共查询到20条相似文献,搜索用时 15 毫秒
1.
Zeigler B.P. 《Proceedings of the IEEE. Institute of Electrical and Electronics Engineers》1989,77(1):72-80
It is shown how systems can be advantageously represented as discrete event models by using DEVS (discrete event system specification), set-theoretic formalism. Such DEVS models provide a basis for the design of event-based logic control. In this control paradigm, the controller expects to receive confirming sensor responses to its control commands within definite time windows determined by its DEVS model of the system under control. The event-based control paradigm is applied in advanced robotic and intelligent automation, showing how classical process control can be readily interfaced with rule-based symbolic reasoning systems 相似文献
2.
《Semiconductor Manufacturing, IEEE Transactions on》2009,22(1):154-163
3.
MengChu Zhou 《Semiconductor Manufacturing, IEEE Transactions on》1998,11(3):333-357
This paper presents a Petri net approach to modeling, analysis, simulation, scheduling, and control of semiconductor manufacturing systems. These systems can be characterized as discrete event systems that exhibit sequential, concurrent, and conflicting relations among the events and operations. Their evolution is dynamic over time. The system complexity is tremendous owing to the complex semiconductor manufacturing processes and test procedures. A formal approach such as Petri nets enables one to describe such complex discrete event systems precisely and thus allows one to perform both qualitative and quantitative analysis, scheduling and discrete-event control of them. This paper also serves as a tutorial paper. It briefly reviews applications of Petri nets in semiconductor manufacturing automation. It then introduces definitions and concepts of Petri nets. It proceeds with a discussion of basic Petri net modules in system modeling, a modeling method and a practical system's modeling example. Next, the paper presents their properties and their implications in manufacturing systems, as well as their analysis methods. Timed Petri nets are introduced for system simulation, performance evaluation, and scheduling purposes. An application-oriented case study is presented. Finally, the paper concludes with the active research areas in applying Petri nets to design of semiconductor manufacturing systems 相似文献
4.
Statistical Wavelet Subband Characterization Based on Generalized Gamma Density and Its Application in Texture Retrieval 总被引:1,自引:0,他引:1
5.
6.
Adivikolanu S. Zafiriou E. 《Electronics Packaging Manufacturing, IEEE Transactions on》2000,23(1):56-68
We consider the run-to-run (RtR) correction of input recipes for semiconductor manufacturing processes using measurement information from previous runs. A RtR control algorithm that has been experimentally tested by industry and academia is the EWMA (exponentially weighted moving average) RtR controller. In this paper we provide extensions to this algorithm to address some of its drawbacks and also provide a rigorous theoretical analysis of its properties based on discrete control theory. By formulating the RtR control problem in the internal model control (IMC) structure used in feedback process control, we are able to extend the algorithm to completely eliminate offsets due to unmodeled process drifts, which is a common problem in semiconductor manufacturing. We also develop conditions for robustness with respect to modeling error and measurement delays. Tradeoffs between robustness guarantees and fast RtR response as well as handling of measurement noise are developed and presented in the form of plots that can be used for tuning the parameters of the RtR-IMC controller to accomplish the objectives set by the process engineer. The results are illustrated through several simulations including control of film deposition uniformity in an epitaxial reactor and tungsten deposition rate in a tungsten CVD reactor 相似文献
7.
Modelling and analysis for the design and operation of manufacturing systems is a vital need. For semiconductor manufacturing systems, which are large scale systems, discrete Petri nets do not constitute an adequate tool for modeling and analysis. In fact, use of discrete Petri nets is confronted with tile state explosion and the high cost of simulation. In this paper, hybrid Petri nets are presented as powerful tools for modeling and simulation of semiconductor manufacturing systems. This model has been used for modeling and simulation of a real life electronic components manufacturing system. It provides an accurate and first simulation of this system 相似文献
8.
《Electron Devices, IEEE Transactions on》2009,56(1):38-42
9.
《Lightwave Technology, Journal of》2009,27(15):2949-2952
10.
ABSTRACT Efficiency has been a major factor in the growth of photovoltaic (PV) systems. Different control techniques have been explored to extract maximum power from PV systems under varying environmental conditions. This paper evaluates the performance of a new improved control technique known as model predictive control (MPC) in power extraction from PV systems. Exploiting the ability of MPC to predict future state of controlled variables, MPC has been implemented for tacking of maximum power point (MPP) of a PV system. Application of MPC for maximum power point tracking (MPPT) has been found to result into faster tracking of MPP under continuously varying atmospheric conditions providing an efficient system. It helps in reducing unwanted oscillations with an increase in tracking speed. A detailed step by step process of designing a model predictive controller has been discussed. Here, MPC has been applied in conjunction with conventional perturb and observe (P&O) method for controlling the dc-dc boost converter switching, harvesting maximum power from a PV array. The results of MPC controller has been compared with two widely used conventional methods of MPPT, viz. incremental conductance method and P&O method. The MPC controller scheme has been designed, implemented and tested in MATLAB/Simulink environment and has also been experimentally validated using a laboratory prototype of a PV system. 相似文献
11.
