直流磁控溅射法制备ZnO:W透明导电薄膜及其性能表征

利用直流磁控溅射法成功地在室温玻璃衬底上制备出了电阻率低、透光率高的掺钨氧化锌（ZnO:W）透明导电薄膜。沉积压强在12-21 Pa之间变化。X射线衍射结果表明实验制备的ZnO:W为六方纤锌矿结构的多晶薄膜,具有垂直于衬底方向的c轴择优取向。沉积压强对ZnO:W薄膜的晶化程度、形貌和电阻率有很大影响,而对其透光率和光学带隙及折射率影响不大。当沉积压强为21 Pa,溅射功率为130 W时,所制备薄膜的电阻率达到最小值1.5×10-4 Ω·cm,其方块电阻、可见光透过率分别为6.8 Ω/□和91.3%。     

制备条件对Ge2Sb2Te5薄膜电学性能的影响

研究了磁控溅射制备Ge2Sb2Te5薄膜时,制备条件诸如功率、气压等对薄膜性能的影响.主要通过测量薄膜方块电阻随退火温度的变化情况,探索Ge2Sb2Te5薄膜的成长机理.实验结果表明,不同溅射功率下制备的薄膜经不同温度退火后方块电阻没有明显的区别,而随着溅射气压的上升,薄膜方块电阻随退火温度的增加,下降的速率增加,意味着由面心立方结构转变为六方结构所需的结晶温度降低.     

制备条件对Ge2Sb2Te5薄膜电学性能的影响

研究了磁控溅射制备Ge2Sb2Te5薄膜时,制备条件诸如功率、气压等对薄膜性能的影响.主要通过测量薄膜方块电阻随退火温度的变化情况,探索Ge2Sb2Te5薄膜的成长机理.实验结果表明,不同溅射功率下制备的薄膜经不同温度退火后方块电阻没有明显的区别,而随着溅射气压的上升,薄膜方块电阻随退火温度的增加,下降的速率增加,意味着由面心立方结构转变为六方结构所需的结晶温度降低.     

制备条件对Ge2Sb2Te5薄膜电学性能的影响

研究了磁控溅射制备Ge2Sb2Te5薄膜时，制备条件诸如功率、气压等对薄膜性能的影响. 主要通过测量薄膜方块电阻随退火温度的变化情况，探索Ge2Sb2Te5薄膜的成长机理. 实验结果表明，不同溅射功率下制备的薄膜经不同温度退火后方块电阻没有明显的区别，而随着溅射气压的上升，薄膜方块电阻随退火温度的增加，下降的速率增加，意味着由面心立方结构转变为六方结构所需的结晶温度降低     

溅射压强对钛镓共掺杂氧化锌透明导电薄膜性能的影响

利用直流磁控溅射工艺在玻璃衬底上制备出了透过率高、电阻率较低的钛镓共掺杂氧化锌透明导电薄膜(TGZO)。研究了溅射压强对TGZO薄膜结构、形貌和光电性能的影响。研究结果表明,溅射压强对TGZO薄膜的结构和电阻率有重要影响。X射线衍射(XRD)表明,TGZO薄膜为具有c轴择优取向的六角纤锌矿结构多晶薄膜。薄膜的电阻率具有随着溅射压强的增大先减小,后增大的规律,在溅射压强为11Pa时,实验获得的TGZO薄膜晶格畸变最小,电阻率具有最小值1.48×10-4Ω.cm,透过率具有最大值94.3%。实验制备的TGZO薄膜附着性能良好,在400～760nm波长范围内的平均透过率都高于90%。     

透明导电薄膜ZnO∶Zr的制备及特性研究

利用直流磁控溅射法在玻璃衬底上制备出了可见光透过率高、电阻率低的ZnO∶Zr(ZZO)透明导电薄膜.讨论了溅射功率对ZZO薄膜结构、形貌及光电性能的影响.研究结果表明,溅射功率对ZZO薄膜的结构和电学性能有很大影响.实验制备的ZZO薄膜为六角纤锌矿结构的多晶薄膜,且具有垂直于衬底方向的c轴择优取向.在溅射功率为115 W时,ZZO薄膜的电阻率具有最小值1.9×10-3 Ω*cm,其霍尔迁移率和载流子浓度分别为18.7 cm2*V-1*s-1和2.07×1020 cm-3.所制备ZZO薄膜样品具有良好的附着性能,其可见光区平均透过率均超过92%.     

