1.17-μm highly strained GaInAs-GaAs quantum-well laser

Excellent lasing properties and temperature characteristic of a highly strained 1.17-μm GaInAs-GaAs double-quantum-well laser are reported. We show that a strained buffer layer, which is employed in the device, has no tradeoff on the device performance. For a 1500-μm-long laser with cleaved facets a threshold current density of 200 A/cm² is achieved. A transparency current density of 180 A/cm² is estimated for as cleaved devices. A record high characteristic temperature in this wavelength range of 150 K is achieved     

1.15-μm wavelength oxide-confined quantum-dot vertical-cavitysurface-emitting laser

Low-threshold lasing is achieved at 1.154 μm for an oxide-confined quantum-dot (QD) vertical-cavity surface-emitting laser (VCSEL) grown on a GaAs substrate. The long wavelength emission is obtained through use of an InAs-GaAs QD active region. A continuous-wave (CW) threshold of 502 μA is obtained for a device size of 10-μm diameter, corresponding to a threshold current density of 640 A/cm²      

Characteristics of GaAsSb single-quantum-well-lasers emitting near1.3 μm

We report data on GaAsSb single-quantum-well lasers grown on GaAs substrates. Room temperature pulsed emission at 1.275 μm in a 1250-μm-long device has been observed. Minimum threshold current densities of 535 A/cm² were measured in 2000-μm-long lasers. We also measured internal losses of 2-5 cm^-1, internal quantum efficiencies of 30%-38% and characteristic temperatures T₀ of 67°C-77°C. From these parameters, a gain constant G₀ of 1660 cm^-1 and a transparency current density J_tr of 134 A/cm² were calculated. The results indicate the potential for fabricating 1.3-μm vertical-cavity surface-emitting lasers from these materials     

Long-wavelength (1.55-μm) vertical-cavity lasers withInGaAsP/InP-GaAs/AlAs DBR's by wafer fusion

We propose a novel design for a 1.55-μm vertical-cavity surface-emitting laser (VCSEL) structure employing double InGaAsP/InP-GaAs/AlAs distributed Bragg reflectors. The fundamental features of InP/GaAs wafer fusion are examined as a function of load pressure. We demonstrate an exact 1.55-μm emission wavelength in the CW mode with low threshold voltage (2.1 V) and low threshold current density (1.8 kA/cm²)     

Low threshold current GaAs/AlGaAs GRIN-SCH lasers grown bymolecular beam epitaxy on Si3N4 masked substrates

High-performance single-quantum-well graded-refractive index separate confinement heterostructure (SQW GRINSCH) laser have been grown by molecular beam epitaxy on Si₃N₄ patterned GaAs (100) substrates. Lasers grown on stripe windows orientated in the [011] direction have optical waveguiding and current confinement supplied by facetting occurring during growth. Lasers fabricated on 10 μm wide Si ₃N₄ openings have threshold currents as low as 15 mA for a 500 μm-long cavity. The current density required to reach optical transparency is 144 A/cm²; an internal quantum efficiency of 81%, and a peak optical power of 70 mW per facet has been obtained. Device performance comparable to ridge lasers is observed in a self-aligned laser process     

Optical and microwave performance of GaAs-AlGaAs and strained layerInGaAs-GaAs-AlGaAs graded index separate confinement heterostructuresingle quantum well lasers

GaAs-AlGaAs and strained layer In_0.3Ga_0.7As-GaAs-AlGaAs GRINSCH SQW lasers grown by molecular beam epitaxy are discussed. The strained-layers have threshold currents of 12 mA for 30-μm×400-μm devices (1000 A/cm²) and threshold current densities of 167 A/cm² for 150-μm×800-μm devices. The threshold currents of strained-layer InGaAs lasers are lower than those of GaAs for all dimensions tested with 20-μm-wide GaAs devices exhibiting threshold currents three times those of In_0.3Ga_0.7As devices. Microwave modulation of 10-μm×500-μm strained-layer lasers with simple mesa structures yields bandwidths of 6 GHz. For all dimensions tested, strained-layer InGaAs devices have greater bandwidths than GaAs devices. These measurements confirm theoretical predictions of the effects of valence band modification due to biaxially compressive strain     

GaInNAs-GaAs long-wavelength vertical-cavity surface-emitting laserdiodes

Vertical-cavity surface-emitting laser diodes with GaInNAs-GaAs quantum-well (QW) active layers are demonstrated for the first time. GaInNAs permits the realization of a long-wavelength vertical-cavity laser grown directly on a GaAs substrate. Room-temperature (RT) pulsed operation is achieved, with an active wavelength near 1.18 μm, threshold current density of 3.1 kA/cm², slope efficiency of ~0.04 W/A, and output power above 5 mW for 45-μm-diameter devices. Laser oscillation is observed for temperatures at high as 95°C     