Optimal automatic control of multistage production processes 总被引:2,自引:0,他引:2
Fenner J.S. Jeong M.K. Jye-Chyi Lu 《Semiconductor Manufacturing, IEEE Transactions on》2005,18(1):94-103
Today's high-tech industries produce complicated products involving many processing steps. The usual approach of modeling and controlling each of these steps in isolation is re-evaluated. This work develops a data model of synchronized observations collected from several stages of a multistage manufacturing process, and proposes an across-stage automatic control scheme for adjusting nonstationary process drifts. The proposed controller applies dynamic programming tools to optimize multiple goals specified for individual process stages and possible mismatch between stages. Several examples and simulation studies demonstrate that the proposed method is a valuable tool for improving semiconductor manufacturing quality. 相似文献
12.
Adaptive Sliding-Mode Neuro-Fuzzy Control of the Two-Mass Induction Motor Drive Without Mechanical Sensors 总被引:2,自引:0,他引:2
Orlowska-Kowalska T. Dybkowski M. Szabat K. 《Industrial Electronics, IEEE Transactions on》2010,57(2):553-564
13.
As production requirements in semiconductor manufacturing continue to escalate, it is rarely possible to perform quality measurements on a product before subsequent process operations are performed. This delay between manufacturing and metrology coupled with inaccurate process models can lead to closed-loop instabilities. This paper investigates the effect of metrology delay on the closed-loop stability of a multiple input-multiple output exponentially weighted moving average run-to-run controller. The generalized Routh-Hurwitz stability criteria are used to derive the necessary and sufficient conditions for stability. A sufficient condition for stability is then derived for systems with any length of metrology delay. This condition states that if all of the eigenvalues of a model-mismatch matrix fall inside a circle with unit radius and centered at {1,0} on the complex plane, then the closed-loop system is stable. 相似文献
14.
This paper presents a system‐of‐systems (SoS) approach to the formal modeling of a cyber‐physical system (CPS) for simulation‐based analysis. The approach is based on a convergence technology for modeling and simulation of a highly complex system in which SoS modeling methodology, hybrid systems modeling theory, and simulation interoperation technology are merged. The methodology maps each constituent system of a CPS to a disparate model of either continuous or discrete types. The theory employs two formalisms for modeling of the two model types with formal specification of interfaces between them. Finally, the technology adapts a simulation bus called DEVS BUS whose protocol synchronizes time and exchange messages between subsystems simulation. Benefits of the approach include reusability of simulation models and environments, and simulation‐based analysis of subsystems of a CPS in an inter‐relational manner. 相似文献
15.
《Solid-State Circuits, IEEE Journal of》2009,44(11):2881-2890
16.
《Electron Devices, IEEE Transactions on》2009,56(4):620-626
17.
18.
《Microwave and Wireless Components Letters, IEEE》2008,18(11):755-757
19.
Saxena S. Mozumder P.K. Taylor K.J. 《Semiconductor Manufacturing, IEEE Transactions on》1996,9(1):128-135
Present day semiconductor manufacturing processes are subject to tight specifications. High yields with tight process specifications require drive to target process control. As the size of the wafer in the semiconductor industry increases, nonuniformity across the wafer becomes a crucial yield limiting issue. Modeling nonuniformity in terms of the equipment settings permits calculation of recipes required to achieve the desired nonuniformity. However, models for single measures of nonuniformity, such as standard deviation, or range, do not capture all aspects of the nonuniformity and often do not model well in terms of the equipment settings. This paper describes the use of spatial models to simultaneously quantify multiple measures of nonuniformity, and a controller to keep the nonuniformities within specifications, Use of spatial models in conjunction with a monitor wafer controller (MWC) enables the simultaneous control of multiple nonuniformity measures. The paper presents the results of applying the MWC with spatial models to a plasma enhanced TEOS (PETEOS) deposition process on an Applied Materials Precision 5000 (AMT5000). The controller has been keeping the PETEOS process within specifications for over two years 相似文献
20.
《Industrial Electronics, IEEE Transactions on》2009,56(7):2347-2356