利用椭偏仪研究氢气退火处理对ZnO-Ga薄膜光学性能的影响

通过溶胶凝胶技术制备了不同Ga掺杂含量的ZnO透明导电薄膜,研究了Ga掺杂对GZO薄膜结构、电学及光学性能的影响.从X射线衍射光谱分析,所有薄膜均表现为六方纤锌矿结构,经过氢气退火处理之后,薄膜的电学性能均得到提高,当Ga掺杂含量为5 at%时,得到薄膜的电阻率为3.410×10-3 Ω·cm.利用可变入射角椭圆偏振光谱仪(VASE)在270~1 600 nm波长范围内研究了GZO薄膜折射率和消光系数的变化,采用双振子模型对实验数据进行拟合.     

制备工艺对ITO薄膜的电阻率及沉积速率的影响

采用射频磁控溅射法制备了氧化铟锡[ITO,In2O3:SnO2=90:10(质量比)]薄膜,详细探讨了溅射气氛氧氩体积比、溅射功率及溅射气压对ITO薄膜电阻率和沉积速率的影响。结果表明:溅射工艺参数对ITO薄膜电阻率和沉积速率的影响十分明显。随着氧氩体积比的增大,样品的电阻率显著增大,沉积速率下降;随着溅射功率的增加,ITO薄膜的电阻率先减小后略微增大,沉积速率上升;随着溅射气压升高,ITO薄膜的电阻率先减小后增大,当溅射气压增大到较大值时,ITO薄膜的电阻率又开始减小,而沉积速率则先上升后下降。     

基于皮秒激光诱导击穿光谱技术的镓酸锌薄膜的快速定量分析研究

采用射频磁控溅射方法在不同的溅射功率下制备了掺杂Ga元素的ZnO透明导电薄膜材料(ZnGa₂O₄, GZO),在GZO薄膜的制备过程中,溅射功率会对样品的组分配比产生影响,从而导致GZO薄膜的性能产生差异。文中利用皮秒激光诱导击穿光谱技术(PS-LIBS)对GZO薄膜进行了微烧蚀分析,对GZO薄膜的关键元素浓度比进行了快速定量分析研究。结果表明GZO薄膜的光学性能与元素谱线强度比之间存在一定的联系,随着溅射功率的增加,Zn/Ga的谱线强度比值与浓度比呈现出一致的变化,Ga元素的含量与样品的禁带宽度变化一致。同时,使用玻耳兹曼斜线法与斯塔克展宽法对等离子体温度与电子密度进行了计算。所有结果表明,PS-LIBS技术可以实现GZO薄膜关键组分配比的快速分析,为磁控溅射法制备GZO薄膜的工艺现场的快速性能分析、制备参数的实时优化提供了技术参考。     

溅射功率对PET衬底上ZnO:Zr薄膜性能的影响

采用直流磁控溅射法在室温下柔性PET衬底上制备出了高质量的掺锆氧化锌(ZnO:Zr)透明导电薄膜。研究了溅射功率对ZnO:Zr薄膜表面形貌、结构、电学和光学性能的影响。溅射功率对ZnO:Zr薄膜的电阻率影响显著:当溅射功率从60W增加到90W时,薄膜的电阻率先减小后增大,在最佳功率80W时,电阻率具有最小值3.67×10-3Ω·cm。所制备的ZnO:Zr薄膜具有良好的附着性能,在可见光区平均透射率高达90%。     

