不同生长温度下Zn1-xSbxO薄膜的结构与发光性能研究

采用固相反应法制备了不同比例的Sb掺杂ZnO靶材,并用脉冲激光沉积(PLD)法在Si(100)基底上制备了Zn_1-xSb_xO薄膜。通过XRD、光致发光(PL)谱对所制薄膜进行了结构表征和性能分析,探讨了不同Sb掺杂量和不同生长温度对薄膜结晶质量和发光性能的影响。结果表明：对比纯ZnO的PL谱发现ZnSbO薄膜出现了紫外峰,且随着Sb浓度的增加,所有发光峰的强度相对增大;针对Zn_0.98Sb_0.02O薄膜,不同的基底生长温度改变了薄膜的紫外和蓝光发射强度,500℃下薄膜具有最好的结晶质量和最强的发光峰;对于500℃下生长的Zn_0.98Sb_0.02O薄膜,当激发光源波长从325nm变化到300nm,峰位红移,而且紫外峰与蓝光锋强度比由1∶3变为12∶1。据此,可以通过改变Sb掺杂量、生长温度和激发光源波长,从而制备出不同波段、不同强度的发光器件。     

铝掺杂氧化锌薄膜的光学性能研究

采用溶胶-凝胶法,在玻璃基底上制备了掺杂不同质量分数Al的ZnO薄膜,并采用X射线衍射(XRD)仪、扫描电子显微镜(SEM)、紫外-可见光谱仪(UV-Vis)、光致发光光谱(PL)等方法测试和分析了不同Al掺杂浓度对ZnO薄膜的形貌结构、光学性能影响。结果表明,Al的掺杂引起了晶体生长过程中择优取向的改变,掺杂ZnO薄膜的表面颗粒随Al掺杂量的增加而增大,可见光范围内的平均透射率78%,光致发光光谱分析表明,纯的ZnO薄膜有很强的紫外发光,而随Al的质量分数的增加,紫外发光强度迅速下降。     

Al掺杂浓度对氧化锌纳米棒结构和光学性能的影响

采用水热合成法以15min的溅射时间,0.7Pa的溅射压强制备的ZnO种子层玻璃片为衬底,制备出具有较好光致发光性能的Al掺杂ZnO纳米棒。采用X射线衍射仪(XRD)、扫描电子显微镜(SEM)和光致发光谱(PL)谱表征了样品的晶体结构、表面形貌和光致发光性能。结果表明,不同的Al掺杂浓度对于ZnO纳米棒产生了一定的影响,适当的Al掺杂使ZnO纳米棒的c轴择优取向更好,改善了ZnO的近紫外发光和蓝色发光特性。其结晶质量随着Al掺杂量的增加而降低,而且纳米棒的顶端在逐渐变细。随着Al~(3+)浓度的增加,纳米棒的光学性能先变好后变差,在Zn~(2+)与Al~(3+)的浓度比为1∶0.02时,纳米棒的光学性能效果最佳,紫外发光峰强度最大,并且出现了蓝移。     

一种P掺杂ZnO纳米梳的制备及其光致发光性能研究

采用化学气相沉积(CVD)方法制备了P掺杂ZnO纳米梳,扫描电子显微镜(SEM)结果显示,纳米梳状产物均匀分布在Si衬底上。P掺杂ZnO纳米梳为高度结晶的六方纤锌矿结构,ZnO中P的掺杂含量约为2%(原子分数)。室温光致发光(PL)光谱表明,P掺杂ZnO纳米梳在样品不同区域的发光性能略有不同,但是均出现3个发光峰:紫外、绿光和近红外发光峰。同时PL结果也表明样品的整体结晶质量比较好。     

锑掺杂对二氧化锡薄膜结构及发光性质的影响

采用射频磁控溅射方法在石英玻璃衬底上制备了SnO2:Sb薄膜.所制备的薄膜为四方金红石结构的多晶薄膜.PL谱表明,样品在396、450、500nm附近存在室温光致发射峰,发光峰的起因分别与SnO2薄膜中的氧空位缺陷及掺杂所致的施主一受主对之间的跃迁以及电子由其激发态向基态能级跃迁等因素有关.     

