Barrier characteristics of gold Schottky contacts on moderately doped n-InP based on temperature dependent I-V and C-V measurements

The temperature dependences of current-voltage (I-V) and capacitance-voltage (C-V) characteristics of the gold Schottky contacts on moderately doped n-InP (Au/MD n-InP) Schottky barrier diodes (SBDs) have been systematically investigated in the temperature range of 60-300 K. The main diode parameters, ideality factor (n) and zero-bias barrier height (apparent barrier height) were found to be strongly temperature dependent and while the decreases, the n and the increase with decreasing temperature. According to Thermionic Emission (TE) theory, the slope of the conventional Richardson plot [In(J₀/T²) vs. 1000/T] should give the barrier height. However, the experimental data obtained do not correlate well with a straight line below 160 K. This behaviour has been interpreted on the basis of standard TE theory and the assumption of a Gaussian distribution of the barrier heights due to barrier inhomogeneities that persist at the metal-semiconductor interface. The linearity of the apparent barrier height vs. 1/(2kT) plot that yields a mean barrier height of 0.526 eV and a standard deviation (σ_s0) of 0.06 eV, was interpreted as an evidence to apply the Gaussian distribution of the barrier height. Furthermore, modified Richardson plot [ vs. 1/T] has a good linearity over the investigated temperature range and gives the and the Richardson constant (A^∗) values as 0.532 eV and 15.90 AK⁻²cm⁻², respectively. The mean barrier heights obtained from both plots are appropriate with each other and the value of A^∗ obtained from the modified Richardson plot is close to the theoretical value of 9.4 AK⁻²cm⁻² for n-InP. From the C-V characteristics, measured at 1 MHz, the capacitance was determined to increase with increasing temperature. C-V measurements have resulted in higher barrier heights than those obtained from I-V measurements. The discrepancy between Schottky barrier heights(SBHs) obtained from I-V and C-V measurements was also interpreted. As a result, it can be concluded that the temperature dependent characteristic parameters for Au/MD n-InP SBDs can be successfully explained on the basis of TE mechanism with Gaussian distribution of the barrier heights.     

Barrier height inhomogeneities in a Ni/SiC-6H Schottky n-type diode

Two models have been used in order to explain the anomalies observed in a Ni/SiC-6H Schottky n-type diode I(V) characteristic. Both, parallel conduction and potential fluctuation models showed that the barrier's height is around a mean value of 1.86 V, corresponding to a factor of ideality of n=1. Another conclusion was that  V.It has been, also, explained why the Arrhénius or Richardson plot (ln(I_s/T²) versus 1/T) is not linear and why the area of the low barrier height A_l, representing a defective zone, is approximately about 0.12% of the total area contact.     

A novel nonvolatile memory based on self-organized quantum dots

A novel type of memory based on self-organized quantum dots (QDs) is presented, which merges the advantages of the most important semiconductor memories, the dynamic random access memory (DRAM) and the Flash. A nonvolatile memory with fast access times and good endurance (>10¹⁵ write/erase cycles) as an ultimate solution seems possible. A storage time of 1.6 s at 300 K in InAs/GaAs QDs with an additional Al_0.9Ga_0.1As barrier is demonstrated and a retention time of 10⁶ years is predicted for GaSb QDs in an AlAs matrix. A minimum write time of 6 ns is obtained for InAs/GaAs QDs. This value is already in the order of the access time of a DRAM cell and at the moment limited by the RC low pass of the device. An erase time of milliseconds is shown in first measurements on GaSb/GaAs QDs at . Faster write/erase times below even at room temperature are expected for improved device structures.     

