Wire-bond failure mechanisms in plastic encapsulated microcircuits and ceramic hybrids at high temperatures

Ceramic hybrids are the preferred solution when long-term high-temperature reliability is required, but standard plastic encapsulated microcircuits (PEMs) are an interesting alternative due to low price and high availability. Test vehicles with standard PEMs were subjected to thermal ageing at 150–175 °C. Six of eight vehicles failed after only three weeks at 175 °C, and the cause of failure was found to be microcracking at the interface between gold ball and aluminium bond pad giving rise to resistance increase. The intermetallic region was formed during high-temperature lead soldering and continued to develop during thermal ageing. The high-temperature performance of aluminium wire bonding to a selection of thick film metallizations on ceramic substrate was also investigated. Gold–palladium has previously been reported as a high-temperature solution, but we found that the mechanical strength of aluminium to gold–palladium (AuPd) degraded seriously at temperatures above 200 °C due to intermetallic formation. Aluminium to silver thick film plated with copper and nickel showed good mechanical strength and unaltered electrical resistance after four weeks thermal ageing at 250 °C.     

Reliability of wire-bonding and solder joint for high temperature operation of power semiconductor device

Thick Al wires bonded on chips of power semiconductor devices were examined for thermal cycle tests, then the bonded joints were cut using microtome method, after that those were observed by scanning electron microscope and analyzed by electron back scattered diffraction. Some cracks were observed between Al wires and the chips, unexpectedly the crack lengths were almost constant for −40/150 °C, −40/200 °C and −40/250 °C tests. It is considered that re-crystallization has been progressed during the high temperature side of the thermal cycle tests.Furthermore, joint samples were prepared using high temperature solders such as Zn–Al and Bi with CuAlMn, Direct Bonded Copper insulated substrates and Mo heatsinks. The fabricated samples were evaluated by scanning acoustic microscope before and after thermal cycle tests. Consequently, almost neither serious damages nor delaminations were observed for −40/200 °C and −40/250 °C tests.     

Influence of rapid thermal annealing on morphological and electrical properties of RF sputtered AlN films

Aluminum nitride films were deposited, at 200 °C, on silicon substrates by RF sputtering. Effects of rapid thermal annealing on these films, at temperatures ranging from 400 to 1000 °C, have been studied. Fourier transform infrared spectroscopy (FTIR) revealed that the characteristic absorption band of Al–N, around 684 cm⁻¹, became prominent with increased annealing temperature. X-ray diffraction (XRD) patterns exhibited a better, c-axis, (0 0 2) oriented AlN films at 800 °C. Significant rise in surface roughness, from 2.1 to 3.68 nm, was observed as annealing temperatures increased. Apart from these observations, micro-cracks were observed at 1000 °C. Insulator charge density increased from 2×10¹¹ to 7.7×10¹¹ cm⁻² at higher temperatures, whereas, the interface charge density was found minimum, 3.2×10¹¹ eV⁻¹cm⁻², at 600 °C.     

CCGA packages for space applications

Commercial-off-the-shelf (COTS) area array packaging technologies in high reliability versions are now being considered for applications, including use in a number of NASA electronic systems being utilized for both the Space Shuttle and Mars Rover missions. Indeed, recently a ceramic package version specifically tailored for high reliability applications was used to provide the processing power required for the Spirit and Opportunity Mars Rovers built by NASA-JPL. Both Rovers successfully completed their 3-months mission requirements and continued exploring the Martian surface for many more moths, providing amazing new information on previous environmental conditions of Mars and strong evidence that water exists on Mars.Understanding process, reliability, and quality assurance (QA) indicators for reliability are important for low risk insertion of these newly available packages in high reliability applications. In a previous investigation, thermal cycle test results for a non-functional daisy-chained peripheral ceramic column grid array (CCGA) and its plastic ball grid array (PBGA) version, both having 560 I/Os, were gathered and are presented here. Test results included environmental data for three different thermal cycle regimes (−55/125 °C, −55/100 °C, and −50/75 °C). Detailed information on these—especially failure type for assemblies with high and low solder volumes—are presented. The thermal cycle test procedure followed those recommended by IPC-9701 for tin–lead solder joint assemblies. Its revision A covers guideline thermal cycle requirements for Pb-free solder joints. Key points on this specification are also discussed.In a recent investigation a fully populated CCGA with 717 I/Os was considered for assembly reliability evaluation. The functional package is a field-programmable gate array that has much higher processing power than its previous version. This new package is smaller in dimension, has no interposer, and has a thinner column wrapped with copper for reliability improvement. This paper will also present thermal cycle test results for assemblies of this and its plastic package version with 728 I/Os, both of which were exposed to four different cycle regimes. Two of these cycle profiles are specified by IPC-9701A for tin–lead, namely, −55 to 100 °C and −55 to 125 °C. One is a cycle profile specified by Mil-Std-883, namely, −65/150 °C, generally used for ceramic hybrid packages screening and qualification. The last cycle is in the range of −120 to 85 °C, a representative of electronic systems directly exposed to the Martian environment without use in a thermal control enclosure. Per IPC-9701A, test vehicles were built using daisy chain packages and were continuously monitored and/or manually checked for opens at intervals. The effects of many process and assembly variables—including corner staking commonly used for improving resistance to mechanical loading such as drop and vibration loads—were also considered as part of the test matrix. Optical photomicrographs were taken at various thermal cycle intervals to document damage progress and behavior. Representative samples of these are presented along with cross-sectional photomicrographs at higher magnification taken by scanning electron microscopy (SEM) to determine crack propagation and failure analyses for packages.     