水热法制备掺铝氧化锌纳米棒阵列及其光学特性

采用水热法,在ZnO种子层上制备出不同Al掺杂量的ZnO纳米棒阵列薄膜,利用XRD、SEM、TEM、PL等检测手段对样品进行结构、形貌和发光性能分析.结果表明,纳米棒属于六方纤锌矿结构,具有垂直基底沿[002]方向生长的特征,PL谱上存在强的近紫外辐射峰.随着掺杂量的增加,纳米棒直径略有减小,近紫外辐射峰蓝移,强度先增加后减小,证明掺杂会形成非辐射中心,探讨了Al掺杂ZnO纳米棒阵列的发光机理.     

Mg掺杂对ZnO纳米纤维发光性能的影响

采用静电纺丝法在Si基底上制备了不同Mg掺杂浓度的ZnO纳米纤维膜,利用扫描电子显微镜(SEM)、X射线衍射(XRD)、X射线光电子能谱(XPS)、光致发光(PL)等手段对不同Mg掺杂浓度ZnO纳米纤维膜的表面形貌、晶体结构、化学成分、发光性能进行研究。SEM结果表明MgxZn1-xO纳米纤维的直径在50~300nm。XRD结果表明在Mg掺杂浓度低于15%(x=0.15)时,晶体呈现ZnO六角纤锌矿结构,当掺杂浓度达到20%(x=0.2)时,晶体出现MgO的分相。XPS结果表明Mg已成功掺入到ZnO纳米纤维中。PL谱表明MgxZn1-xO纤维膜具有较强的紫外发射,而可见发射几乎观察不到,随着Mg掺杂浓度的增加,紫外发光峰明显蓝移且发光强度增加。     

Mn、Co掺杂ZnO薄膜结构及发光特性研究

利用脉冲激光沉积(PLD)方法在Si(100)衬底上制备了ZnO、Zn0.8Mn0.2O、Zn0.8Co0.2O薄膜.薄膜的晶体结构和表面形貌采用X射线衍射仪和原子力显微镜测试.表明薄膜具有明显的c轴择优生长取向,薄膜表面较为平整,颗粒尺寸在纳米量级,薄膜中晶粒的生长模式为"柱状"模式.此外,Mn、Co掺入后,薄膜的X射线衍射峰有小角度偏移,这与 Mn2 、Co2 离子半径有关.PL谱显示Mn、Co掺杂ZnO薄膜的蓝、绿发光峰的位置相对纯的ZnO薄膜没有改变,还出现了紫外发光峰,其中Mn掺杂的蓝、绿光峰的强度减弱,Co掺杂的蓝光峰强度减弱,绿光峰强度增强.这是因为Mn、Co掺入改变了ZnO本征缺陷的浓度,发光峰的强度也随之而改变.     

溶胶-凝胶法制备Y掺杂ZnO薄膜及其光电性能研究

采用溶胶-凝胶法在玻璃衬底上制备了不同掺Y浓度的ZnO透明导电薄膜。X射线衍射(XRD)表明,所制备的Y掺杂ZnO透明导电薄膜为六角纤锌矿结构的多晶薄膜,且具有C轴择优取向。随着Y掺杂浓度的升高,(002)峰向低角度方向移动。UV透射曲线表明,薄膜在可见光区(400～800nm)的平均透过率超过85%,具有明显的紫外吸收边,通过改变Y的掺入浓度,可以使吸收边向短波方向移动,从而使薄膜的禁带宽度可调。制备的Y掺杂ZnO薄膜电阻率最小值为3.68×102Ω·cm。     

沉积气压对磁控溅射制备ZnO薄膜的结构与光学性能影响

采用CS-400型射频磁控溅射仪在Si(111)和石英基底上成功的制备了ZnO薄膜,分别用XRD、SEM、紫外-可见光分光光度计和荧光分光光度计表征样品的结构和光学性质.实验表明,采用射频磁控溅射制备的ZnO薄膜具有六角纤锌矿结构的(002)峰和(101)峰的两种取向.在沉积气压>1.0Pa时所制备的ZnO薄膜具有(002)择优取向,并且十分稳定.SEM图表明,ZnO薄膜颗粒大小较为均匀,晶粒尺寸随着气压升高而变小,沉积气压不同时,薄膜样品的生长方式有所差异.在400～1000nm范围内,可以看出除O.5Pa下制备的ZnO薄膜外,其余ZnO薄膜在可见光区域的平均透过率超过80%,吸收边在380nm附近,所对应的光学带隙约为3.23～3.27eV,并随着沉积气压上升而变大.ZnO薄膜的PL谱上观察到了392nm的近紫外峰和419nm的蓝峰;沉积气压对Zno薄膜的发光峰位和峰强有影响.     

