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设计并制作了双异质结双平面掺杂的Al0 .2 4 Ga0 .76 As/ In0 .2 2 Ga0 .78As/ Al0 .2 4 Ga0 .76 As功率PHEMT器件,采用双选择腐蚀栅槽结构,有效提高了PHEMT器件的输出电流和击穿电压.对于1μm栅长的器件,最大输出电流为5 0 0 m A/ mm ,跨导为2 75 m S/ m m,阈值电压为- 1 .4 V,最大栅漏反向击穿电压达到了33V .研究结果表明,在栅源间距一定时,栅漏间距对于器件的输出电流、跨导和击穿电压有很大关系,是设计功率PHEMT的关键之一. 相似文献
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为提高PHEMT性能,从改进PHEMT结构出发,采用介质栅器件结构,研制了0.25 μm介质栅PHEMT器件,并与Win公司生产的0.25 μm非介质栅器件的频率特性、开态击穿和功率特性进行了比较.介质栅器件选用了合适的栅凹槽的宽度和掺杂浓度,提高了开态击穿电压.这意味着可以在更高的电压下稳定的工作而不被烧毁.0.25 μm介质栅器件的截止频率达到19 GHz,开态击穿电压超过11 v,功率密度超过1 W/mm,表现出了较非介质栅器件更为优异的功率性能.最后分析了介质栅器件的优势和有待改进的方向,优化器件栅凹槽形貌,调整栅帽下面介质的厚度,使用双场板结构等可以进一步提升器件性能. 相似文献
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MBE生长的高质量AlGaAs/InGaAs双δ掺杂PHEMT结构的材料 总被引:2,自引:2,他引:0
用 MBE方法制备的 PHEMT微结构材料 ,其 2 DEG浓度随材料结构的不同在 2 .0— 4.0× 1 0 12 cm- 2 之间 ,室温霍耳迁移率在 50 0 0— 650 0 cm2 · V- 1· s- 1之间 .制备的 PHEMT器件 ,栅长为 0 .7μm的器件的直流特性 :Idss~ 2 80 m A/mm,Imax~ 52 0— 580 m A/mm,gm~ 32 0— 40 0 m S/mm,BVDS>1 5V( IDS=1 m A/mm) ,BVGS>1 0 V,微波特性 :P0 ~ 60 0— 90 0 m W/mm,G~ 6— 1 0 d B,ηadd~ 40— 60 % ;栅长为 0 .4μm的器件的直流特性 :Imax~ 80 0 m A/mm,gm>40 0 m S/mm. 相似文献
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采用南京电子器件研究所的 76 mm Ga As的 PHEMT单片技术 ,进行了 1 6 .5~ 2 0 GHz的 PHEMT MMIC的设计与研制。其中 PHEMT器件选用双平面掺杂 Al Ga As/In Ga As/Ga As PHEMT异质结结构 ,0 .5μm栅长的 76 mm Ga As工艺制作。在 MMIC设计中 ,准确的器件模型是设计 Ku波段单片的关键。为了保证单片研制的成功 ,利用 Agilent软件进行了 PHEMT器件模型的提取。模型可直接应用于 HP- EESOF Libra软件中 ,进行线性和非线性分析。PHEMT单片放大器采用三级有耗匹配放大器拓扑 ,输入和输出端口匹配至 50 Ω,CPW形式引… 相似文献
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设计了一种GaAs PHEMT低噪声器件。通过电子束直写手段实现了0.15μm Y型栅,对栅型优化以减小器件栅电阻和栅寄生电容。采用高In含量的沟道设计以改善沟道电子输运特性,采用InGaAs/GaAs复合帽层以改善欧姆接触特性,并通过低噪声工艺流程制作了4×50μm GaAs PHEMT器件。测试结果表明,器件fT达到80GHz,在10GHz处最小噪声系数小于0.4dB,相关增益大于10dB。对于0.15μm栅长GaAs PHEMT器件来说,这是很好的结果。 相似文献
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《固体电子学研究与进展》2001,(3)
南京电子器件研究所于 2 0 0 0年进行了 Ga As功率 PHEMT的研究开发 ,完成了“WC2 0 0 3型高电子迁移率功率晶体管”项目的设定和 Ku波段 1 0 W功率 PHEMT的研制。WC2 0 0 3型器件在 9.4~ 9.9GHz带内 ,输出功率大于 2 .5W,功率增益大于 9.5d B,功率附加效率典型值为 40 % ,带内增益起伏小于± 0 .5d B,该器件的栅宽为 4.8mm。采用两个 9.6mm栅宽功率 PHEMT管芯合成研制的 Ku波段内匹配功率 PHEMT,在 1 0 .5~ 1 1 .3GHz带内 ,输出功率大于 9.8W,带内最大输出功率为 1 0 .9W,功率增益大于 9.9d B,功率附加效率典型值为 40 %… 相似文献
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X波段宽带单片低噪声放大器 总被引:13,自引:1,他引:12
从获取放大器的等噪声系数圆最大半径的角度来进行电路设计,设计了工作于X波段9~14GHz的宽带低噪声单片放大器,采用法国OMMIC公司的0.2μmGaAsPHEMT工艺(fT=60GHz)研制了芯片。在片测试结果为在9~14GHz,噪声系数<2.5dB,最小噪声系数在10.4GHz为2.0dB,功率增益在所需频段9~14GHz大于21dB,输入回波损耗<-10dB,输出回波损耗<-6dB。在11.5GHz,输出1dB压缩点功率为19dBm。 相似文献
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Wu C.S. Pao C.K. Yau W. Kanber H. Hu M. Bar S.X. Kurdoghlian A. Bardai Z. Bosch D. Seashore C. Gawronski M. 《Microwave Theory and Techniques》1995,43(2):257-266
