Flexible inverted polymer solar cells on polyethylene terephthalate substrate containing zinc oxide electron-collection-layer prepared by novel sol–gel method and low-temperature treatments

Flexible and air-stable polymer solar cells were fabricated on a polyethylene terephthalate (PET) substrate. The cell structure was indium tin oxide (ITO) on PET/zinc oxide (ZnO)/[6,6]-phenyl C₆₁ butyric acid methyl ester (PCBM):regioregular poly(3-hexylthiophene) (P3HT)/poly (3,4-ethylenedioxylenethiophene):poly(4-styrene sulfonic acid) (PEDOT:PSS)/Au, this being called the ZnO cell. Reproducible cell performances were obtained despite the ZnO cells being fabricated in air and at low temperature, using a novel ZnO precursor solution containing zinc(II) acetylacetonate as a metal source and acetylacetone as a Zn²⁺ complexing agent. The power conversion efficiency (PCE) of the flexible ZnO cells without sealing was 2.15% under irradiating AM1.5G simulated sunlight at 100 mW cm^?2. In addition, the performance of the non-sealed ZnO cells was almost constant in ambient atmosphere under continuous light irradiation for 100 h.     

Effect of 100 MeV O7+ ion beam irradiation on radio frequency reactive magnetron sputtered ZnO thin films

Zinc oxide (ZnO) thin films were deposited on sapphire substrates at room temperature by radio frequency (RF) magnetron sputtering. These films were irradiated with 100 MeV O⁷⁺ ions of the fluencies 5×10¹³ ions/cm² at room temperature (RT) and at liquid nitrogen temperature (LNT). Profilometer studies showed that the roughness of pristine and LNT irradiated ZnO thin films were higher than that of the RT irradiated ZnO thin film. The glancing angle X-ray diffraction analysis reveals a reduced intensity and increased full width at half maximum (FWHM) of the (002) diffraction peak in the case of LNT irradiated film indicating disorder. However, the intensity and FWHM of the (002) diffraction peak in the case of RT irradiated ZnO thin films are comparable to those of the pristine film. UV–visible transmission spectra show that the percentage of transmission and band gap energy are different for RT and LNT irradiated films. While the pristine ZnO thin film exhibits two emissions—a broad emission at 403 nm and a sharp emission at 472 nm in its photoluminescence spectrum; the emission at 472 nm was absent for the irradiated films. The atomic concentrations of zinc and oxygen during the irradiation process were obtained using auger electron spectroscopy.     

Fabrication of Ag nanoparticle/ZnO thin films using dual-plasma-enhanced metal-organic chemical vapor deposition (DPEMOCVD) system incorporated with photoreduction method and its application

We report a novel method to grow silver nanoparticle/zinc oxide (Ag NP/ZnO) thin films using a dual-plasma-enhanced metal-organic chemical vapor deposition (DPEMOCVD) system incorporated with a photoreduction method. The crystalline quality, optical properties, and electrical characteristics of Ag NP/ZnO thin films depend on the AgNO₃ concentration or Ag content and annealing temperature. Optimal Ag NP/ZnO thin films have been grown with a AgNO₃ concentration of 0.12 M or 2.54 at%- Ag content and 500 °C- rapid thermal annealing (RTA); these films show orientation peaks of hexagonal-wurtzite-structured ZnO (002) and face-center-cubic-crystalline Ag (111), respectively. The transmittance and resistivity for optimal Ag NP/ZnO thin films are 85% and 6.9×10⁻⁴ Ω cm. Some Ag NP/ZnO transparent conducting oxide (TCO) films were applied to InGaN/GaN LEDs as transparent conductive layers. The InGaN/GaN LEDs with optimal Ag NP/ZnO TCO films showed electric and optical performance levels similar to those of devices fabricated with indium tin oxide.     

Influence of flexible substrates on inverted organic solar cells using sputtered ZnO as cathode interfacial layer

Zinc oxide (ZnO) has recently shown to be of considerable interest for the development of interfacial buffer layers in inverted organic solar cells (OSCs). High quality ZnO thin films can indeed be prepared on large-area ITO-coated flexible substrates, using low temperature deposition techniques such as sputtering, a compatible technique with roll-to-roll process. However, further studies are still needed for a better understanding of the influence of the flexible substrate properties on the photovoltaic performances of those devices. In this work, ZnO films have been sputtered on ITO-coated flexible (PEN) substrates and annealed at different temperatures. The role of the surface morphology and the crystalline quality of ZnO films has been investigated. In the window of flexible compatible process, we found that moderate annealing temperatures of ZnO (?180 °C) lead to improved structural properties and performances. Interestingly, we achieve optimal performances for an annealing temperature of 160 °C, resulting in power conversion efficiency (PCE) equivalent to the highest performances usually achieved on rigid cells.     

