films can be used as an effective diagnostic tool to assess film quality. The optical properties of Pb_1−xLa_xTi_1−x/4O₃ [where x=0 (undoped), 10, 15, 20, 25 and 30 at.%] thin films were investigated using both transmission and reflection spectra in the 200–900-nm wavelength range. The refractive index (n), extinction coefficient (k) and the thickness of the film (d_f) were determined from the measured transmission spectra. The thickness of the film obtained from the interference fringes in transmission or reflection spectra matched well with those obtained from other methods. The appearance of interference fringes is an indication of the thickness uniformity of the film. The low value of extinction coefficient (in the order of 10⁻²) as observed in our films is a qualitative indication of excellent surface smoothness of the films. The densities of the films were estimated from their refractive indices using effective medium approximation. The average oscillator strength and its associated wavelength were estimated using a Sellmeier-type dispersion equation. Absorption coefficient (α) and the band-gap energy (E_g) were obtained for undoped and La doped films with varying La concentration. It was found that the refractive index and packing fraction values decrease with La doping. La doping was found to decrease the grain size of the films and increase the density of individual grains. Increased La content led to clustering of smaller grains. The observed variation of band-gap energy with La doping has been correlated to the observed microstructure of these films.     

光反射干涉谱新方法测试薄膜厚度和光学常数

依据测量薄膜和光之间相互作用可确定薄膜特性的原理,并基于光反射干涉谱与德国最新研发薄膜分析软件SCOUT的新方法可测量已知或未知材料的多层薄膜厚度及其折射率n、消光系数k。通过实际测试证明：该方法可测试单晶硅、玻璃、ITO玻璃基底上沉积薄膜的厚度,样品基本不需要特别准备,对样品无破坏性,测试精准。理论上可以测量所有透光或半透光薄膜的厚度和光学常数,操作非常简便,适合于镀膜行业的在线检测和实时监控,且SCOUT软件在多层膜及多种材料的研发、制备等方面具有应用潜力。     

Preparation and characterisation of thickness dependent nano-structured ZnS thin films by sol–gel technique

Zinc sulfide (ZnS) thin films of different thickness were coated on glass substrates by the sol–gel dip-coating technique. Thickness dependent structural and optical properties of the films were studied in detail. X-ray diffraction (XRD) analysis indicated that the films had mixture of cubic (β) and hexagonal (α) phases with cubic (β) phase being predominant. Scanning electron microscope (SEM) showed that the film surfaces were smooth and crack free. Energy dispersive X-ray (EDX) measurement showed no impurity in the ZnS compound with elemental concentration of Zn/S being 50.38/49.62. Optical measurements showed that optical transmittance of the films were decreased in the visible range as the film thickness increased and band gap of the thin films were estimated to be about 3.61, 3.56, and 3.39?eV for the films with thickness of 100, 220, and 360?nm, respectively. Reactive indices and extinction coefficients of the films were measured by Spectroscopic Ellipsometer. Both the refractive index (n) and extinction coefficient (k) of the films were increased as the film thickness decreased. Electrical measurements showed that the resistivity of the films were decreased as the substrate temperature and film thickness increased.     

热处理对钛酸锶钡薄膜光学性能的影响

采用无水溶胶-凝胶技术制备了钛酸锶钡光学薄膜,系统研究了预处理和退火温度对钛酸锶钡薄膜的相结构、微观形貌和光性能的影响,优化了薄膜的光学性能,结果表明,膜的结构和形貌直接影响其光学性能。通过150℃预处理和850℃退火获得了晶化程度良好、表面形貌平整致密的钛酸锶钡薄膜。该膜在350-1000nm的最大光透过率为80．72％,在600-1000nm的折射率稳定在-1．93左右,消光系数最小,最小值为4x10-5。     

Optical constants in the ultraviolet region of evaporated high index thin films

A suitable method to determine the optical constants of high index thin films is essential for developing high efficiency dielectric thin film devices in theuv region from 240 nm to 400 nm. A quick and accurate method is established to determine these constants. Using this method the optical losses, refractive index, absorption coefficient and extinction coefficient of ZrO₂ films prepared by the method of reactive evaporation were evaluated in theuv region.     

