QPQ氮化时间对316L不锈钢组织和性能的影响

对316L不锈钢进行了QPQ(Quench-Polish-Quench)处理,研究了600℃渗氮温度下保温(60、90、120、150和180min)后渗层的组织和性能。利用光学显微镜、SEM、XRD、显微维氏硬度计和摩擦磨损机分析材料渗层的显微组织、物相、硬度和耐磨性。结果表明,316L不锈钢经QPQ处理后,渗层表面氧化层由Fe3O4组成,中间化合物层的物相主要包括Fe2~3N、Fe4N、Cr N和α-N相,靠近基体的扩散层主要由Cr N和γN相组成。随着渗氮时间延长,化合物层厚度从60 min的16.54μm增加到180 min的34.94μm,化合物层厚度与渗氮时间呈抛物线关系。与未处理试样相比,QPQ处理试样硬度值提高了4~6倍。干摩擦磨损测试表明,未处理试样表面发生粘着磨损,磨损量和磨损率较大;渗氮后150 min试样耐磨性最好。     

甲酰胺浓度对38CrMoAl钢液相等离子电解渗氮过程的影响

采用液相等离子电解渗氮技术,研究了不同甲酰胺浓度对38CrMoAl钢渗氮层组织及性能的影响。利用OM、SEM、XRD观察分析渗氮层的微观组织结构和物相构成,RF-GDOES和Parstat2273电化学工作站分别表征渗氮层的元素分布和耐蚀性,并测试分析了渗层截面的显微硬度。结果表明,随着电解液中甲酰胺浓度的升高,渗氮致密层、白亮层、扩散层厚度呈先增加后降低的趋势,渗氮层最大显微硬度值呈增加的趋势;当甲酰胺浓度升高至70%时渗氮层达到最大,为125μm,白亮层为51μm;渗氮后扩散层硬度值较高,而心部组织硬度较未处理试样提升约2倍;渗氮层表层主要含Fe2N和Fe3N相,扩散层以Fe16N2、FeN相为主,过渡层主要为α-Fe、FeN0.097相;渗氮层的耐蚀性优于未经处理试样。     

316L不锈钢表面Ta涂层的制备及性能

为改善316L不锈钢在体液中的生物相容性,采用双辉等离子体表面合金化技术在其表面制备了Ta涂层,并使用扫描电子显微镜(SEM)、能谱仪(EDS)和X射线衍射仪(XRD)对Ta涂层的形貌、成分分布和物相结构进行分析,借助划痕仪、往复摩擦磨损试验机和电化学工作站对涂层的结合强度、磷酸盐缓冲溶液(PBS)中的耐磨性及耐蚀性进行研究。结果表明:所制备的Ta涂层由厚度均为2μm左右的沉积层和扩散层组成,主要物相为α-Ta,涂层与基体的结合强度良好,发生破裂的临界载荷达到111 N。Ta涂层的比磨损率仅为基体的12.5%,自腐蚀电位比基体提高234 mV,腐蚀电流密度则降低2个数量级,磨损前后涂层样品的腐蚀速率分别为基体的1.9%和3.6%。表明Ta涂层能显著提升316L不锈钢在PBS溶液中的耐磨性和耐蚀性。     

高速钢钻头电火花沉积 Ti( C, N) /Al2O3 复合涂层的组织及切 削性能

目的在高速钢钻头表面电火花沉积Ti(C,N)/Al2O3复合涂层,以提高其切削性能。方法利用电火花沉积技术,以Ti(C,N)/Al2O3作为电极材料,在高速钢钻头表面制备Ti(C,N)/Al2O3涂层,考察涂层的物相组成、组织形貌及横截面硬度分布,并进行切削试验。结果涂层组织均匀,厚度约32~36μm,物相主要为C0.3N0.7Ti,Al2O3,AlTi3,Fe7W6,Fe4N,TiN和AlN,平均硬度是基体高速钢的2.6倍。结论在高速钢钻头表面制备Ti(C,N)/Al2O3涂层可以提高刀具的切削性能,延长其使用寿命。     