Hydrogen incorporation, diffusivity and evolution in bulk ZnO

Hydrogen is readily incorporated into bulk, single-crystal ZnO during exposure to plasmas at moderate (100–300°C) temperatures. Incorporation depths of >25 μm were obtained in 0.5 h at 300°C, producing a diffusivity of 8 × 10⁻¹⁰ cm²/V s at this temperature. The activation energy for diffusion is 0.17 ± 0.12 eV, indicating an interstitial mechanism. Subsequent annealing at 500–600 °C is sufficient to evolve all of the hydrogen out of the ZnO, at least to the sensitivity of Secondary Ion Mass Spectrometry (<5 × 10¹⁵ cm⁻³). The thermal stability of hydrogen retention is slightly greater when the hydrogen is incorporated by direct implantation relative to plasma exposure, due to trapping at residual damage.     

Effect of different temperature cycling profiles on the crack initiation and propagation of Sn–3.5Ag wave soldered solder joints

Temperature cycling of a test board with different electronic components was carried out at two different temperature profiles in a single-chamber climate cabinet. The first temperature profile ranged between −55 and 100 °C and the second between 0 and 100 °C. Hole mounted components and secondary side SMD components were wave soldered with an Sn–3.5Ag alloy. Joints of both dual in line (DIL) packages and ceramic chip capacitors were investigated. Crack initiation and propagation was analysed after every 500 cycles. In total, 6500 cycles were run at both temperature profiles and the observations from each profile were compared.For both kinds of components analysed, cracks were first visible for the temperature profile ranging between −55 and 100 °C. For this temperature profile, and for DIL packages, cracks were visible already after 500 cycles, whereas for the other temperature profile, cracks initiated between 1000 and 1500 cycles. The cracks observed after 1500 cycles were visibly smaller for the temperature profile ranging between 0 and 100 °C, concluding that crack initiation and propagation was slightly slower for this temperature profile. For the chip capacitors, cracks were first visible after 2000 cycles.     

Advanced electrical and stability characterization of untrimmed and variously trimmed thick-film and LTCC resistors

As-fired thick-film resistors have the resistance tolerance within ±20% and this tolerance is increased for smaller components. Therefore the novel trimming methods are necessary for microresistors, especially when they are embedded in LTCC substrate. This paper compares electrical (normalized temperature dependence of resistance, low frequency noise) and stability properties (relative resistance drift, changes of current noise index) of untrimmed, voltage pulse trimmed and laser trimmed unglazed thick-film resistors after step-increased long-term thermal ageing at 162 °C, 207 °C and 253 °C. Moreover the effect of long term exposure (1000 h, 125 °C) and thermal shocks (1000 shocks between −55 °C and 125 °C) is analysed for untrimmed and voltage pulse trimmed buried LTCC resistors.     

Pb-free high temperature solders for power device packaging

Reliabilities of joints for power semiconductor devices using a Bi-based high temperature solder has been studied. The Bi-based solder whose melting point is 270 °C were prepared by mixing of the CuAlMn particles and molten Bi to overcome the brittleness of Bi. Then, joined samples using the solder were fabricated and thermal cycling tests were examined. After almost 2000 test cycles of −40/200 °C test, neither intermetallic compounds nor cracks were observed for CTE (Coefficient of Thermal Expansion) matched sample with Cu interface. On the other hand, certain amount of intermetallic compound such as Bi₃Ni was found for a sample with Ni interface. In addition, higher reliability of this solder than Sn-Cu solder was obtained after −40/250 °C test. Furthermore, an example power module structure using double high temperature solder layers was proposed.     