Antireflecting coating from Ta<Subscript>2</Subscript>O<Subscript>5</Subscript> and SiO<Subscript>2</Subscript> multilayer films

Sol-gel method is important for depositing antireflective coating that allows control over thickness as well as the index of refraction. Antireflective coatings which are produced from Ta₂O₅ and SiO₂ multi-layer thin films using sol-gel spin coating method are presented. The refractive index and the thickness are controlled by the composition and the concentration of the solution respectively. The thickness, refractive index and extinction coefficient of the films were calculated through transmission and reflection measurement by an NKD analyser. Mechanical properties of the films were checked by the cross tape test and dry sun test at 760 W/m². The result shows that the sample heat treated at 450^∘C for 15 min approaches a reflectance with less than 0.5% at around 840 nm.     

Development of thickness measurement program for transparent conducting oxide thin films

The gallium doped zinc oxide has been one of the candidates for the transparent conducting oxide thin film electrode. It is not suitable to use a conventional light interference method to measure the thickness of the gallium doped zinc oxide thin film because the refractive index and extinction coefficient of the thin film is unknown during the optimization of the deposition conditions. In this paper, we report on the details of the film thickness program which uses the measured optical and electric properties and relationship between the plasma frequency and the optical constant of the film. The obtained film thickness of the prepared gallium doped zinc oxide thin film using the program was comparable with thicknesses measured by a cross-sectional analysis of the atomic force microscopy and the surface profiler. Moreover, the optical constant of refractive index and extinction coefficient of the film could also be estimated.     

Titanium oxide film for the bottom antireflective layer in deep ultraviolet lithography

Titanium oxide thin film, fabricated with tetraisopropyltitanate and oxygen by electron cyclotron resonance-plasma-enhanced chemical vapor deposition, is investigated as a potential candidate for the antireflective layer in KrF excimer laser (248-nm) lithography. The oxygen flow-rate dependence of the optical properties such as the refractive index (n) and the extinction coefficient (k) of the film at the 248-nm wavelength has been characterized, and the films with the expected combinations of n and k values for the antireflective layer have been deposited. Simulation results indicate that reflectance values of less than 4% and as low as 1.2% can be reached at the interface between the photoresist and the film postulating the structures of the photoresist/300-A TiO(x) film/c-Si substrate and the W-Si substrate, respectively, by selected proper combinations of n and k values. Moreover the reflectance can be further reduced to almost zero by changing the film thickness. Thus it is found that titanium oxide thin films can be used as the bottom antireflective layer in KrF excimer laser lithography.     

Antimony-incorporated TiO2 thin films: preparation and optical and electrical characteristics

Antimony-incorporated TiO₂ thin films were prepared using the spray-pyrolysis technique. The optical characteristics (percentage transmittance, refractive index, extinction coefficient) and the film thickness were investigated. The resistivity of the prepared samples was measured, and the effect of Sb concentration and film thickness on the measured parameters was discussed. The effect of Sb on the band-gap was also studied.     

Characterization of chemically sprayed CdO films on borate and phosphate glass substrates produced by melt-quenching technique

The properties of substrates used to deposit thin films are an important parameter in thin film production. Instead of using a commercial substrate, in this work, borate and phosphate glasses have been obtained by classic melt-quenching technique to be used as substrates for CdO films. Also, a microscope glass substrate has been used to compare the coating properties by other glass substrates. All films have been produced by Ultrasonic Spray Pyrolysis technique. The substrate temperature has been selected as 275 ± 5 °C. Thicknesses and some optical parameters such as refractive index and extinction coefficient have been determined by spectroscopic ellipsometry. Absorbance and transmittance spectra have been taken by UV/VIS spectrophotometer. Four-probe method has been used to determine the electrical resistivity values of the films. XRD investigations have shown that type of the substrate dramatically affects the characteristics of CdO films. CdO film deposited on phosphate glass substrate has the best structural quality. Atomic Force Microscope has been used to investigate the surface properties and roughness values of the films.     

