共查询到11条相似文献,搜索用时 53 毫秒
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摩擦强度对薄膜表面形态的作用:原子力显微镜下的观察 总被引:2,自引:2,他引:0
展示了摩擦强度对聚酰亚胺薄膜表面形态的影响,原子力显微图像显示,机械摩擦会使聚酰亚胺薄膜表面上形成微沟槽,这些沟槽的表面具有丰富的表面精细构造。原子显微图像还揭示了机械摩擦可以改变被磨擦聚酰亚胺膜的表面形态。 相似文献
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Watari F 《Journal of electron microscopy》1999,48(5):537-544
Atomic force microscopy was applied to the in-situ observation of the etching process of human teeth by acid agents. The change of surface morphology was observed consecutively before and during etching for the same area in the same specimen. The course of the etching process in enamel from dissolution of smear layer just after injection of acid agent, appearance of enamel prisms and progress of demineralization were quantitatively analysed for three fundamental acid agents of 2% phosphoric acid, 10% citric acid and 10% polyacrylic acid. Then the depth profile, etching amount, etching rate and thickness of smear layer were evaluated. Observation by scanning electron microscopy was also done and compared with the results by atomic force microscopy. 相似文献
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C. Guilln M. A. Martínez A. Rodríguez J. Herrero M. T. Gutirrez 《Progress in Photovoltaics: Research and Applications》1996,4(6):439-446
The morphology of CdS-indium tin oxide (ITO) and CdS-ZnO bilayers has been investigated by atomic force microscopy in order to obtain a better understanding of their behaviour as window coatings in solar cells. Chemical bath-deposited CdS layers with t hicknesses ranging between 0.05 and 0.12 μm and RF-magnetron-sputtered ITO and ZnO films have been independently analysed before the study of the combined materials. A CdS thickness below 0.1 μm has been found to be optimal for avoiding the adhesi on of large solution particles from the chemical bath, and thus for achieving a homogeneous CdS layer useful as a polycrystalline substrate to improve the transparent conductive oxide (TCO) grain size. 相似文献
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Device and interconnect electrical failures often occur in the form of short or open circuits which produce hot or cold spots under voltage bias. With the minimum device feature size shrinking to 0.25 μm and less, it is impossible to locate the exact position of defects by traditional thermal or optical techniques such as infra-red emission thermometry, liquid crystals or optical beam induced current. We have used a temperature-sensing probe in an atomic force microscope to locate a hot spot created by a short-circuit defect between the gate and the drain of a Si MOSFET with a spatial resolution of about 0.5 μm. The technique has the potential to produce spatial resolutions in the range of 0.05 μm and efforts are underway to reach this goal 相似文献
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Characteristics of local nanolithography on oxidative titanium dots and wires were studied using an amplitude modulation atomic force microscopy in the non-contact mode. Nanolithographic experiments were conducted to investigate the influence that different experimental parameters had on the height, the width, the growth rate, the morphology, and the composition of the nanostructures using Auger electron spectroscopy. The results indicate that anodization time, applied voltage, and tip-sample distance are proportional to the heights and widths of the dots. When the tip-sample distance was too close during continued anodization, concave dots appeared because the oxide that enclosed the tip. Carbon nanotube probe fabricated dots are also presented and compared. 相似文献
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CSPM 930b型多功能扫描探针显微镜经常需要进行手动激光光路调整。该仪器使用说明书[1] 介绍的调整方法可操作性差、手续繁琐、过程冗长 ,且难以判断激光束是否准确照射到微悬臂针尖背面的镀金层上 ,往往造成误判而导致微悬臂针尖被撞断裂。而且 ,按照原有方法操作者需要长时间全神贯注观察激光斑 ,使用者眼睛极易疲劳甚至造成损伤。笔者使用该仪器过程中 ,对光路调整方法进行了大量试验 ,摸索出了一套操作方便 ,容易准确判断针尖位置的有效方法。现总结交流如下。调整方法CSPM 930b扫描探针显微镜AFM部分激光光路如图 1所示。… 相似文献
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