Reliability study of underfill/chip interface under accelerated temperature cycling (ATC) loading

Interface reliability issue has become a major concern in developing flip chip assembly. The CTE mismatch between different material layers may induce severe interface delamination reliability problem. In this study, multifunctional micro-moiré interferometry (M³I) system was utilized to study the interfacial response of flip chip assembly under accelerated thermal cycling (ATC) in the temperature range of −40 °C to 125 °C. This in-situ measurement provided good interpretation of interfacial behavior of delaminated flip chip assembly. Finite element analysis (FEA) was carried out by introducing viscoelastic properties of underfill material. The simulation results were found to be in good agreement with the experimental results. Interfacial fracture mechanics was used to quantify interfacial fracture toughness and mode mixity of the underfill/chip interface under the ATC loading. It was found that the interfacial toughness is not only relative to CTE mismatch but also a function of stiffness mismatch between chip/underfill.     

Reliability of 80 μm pitch flip chip attachment on flex

The interest toward flip chip technology has increased rapidly during last decade. Compared to the traditional packages and assembly technologies flip chip has several benefits, like less parasitics, the small package size and the weight. These properties emphasize especially when flip chip component is mounted direct to the flexible printed board. In this paper flip chip components with Kelvin four point probe and daisy chain test structure were bonded to the polyimide flex with two different types of anisotropically conductive adhesive films and one anisotropically conductive adhesive paste. The reliability of small pitch flip chip on flex interconnections (pitch 80 μm) was tested in 85°C/85% RH environmental test and −40↔+125°C thermal shock test. According to the results it is possible to achieve reliable and stable ohmic contact, even in small pitch flip chip on flex applications.     

Thermal fatigue endurance of collapsible 95.5Sn4Ag0.5Cu spheres in LTCC/PWB assemblies

The behavior of thermomechanically loaded collapsible 95.5Sn4Ag0.5Cu spheres in LTCC/PWB assemblies with high (LTCC/FR-4; ΔCTE 10 ppm/°C) and low (LTCC/Arlon; ΔCTE < 10 ppm/°C) global thermal mismatches was studied by exposing the assemblies into two thermal cycling tests. The characteristic lifetimes of the LTCC/FR-4 assemblies, tested over the temperature ranges of 0–100 °C and −40 to 125 °C, were 1475 and 524 cycles, respectively, whereas the corresponding values of the LTCC/Arlon assemblies were 5424 and 1575 cycles. According to the typical requirements for the industrial lifetime duration of solder joints, the former values are inadequate, whereas the latter are at an acceptable level in a few cases. Furthermore, the global thermal mismatch affected the thermal fatigue behavior of the 95.5Sn4Ag0.5Cu spheres in the temperature range of −40 to 125 °C.     

Ballistic electron emission microscopy studies of the temperature dependence of Schottky barrier height distribution in CoSi2/n-Si(1 0 0) diodes formed by solid phase reaction

Ballistic electron emission microscopy (BEEM) and ballistic electron emission spectroscopy have been performed on polycrystalline and epitaxial CoSi₂/n-Si(1 0 0) contacts at temperatures ranging from −144°C to −20°C. The ultra-thin CoSi₂ films (10 nm) were fabricated by solid state reaction of a single layer of Co (3 nm) or a multilayer of Ti (1 nm)/Co (3 nm)/amorphous-Si(1 nm)/Ti (1 nm) with a Si substrate, respectively. The spatial distribution of barrier height over the contact area obeys a Gaussian function at each temperature. The mean barrier height increases almost linearly with decreasing temperature with a coefficient of −0.23±0.02 meV/K for polycrystalline CoSi₂/Si diodes and −0.13±0.03 meV/K for epitaxial diodes. This is approximately equal to one or one-half of the temperature coefficient of the indirect energy gap in Si, respectively. It suggests that the Fermi level is pinned to different band positions of Si. The width of the Gaussian distribution is about 30–40 meV, without clear dependence on the temperature. The results obtained from conventional current–voltage and capacitance–voltage (I–V/C–V) measurements are compared to BEEM results.     