Effects of the substrate temperature and solution molarity on the structural opto-electric properties of ZnO thin films deposited by spray pyrolysis

Zinc oxide (ZnO) was largely studied in various applications such as photovoltaic conversion, optoelectronics and piezoelectric, because of its interesting physical properties (morphological, structural, optical and electrical). The present work deals with the preparation of zinc oxide thin films (ZnO) deposited by the spray pyrolysis method. The starting solution was zinc chloride (ZnCl₂). Effects of solution molarity and substrate temperature on films properties were investigated. All films deposited were characterized by various techniques such as X-ray diffraction for structural characterizations, profilometry for thickness measurements, UV–vis transmission spectrophotometry for optical properties and the four probes conductivity measurements for electrical characterization. The X-ray diffraction (XRD) patterns show that the films deposited are polycrystalline with (0 0 2) plan as preferential orientation. The UV–vis spectroscopy confirms the possibility of good transparent ZnO thin films deposition with an average transmission of about ∼85% in the visible region. However, the measured electrical resistivities of the deposited films were in the order of 10⁴ Ω cm     

Low temperature Solution-Processed ZnO film on flexible substrate

Transparent conductive ZnO films were directly deposited on unseeded polyethersulfone (PES) substrates with a spin-spray method using aqueous solution at a low substrate temperature of 85 °C. All ZnO films were crystalline with wurtzite hexagonal structure and impurity phases were not detected. ZnO films deposited without citrate ions in the reaction solution had a rod array structure. In contrast, ZnO films deposited with citrate ions in the reaction solution had a continuous, dense structure. The transmittance of the ZnO films was improved from 11.9% to 85.3% as their structure changed from rod-like to continuous. After UV irradiation, the ZnO films with a continuous, dense structure had a low resistivity of 9.1×10⁻³ Ω cm, high carrier concentration of 2.7×10²⁰ cm⁻³ and mobility of 2.5 cm² V⁻¹ s⁻¹.     

Effect of UV light irradiation on photovoltaic characteristics of inverted polymer solar cells containing sol–gel zinc oxide electron collection layer

An inverted organic bulk-heterojunction solar cell containing a zinc oxide (ZnO) based electron collection layer with a structure of ITO/ZnO/[6,6]-phenyl C₆₁ butyric acid methyl ester (PCBM): regioregular poly(3-hexylthiophene) (P3HT)/poly(3,4-ethylenedioxylenethiophene): poly(4-styrene sulfonic acid)/Au (ZnO cell) was fabricated. We examined the relationship between the heating temperature of the ZnO layer and the device performance under irradiation by simulated sunlight while cutting the UV light. The effects of the UV light contained in simulated sunlight were investigated by photocurrent–voltage (I–V) and alternating current impedance spectroscopy (IS) measurements. When the ZnO cells were irradiated with simulated sunlight, they exhibited a maximum power conversion efficiency (PCE) of over 3%, which hardly varied with the heating temperature of ZnO layers treated at 250 °C, 350 °C, and 450 °C. In contrast, when the ZnO cells were irradiated with simulated sunlight without UV content, their photovoltaic characteristics were very different. In the case of the cell with ZnO prepared by heating at 250 °C, PCE of 2.7% was maintained even under continuous irradiation with simulated sunlight without UV. However, for the cells with ZnO prepared by heating at 350 °C and 450 °C, the shapes of the I–V curves changed with the UV-cut light irradiation time, accompanying an increase in their series resistance. Overall, after UV-cut light irradiation for 1 h, the PCE of the cell with ZnO prepared by heating at 350 °C decreased to 1.80%, while that of the cell with ZnO prepared by heating at 450 °C fell to 1.35%. The photo IS investigations suggested that this performance change was responsible for the formation of charge-trapping sites at the ZnO/PCBM:P3HT interface which act as recombination centers for photo-produced charges in the PCBM:P3HT layer.     