GCr15钢气体渗氮+淬火复合处理及干摩擦行为

用气体渗氮+淬火(N+Q)复合处理技术对GCr15进行表面强化,并与单纯的气体渗氮、淬火进行比较,系统研究了硬化层的物相、组织结构及干摩擦特性。结果表明:530℃气体渗氮9 h后,渗氮层的化合物层为ε相,厚度约为40μm;而渗氮之后淬火(N+Q)复合处理使氮化物完全分解,促使N元素向基体扩散,扩散区深约900μm,N固溶强化作用使得扩散区硬度比淬火硬度约高200 HV0.1,但是因氮化物分解产生孔隙致使表层硬度下降。分别在20 N和100 N载荷进行往复干摩擦试验,气体渗氮与N+Q复合处理都能有效降低摩擦因数。在20 N载荷时,N+Q复合处理试样体积磨损率低于渗氮与淬火试样;而在100 N载荷时,因其表面孔隙,使得初始磨损比淬火试样严重,但是磨损一段时间后耐磨性能提高。     

等离子辉光TiN复合渗镀层结构与性能的研究

利用等离子渗金属技术、尖端放电、空心阴极效应和反应气相沉积技术，在碳钢表面形成具有扩散层和沉积层的新型复合渗镀TiN沉积层＋TiN析出相＋Ti扩散层，并与等离子渗镀TiN，Ti层以及在碳钢基体表面直接用PVD法沉积TiN薄膜的表面形貌、结构、耐蚀性进行了检测和分析。结果表明：等离子渗镀的复合渗镀TiN／Ti层表面为均匀起伏的胞状物，Ti和N原子由表层呈梯度沿基体向内分布，属于冶金扩散层；用等离子渗金属技术等形成的复合渗镀TiN沉积层＋TiN析出相＋Ti扩散层，其表面形貌是为均匀、致密、细小的组织，平均硬度达到2500HV0．1左右，渗镀层厚度达十几微米，TiN层择优取向为（200）晶面；而PVD法直接沉积TiN薄膜厚度较薄，晶粒以不规则形式分布在基体上。在0．5mol／L H2SO4溶液中腐蚀性能表明，复合渗镀TiN沉积层＋TiN析出相＋Ti扩散层的耐蚀性较好。     

直流电场对42CrMo钢盐浴渗氮催渗与改性作用

以42CrMo钢为材料,对比研究了传统和直流电场催渗盐浴渗氮技术。利用光学显微镜、显微硬度计和X射线衍射仪对渗层的显微组织、渗层厚度、硬度及物相进行了测试和分析。研究结果表明:直流电场可以显著提高盐浴渗氮速度,降低渗氮温度或缩短渗氮时间;在外加电压7.5 V直流电场条件下,保温时间为80 min时,处理温度530℃获得的化合物层厚度与同样时间常规盐浴渗氮560℃时获得的层深相近,约为6.7μm,处理温度为560℃时化合物层厚度提高到12.1μm。虽然直流电场不改变42CrMo钢盐浴渗氮层的主要物相,均由ε-Fe_3N相、γ'-Fe_4N相和Cr N相构成,但直流电场盐浴渗氮后渗层中硬度较高的γ'-Fe_4N相的相对含量更高。因此,直流电场盐浴渗氮处理后的42CrMo钢的截面显微硬度大幅度的提高,经过575℃×80 min,7.5 V盐浴渗氮后的试样截面显微硬度达到1100 HV0.01,是基体硬度的3倍。同时,施加电场盐浴渗氮使42CrMo钢耐蚀性比常规盐浴渗氮进一步提高。     