We have demonstrated very good performance, high yield Ka-band multifunctional MMIC results using our recently developed 0.25-μm gate length pseudomorphic HEMT (PHEMT) manufacturing technology. Four types of MMIC transceiver components-low noise amplifiers, power amplifiers, mixers, and voltage controlled oscillators-were processed on the same PHEMT wafer, and all were fabricated using a common gate recess process. High performance and high producibility for all four MMIC components was achieved through the optimization of the device epitaxial structure, a process with wide margins for critical process steps and circuit designs that allow for anticipated process variations, resulting in significant performance margins. We obtained excellent results for the Ka-band power amplifier: greater than 26 dBm output power at center frequency with 4.0% standard deviation over the 3-in. wafer, 2-GHz bandwidth, greater than 20 pet-cent power-added efficiency, over 8 dB associated gain, and over 10 dB linear gain. The best performance for the Ka-band LNA was over 17 dB gain and 3.5 dB noise figure at Ka-band. In this paper, we report our device, process, and circuit approach to achieve the state-of-the-art performance and producibility of our MMIC chips 相似文献
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研制了一款60~90 GHz功率放大器单片微波集成电路(MMIC),该MMIC采用平衡式放大结构,在较宽的频带内获得了平坦的增益、较高的输出功率及良好的输入输出驻波比(VSWR)。采用GaAs赝配高电子迁移率晶体管(PHEMT)标准工艺进行了流片,在片测试结果表明,在栅极电压为-0.3 V、漏极电压为+3 V、频率为60~90 GHz时,功率放大器MMIC的小信号增益大于13 dB,在71~76 GHz和81~86 GHz典型应用频段,功率放大器的小信号增益均大于15 dB。载体测试结果表明,栅极电压为-0.3 V、漏极电压为+3 V、频率为60~90 GHz时,该功率放大器MMIC饱和输出功率大于17.5 dBm,在71~76 GHz和81~86 GHz典型应用频段,其饱和输出功率可达到20 dBm。该功率放大器MMIC尺寸为5.25 mm×2.10 mm。 相似文献
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主要介绍了C波段高增益低噪声单片放大器的设计方法和电路研制结果。电路设计基于Agilent ADS微波设计环境,采用GaAs PHEMT工艺技术实现。为了消除C波段低噪声放大器设计中在低频端产生的振荡,提出了在第三级PHEMT管的栅极和地之间放置RLC并联再串联电阻吸收网络的方法,降低了带外低频端的高增益,从而消除了多级级联低噪声放大器电路中由于低频端增益过高产生的振荡。通过电路设计与版图电磁验证相结合的方法,使本产品一次设计成功。本单片采用三级放大,工作频率为5~6GHz,噪声系数小于1.15dB,增益大于40dB,输入输出驻波比小于1.4∶1,增益平坦度ΔGp≤±0.2dB,1dB压缩点P-1≥10dBm,直流电流小于90mA。 相似文献
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A wideband MMIC power amplifier at W-band is reported in this letter. The four-stage MMIC, developed using 0.1 μm GaAs pseudomorphic HEMT (PHEMT) technology, demonstrated a flat small signal gain of 12.4±2 dB with a minimum saturated output power (Psat) of 14.2 dBm from 77 to 100 GHz. The typical Psat is better by 16.3 dBm with a flatness of 0.4 dB and the maximum power added efficiency is 6% between 77 and 92 GHz. This result shows that the amplifier delivers output power density of about 470 mW/mm with a total gate output periphery of 100 μm. As far as we know, it is nearly the best power density performance ever published from a single ended GaAs-based PHEMT MMIC at this frequency band. 相似文献
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Ka波段功率PHEMT的设计与研制 总被引:1,自引:1,他引:0
