发光二极管中负电容现象的实验研究

对各种发光二极管（LEDs）的负电容（NC）进行了研究。实验结果表明，所有的LEDs都展示了NC现象。电压调制发光（VMEL）实验确认，在发光有源区中注入载流子引起的强发光复合是产生NC现象的基本原因。测量还表明，不同的LEDs的NC随电压和频率的变化规律是类似的；测试频率越低，正向偏压越高，NC现象越明显。     

发光二极管中负电容现象分析

利用正向交流(ac)小信号方法对发光二极管(LED)的电容-电压特性进行测量,可以观察到发光二极管中的负电容现象。首次提出测量到的负电容现象是表象,不存在负电容;首次提出发光二极管P-N结的结电容在特定的正向电压范围内等效于可变电容,特定参数的可变电容使电流的相位移相π,使得在测量中表现为负电容。     

垂直结构GaN基LEDs电流分布计算分析

电流分布是影响大功率LEDs器件性能的重要因素,与传统结构GaN基器件比较,垂直结构器件通过采用上下电极分布,明显改善了LEDs器件内部电流分布均匀性。通过理论分析与数值计算,建立起了垂直结构GaN基LEDs电流分布模型,研究了垂直结构GaN基LEDs电流分布及I-V特性。结果表明,与传统平面结构比较,垂直结构GaN基LEDs的电流分布均匀性得到了明显改善,同时正向电压降低约7%。最后,通过晶片键合与激光剥离技术,制备了垂直结构GaN基LEDs,测试结果表明,实验结果和理论计算值相吻合。该结果对GaN基LEDs器件的优化设计具有重要指导意义。     

发光二极管中负电容现象的机理

为解释发光二极管（LEDs）中的负电容（NC）现象，提出了在有源区与局部强复合效应有关的新模型，首次通过对载流子连续性方程的求解导出了NC的解析表达式。理论结果表明，在一定的范围内激活区载流子复合速率越大，LEDs中的NC效应越显著，这与实验结果完全一致。它表明，LEDs中的NC是由其激活区载流子复合引起的，而非外部原因造成。     

用金属有机化学汽相沉积法生长立方相氮化镓发光二极管

尽管在砷化镓衬底上能否生长出令人满意的亚稳态立方相氮化镓仍受到工业界的怀疑,但国家光电技术研究中心和北京半导体所的研究人员已经使用这种方法制出蓝光输出发光二极管(LEDs).绝大多数现存的蓝光LEDs是基于最稳相的六方相GaN.尽管在自然界中不存在亚稳态立方相GaN,但可预言存在具有更高的载流子迁移率,更容易的P型掺杂和更窄能带隙的GaN.研究小组用金属有机化学汽相外延法在掺硅GaAs衬底上生长出了立方相GaN层状结构.一种对发光质量有益的亚微尺寸颗粒是从插入位错和层积缺陷中释放出来的.研究人员说这种结     

半导体GaN基蓝光发光二极管的精确电学特性

对传统的电容-电压(C-V)、电流 -电压(I-V)测量方法和我们自建的表征方法测量得到的蓝光发光二极管(L ED)正向特性的结 果做了详细的对比分析,发现传统测量方法得到的电学参量是不够精确的。但是传统C-V方法得到的表观电容以及我们自建方法得到的结电容在大电压和低 频率下都表现出了明显的负值,该实验结果与经典肖克莱理论相冲突。此外,我们精确 地得到了负的结电容以及结电导随电压和频率变化的经验表达式。这将为半导体二极管的正 向电学特性的理论研究提供实验基础。     

高功率GaN p—n结蓝色发光二极管

用具有 GaN 缓冲层的 GaN 薄膜制备出高功率 p—n 结蓝色发光二极管(LEDs)。外部量子效率高达0.18%,输出功率比常规的亮度为8mcd 的 SiC 蓝色 LEDs 高出10倍。在正向电流为20mA 的条件下,正向电压低至4V;这是报导过的 GaNLEDs 中最低的正向电压值。峰值波长和半最大值全宽度(FWHM)分别为430nm 和55nm。     

发光二极管负电容与角频率的关系

利用正向交流(AC)小信号方法对发光二极管(LED)的电容-电压特性进行测量,可以观察到发光二极管中的负电容现象.提出了测量到的负电容现象是表象,不存在负电容;发光二极管p-n结的结电容在特定的正向电压范围内等效于可变电容.分析可变电容对交流小信号响应得到:特定参数的可变电容使电流的相位移相π,使得在测量中表现为负电容;得到了发光二极管负电容与角频率的关系表达式.     