Atmospheric plasma deposition of transparent semiconducting ZnO films on plastics in ambient air

Transparent zinc oxide (ZnO) thin films have been successfully synthesized on poly (methyl methacrylate) (PMMA), polycarbonate (PC), and polyethylene terephthalate (PET) substrates by atmospheric plasma deposition in ambient air at room temperature. The structural, optical and electrical properties of the ZnO films as well as their adhesion to the polymer substrates were investigated for various deposition conditions. The film surface exhibited a dome-shaped topography comprised of nanometer-sized grains. The size of both the domes and the grains became larger as the plasma power increased. The visible transmittance increased above 95% with decreasing plasma power. The resistivity exhibited a wide variation in the range of 10²–10⁸ ohm cm. The adhesion energies to PMMA varied from 0.2 to 1.5 J/m² with increasing plasma power. While a finer grain structure achieved with lower plasma power was preferable for higher transmittance, it resulted in lower adhesion to the plastic substrates. The study demonstrated the feasibility of depositing semiconducting transparent ZnO films on polymer substrates at low temperature in ambient air using atmospheric plasma deposition.     

The effects of carrier gas and substrate temperature on ZnO films prepared by ultrasonic spray pyrolysis

ZnO films were deposited on glass substrates in the temperature range of 350–470 °C under an atmosphere of compressed air or nitrogen (N₂) by using ultrasonic spray pyrolysis technique. Structural, electrical and optical properties of the ZnO films were investigated using X-ray diffraction (XRD), scanning electron microscopy (SEM), electrical two-probe and optical transmittance measurements. The ZnO films deposited in the range of 350–430 °C were polycrystalline with the wurtzite hexagonal structure having preferred orientation depending on the substrate temperature. The ZnO films deposited below 400 °C had a preferred (100) orientation while those deposited above 400 °C mostly had a preferred (002) orientation. The resistivity values of ZnO films depended on the types of carrier gas. The ZnO thin films deposited under N₂ atmosphere in the range of 370–410 °C showed dense surface morphologies and resistivity values of 0.6–1.1 Ω-cm, a few orders of magnitude lower than those deposited under compressed air. Hydrogen substition in ZnO possibly contributed to decreasing resistivity in ZnO thin films deposited under N₂ gas. The Hall measurements showed that the behavior of ZnO films deposited at 410 °C under the N₂ atmosphere was n-type with a carrier density of 8.9–9.2×10¹⁶ cm^-3 and mobility of ～70 cm²/Vs. ZnO thin films showed transmission values at 550 nm wavelength in a range of 70–80%. The values of band gaps extrapolated from the transmission results showed bandgap shrinkage in an order of milli electron volts in ZnO films deposited under N₂ compared to those deposited under compressed air. The calculation showed that the bandgap reduction was possibly a result of carrier–carrier interactions.     

Effect of NaOH solution on surface textured ZnO: Al films prepared by pulsed direct current magnetron sputtering

Transparent conducting Al-doped ZnO (ZnO:Al, AZO) thin films were prepared at substrate temperature of 270 °C by pulsed direct current magnetron sputtering. NaOH solution (5 wt%) was employed to etch the AZO films at room temperature, and the surface textured AZO films were obtained successfully. The relationship between the surface textured structures and the etching process controlled by etching time was discussed. The textured morphology of the etched AZO films became clear as increasing the etching time, and the AZO film etched for 30 min exhibited uniformly and distinctly crater-like surface textured structure. Correspondingly, the haze and the resistivity increased with the increasing etching time. And the resistivity of the AZO film etched for 30 min was 3.2×10⁻³ Ω cm.     

ZnO thin Films with blue emission grown using chemical spray pyrolysis

Photoluminescence in the characteristic blue-green region of the spectrum was emitted by zinc oxide (ZnO) thin films grown by chemical spray pyrolysis. We have been able to optimize spray rate and substrate temperature to obtain ZnO thin films with emission centered at ～383 nm and ～517 nm, respectively. We also observed that Al-doped ZnO films resulted in improved radiative efficiency of the near-band-edge emission; optimized Al-doped spray deposited thin films emitted only blue light.     

Effect of substrate temperature on the properties of ZnO thin films prepared by spray pyrolysis

Sprayed ZnO films were grown on glass at different substrate temperatures from 200 °C to 500 °C and their structural, optical and electrical properties were investigated. All films are polycrystalline with hexagonal wurtzite structure. ZnO films at substrate temperatures above 400 °C appear to be better crystalized with (002) plane as preferential orientation. Optical transmission spectrum shows that ZnO films have high transmission (above 80%) in visible region for substrate temperatures above 400 °C. Photoluminescence spectra at room temperature show an ultraviolet emission and two visible emissions at 2.82 eV and 2.37 eV. The resistivity of ZnO films increases with increasing substrate temperatures (above 400 °C). The ZnO film deposited at 400 °C shows highest figure of merit.     