真空退火温度对GZO/Ag/GZO三层膜性能的影响

室温下在玻璃衬底上,采用射频磁控溅射GZO(Ga掺杂ZnO)膜和离子束溅射Ag膜的方法,制备了GZO/Ag/GZO三层膜,分析了真空退火温度对样品结构、光学、电学性能的影响。结果显示:随着退火温度的升高,Ag层的结构得到明显改善,但GZO层结晶度受到了Ag扩散的影响。经过350℃退火后,样品在可见光区平均透射率达92.63%,电阻率由8.0×10–5Ω·cm降至4.0×10–5Ω·cm。     

Enhancement in light extraction efficiency of organic light emitting diodes using double-layered transparent conducting oxide structure

We examined double-layered transparent conducting oxide (TCO) anode structures consisted of zinc-doped indium oxide (IZO) over the gallium-doped zinc oxide (GZO), and IZO over the GZO with electrochemical treatment. In bottom type OLEDs, power efficiency and current efficiency were enhanced by a factor of 1.50 and 1.14 at a current density of 10 mA/cm² in IZO/GZO anode structure, compared to the only IZO anode structure. Due to the reduced sheet resistance of the IZO/GZO TCO surface, the operating voltage of the OLED with IZO/GZO anode structure was lowered, leading to mostly enhance power efficiency. More enhanced in power efficiency and current efficiency by a factor of 1.21 and 1.25 at a current density of 10 mA/cm² were achieved in IZO/GZO anode structure with electrochemical treatment, compared to the IZO/GZO anode structure due to the change of the surface morphology of the GZO and the existence of the nanoporous layer beneath the GZO surface by an electrochemical treatment. In total, double-layered IZO/GZO anode structure with electrochemical treatment was revealed at an enhancement factor of 1.80 in power efficiency and 1.42 in current efficiency, compared to the only IZO anode structure.     

（英）磁控溅射制备纳米晶GZO/CdS双层膜及GZO/CdS/p-Si异质结光伏器件的研究

本文中,采用磁控溅射制备Ga掺杂ZnO (GZO)/CdS双层膜在p型晶硅衬底上以形成GZO/CdS/p-Si异质结器件。纳米晶GZO/CdS双层膜的微结构、光学及电学特性,通过XRD、SEM、XPS、紫外-可见光分光光度计和霍尔效应测试系统表征。GZO/CdS/p-Si异质结J-V曲线显示良好的整流特性。在±3V时,整流比IF/IR(IF和IR分别表示正向和反向电流)已达到21。结果表明纳米晶GZO/CdS/p-Si异质结具有好的二极管特性,在反向偏压下获得高光电流密度。纳米晶GZO/CdS/p-Si异质结显示明显的光伏特性。由于CdS晶格常数在GZO和晶Si之间,它能作为一个介于GZO和晶Si之间的缓冲层,能有效地减少GZO和p-Si之间的界面态。因此,我们获得了GZO/CdS/p-Si异质结明显光伏特性。     

Spray deposited ZnO and Ga doped ZnO based DSSC with bromophenol blue dye as sensitizer: Efficiency analysis through DFT approach

Dye sensitized solar cells based on spray deposited ZnO and Ga doped ZnO (GZO) thin film were fabricated with Bromophenol Blue as the photo sensitizer. XRD results show the hexagonal wurtzite phase of ZnO and GZO thin films with c-axis growth orientation, and the diminished crystalline nature of GZO thin film as the effect of doping. FE-SEM results revealed the morphology induced internal light interaction capability of GZO thin film for better harvesting of photon energy. Photovoltaic studies showed that the DSSC fabricated with GZO thin film has obtained enhanced power conversion efficiency (1%) than the ZnO thin film based DSSC (0.2%), as a result of Ga doping. To investigate the obtained photovoltaic performance of the device, the electronic properties of Bromophenol Blue dye were theoretically analyzed with Density Functional Theory (DFT) study.     