AISI 300系列奥氏体不锈钢渗氮层组织和性能研究

目的 在AISI 300系列奥氏体不锈钢表面制备单一S相渗氮层,提高该系列不锈钢渗氮层的硬度、抗磨损性能,对比揭示渗氮前后不锈钢的磨损机制。方法 采用低温辉光等离子渗氮技术(LTPNT)在AISI 300系列奥氏体不锈钢表面制备渗氮层。利用光学显微镜(OM)、扫描电子显微镜(SEM)、电子探针(EPMA)、X射线衍射仪(XRD)分析渗氮层的截面形貌、元素分布和物相组成;通过比磨损率和磨痕形貌分析渗氮层的摩擦学性能;利用电化学实验考察渗氮前后3种不锈钢的耐蚀性。结果 AISI 300系列奥氏体不锈钢经380 ℃、12 h处理后,其表面获得了厚度为15 μm左右、与基体致密结合、组织成分均匀的渗氮层;渗氮层的相结构主要为S相,无CrN相析出;经渗氮后,该系列不锈钢表面硬度均为1 100HV左右,较基体硬度提高了5倍左右;不锈钢基体的磨损机理为黏着和磨粒磨损,经渗氮后转变为氧化磨损和微切削;渗氮层的比磨损率约为不锈钢基体的1/20,抗磨损的能力得到显著提升;在25 ℃环境温度下渗氮后,304L、316L和321的自腐蚀电位下降,腐蚀电流密度增加,腐蚀速率加快,耐腐蚀性能稍有降低。通过对比腐蚀形貌发现,渗氮层仍具有一定的耐蚀性能。结论 通过LTPNT可以获得高硬度、组织均匀致密、结合强度高的渗氮层,渗氮层中S相的存在可以显著提高AISI 300系列奥氏体不锈钢的表面硬度、抗磨损能力,降低其摩擦因数和比磨损率,对延长不锈钢的服役寿命有着积极的作用。     

复合表面处理改善304不锈钢的微观结构和耐磨性

目的 提高奥氏体不锈钢的耐磨性.方法 采用电镀法在304奥氏体不锈钢表面进行镍涂层预处理,然后在450℃及以下,于流动的高纯度NH3中进行气体渗氮,获得复合表面处理试样.使用扫描电子显微镜、X射线衍射仪和显微硬度仪,研究了渗氮层的组织、相组成和显微硬度.使用球盘式摩擦磨损试验机,选用硬度相差很大的两种材料GCr15和Si3N4作为摩擦副,对其耐磨性进行了探讨.结果 在400℃时,复合表面处理试样的基底表面生成约6.34μm厚的连续渗氮层,而单一渗氮试样表面没有渗氮层形成,而且450℃复合表面处理试样的渗氮层厚度为24.26μm,约是单一渗氮处理试样的7.85倍.400℃复合表面处理试样的渗氮层主要由γN-Fe组成.450℃复合表面处理试样的渗氮层主要由γN-Fe和少量铬的氮化物组成.400℃和450℃复合表面处理试样的最大硬度分别为780HV0.05和1450HV0.05,分别是原材料的3.3和6.2倍.与原材料相比,以GCr15作摩擦副时,400℃和450℃复合表面处理试样的磨损量分别下降了约75.7％和89.4％;以Si3N4作摩擦副时,400℃和450℃复合表面处理试样的磨损量分别下降了约82.5％和88％.结论 镍涂层预处理有利于提高气体渗氮效率.复合表面处理明显提高了材料的渗氮层厚度、硬度及耐磨性.     

钛催渗低温离子渗氮对304不锈钢组织性能的影响

目的 在保障304奥氏体不锈钢良好耐蚀性前提下,研发显著改善表层硬度及耐磨性的低温高效离子渗氮技术。方法 低温离子渗氮时,在试样周围均匀放置微量海绵钛,研发304奥氏体不锈钢创新钛催渗低温离子渗氮技术。采用光学显微镜、扫描电子显微镜、能谱分析仪、X射线粉末衍射仪、显微维氏硬度计、摩擦磨损测试仪,以及电化学工作站等设备分别对试样截面显微组织、物相及成分、截面显微硬度、渗层耐磨性能、耐蚀性能等渗层组织性能进行测试与分析。结果 304奥氏体不锈钢在420 ℃/4 h钛催渗离子渗氮处理后,不仅保持了良好耐蚀性,且渗层耐蚀性比常规低温离子渗氮略有提升,同时,表面硬度与耐磨性大幅提高,表面硬度由常规离子渗氮的978HV0.025提升至1350HV0.025。磨损率由20.9 μg/(N.m)降低至7.4 μg/(N.m),下降了约2/3。特别有价值的是,钛催渗低温离子渗氮效率比传统离子渗氮显著提升,渗氮层厚度由常规离子渗氮的11.37 μm增厚到48.32 μm,即渗氮效率提高到常规离子渗氮的4倍以上。结论 本研究研发的钛催渗低温离子渗氮技术在保障304奥氏体不锈钢优良耐蚀性的同时,能够大幅度提升不锈钢表面硬度及耐磨性能,且具有显著的催渗效果。     

Thermal effect of ion implantation with ultra-short ion beams

Ion implantation with plasma guns operated in the detonation mode presents several differences from normally used low current ion implanter systems.