报道了Ka 波段功率PHEMT的设计和研制结果。利用双平面掺杂的AlGaAs/InGaAsPHEMT材料,采用0.2 μm 的T型栅及槽型通孔接地技术,研制的功率PHEMT的初步测试结果为:Idss:365 m A/m m ;gm 0:320 m S/m m ;Vp:- 1.0~- 2.0 V。总栅宽为750 μm 的功率器件在频率为33 GHz时,输出功率大于280 m W,功率密度达到380 m W/m m ,增益大于6 dB。 相似文献
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Chu C.-K. Huang H.-K. Liu H.-Z. Lin C.-H. Chang C.-H. Wu C.-L. Chang C.-S. Wang Y.-H. 《Microwave and Wireless Components Letters, IEEE》2007,17(2):151-153
This letter presents a compact X-band high gain and high power four-stage AlGaAs/InGaAs/GaAs pseudomorphic high electron mobility transistor (PHEMT) monolithic microwave integrated circuit (MMIC) high power amplifier (PA). This amplifier is designed to fully match a 50-Omega input and output impedance. Based on 0.35-mum gate-length power PHEMT technology, this PA MMIC is fabricated on a 3-mil thick wafer. While operating under 8 V and 2700-mA dc bias condition, the characteristics of 40-dB small-signal gain, a 10-W continuous-wave saturation output power, and 33% power added efficiency at 9.7GHz can be achieved 相似文献
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运用微波在片测试技术和IC-CAP模型提取软件对总栅宽为850μm PHEMT器件进行了大信号建模,并利用此模型,采用分布式放大器与电抗匹配相结合的方法,制备了一款三级宽带功率放大器。实验测试结果和ADS仿真结果相吻合。其测试结果为:在6~18GHz频段内,平均输出功率Po为33dBm,功率增益Gp在22~24dB之间,功率附加效率PAE在23%~28%之间,输入输出端口电压驻波比VSWR<1.8,稳定性判断因子K>1(在5~19GHz内)。 相似文献
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Chen-Kuo Chu Hou-Kuei Huang Hong-Zhi Liu Che-Hung Lin Ching-Hsueh Chang Chang-Luen Wu Chian-Sern Chang Yeong-Her Wang 《Microwave and Wireless Components Letters, IEEE》2008,18(10):707-709
An X-band high-power and high power added efficiency (PAE), two-stage AlGaAs/InGaAs/GaAs psuedomorphic high electronic mobility transistor (PHEMT) monolithic microwave integrated circuit (MMIC) power amplifier is presented. The amplifier is designed to fully match a 50 Omega input and output impedance. Based on a 0.35 mum gate-length power PHEMT technology, the MMIC is fabricated on a 3 mil thick wafer. Under an 8 V DC bias condition, the characteristics of 17.5 dB small-signal gain, 10 W continuous wave mode saturation output power of 42% PAE, and 12.6 W pulse saturation output power of 52.6% PAE at 9.4 GHz can be achieved. 相似文献
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《Microwave Theory and Techniques》1976,24(6):305-311
Vertical MOS silicon power transistors for microwave power applications have been fabricated using an angle evaporation technique to position the gate electrode on the side of a mesa. These devices have produced 3-W output power at 1.5 GHz as a Class B amplifier and exhibit excellent linearity and noise properties. Device modeling has shown that parasitic capacitances are the chief factor limiting the frequency response, and the prospects for useful devices at 4 GHz are good. 相似文献