Strain-compensated InGa(As)P-InAsP active regions for 1.3-μmwavelength lasers

The demonstration of an optimized strain compensated multiple-quantum-well (MQW) active region for use in 1.3-μm wavelength lasers is described. Utilizing narrow bandgap tensile-strained InGaAsP instead of wide bandgap InGaP barriers in strain-compensated lasers, we observe a reduction in threshold current density (Jth) from 675 to 310 A/cm² and in T₀ from 75 K to 65 K for 2-mm long seven quantum-well devices. Additionally, the lowest reported Jth for MBE grown 1.3-μm wavelength lasers of 120 A/cm² for single-quantum-well (SQW) 45-mm-long lasers was attained     

Design and fabrication of low-threshold 1.55-μm graded-indexseparate-confinement heterostructure strained InGaAsPsingle-quantum-well laser diodes

This paper presents a guideline for designing an optimum low-threshold 1.55-μm graded-index (GRIN) separate confinement-heterostructure (SCH) strained InGaAsP single quantum-well (SQW) laser diode (LD). The guideline was formulated based on the results of numerical and experimental analysis. After calculating the sheet carrier density at the lasing threshold, the guideline was obtained by considering the tradeoff between carrier and optical confinements in the well: the GRIN layer energy gap should be varied parabolically from InP to InGaAsP having a band gap wavelength of 1.1 μm to inject a large number of carriers into the well, and the thickness of one side of the GRIN layer should be more than 300 nm to keep a strong optical confinement. The GRIN SQW LD designed using the guideline has a J_th as low as 98 A/cm² at a cavity length of 5 mm, which proves the guideline is effective for designing low-threshold 1.55-μm GRIN SQW LDs     

Low threshold 1.3 μm-GaInAsP/InP tensile strained single quantumwell lasers grown by low-pressure MOCVD

1.3 μm Ga_0.49In_0.51As_0.7P_0.3-1.15% tensile strained single quantum well (SQW) lasers are successfully fabricated. The lowest threshold current for a 200 μm-long, 20 μm-wide ridge waveguide laser with high reflectivity coating is as low as 6 mA, corresponding to a very low threshold current density of 150 A/cm²     

Room-temperature pulsed operation of triple-quantum-well GaInNAslasers grown on misoriented GaAs substrates by MOCVD

The lasing operation of three-quantum-well GaInNAs stripe geometry lasers grown by MOCVD on 0° and 6° misoriented (100) GaAs substrates, respectively, have been demonstrated and their performance is compared for the first time. Both devices achieved room temperature, pulsed lasing operation at an emission wavelength of 1.17 μm, with a threshold current density of 667 A/cm² for lasers grown on 6° misoriented substrates, and 1 kA/cm² for lasers grown on 0° misoriented substrates. The threshold for the lasers grown on 6° misoriented substrates compares favorably with the best results for GaInNAs lasers. Lasers with narrower stripe width and a planar geometry have also been demonstrated by the use of lateral selective wet oxidation for current confinement, with a threshold current density of 800 A/cm² for 25-μm-wide devices     

High-performance strain-compensated InGaAs-GaAsP-GaAs(λ=1.17 μm) quantum well diode lasers

This letter reports studies on highly strained and strain-compensated InGaAs quantum-well (QW) active diode lasers on GaAs substrates, fabricated by low-temperature (550°C) metal-organic chemical vapor deposition (MOCVD) growth. Strain compensation of the (compressively strained) InGaAs QW is investigated by using either InGaP (tensile-strained) cladding layer or GaAsP (tensile-strained) barrier layers. High-performance λ=1.165 μm laser emission is achieved from InGaAs-GaAsP strain-compensated QW laser structures, with threshold current densities of 65 A/cm² for 1500-μm-cavity devices and transparency current densities of 50 A/cm². The use of GaAsP-barrier layers are also shown to significantly improve the internal quantum efficiency of the highly strained InGaAs-active laser structure. As a result, external differential quantum efficiencies of 56% are achieved for 500-μm-cavity length diode lasers     

Fabrication of In0.25Ga0.75As/InGaAsPstrained SQW lasers on In0.05Ga0.95As ternarysubstrate

A uniform In_0.05Ga_0.95As ternary substrate was grown by using liquid encapsulated Czochralski (LEC) technique with a method of supplying GaAs source material at a constant temperature, and InGaAs/InGaAsP strained single quantum well (SQW) lasers were fabricated on the substrate for the first time. The lasers lased at 1.03 μm and exhibited low threshold current density of 222 A/cm² and excellent characteristic temperature of 221 K, showing that the ternary substrate has a sufficient quality for laser fabrication     

Low-threshold current density 1.3-μm InAs quantum-dot laserswith the dots-in-a-well (DWELL) structure

The wavelength of InAs quantum dots in an In_0.15Ga_0.85As quantum-well (DWELL) lasers grown on a GaAs substrate has been extended to 1.3-μm. The quantum dot lasing wavelength is sensitive to growth conditions and sample thermal history resulting in blue shifts as much as 73 nm. The room temperature threshold current density is 42.6 A cm^-2 for 7.8-mm cavity length cleaved facet lasers under pulsed operation     

Low-threshold operation of 1.3-μm GaAsSb quantum-well lasersdirectly grown on GaAs substrates