Ionic outgassing from photoacid generators upon irradiation at 13.5 nm

Photoresist outgassing is considered a possible source of contamination of optics in extreme ultraviolet (EUV) lithography at 13.5 nm. We measured the relative proportions of ionic outgassing from 18 commercially available photoacid generators (PAG), which is a key component of chemically amplified photoresists, upon irradiation at 13.5 nm. These PAG include 17 triarylsulfonium or diaryliodonium salts, which contain or as the anion, and one PAG of molecular type. The overall outgassed ions in the range 10-200 u were counted in relative proportions. Outgassing of F⁺ is found to be dominant, and for most PAG the extent of F⁺ outgassing shows a satisfactory correlation with the ratio of F atomic photoabsorption to the overall PAG photoabsorption. Outgassed ions F⁺, CF⁺, and from PAG containing the anion and additional such as , and from those containing are identified. Triphenylsulfonium perfluoro-1-butanesulfonate is one PAG to emit the most abundant F⁺ and total ionic fragments, and a PAG of molecular type (N-hydroxy-5-norbornene-2,3-dicarboximide perfluoro-1-butanesulfonate) also emits abundantly both hydrocarbon ions and F⁺. Ionic outgassing of PAG cations includes (C₆H₅)₂S⁺ from R(C₆H₅)₂S⁺ salts and I⁺ from diaryliodonium salts. For PAG containing t-C₄H₉, significantly less F⁺ outgassing is observed; additional outgassing pathways are proposed. The pressure rise caused by PAG shows no dependence on the anion identity, but is correlated with cation photoabsorption, and ascribed to neutral aryl outgassing. Other minor outgassing species include from sulfonates; and ‘photostable’ PAH cations are identified for the first time and provide evidence of concurrent outgassing from, and polymerization of, PAG upon irradiation at 13.5 nm.     

A 1-V RF-CMOS LNA design utilizing the technique of capacitive feedback matching network

In this paper, a CMOS low-noise amplifier (LNA) with a new input matching topology has been proposed, analyzed and measured. The input matching network is designed through the technique of capacitive feedback matching network. The proposed LNA which is implemented in a technology is operated at the frequency of 12.8 GHz. It has a gain S21 of 13.2 dB, a noise figure (NF) of 4.57 dB and an NF_min of 4.46 dB. The reverse isolation S12 of the LNA can achieve and the input and output return losses are better than . The input 1-dB compression point is and IIP3 is . This LNA drains 10 mA from the supply voltage of 1 V.     

Current transport mechanisms and trap state investigations in (Ni/Au)-AlN/GaN Schottky barrier diodes

The current transport mechanisms in (Ni/Au)-AlN/GaN Schottky barrier diodes (SBDs) were investigated by the use of current-voltage characteristics in the temperature range of 80-380 K. In order to determine the true current transport mechanisms for (Ni/Au)-AlN/GaN SBDs, by taking the J_s(tunnel), E₀, and R_s as adjustable fit parameters, the experimental J-V data were fitted to the analytical expressions given for the current transport mechanisms in a wide range of applied biases and at different temperatures. Fitting results show the weak temperature dependent behavior in the saturation current and the temperature independent behavior of the tunneling parameters in this temperature range. Therefore, it has been concluded that the mechanism of charge transport in (Ni/Au)-AlN/GaN SBDs, along the dislocations intersecting the space charge region, is performed by tunneling.In addition, in order to analyze the trapping effects in (Ni/Au)-AlN/GaN SBDs, the capacitance-voltage (C-V) and conductance-voltage (G/ω-V) characteristics were measured in the frequency range 0.7-50 kHz. A detailed analysis of the frequency-dependent capacitance and conductance data was performed, assuming the models in which traps are located at the heterojunction interface. The density (D_t) and time constants (τ_t) of the trap states have been determined as a function of energy separation from the conduction-band edge (E_c − E_t) as D_t≅(5-8)×10¹², respectively.     

Temperature dependent current–voltage (I–V) characteristics of Au/n-Si (1 1 1) Schottky barrier diodes with PVA(Ni,Zn-doped) interfacial layer