Enhancement of the hydrogen gas sensitivity by large distribution of c-axis preferred orientation in highly Ga-doped ZnO polycrystalline thin films

The hydrogen gas sensing properties of highly Ga-doped ZnO (GZO) polycrystalline thin films deposited by radio-frequency magnetron sputtering have been studied. The relationship between the microstructural properties of preferred c-axis oriented thin films and the hydrogen gas sensing properties is described. The crystallite size and the preferred orientation distribution were characterized by X-ray diffraction. The crystallite size increased and the preferred orientation distribution decreased with increasing film thickness. In order to control the crystallite size and the c-axis orientation separately, a highly oriented ZnO template layer with different thickness was employed for deposition of 30-nm-thick GZO films. The c-axis orientation of these films were nearly comparable each other, while the crystallite size increased significantly with increasing thickness of the ZnO templates. The hydrogen gas sensitivity at an operating temperature of 330 °C increased slightly with decreasing crystallite size, while the sensitivity was dramatically enhanced by increasing the preferred orientation distribution. It is therefore proposed that the c-axis orientation plays an important role in determining the sensitivity of the hydrogen gas sensor.     

Characteristics of In2O3:Sn films prepared by reactive r-f sputtering

Oxide films were prepared by sputtering onto various substrates from alloy targets ranging in composition from 90-In;10-Sn to 70-In;30-Sn by weight. Sputtering atmospheres varied from 100 percent argon to 100 percent oxygen. As-sputtered resistances ranged from ~ 300 Ω/□ to > 7 x 10⁶ for 2500 Å to 100 Å films respectively. The films were subse-quently annealed in reducing and oxidizing atmospheres for times up to 100 minutes and temperatures up to 500°C. Final resistances were typi-cally ~ 200 Ω/□ for a 400 Å-thick film annealed in forming gas; oxygen was somewhat less effective in lowering the resistance. The white-light transmission of the as-sputtered films varied from one percent to 90 percent as compared with the uncoated microscope slide. Annealing typically increased the transmission to 90–95 percent. Data are also presented on the effects of the film thickness and the substrate for both the as-sputtered and the annealed-film characteristics.     

The effect of transparent conductive nanocrystalline oxide thin layer on performance of UV detectors fabricated on Fe-doped GaN

Two kinds of metal-semiconductor-metal (MSM) Schottky UV detectors with and without an insertion layer of transparent conductive nanocrystalline oxide were fabricated on Fe-doped semi-insulating GaN epilayers. It is found that the optical responsivity of the detectors can be significantly improved by two orders of magnitude by inserting a thin layer of Ga-doped nanocrystalline ZnO (GZO) between metal electrode and Fe-doped GaN. Such improvement is suggested to be associated with the valence-band discontinuities and efficient suppression recombination of traps induced by Fe impurities in GaN due to the insertion of a thin layer of GZO.     

溅射制作埋嵌电阻的TaN薄膜电阻率的控制

文章介绍的是由射频（RF）溅射反应沉淀制备的TaN薄膜,以及在各种N2/Ar气流比例和工作压力下测试其电阻率变化。从X射线衍射（X-RD）图像和四点探针测试仪测试的TaNx薄膜方块电阻来看。研究发现,TaNx薄膜电阻率发生突变的原因主要是由于N2分压的作用而使TaNx薄膜晶体结构发生了变化。当六边形结构的TaN薄膜变成面心立方行结构时,薄膜电阻从16Ω/sq增加到1396Ω/sq。但是,在晶体结构不变和一定的工作压力范围内,我们能把TaN薄膜的电阻率控制在69Ω/sq到875Ω/sq范围内。在扫描电子显微镜（SEM）成像中,晶粒尺寸随着工作压力的增加将会有所减小。     

磁控溅射氧化钛薄膜的电学特性研究

采用直流磁控溅射法在K9玻璃上制备了不同溅射温度和氧气流量的氧化钛(TiOx)薄膜.采用XPS、霍尔效应测试仪对薄膜的组份、载流子浓度和迁移率进行了测试,发现随着溅射氧气流量的增大,薄膜中的氧元素比例增大,载流子浓度减小,迁移率增大.分析了TiOx薄膜的电阻温度系数(TCR)与溅射温度和氧分压的关系,薄膜的电阻率从0....