Refractive index of polycrystalline submicrometer polymer thin films: Thickness dependence

Dielectric films used in insulating applications are becoming consistently thinner, hence the thickness of thin and ultathin films is an important design parameter. There exists a need for characterizing and understanding the thickness dependence of properties of films. The refractive index for low dielectric polytetrafluoroethylene crystalline submicrometer thin films is investigated by using an optical spectrometer coupled with a hot stage to monitor their thickness-dependent behavior. It is demonstrated that the refractive index has a strong dependence on film thickness, which can be related to the microstructure and morphology of the film as characterized by Fourier transform infrared spectroscopy and scanning electron microscopy.     

Effect of carbon concentration on the optical properties of nanocrystalline diamond films deposited by hot-filament chemical vapor deposition method

With reducing diamond grain size to nano-grade, the increase of grain boundaries and non-diamond phase will result in the change of the optical properties of chemical vapor deposition (CVD) diamond films. In this paper, the structure, morphology and optical properties of nanocrystalline diamond (NCD) films, deposited by hot-filament chemical vapor deposition (HFCVD) method under different carbon concentration, are investigated by SEM, Raman scattering spectroscopy, as well as optical transmission spectra and spectroscopic ellipsometry. With increasing the carbon concentration during the film deposition, the diamond grain size is reduced and thus a smooth diamond film can be obtained. According to the data on the absorption coefficient in the wavelength range from 200 to 1100 nm, the optical gap of the NCD films decreases from 4.3 eV to 3.2 eV with increasing the carbon concentration from 2.0% to 3.0%. From the fitting results on the spectroscopic ellipsometric data with a four-layer model in the photon energy range of 0.75-1.5 eV, we can find the diamond film has a lower refractive index (n) and a higher extinction coefficient (k) when the carbon concentration increases.     

Influence of the film thickness on structural and optical properties of CdTe thin films electrodeposited on stainless steel substrates

CdTe thin films of different thicknesses were deposited by electrodeposition on stainless steel substrates (SS). The dependence of structural and optical properties on film thickness was evaluated for thicknesses in the range 0.17–1.5 μm. When the film is very thin the crystallites lack preferred orientation, however, thicker films showed preference for (111) plane. The results show that structural parameters such as crystallite size, lattice constant, dislocation density and strain show a noticeable dependence on film thickness, however, the variation is significant only when the film thickness is below 0.8 μm. The films were successfully transferred on to glass substrates for optical studies. Optical parameter such as absorption coefficient (α), band gap (E_g), refractive index (n), extinction coefficient (k_e), real (?_r) and imaginary (?_i) parts of the dielectric constant were studied. The results indicate that all the optical parameters strongly depend on film thickness.     

Determination of film thickness and refractive index in one measurement of phase-modulated ellipsometry

Ellipsometry is often used to determine the refractive index and/or the thickness of a polymer layer on a substrate. However, simultaneous determination of these parameters from a single-wavelength single-angle measurement is not always possible. The present study determines the sensitivity of the method to errors of measurement for the case of phase modulated ellipsometry and identifies conditions for decoupling film thickness and refractive index. For a specific range of film thickness, both the thickness and the refractive index can be determined from a single measurement with high precision. This optimal range of the film thickness is determined for organic thin films, and the analysis is tested on hydrogel-like polymer films in air and in water.     

类金刚石薄膜光学特性的椭偏法研究

本文采用脉冲电弧离子镀的方法,在p型硅上沉积类金刚石薄膜,用椭偏法测试薄膜的光学常数.根据沉积方法的特点,建立一个四层结构的膜系,并由每一层的吸收情况合理选择色散关系;结合透过率的测试结果,利用光度法给测出薄膜折射率和厚度的估计值,作为椭偏法拟合的初值,拟合效果良好,得到薄膜的折射率、消光系数和几何厚度.     

Refractive index and extinction coefficient determination of an absorbing thin film by using the continuous wavelet transform method

We present the continuous wavelet transform (CWT) method for determining the dispersion curves of the refractive index and extinction coefficient of absorbing thin films by using the transmittance spectrum in the visible and near infrared regions at room temperature. The CWT method is performed on the transmittance spectrum of an a - Si(1-x)C(x):H film, and the refractive index and extinction coefficient of the film are continuously determined and compared with the results of the envelope and fringe counting methods. Also the noise filter property of the method is depicted on a theoretically generated noisy signal. Finally, the error analyses of the CWT, envelope, and fringe counting methods are performed.