Influence of molar concentration on the physical properties of nebulizer-sprayed ZnO thin films for ammonia gas sensor

Zinc oxide (ZnO) thin films were deposited by nebulizer spray pyrolysis technique with different molar concentrations of 0.05 M, 0.10 M and 0.15 M. The films were characterized by structural, morphological, electrical and optical properties. X-ray diffraction confirms that the all films are polycrystalline in nature with hexagonal crystal structure having preferential orientation along (002) plane and the maximum crystallite size is found to be ～77 nm. The band gap energy increases with molar concentration and reaches a maximum value of 3.2 eV at 0.15 M. Room temperature photoluminescence measurements were performed and band to band emission energies of ZnO films were determined. High resolution scanning electron microscopy shows the uniform distribution, densely packed grains with a plate like structure of ～55 nm (0.05 M).     

Nanotribological properties of ALD-processed bilayer TiO2/ZnO films

TiO₂/ZnO films grown by atomic layer deposition (ALD) demonstrated nanotribological behaviors using scratch testing. TEM profiles obtained an amorphous structure TiO₂ and nanocrystalline structure ZnO, whereas the sample has significant interface between the TiO₂/ZnO films. The experimental results show the relative XRD peak intensities are mainly contributed by a wurtzite oxide ZnO structure and no signal from the amorphous TiO₂.With respect to tribology, increased friction causes plastic deformation between the TiO₂ and ZnO films, in addition to delamination and particle loosening. The plastic deformation caused by adhesion and/or cohesion failure is reflected in the nanoscratch traces. The pile-up events at a loading penetration of 30 nm were measured at 21.8 μN for RT, 22.4 μN for 300 °C, and 36 μN for 400 °C. In comparison to the other conditions, the TiO₂/ZnO films annealed at 400 °C exhibited higher scratch resistance and friction with large debris, indicating the wear volume is reduced with increased annealing temperature and loading.     

Solution-processed annealing-free ZnO nanoparticles for stable inverted organic solar cells

We report the development and application of high-quality zinc oxide nanoparticles (ZnO NPs) processed in air for stable inverted bulk heterojunction solar cells as an electron extraction layer (EEL). The ZnO NPs (average size ∼11 nm) were dispersed in chloroform and stabilized by propylamine (PA). We demonstrated that the ZnO NP dispersion with 4 vol.% of PA as stabilizer can be used in air directly and remains clear up to one month after preparation. Our inverted solar cells consisted of a blade-coated poly(N-9′-heptadecanyl-2,7-carbazole-alt-5,5-(4′,7′-di-2-thienyl-2′,1′,3′-benzothiadiazole (PCDTBT) and [6,6]-phenyl C₇₁-butyric acid methyl ester (PC₇₁BM) (1: 4 by weight) active layer sandwiched between a ZnO electron extraction layer and a MoO₃/Ag anode. All solar cells with ZnO films fabricated in air using PA-stabilized ZnO dispersions prepared within a time window of one month exhibited power conversion efficiencies (PCE) above 4%. In contrast, if the ZnO film was prepared in air using regular un-stabilized ZnO NP dispersion, the PCE would drop to 0.2% due to poor film quality. More interestingly, X-ray photoelectron spectroscopy and nuclear magnetic resonance measurements indicated that the PA ligands were not covalently bonded to ZnO NPs and did not exist in the deposited ZnO films. The spin-cast ZnO thin films (without any thermal treatment) are insoluble in organic solvents and can be directly used as an EEL in solar cells. This feature is beneficial for fabricating organic solar cells on flexible polymer substrates. More importantly, our non-encapsulated inverted solar cells are highly stable with their PCEs remaining unchanged after being stored in air for 50 days.     

Properties of cobalt-doped zinc oxide thin films grown by pulsed laser deposition on glass substrates

Undoped and cobalt-doped zinc oxide (CZO) polycrystalline piezoelectric thin films (Co: 3, 5 at.%) using a series of high quality ceramic targets have been deposited at 450 °C onto glass substrates using a pulsed laser deposition method. The used source was a KrF excimer laser (248 nm, 25 ns, 2 J∕cm²). X-ray diffraction patterns showed that the Co-doped ZnO films crystallize in a hexagonal wurtzite type structure with a strong (0 orientation, and the grain sizes calculated from these patterns decrease from 37 to 31 nm by increasing Co doping. The optical waveguiding properties of the films were characterized by using a prism-coupling method. The distinct M-lines of the guided transverse magnetic (TM) and transverse electric (TE) modes of the ZnO films waveguide have been observed. With the aim of study the optical properties of the ZnO films, an accurate refractive index and thickness measurement apparatus was set up, which is called M-lines device. An evaluation of experimental uncertainty and calculation of the precision of the refractive index and thickness were developed on ZnO films. The optical transmittance spectra showed a good transparency in the visible region. Calculated optical band gap varying from 3.23 to 3.37 eV when the content of Co doping increases from 0 to 5 at.%.     