GaAsSb quantum-well (QW) edge-emitting lasers grown on GaAs substrates were demonstrated. The optical quality of the QW was improved by optimizing the growth conditions and introducing a multi-QW to increase the gain. As a result, 1.27-μm lasing of a GaAs_0.66 Sb_0.34-GaAs double-QW laser was obtained with a low-threshold current density of 440 A/cm², which is comparable to that in conventional InP-based long-wavelength lasers. 1.30 μm lasing with a threshold current density of 770 A/cm² was also obtained by increasing the antimony content to 0.36. GaAsSb QW was found to be a suitable material for use in the active layer of a 1.3-μm vertical-cavity surface-emitting lasers     

Steady-state and transient characteristics of microcavitysurface-emitting lasers with compressively strained quantum-well activeregions

In conventional semiconductor lasers, the dimensions of the optical cavity greatly exceed the photon wavelength, and the photon density of states forms a continuum since it is essentially that of a bulk system. On the other hand, in an ideal laser, one would like to have a single optical mode coincident with the maximum in the gain spectrum of the active medium. We show that substantial density-of-states quantization and enhancement of the fraction of photons spontaneously emitted into the lasing mode can be obtained by reducing the lateral width of the surface-emitting laser. For emission at λ=0.954 μm, the threshold current density can be drastically reduced by increasing the coupling factor to a few percent. For a cavity structure width of 0.3 μm, the threshold current density is 50 A/cm², compared with 250 A/cm² for the 0.6-μm cavity. At lower still lateral widths, the cavity loses its vertical character, and confinement of the lateral optical mode rapidly deteriorates. The large-signal response of microcavity lasers is slightly improved primarily due to elimination of mode competition in intrinsically single-mode microcavities, with relaxation times close to 1 ns. The enhancement of the spontaneous emission coupling factor results in an increase of the relaxation oscillation frequency and improvement in the standard small-signal response of microcavity lasers. For J=10J_th, the -3 dB modulation frequency exceeds 40 GHz. Since low threshold current densities may be achieved in microcavity lasers, the gains in small-signal performance are primarily extrinsic, i.e., higher modulation bandwidths ace accessible for the same injection     

High-power operation in 0.98-μm strained-layer InGaAs-GaAssingle-quantum-well ridge waveguide lasers

High power strained-layer InGaAs-GaAs graded-index separate confinement heterostructure (GRIN-SCH) single-quantum-well (SQW) lasers at an emission wavelength of 0.98 μm have been fabricated. A light power as high as 270 mW and a maximum front power conversion efficiency of 51.5% have been obtained for the antireflective and highly-reflective coated laser with 9-μm-wide ridge and 600-μm-long cavity     

Long-wavelength GaInNAs(Sb) lasers on GaAs

The boom in fiber-optic communications has caused a high demand for GaAs-based lasers in the 1.3-1.6-μm range. This has led to the introduction of small amounts of nitrogen into InGaAs to reduce the bandgap sufficiently, resulting in a new material that is lattice matched to GaAs. More recently, the addition of Sb has allowed further reduction of the bandgap, leading to the first demonstration of 1.5-μm GaAs-based lasers by the authors. Additional work has focused on the use of GaAs, GaNAs, and now GaNAsSb barriers as cladding for GaInNAsSb quantum wells. We present the results of photoluminescence, as well as in-plane lasers studies, made with these combinations of materials. With GaNAs or GaNAsSb barriers, the blue shift due to post-growth annealing is suppressed, and longer wavelength laser emission is achieved. Long wavelength luminescence out to 1.6 μm from GaInNAsSb quantum wells, with GaNAsSb barriers, was observed. In-plane lasers from these samples yielded lasers operating out to 1.49 μm, a minimum threshold current density of 500 A/cm² per quantum well, a maximum differential quantum efficiency of 75%, and pulsed power up to 350 mW at room temperature     

High-performance long-wavelength (λ~1.3 μm) InGaAsPNquantum-well lasers

We demonstrate high-performance InGaAsPN quantum well based long-wavelength lasers grown on GaAs substrates, nitrogen containing lasers emitting in the λ=1.2- to 1.3-μm wavelength range were grown by gas source molecular beam epitaxy using a RF plasma nitrogen source. Under pulsed excitation, lasers emitting at λ=1.295 μm exhibited a record low threshold current density (J_TH) of 2. 5 kA/cm². Lasers grown with less nitrogen in the quantum well exhibited significantly lower threshold current densities of J_TH =1.9 kA/cm² at λ=1.27 μm and J_TH=1.27 kA/cm² at λ=1.2 μm. We also report a slope efficiency of 0.4 W/A and an output power of 450 mW under pulsed operation for nitrogen containing lasers emitting at 1.2 μm     

Submilliampere-threshold 1.5-μm strained-layer multiple quantumwell lasers

The effect of high-reflection facet coatings on strained-layer multiple-quantum-well lasers was studied and submilliampere-threshold lasers were made in the 1.5-μm wavelength region with a short cavity and high-reflection-coated facets. As a result of the compressive strain, the threshold current density is loss-limited instead of transparency-limited. By the use of the step-graded-index separate confinement heterostructure to reduce the waveguide loss, a threshold current density of 550 A/cm² was measured on 30-μm wide broad area lasers with 1-mm long cavity