光纤通信产业调查与发展我国光纤通信产业政策建议

本文首先对国内外光纤通信发展现状及我国光纤通信产业发展状况作了较全面的阐述，然后对我国光纤通信产业目前存在的问题进行了探讨，最后对如何发展我国光纤通信产业提出了建议。     

光纤通信的现状及发展

光纤通信技术目前处于一个高速发展时期,本文回顾了光纤通信的发展历程,指出了光纤通信的特点,并对不同类型的通信方式进行了比较,说明了我国光通信的现状,并结合世界上光纤通信的发展趋势探讨了我国光纤通信研究现状及其发展。     

光纤通信的现状及发展

光纤通信技术目前处于一个高速发展时期,本文回顾了光纤通信的发展历程,指出了光纤通信的特点,并对不同类型的通信方式进行了比较,说明了我国光通信的现状,并结合世界上光纤通信的发展趋势探讨了我国光纤通信研究现状及其发展。     

信息社会的曙光

对国外光纤通信的发展进程进行了阐述，在介绍我国光纤通信发展现状的基础上，阐明了对我国光纤通信发展战略的一些看法。     

信息社会的曙光——全球光纤通信的现状与发展

对国外光纤通信的发展进程进行了阐述,在介绍我国光纤通信发展现状的基础上,阐明了对我国光纤通信发展战略的一些看法。     

我国的光纤通信及其发展

本文简要概括了国外光纤通信的当前发展水平,着重介绍了我国在发展光纤通信方面作出的努力,提出了为使我国光纤通信迅速发展而亟待解决的若干问题。     

大力推广光纤通信在我国的应用

本文根据全国光纤通信工作会议资料整理而成,报导了我国光纤通信的现状、战略任务和措施;叙述了光纤通信的发展趋势。     

巨大的中国光通信市场

1.中国光通信的发展 中国从七十年代开始光纤通信的研究。1975年,电子工业部决定将部属第34研究所从成都迁建桂林,专门从事光纤通信系统与整机的研究开发工作。从此拉开了我国光纤通信研究的序幕。其后,邮电部等其它部委也相继开始了光纤通信的研究。目前,我国已拥有一大批具有较强技术实力的光纤通信科研院所与高等院校。     

探究电信光纤通信技术的优势

目前我国信息全球化水平在不断的提高,电信光纤技术在一定程度上得到了有效的发展,从而加深了人们对电信光纤通信技术的认识以及依赖程度。电信光纤通信技术能够提高信息传输的速度,以及远距离传输的功能。本文主要简单介绍了光纤通信的定义和光纤通信的构成,并就我国光纤通信的发展现状和未来发展的情况进行了简单的介绍。     

DWDM光通信发展的热点技术

从我国光纤通信的现状和 DWDM技术的应用出发 ,对 DWDM光纤通信热门课题予以了讨论和分析 ,并回顾了我国光纤通信的发展历程 ,指出了我国未来在 DWDM技术领域存在巨大的发展空间和由此带来的市场前景     

计算机稽核管理信息系统的组建

阐述了金融机构稽核管理的重要性，提出了“稽核管理信息系统”的设计思想与实现方法，主要包括系统目标、系统结构、系统安全以及系统特点。此系统应用于金融机构的事后监督业务，能有效地防范和化解金融风险。     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Group 2 element and related compounds as chemical vapour deposition precursors for high-temperature superconducting metal oxides

The advent of high-temperature superconducting metal oxides (SMOs) has prompted an increasing number of studies aimed at the development of new routes to their syntheses, in particular in the form of thin films. The preferred method in this regard has been that of chemical vapour deposition (CVD); however, significant difficulties have been associated with the efficacy of commercial precursors for the group 2 metals, in particular those of the bis(β-diketonates) of barium, whose co-ordinative unsaturation leads to cluster formation. The development of alternative β-diketonate precursor systems has focused upon the synthesis of stable Lewis acid-base complexes by either inter- or intramolecular stabilisation. The results of these studies are described herein, along with a review of the research to date on non-β-diketonate derivatives of the group 2 metals, including organometallic, halide, amide, carboxylate and alkoxide compounds. On the basis of the results to date, a series of goals for the synthesis of the ideal precursor are discussed.     