Effects of substrate temperature on the structural and magnetic properties in Cr-doped ZnO films prepared by magnetron sputtering

High quality Cr-doped ZnO thin films with Cr content of 2 at.% were prepared at substrate temperatures from 300 to 450 °C by RF magnetron sputtering. The effect of substrate temperature on the crystallographic structures and magnetic properties of the thin films were investigated by means of X-ray diffractrometry (XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy and Physical Property Measurement System, respectively. XRD patterns show that all the prepared films with hexagonal wurtzite structure have a preferred orientation with the caxis perpendicular to the substrates plane. XPS spectra demonstrate that the Cr ions are in +3 valence state in doped ZnO films. Magnetic measurements reveal that the Crdoped ZnO thin films exhibit room-temperature ferromagnetism that becomes weaker with the increasing of the substrate temperature.The origin of the observed FM is interpreted by the overlapping of polarons mediated through oxygen vacancy based on the bound magnetic polarons models.     

Effects of buffer layer thickness on properties of ZnO thin films grown on porous silicon by plasma-assisted molecular beam epitaxy

ZnO thin films with different buffer layer thicknesses were grown on Si and porous silicon (PS) by plasma-assisted molecular beam epitaxy (PA-MBE). The effects of PS and buffer layer thickness on the structural and optical properties of ZnO thin films were investigated by atomic force microscopy (AFM), scanning electron microscopy (SEM), X-ray diffraction (XRD), and photoluminescence (PL). The ZnO buffer layers, the intensity of the (002) diffraction peak for the ZnO thin films and its full width at half maximum (FWHM) decreased with an increase in the thickness of the ZnO buffer layers, indicating an improvement in the crystal quality of the films. On introducing PS as a substrate, the grain sizes of the ZnO thin films became larger and their residual stress could be relaxed compared with the ZnO thin films grown on Si. The intensity ratio of the ultraviolet (UV) to visible emission peak in the PL spectra of the ZnO thin films increased with an increase in buffer layer thickness. Stronger and narrower UV emission peaks were observed for ZnO thin films grown on PS. Their structural and optical properties were enhanced by increasing the buffer layer thickness. In addition, introduction of PS as a substrate enhanced the structural and optical properties of the ZnO thin films and also suppressed Fabry-Perot interference.     

Thickness dependence of structural, electrical and optical properties of sprayed ZnO:Cu films

ZnO:Cu thin films have been deposited by spray pyrolysis techniques within two different (450 °C and 500 °C) substrate temperatures. The structural properties of ZnO:Cu thin films have been investigated by X-ray diffraction techniques. The X-ray diffraction spectra showed that ZnO:Cu thin films are polycrystalline with the hexagonal structure and show a good c-axis orientation perpendicular to the substrate. The most preferential orientation is along the (002) direction for all spray deposited ZnO:Cu films together with orientations in the (100) and (101) planes also being abundant. Some parameters of the films were calculated and correlated with the film thickness for two different substrate temperatures. The optical properties of ZnO:Cu thin films have been investigated by UV/VIS spectrometer and the band gap values were found to be ranging from 3.29 eV to 3.46 eV.     

Nanostructured zinc oxide films synthesized by successive chemical solution deposition for gas sensor applications

Nanostructured ZnO thin films have been deposited using a successive chemical solution deposition method. The structural, morphological, electrical and sensing properties of the films were studied for different concentrations of Al-dopant and were analyzed as a function of rapid photothermal processing temperatures. The films were investigated by X-ray diffraction, scanning electron microscopy, energy dispersive X-ray spectroscopy, X-ray photoelectron and micro-Raman spectroscopy. Electrical and gas sensitivity measurements were conducted as well. The average grain size is 240 and 224 Å for undoped ZnO and Al-doped ZnO films, respectively. We demonstrate that rapid photothermal processing is an efficient method for improving the quality of nanostructured ZnO films. Nanostructured ZnO films doped with Al showed a higher sensitivity to carbon dioxide than undoped ZnO films. The correlations between material compositions, microstructures of the films and the properties of the gas sensors are discussed.     