The most important differences are the high power of the beams generated with the plasma guns owing to their pulsed nature on one hand, and the plasma environment in which the target is immersed during the process of implantation on the other hand. Both effects were studied in this work.

The temperature profiles and their evolutions during and after nitrogen implantation in pure titanium, stainless steel and copper were investigated by using the finite differences method. The calculation for nitrogen ion implantation (fluence of 10¹³ cm⁻² and pulse time of 400 ns) in pure titanium, shows melting layers of 20 ns after the first 200 ns of implantation, with a fast cooling after the end of implantation. Thermal gradients of 1000 K μm⁻¹ and a heating rate of 5 K ns⁻¹ were also observed.

Optical spectroscopy observations (real time spectroscopy) of the implantation region show a highly activated nitrogen plasma.

Both effects can be of extreme importance in several applications such as, for example, titanium nitriding because of an extra temperature assisted absorption by the getter effect.     

锶离子掺杂对NiO薄膜离子传输和电致变色性能的改善作用

电致变色材料在智能显示和军事伪装等领域具有非常重要的应用前景。为了改善NiO薄膜在碱性电解液中变色响应时间长,循环稳定性差的问题,本文采用水热法制备了锶离子掺杂纳米片状NiO电致变色薄膜,离子掺杂引起的晶格畸变与微纳结构的协同作用,使NiO薄膜展现出了优异的电致变色性能。锶离子掺杂一方面改善了NiO薄膜的电化学特性,从而缩短了电致变色响应时间(着色时间约为4.5 s,褪色时间约为2.7 s),提高了着色效率(CE, 85.2 cm₂^C_-1⁾。另一方面为NiO晶体结构提供了支撑,增强了电致变色过程中晶体结构的稳定性,从而显著提升了薄膜的循环稳定性(循环次数超过了10000次)。本文的研究结果对促进电致变色材料的工程化应用具有一定的借鉴和指导意义。     

High-energy heavy ion beam annealing effect on ion beam synthesis of silicon carbide

Silicon carbide (SiC) is a superior material potentially replacing conventional silicon for high-power and high-frequency microelectronic applications. Ion beam synthesis (IBS) is a novel technique to produce large-area, high-quality and ready-to-use SiC crystals. The technique uses high-fluence carbon ion implantation in silicon wafers at elevated temperatures, followed by high-energy heavy ion beam annealing. This work focuses on studying effects from the ion beam annealing on crystallization of SiC from implanted carbon and matrix silicon. In the ion beam annealing experiments, heavy ion beams of iodine and xenon, the neighbors in the periodic table, with different energies to different fluences, I ions at 10, 20, and 30 MeV with 1-5 × 10¹² ions/cm², while Xe ions at 4 MeV with 5 × 10¹³ and 1 × 10¹⁴ ions/cm², bombarded C-ion in implanted Si at elevated temperatures. X-ray diffraction, Raman scattering, infrared spectroscopy were used to characterize the formation of SiC. Non-Rutherford backscattering and Rutherford backscattering spectrometry were used to analyze changes in the carbon depth profiles. The results from this study were compared with those previously reported in similar studies. The comparison showed that ion beam annealing could indeed induce crystallization of SiC, mainly depending on the single ion energy but not on the deposited areal density of the ion beam energy (the product of the ion energy and the fluence). The results demonstrate from an aspect that the electronic stopping plays the key role in the annealing.     