基于卷积神经网络的PCB板通用分拣算法

传统PCB板分拣算法特征点由人工提取,位姿计算方法单一,且存在预处理步骤繁琐、样本要求高、位姿精度低、适用性低等缺点。为解决上述问题,文中提出一种基于卷积神经网络的PCB板通用分拣算法。改进的CaffeNet网络模型自动学习大量图片数据中PCB板的深层特征,并完成PCB板自动识别分类。运用改良RANSACS算法提高ORB算法特征点匹配正确率,采用最小二乘法计算模板图片与待匹配图片间角度差,以实现各类PCB板快速定位。实验证明,算法分拣正确率达到99.35%,具有良好的准确率和分拣效率。     

Design and experimental study of compensation fitting on the angle-tuned filters

For a 100 GHz DWDM angle-tuned filter with low polarization dependent loss, the insertion loss and the Gaussian- transformation tendency of the transmission spectrum will become more serious as the incident angle is increased. It is because of that the optical path and the transmission modes of the thin film filter will change when the incident angle is varied. According to the thin film matrix theory, the analysis model is established, the displacement change of the transmis- sion field is simulated, and a dynamic compensation fitting is also designed and fabricated in the paper. The experimental results show that it can effectively reduce the insertion loss and the phenomenon of Gaussian process. Using the compen- sation fitting, the tunable range of the filter is at about 20 nm which coincides with the theoretical design.     

光电催化降解化学镀铜废水中的EDTA

PCB制造过程中的化学镀铜废水,由于络合剂EDTA（乙二胺四乙酸二钠）的存在,影响着末端处理使用化学沉淀方法的处理效果。本文采用溶胶-凝胶法,以泡沫镍片为载体,制得负载型纳米TiO₂催化剂。以制备的负载型催化剂为工作电极,以波长为275.3 nm的紫外灯为光源,选择降解物为PCB化学镀铜废水中的EDTA。用自制的光电催化降解反应装置,对光电催化降解PCB化学镀铜废水中的EDTA进行研究;用消解法测定目标物EDTA降解过程的COD变化以计算其降解效率;探讨影响含EDTA废水降解效率的一些因素:如外加电压、溶液PH值、温度等。结果表明,用负载型纳米TiO₂催化剂对化学镀铜废水中的EDTA进行光电催化降解有一定的效果。     

Study of waveguide coupling efficiency in hybrid silicon lasers

This paper presents a new method to increase the waveguide coupling efficiency in hybrid silicon lasers. We find that the propagation constant of the InGaAsP emitting layer can be equal to that of the Si resonant layer through improving the design size of the InP waveguide. The coupling power achieves 42% of the total power in the hybrid lasers when the thickness of the bonding layer is 100 nm. Our result is very close to 50% of the total power reported by Intel when the thickness of the thin bonding layer is less than 5 nm. Therefore, our invariable coupling power technique is simpler than Intel＇s.     

SIMOX材料顶层硅膜中残余氧的行为

利用光致发光谱 (PL)和二次离子质谱 (SIMS)检测了不同退火条件下处理的 SIMOX材料的顶层硅膜 .实验结果显示 ,SIMOX顶层硅膜的 PL 谱有三个峰 :它们是能量为 1.10 e V的 a峰、能量为 0 .77e V的 b峰和能量为0 .75 e V的 c峰 .与 RBS谱相比 ,发现 a峰峰高及 b/ a峰值比是衡量顶层硅膜单晶完整性的标度 .谱峰 b起源于SIMOX材料顶层硅膜中残余氧 ,起施主作用 .SIMS测试结果显示 ,谱峰 c来源于 SIMOX材料顶层硅膜中的碳和氮 .     

电磁波在均匀磁化等离子体中的衰减与反射

等离子体覆盖住金属导体,通过等离子体对入射电磁波的折射、吸收,使得入射波功率衰减,降低了反射功率,起到减小目标RCS的作用.对于均匀磁化等离子体,针对介电常数与等离子体粒子密度、外加磁场强度、电子碰撞频率以及入射波频率的关系,仿真计算了不同的等离子体粒子密度、外加磁场强度、电子碰撞频率以及不同等离子体厚度在毫米波波段对电磁波的衰减和反射特性的影响.     

一种简化的火焰夹角计算方法及其遥测布站应用

火箭尾焰造成的信号衰减是运载火箭设计及地面测量点位选择重点考虑的问题之一。针对遥测设备人员难以知悉目标飞行姿态参数,无法采用传统方法计算火焰夹角的问题,在推导测站位置、火焰夹角及火箭飞行过程俯仰角间数学关系的基础上,提出了一种采用空间两向量夹角余弦反算火焰夹角的方法并进行实测数据验证。简化方法不需要目标飞行姿态参数,与传统方法比较计算结果误差小于0.1°,满足设备布站分析的精度要求。在设备布站前,应用此方法对目标跟踪过程中的火焰夹角进行计算,进一步对火焰影响信号接收情况进行预估,提高了设备站址选择的合理性。