Ball grid array reliability assessment for aerospace applications

Reliability of ball grid arrays (BGAs) was evaluated with special emphasis on space applications. This work was performed as part of a consortium led by the Jet Propulsion Laboratory (JPL) to help build the infrastructure necessary for implementing this technology. Nearly 200 test vehicles, each with four package types, were assembled and tested using an experiment design. The most critical variables incorporated in this experiment were package type, board material, surface finish, solder volume, and environmental condition. The packages used for this experiment were commercially available packages with over 250 I/Os including both plastic and ceramic BGA packages.The test vehicles were subjected to thermal and dynamic environments representative of aerospace applications. Two different thermal cycling conditions were used, the JPL cycle ranged from −30°C to 100°C and the Boeing cycle ranged from −55°C to 125°C. The test vehicles were monitored continuously to detect electrical failure and their failure mechanisms were characterized. They were removed periodically for optical inspection, scanning electron microscopy (SEM) evaluation, and cross-sectioning for crack propagation mapping. Data collected from both facilities were analyzed and fitted to distributions using the Weibull distribution and Coffin–Manson relationships for failure projection. This paper will describe experiment results as well as those analyses.     

Vibrational spectroscopy characterization of low-dielectric constant SiOC:H films prepared by PECVD technique

Low-dielectric constant SiOC:H films were prepared by plasma enhanced chemical vapour deposition (PECVD) from trimethyl-silane (H–Si–(CH₃)₃) and ozone (O₃) gas mixture. The samples were preliminarily annealed at 400 °C in N₂ atmosphere and then in N₂+He plasma. Afterwards, they were treated in vacuum at some fixed temperatures in the range between 400 and 900 °C. Structural investigations of the annealed films were carried out by means of vibrational spectroscopy techniques. FT-IR spectrum of a preliminarily treated sample shows absorption bands due to stretching modes of structural groups like Si–CH₃ at 1270 cm⁻¹, Si–O–Si at 1034 cm⁻¹ and C–H_x in the region between 2800 and 3000 cm⁻¹. No significant spectral change was observed in the absorption spectra of samples annealed up to 600 °C, indicating that the preliminarily treated film retains a substantial structural stability up to this temperature. Above 600 °C, absorption spectra show a strong quenching of H-related peaks while the band due to Si–O–Si anti-symmetric stretching mode shifts towards higher energy, approaching the value observed for thermally grown SiO₂. Raman spectra of samples treated at temperatures T500 °C exhibit both D and G bands typical of sp²-hybridised carbon, due to the formation of C–C bonds within the film which is accompanying the release of hydrogen. The intensity of D and G bands becomes more pronounced in samples annealed at higher temperatures, thus suggesting a progressive precipitation of carbon within the oxide matrix.     

Effects of bonding temperature on the properties and reliabilities of anisotropic conductive films (ACFs) for flip chip on organic substrate application

The effects of bonding temperatures on the composite properties and reliability performances of anisotropic conductive films (ACFs) for flip chip on organic substrates assemblies were studied. As the bonding temperature decreased, the composite properties of ACF, such as water absorption, glass transition temperature (T_g), elastic modulus (E′) and coefficient of thermal expansion (α), were improved. These results were due to the difference in network structures of cured ACFs which were fully cured at different temperatures. From small angle X-ray scattering (SAXS) test result, ACFs cured at lower temperature, had denser network structures. The reliability performances of flip chip on organic substrate assemblies using ACFs were also investigated as a function of bonding temperatures. The results in thermal cycling test (−55 °C/+150 °C, 1000 cycles) and PCT (121 °C, 100% RH, 96 h) showed that the lower bonding temperature resulted in better reliability of the flip chip interconnects using ACFs. Therefore, the composite properties of cured ACF and reliability of flip chip on organic substrate assemblies using ACFs were strongly affected by the bonding temperature.     