Current–voltage (I–V) characteristics of Au/PVA/n-Si (1 1 1) Schottky barrier diodes (SBDs) have been investigated in the temperature range 80–400 K. Here, polyvinyl alcohol (PVA) has been used as interfacial layer between metal and semiconductor layers. The zero-bias barrier height (Φ_B0) and ideality factor (n) determined from the forward bias I–V characteristics were found strongly dependent on temperature. The forward bias semi-logarithmic I–V curves for different temperatures have an almost common cross-point at a certain bias voltage. The values of Φ_B0 increase with the increasing temperature whereas those of n decrease. Therefore, we have attempted to draw Φ_B0 vs. q/2kT plot in order to obtain evidence of a Gaussian distribution (GD) of the barrier heights (BHs). The mean value of BH and standard deviation (σ₀) were found to be 0.974 eV and 0.101 V from this plot, respectively. Thus, the slope and intercept of modified vs. q/kT plot give the values of and Richardson constant (A^?) as 0.966 eV and 118.75 A/cm²K², respectively, without using the temperature coefficient of the BH. This value of A^* 118.75 A/cm²K² is very close to the theoretical value of 120 A/cm²K² for n-type Si. Hence, it has been concluded that the temperature dependence of the forward I–V characteristics of Au/PVA/n-Si (1 1 1) SBDs can be successfully explained on the basis of the Thermionic Emission (TE) theory with a GD of the BHs at Au/n-Si interface.     

Optimization of the electrical properties of Al/a-SiC:H Schottky diodes by means of thermal annealing of a-SiC:H thin films

The present work reports on the optimization of the electrical properties of Al/a-SiC:H Schottky diodes by means of thermal annealing of a-SiC:H thin films. Optical transmission experiments have shown that the optical properties of the films are affected by thermal annealing when T_a>600 °C, due to emission of hydrogen bonded to silicon. Although the electrical properties of Al/a-SiC:H Schottky diodes are invariant for T_a?400 °C, for higher T_a these properties are improved with the optimum result achieved at . At this annealing temperature the linear log I-V characteristics span about eight orders of magnitude and the ideality factor is 1.09±0.04, making these diodes very interesting for many potential applications. For higher T_a (>600 °C) the electrical properties of Al/a-SiC:H Schottky diodes deteriorate with complete degradation at . For temperatures up to 600 °C this behavior is attributed to relaxation of the strain in the amorphous network which is possibly combined with weak hydrogen emission for temperatures up to 600 °C, leading to an optimum material quality. For further increase of T_a (>600 °C) the observed deterioration of the electrical properties of Al/a-SiC:H Schottky diodes is due to the intensive emission of hydrogen atoms bonded to silicon that cause voids in the amorphous network. These results are also supported by the experimental values of the room temperature apparent barrier height of the Al/a-SiC:H junction ?_bRT and its temperature coefficient γ.     

Self-aligned In0.49Ga0.51P/GaAs HBT DC and RF characteristics related with orientations

A self-aligned InGaP/GaAs HBT DC and RF characteristics related with orientations were studied. The DC current gain was greater for the [0 1 1] emitter orientation compared to orientation. However, it also showed slightly better RF performance for orientation with a cutoff frequency f_T 69 GHz compared to the f_T of 62 GHz for the [0 1 1] orientation. This experimental work has been proposed that the dependence of the characteristics could be attributed to both piezoelectric effect and the difference between lateral etched profiles in different directions.     

YBCO superconducting tapes by melt-annealing method on metallic Ni%5W substrates

Superconducting tapes of YBCO-123 were produced by melt-annealing method on metallic Ni%5W substrates. YBCO thick films of about thick were deposited on Ni%5W tapes previously CeO₂ coated using different thermal treatments. A final architecture of the tapes like Ni%5W/CeO₂/YBCO/Au-Pd was achieved.Critical temperatures (T_c) of the superconducting tapes around 89 K and critical current densities (J_c) of at 77 K and were determined by resistive methods. All the samples displayed a granular character and the crystalline structure of the superconducting YBCO-123 with and preferential orientation along the c-axis as determined by SEM and XRD analysis, respectively. Both grain sizes and c-axis orientation are dependent of the thermal treatments.     