C轴择优取向ZnO薄膜的溅射工艺与结构研究

通过改变直流磁控反应溅射法的工艺条件,同时在玻璃和Si(100)、Si(111)两种硅基底上制备了ZnO薄膜。用x射线衍射方法(xRD和xRC)对薄膜结构性能进行测试表明,这些基底上生长的ZnO薄膜都得到了明显的c轴择优取向和较高的结晶度,硅基底上的薄膜结构性能普遍好于玻璃基底上淀积的薄膜。并对溅射工艺与结构的关系进行了分析。     

Sol–gel derived ZnO/PVP nanocomposite thin film for superoxide radical sensor

Pure ZnO films and ZnO nanoparticle-dispersed polyvinylpyrrolidone (PVP) composite films are prepared on Pyrex glass substrates by the sol–gel dip-coating technique utilizing zinc acetate precursor. The thin films are extensively characterized for surface morphology, chemistry, and nanocrystallite size using various advanced analytical techniques including Fourier transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). For the processing conditions considered, ZnO semiconductor thin films with nanocrystallite size 20–30 nm are obtained. The ZnO nanoparticle size in the PVP composite film increases with increase in ZnO content. The resistance of both the synthesized ZnO and ZnO/PVP thin films decrease significantly after exposure to solution containing superoxide anion radicals (SOR). The results thus indicate that ZnO and ZnO/PVP composite thin films can be used as biosensors for SOR and potentially for characterizing the antioxidant properties of fluids.     

Microstructure, wettability and optical characteristics of ZnO/In2O3 thin films

Zinc oxide (ZnO) thin films were prepared using thermal oxidation of zinc metallic films deposited by vacuum evaporation. The structure of the as-obtained ZnO films was investigated by X-ray diffraction technique and atomic force microscopy. Investigations revealed that ZnO thin films were polycrystalline and have a hexagonal (wurtzit) structure. The structural parameters depend on the oxidation conditions. The wettability of the films was studied and was observed that under UV-irradiation the ZnO films become super-hydrophilic. Optical properties of the films were investigated and it was observed that, in visible domain, optical transmittance ranged between 85 and 95% and optical reflectance is less 15%.     

Influence of the substrate nature on the properties of ZnO thin films

Zinc metallic films, deposited onto different substrates, were submitted to a thermal oxidation process, in air, in order to obtain ZnO thin films. X-ray diffraction patterns revealed that as-obtained ZnO thin films were polycrystalline and have a wurtzite (hexagonal) structure. The temperature dependences of the electrical conductivity during some heating/cooling cycles were studied and the conduction mechanism was interpreted in terms of Seto model. The sensitivity of ZnO thin films, at five gases, was investigated and it was established that ethanol is the test gas that produces the most significant changes in the electrical resistance of all the studied films. Some correlations between the oxidation temperature and the substrate nature and the parameters which characterize the structural and electrical properties of ZnO thin films have been established.     

ZnO thin films deposited by a CVT technique in closed ampoules

ZnO thin films were prepared on quartz glass, Si (100), and sapphire (001) substrates by a chemical vapour transport (CVT) technique. During the growing processes, the source and substrate temperatures were maintained at 1000 °C and 600 °C, respectively. The scanning electron microscopy (SEM) and X-ray diffraction (XRD) measurements showed that the crystalline qualities of ZnO thin films were sensitively dependent on substrates. ZnO thin film deposited on sapphire substrate exhibited the best morphology with the largest crystallite size of more than 20 μm. Meanwhile, the XRD patterns showed that ZnO thin film deposited on sapphire substrate was strongly c-axis preferred-oriented with high crystalline quality. The optical properties of ZnO thin films were investigated by photoluminescence (PL) spectroscopy at room temperature (RT). The results suggested that the optical properties of ZnO thin films were highly influenced by their crystalline qualities and surface morphologies.     

纳米ZnO镶嵌SiO2薄膜的光学特性研究

采用射频反应磁控溅射法在玻璃衬底上成功制备出纳米ZnO镶嵌SiO2非晶薄膜,利用X射线衍射仪、场发射扫描电子显微镜、X射线光电子能谱仪和紫外-可见分光光度计研究了纳米Zn0镶嵌SiO2薄膜相比纯ZnO纳米薄膜结构的变化及镶嵌结构对其光学特性的影响.研究发现与纯ZnO纳米薄膜相比,纳米ZnO镶嵌SiO2薄膜结构样品呈非晶结构,在紫外区光吸收系数以及光学带隙明显增大,光吸收以及光学带隙的变化与样品制备的衬底温度有关.研究结果表明,由于SiO2的特殊结构实现了对纳米ZnO的束缚,减少了ZnO纳米粒子的集聚,使得量子限制效应变得显著,导致复合膜光学带隙的明显增大以及吸收边的蓝移.