Effect of ion implantation layer on adhesion of DLC film by plasma-based ion implantation and deposition

High adhesive diamond-like carbon (DLC) film on SUS304 was obtained using carbon ion implantation between DLC film and substrate material by plasma-based ion implantation and deposition (PBIID). Implantation of mixed silicon and carbon ions to the substrate resulted in much higher adhesion strength than that of the epoxy resin. Effect of ion implantation on adhesion of DLC film was studied by cross sectional STEM observation and EDS element analysis. Enhancement in adhesive strength by ion implantation of mixed carbon and silicon was ascribed to the formation of the multilayer interface consisting of mixed carbon and silicon ion implanted layer and the amorphous layer of carbon and silicon.     

The effect of ion implantation on the corrosion behaviour of pure iron-III. Tantalum ion implantation

Pure iron specimens were implanted with doses of 5 × 10¹⁴ and 2 × 10¹⁵ tantalum ions/mm². Using a three sweep potentiokinetic polarization technique the corrosion behaviour of these surface alloy layers was compared with that of pure iron and of a conventional Fe-4.9 wt% Cr alloy. It was found that tantalum implantation improved the corrosion resistance of pure iron and in particular reduced both the critical current density for passivation and the passive current density. The corrosion resistance of tantalum implanted iron was similar to that of the conventional Fe-4.9 wt% Cr alloy. The beneficial effects of tantalum implantation were unexpectedly persistent.     

Doping-dependent ion selectivity of polyaniline membranes

Polyaniline (PAN) films were cast from a solution in N-methyl-2-pyrrolidone (NMP) and characterised by atomic force microscopy (AFM), FTIR, X-ray, TGA and DSC. Ion selectivity of the films as free-standing membranes in the electrolyte/membrane/electrolyte system was characterised by transmembrane electric potential. It was demonstrated that PAN membrane has completely different permeability and ion selectivity in the undoped and HCl-doped states. In the undoped state, the membrane is hardly permeable to inorganic ions, but still it is selective to H⁺. After HCl-doping transmembrane resistance decreases by a few orders of value, and the membrane becomes anion/H⁺-selective.     

轰击能量对离子束辅助磁控溅射沉积Cr-N薄膜断裂韧性的影响

应用低能离子束辅助磁控溅射技术(IBAMS)沉积Cr-N薄膜,用场发射扫描电镜(FESEM)、原子力显微镜(AFM)和X射线衍射表征薄膜的组织结构,讨论了轰击能量对Cr-N薄膜组织、晶粒度以及硬度和断裂韧性的影响.结果表明:随离子束辅助轰击能量的升高,Cr-N薄膜由粗大的柱状晶变为细小的晶粒,当轰击能量达到1 200 V时,薄膜呈现等轴晶结构,薄膜致密度增加.FESEM得到的表面颗粒尺寸和AFM得到的粗糙度随轰击能量升高呈现相同的变化趋势,这些表观大颗粒是由许多小的亚晶块聚集而成.进一步用X射线衍射谱形分析表明:随轰击能量从0 V升高到800 V时,亚晶块的尺寸逐渐减小;到800 V时,晶块尺寸约为9 nm,但当能量升到1 200 V时,晶块尺寸反而增大,这是由离子束辅助轰击导致的两种不同机制而引起的,一种是离子轰击导致的喷丸碎化作用,而另一种为热效应引起的晶粒长大;当轰击能量从0 V增加800 V时,薄膜的硬度和断裂韧性都显著提高,与晶粒度的减小有关;而到1 200 V时,晶粒度较未辅助略大,但却具有很高的硬度以及较高的断裂韧性,说明硬度和断裂韧性的提高还与离子束轰击导致薄膜的致密化增加有关.     

Fluorine and carbon ion implantation and deposition on metals by plasma source ion implantation

Deposition of fluorine containing diamond-like carbon films is an effective solution for the improvement of machine parts in an aggressive aqueous environment when the combination of a hydrophobic surface with good corrosion protection and low friction coefficients is required. Stainless steel and silicon were treated by plasma source ion implantation using the gases CF₄, C₆F₆ and C₆H₅F, in the latter case with previous methane implantation. Depending on the plasma gas there are differences in the fluorine content, depth distribution, film thickness, water contact angle and friction coefficient.