Properties of wurtzite GaN MESFETs studied by two-dimensional full band Monte Carlo approach

The properties of a GaN Metal-Semiconductor Field Effect Transistor were studied based on two-dimensional full band Monte Carlo simulations. The dependences of the distributions of the electric potential, electron concentration, electric field, drift velocity, and average electron energy on the gate-source voltage (V_GS) and drain-source voltage (V_DS) were obtained, then the characteristics of the drain current (I_DS) versus the drain-source voltage (V_DS) and the transconductance (G_m) versus V_GS characteristics were determined. At and I_DS is 5.03 A/cm, which is higher value. The G_m−V_GS curve shows bell shaped and the maximum G_m is 112 ms/mm at and The current gain cutoff frequency (f_T) is 98 GHz at and      

PAMBE growth of (1 1 2¯ 2)-oriented GaN/AlN nanostructures on m-sapphire

We report on the plasma-assisted molecular-beam epitaxial growth of (1 1 2¯ 2)-oriented GaN/AlN nanostructures on (1 1¯ 0 0) m-plane sapphire. Moderate N-rich conditions enable to synthesize AlN(1 1  2) directly on m-sapphire, with in-plane epitaxial relationships [1 1 2¯ 3¯]_AlN∥[0 0 0 1]_sapphire and [1  0 0]_AlN∥[1 1 2¯ 0]_sapphire. In the case of GaN, a Ga-excess of one monolayer is necessary to achieve two-dimensional growth of GaN(1 1 2¯ 2). Applying these growth conditions, we demonstrate the synthesis of (1 1 2¯ 2)-oriented GaN/AlN quantum well structures, showing a strong reduction of the internal electric field. By interrupting the growth under vacuum after the deposition of few monolayers of GaN under slightly Ga-rich conditions, we also demonstrate the feasibility of quantum dot structures with this orientation.     

High-mobility pentacene thin-film transistors with copolymer-gate dielectric

Pentacene thin-film transistors have been obtained using polymethyl-methacrylate-co-glyciclyl-methacrylate (PMMA-GMA) as the gate dielectric. The optimum active layer thickness in thin-film transistors (OTFTs) was investigated. The present devices show a wide operation voltage range. The on/off current ratio is as high as 10⁵. In linear region (), the field-effect mobility of device increases with the increase in gate field at low-voltage region (), and a mobility of 0.33 cm²/V s can be obtained when . In saturation region, the mobility increases linearly with the gate field, and a high mobility of 1.14 cm²/V s can be obtained at . The influence of voltage on mobility of device was investigated.     

A detailed study of current–voltage characteristics in Au/SiO2/n-GaAs in wide temperature range

The forward and reverse-bias current–voltage (I–V) characteristics of Au/SiO₂/n-GaAs (MIS) type Schottky barrier diode (SBDs) have been investigated in the wide temperature range of 80–400 K. The zero-bias barrier height (_Bo) and ideality factor (n) assuming the thermionic emission (TE) mechanism show strong temperature dependence. While n decreases, _Bo increases with increasing temperature. Such temperature dependence of _Bo is an obvious disagreement with the reported negative temperature coefficient (α_temp) of barrier height. Therefore, we have reported a modification which includes the n and electron-tunneling parameter (αχ^1/2δ) in the expression of reverse-saturation current (I₀). After this modification, the value of α_temp obtained as −4 × 10⁻⁴ eV/K which is very close to α_temp of GaAs band-gap (−5.4 × 10⁻⁴ eV/K). Richardson plot of the ln(I₀/T²) versus 1/T has two linear region; the first region is (200–400 K) and the second region (80–150 K). The values of the activation energy (E_a) and Richardson constant were obtained from this plot and the values of E_a and Richardson constants (A^*) are much lower than the known values. These behaviors of the Au/SiO₂/n-GaAs (MIS) type (SBDs) have been interpreted by the assumption of a double-Gaussian distribution of barrier heights (BHs) at the metal–semiconductor interface giving a mean BHs () of 1.20 and 0.68 eV and standard deviation (σ_s) of 0.1503 and 0.0755 V, respectively. Thus the modified ln versus q/kT for two different temperature ranges (200–400 K and 80–150 K) plot then gives mean barrier heights and A^*, 1.18 and 0.66 eV and 7.08 and 3.81 A/cm² K², respectively. This value of the A^* 7.08 A/cm² K² is very close to the theoretical value of 8.16 A/cm² K² for n-type GaAs. Hence, all these behaviours of the forward-bias I–V characteristics of the Au/SiO₂/n-GaAs (MIS) type SBDs can be successfully explained on the basis of a TE mechanism with a double-Gaussian distribution of the BHs.