发光二极管负电容与角频率的关系

利用正向交流(AC)小信号方法对发光二极管(LED)的电容-电压特性进行测量,可以观察到发光二极管中的负电容现象.提出了测量到的负电容现象是表象,不存在负电容;发光二极管p-n结的结电容在特定的正向电压范围内等效于可变电容.分析可变电容对交流小信号响应得到:特定参数的可变电容使电流的相位移相π,使得在测量中表现为负电容;得到了发光二极管负电容与角频率的关系表达式.     

GaN基白光LED温度特性实验研究

实验研究了恒流驱动条件下,GaN基白光LED的正向电压、发光光谱和发光效率随环境温度的变化情况.结果表明,在输入电流恒定的情况下,随着温度的升高,结电压和发光强度与温度具有良好的线性关系,并且GaN基白光LED的发光颜色总是向蓝光漂移,而小电流驱动时比大电流驱动时蓝光漂移更明显.根据实验结果,分析了器件的最佳额定工作电流.

Abstract：

Under a constant driving current, the changes of the forward voltage, emission spectrum and luminous efficiency of GaN-based White LEDs with the ambient temperature are studied experimentally. It is found that the forward voltage and the luminous intensity depend on the temperature linearly with constant injection current, and luminous colors of GaN-based White LEDs always shift towards blue. And the blue shift with low driving current is more obvious than that with high driving current. According to the results, the best rated operating current of GaN-based white LEDs is discussed.     

Edge-emitting electroluminescence polarization investigation of InGaN/GaN light-emitting diodes grown by metal-organic chemical vapor deposition on sapphire (0001)

The edge-emitting electroluminescence (FL) state of polarization of blue and green InGaN/GaN light-emitting diodes (LEDs) grown in EMCORE’s commercial reactors was studied and compared to theoretical evaluations. Blue (∼475 nm) LEDs exhibit strong EL polarization, up to a 3:1 distinction ratio. Green (∼530 nm) LEDs exhibit smaller ratios of about 1.5:1. Theoretical evaluations for similar InGaN/GaN superlattices predicted a 3:1 ratio between light polarized perpendicular (E⊥c) and light polarized parallel (E‖c) to the c axis. For the blue LEDs, a quantum well-like behavior is suggested because the E⊥c mode dominates the E‖c mode 3:1. In contrast, for the green LEDs, a mixed quantum well (QW)-quantum dot (QD) behavior is proposed, as the ratio of E⊥c to E‖c modes drops to 1.5:1. The EL polarization fringes were also observed, and their occurrence may be attributed to a symmetric waveguide-like behavior of the InGaN/GaN LED structure. A large 40%/50% drop in the surface root mean square (RMS) from atomic force microscopy (AFM) scans on blue/green LEDs with and without EL fringes points out that better surfaces were achieved for the samples exhibiting fringing. At the same time, a 25%/10% increase in the blue/green LED photoluminescence (PL) intensity signal was found for samples displaying EL interference fringes, indicating superior material quality and improved LED structures.     

The effects of interface states on the capacitance and electroluminescence efficiency of InGaN/GaN light-emitting diodes

The capacitance-voltage characteristics and external quantum efficiency of electroluminescence in blue GaN light-emitting diodes (LEDs) with an InGaN quantum well have been investigated in the temperature range 77–300 K. The results obtained are interpreted taking into account the effect of the InGaN/GaN interface states of structural defects and impurities on the capacitance of the GaN LEDs. The nonlinearity of the C^?2(U) characteristics observed at low forward bias is attributed to an increase in the interface charge resulting from tunneling of free electrons and their trapping at the interface states. According to estimates, states with a density of about 3 × 10¹² cm^?2 are present at the interface. A recombination current in the interface region suppresses the injection of charge carriers into the quantum well and decreases the electroluminescence efficiency at high forward bias. Degradation of the optical power of the LEDs, accompanied by an increase in the measured capacitance, is attributed to an increase in the density of charged interface states and changes in their distribution in the band gap.     