Direct gold and copper wires bonding on copper

The key to bonding to copper die is to ensure bond pad cleanliness and minimum oxidation during wire bonding process. This has been achieved by applying a organic coating layer to protect the copper bond pad from oxidation. During the wire bonding process, the organic coating layer is removed and a metal to metal weld is formed. This organic layer is a self-assembled monolayer. Both gold and copper wires have been wire-bonded successfully to the copper die even without prior plasma cleaning. The ball diameter for both wires are 60 μm on a 100 μm fine pitch bond pad. The effectiveness of the protection of the organic coating layer starts from the wafer dicing process up to the wire bonding process and is able to protect the bond pad for an extended period after the first round of wire bond process. In this study, oxidization of copper bond pad at different packaging processing stages, dicing and die attach curing, have been explored. The ball shear strength for both gold and copper ball bonds achieved are 5 and 6 g/mil² respectively. When subjected to high temperature storage test at 150 °C, the ball bonds formed by both gold and copper wire bond on the organic coated copper bondpad are thermally stable in ball shear strength up to a period of 1440 h. The encapsulated daisy chain test vehicle with both gold and copper wires bonding have passed 1000 cycles of thermal cycling test (−65 to 150 °C). It has been demonstrated that orientation imaging microscopy technique is able to detect early levels of oxidation on the copper bond pad. This is extremely important in characterization of the bondability of the copper bond pad surface.     

Reliability of AlN substrates and their solder joints in IGBT power modules

The reliability of IGBT modules was investigated with respect to the metallized ceramic (substrate) and the solder layer between the substrate and copper baseplate. Thermal cycles were performed between −55°C and +150°C on substrates based on different technologies and from various manufacturers. An incipient delamination of the metallization could be predicted from the mechanical resonance frequency. The warping of the substrates after cycling due to crack propagation and the adhesion of the metallization were determined. Thermal and active-power cycles were performed on 1200 A / 3.3 kV IGBT power modules to investigate the reliability of the solder joint between substrate and baseplate.     

A simple model for the mode I popcorn effect for IC packages

A simple model for the Mode I popcorn effect is presented here for packages with rectangular die pad (P-DSO). A package “stability parameter”, relating to its moisture sensitivity, is derived from the popcorn model. It describes the critical factors for a robust package - molding compound properties and package, leadframe design for a given preconditioning and soldering process. Furthermore, nomograms generated from the model enable an easy estimation of moisture sensitivity levels (between 1 and 5) of packages with different die pad sizes and molding compound underpad thicknesses and for different soldering temperatures ranging from 220°C to 260°C (Pb-free soldering).     

Properties of low temperature Sn–Ag–Bi–In solder systems

The metallurgical and mechanical properties of Sn–3.5 wt%Ag–0.5 wt%Bi–xwt%In (x = 0–16) alloys and of their joints during 85 °C/85% relative humidity (RH) exposure and heat cycle test (−40–125 °C) were evaluated by microstructure observation, high temperature X-ray diffraction analysis, shear and peeling tests. The exposure of Sn–Ag–Bi–In joints to 85 °C/85%RH for up to 1000 h promotes In–O formation along the free surfaces of the solder fillets. The 85°C/85%RH exposure, however, does not influence the joint strength for 1000 h. Comparing with Sn–Zn–Bi solders, Sn–Ag–Bi–In solders are much stable against moisture, i.e. even at 85 °C/85%RH. Sn–Ag–Bi–In alloys with middle In content show severe deformation under a heat cycles between −40 °C and 125 °C after 2500 cycles, due to the phase transformation from β-Sn to β-Sn + γ-InSn₄ or γ-InSn₄ at 125 °C. Even though such deformation, high joint strength can be maintained for 1000 heat cycles.     

Growth of tin whiskers for lead-free plated leadframe packages in high humid environments and during thermal cycling

Growth behavior of tin whiskers from pure tin and tin–bismuth plated leadframe (LF) packages for elevated temperature and high humidity storages and during thermal cycling was observed. In the storage at 60 °C/93% relative humidity (RH) and 85 °C/85%RH the galvanic corrosion occurred at the outer lead toes and shoulders where the base LF material is exposed, forming tin oxide layers of SnO₂. The corroded layers spread inside the film and formed whiskers around the corroded islands. Many whiskers were observed to grow from grain boundaries for the Fe–42Ni alloy (alloy42) LF packages. It was confirmed that the corrosion tends to occur on the side surfaces of outer leads adjacent to the mold flash. The contribution of ionic contaminants in epoxy mold compound (EMC) to the corrosion was not identified. During thermal cycling between −65 °C and +150 °C whiskers grew out of as-deposited grains for pure tin-plated alloy42 LF packages and they grew linearly with an increase of number of cycle. Growth mechanisms of the whiskers from grain boundaries and as-deposited grains were discussed from the deformation mechanism map for tin and mathematical calculation with a steady-state diffusion model.