Effects of ultraviolet–ozone treatment on organic-stabilized ZnO nanoparticle-based electron transporting layers in inverted polymer solar cells

Electron transporting layers (ETLs) in inverted polymer solar cells (I-PSCs) were fabricated by spin coating a colloidal dispersion of ZnO nanoparticles (NPs), and the effects of ultraviolet–ozone (UVO) treatment on the ZnO NP ETLs were investigated. The brief UVO treatment (<5 min) could considerably improve the performance of the resulting I-PSCs (∼30% increase in power conversion efficiency); whereas, excessive UVO treatment (>10 min) caused significant degradation. The characterization of the ZnO ETLs as a function of the UVO treatment duration revealed that brief treatment can remove the residual organic stabilizer molecules on the surface of the ZnO films by UV induced decomposition mechanism. However, excessive treatment can generate additional defects on/within the ZnO films, which can induce charge recombination. This effect was further confirmed by the thermal treatment of the ZnO ETLs at a high temperature (280 °C) at which the organic surfactants could be removed. Flexible I-PSCs were also fabricated using indium doped tin oxide coated plastic substrates and the usefulness of the room temperature UVO treatment was further confirmed in view of its potential applicability in flexible devices.     

Influence of Sn content on properties of ZnO:SnO2 thin films deposited by ultrasonic spray pyrolysis

The present work is devoted to the preparation of zinc oxide (ZnO): tin oxide (SnO₂) thin films by ultrasonic spray technique. A set of films are deposited using a solution formed with zinc acetate and tin chloride salts mixture with varied weight ratio R=[Sn/(Zn+Sn)]. The ratio R is varied from 0 to 100% in order to investigate the influence of Sn concentration on the physical properties of ZnO:SnO₂ films. The X rays diffraction (XRD) analysis indicated that films are composed of ZnO and SnO₂ distinct phases without any alloys or spinnel phase formations. The average grain size of crystallites varies with the ratio R from 17 to 20 nm for SnO₂ and from 24 to 40 nm for ZnO. The obtained films are highly transparent with a transmission coefficient equal to 80%. An increase in Sn concentration increases both the effective band gap energy from 3.2 to 4.01 eV and the photoluminescence intensity peak assigned defects to SnO₂. The films electrical characterization indicated that films are resistive. Their resistivities vary between 1.2×10² and 3.3×10⁴ (Ω cm). The higher resistivity is measured in film deposited with a ratio R equal to 50%.     

Synthesis of highly selective and sensitive Cu-doped ZnO thin film sensor for detection of H2S gas

Copper (Cu) doped zinc oxide (ZnO) thin films were successfully prepared by a simple sol-gel spin coating technique. The effect of Cu doping on the structural, morphology, compositional, microstructural, optical, electrical and H₂S gas sensing properties of the films were investigated by using XRD, FESEM, EDS, FTIR, XPS, Raman, HRTEM, and UV–vis techniques. XRD analysis shows that the films are nanocrystalline zinc oxide with the hexagonal wurtzite structure and FESEM result shows a porous structured morphology. The gas response of Cu-doped ZnO thin films was measured by the variation in the electrical resistance of the film, in the absence and presence of H₂S gas. The gas response in relation to operating temperature, Cu doping concentration, and the H₂S gas concentration has been systematically investigated. The maximum H₂S gas response was achieved for 3 at% Cu-doped ZnO thin film for 50 ppm gas concentration, at 250 °C operating temperature.     

Effects of deposition pressure on the properties of transparent conductive ZnO:Ga films prepared by DC reactive magnetron sputtering

Gallium (Ga)-doped zinc oxide (ZnO:Ga) transparent conductive films were deposited on glass substrates by DC reactive magnetron sputtering. Effects of deposition pressure on the structural, electrical and optical properties of ZnO:Ga films were investigated. X-ray diffraction (XRD) studies show that the films are highly oriented with their crystallographic c-axis perpendicular to the substrate almost independent of the deposition pressure. The morphology of the film is sensitive to the deposition pressure. The transmittance of the ZnO:Ga thin films is over 90% in the visible range and the lowest resistivity of ZnO:Ga films is 4.48×10⁻⁴ Ω cm.