半导体蓝光

叙述了当前以ＧａＮ为代表的第三代半导体材料的崛起。ＧａＮ因其优良的特性而被用于制造蓝色发光二极管和激光二极管,引起了世界蓝光热。它的研究不仅是高技术的前沿课题,而且是具有巨大市场前景的技术经济竞争领域。蓝色发光二极管和激光器在全色动态显示、固体照明光源、交通信号灯、汽车尾灯、光盘信息贮存以及深海通信等领域都有广阔应用前景。     

利用常规工艺提高光子晶体GaN LED的出光效率

计算了GaN二维光子晶体的能带结构,并利用常规工艺在国内首次制备出了GaN基二维平板结构的光子晶体蓝光LED。经过器件测试表明,与没有制作光子晶体的器件相比,光子晶体使器件的有效出光效率达到了原来的1.5倍以上。另外,还对感应耦合等离子体刻蚀(ICP)的制备光子晶体LED的刻蚀工艺进行了分析。     

低温生长n型氮化镓插入层提高LED抗静电能力

在这篇论文里,我们通过在InGaN/GaN 多量子阱和n型氮化镓层中间插入一层低温生长的n型氮化镓显著提高了LED的抗静电能力。通过引入低温生长的氮化镓插入层使得LED抗击穿电压超过4000V的良品率从9.9%提升到74.7%。低温生长的氮化镓插入层作为后续生长的多量子阱的缓冲层,释放了量子阱中的应力并且改善了量子阱的界面质量。另外,我们证明了在氮气气氛下生长低温氮化镓插入层对于LED抗静电能力的改善要强于氢气气氛,同时也进一步证明低温插入层对量子阱中应力的释放有利于提高LED的抗静电能力。光电测试结果表明,在引入低温nGaN缓冲层后,LED的电学特性并没有衰退,并且LED的光输出功率提高了13.9%。     

Effect of Silicon Doping in the Quantum-Well Barriers on the Electrical and Optical Properties of Visible Green Light-Emitting Diodes

The effect of Si doping in the GaN quantum-well (QW) barriers of the InGaN–GaN multiple QW active region in visible green light-emitting diodes (LEDs) was studied. As the doping level of Si increases, the intensity of electroluminescence (EL) decreases, while the forward voltage of the diodes is improved. Degradation of EL is believed to be mainly due to the hole transport blocking effect caused by Si doping in the QW barriers resulting in increased potential barriers. This effect is believed to be more significant in green LEDs than in violet and blue LEDs.      

Point defect determination by eliminating frequency dispersion in C–V measurement for AlGaN/GaN heterostructure

In this paper, an improved small-signal equivalent model is introduced to eliminate frequency dispersion phenomenon in capacitance–voltage (C–V) measurement, and a new mathematic method is proposed to calculate the amount of bulk defect existing in the GaN buffer layer. Compared with photoluminescence (PL) and high resolution X-ray diffraction (HRXRD) data, it is identified that the main component of the bulk defect concentration is made up of the point defect concentration, rather than the edge dislocation concentration. All these results prove the accuracy of the improved C–V model and feasibility of the mathematic model.     

Small-signal model parameter extraction of E-mode N-polar GaN MOS-HEMT using optimization algorithms and its comparison

An improved small-signal parameter extraction technique for short channel enhancement-mode N-polar GaN MOS-HEMT is proposed,which is a combination of a conventional analytical method and optimization techniques.The extrinsic parameters such as parasitic capacitance,inductance and resistance are extracted under the pinch-off condition.The intrinsic parameters of the small-signal equivalent circuit (SSEC) have been extracted including gate forward and backward conductance.Different optimization algorithms such as PSO,Quasi Newton and Firefly optimization algorithm is applied to the extracted parameters to minimize the error between modeled and measured S-parameters.The different optimized SSEC models have been validated by comparing the S-parameters and unity current-gain with TCAD simulations and available experimental data from the literature.It is observed that the Firefly algorithm based optimization approach accurately extracts the small-signal model parameters as compared to other optimization algorithm techniques with a minimum error percentage of 1.3％.     

Influence of GaN material characteristics on device performance for blue and ultraviolet light-emitting diodes

An analysis of blue and near-ultraviolet (UV) light-emitting diodes (LEDs) and material structures explores the dependence of device performance on material properties as measured by various analytical techniques. The method used for reducing dislocations in the epitaxial III-N films that is explored here is homoepitaxial growth on commercial hybride vapor-phase epitaxy (HVPE) GaN substrates. Blue and UV LED devices are demonstrated to offer superior performance when grown on GaN substrates as compared to the more conventional sapphire substrate. In particular, the optical analysis of the near-UV LEDs on GaN versus ones on sapphire show substantially higher light output over the entire current-injection regime and twice the internal quantum efficiency at low forward current. As the wavelength is further decreased to the deep-UV, the performance improvement of the homoepitaxially grown structure as compared to that grown on sapphire is enhanced.