生长于Pt/Ti/SiO_2/Si衬底的Zn_xNi_((1-x))Mn_2O_4薄膜的结构与光学性质（英文）

采用化学溶液法在Pt/Ti/SiO_2/Si衬底上生长了Zn_xNi_((1-x))Mn_2O_4(ZNMO,x=0,0.05,0.1,0.15,0.2,0.25)尖晶石氧化物薄膜。X射线衍射(XRD)与场发射扫描电子显微镜(FESEM)分析结果表明,Zn的掺杂浓度对ZNMO薄膜的结晶性和微结构有明显影响。用椭圆偏振光谱仪测量分析了ZNMO薄膜在300-1 100 nm波段的光学常数,并讨论了Zn掺杂对折射率n和消光系数k的影响。在薄膜的拉曼光谱中观测到两个峰A1 g与F2g,A1 g模式的相对峰位随着Zn的掺杂浓度x的增大而减小。由于晶格应变与晶格失配,拉曼峰峰位随Zn掺杂浓度的变化而轻微移动。     

Mg_xZn_(1-x)O单晶薄膜和MgZnO/ZnO异质结构的光学性质

报道了利用等离子辅助分子束外延技术,在蓝宝石c平面上外延生长的Mgx Zn1 - x O单晶薄膜以及Mg Zn O/Zn O异质结构的光学性质.室温下随着Mg浓度增加,合金薄膜样品的发光峰与吸收边均向高能侧移动.研究了样品紫外发光的起因,将Mgx Zn1 - x O合金薄膜的发光归结为束缚激子的复合.在Mg0 .0 8Zn0 .92 O/ Zn O样品中,观察到了分别来自于Zn O层和Mg Zn O盖层的发光和吸收,并将其归因于来自Zn O层的自由激子和Mg Zn O盖层的束缚激子发射     

MgxNi1-xMn2O4薄膜结构与电学特性研究

采用化学溶液沉积法在Al_2O_3衬底上生长了Mg_xNi_(1-x)Mn_2O_4(MNM,x=0,0.05,0.10,0.15,0.20)薄膜.通过X射线衍射仪和场发射扫描电子显微镜研究了Mg掺杂浓度对MNM薄膜的结构特性的影响,MNM薄膜均匀致密,具有良好的结晶性,为单一立方尖晶石结构.变温电流-电压特性研究显示,MNM薄膜的电输运特性符合小极化子变程跳跃电导模型,同时获得了不同Mg掺杂浓度的MNM薄膜的电阻率ρ、特征温度T_0和电阻温度系数α.研究结果表明,Mg的掺杂对MNM薄膜的结构和电学特性都有一定的影响.     

Pb(Mg1/3Nb2/3)O3-0.3PbTiO3单晶紫外可见近红外光学性质

通过温度依赖的透射和反射光谱研究了在准同型相界附近的Pb(Mg_(1/3)Nb_(2/3))O_3-0.3PbTiO_3(PMN-0.3PT)单晶光学性质.这种禁带宽度随温度范围不同变化规律不同现象,揭示了PMN-PT单晶温度依赖的复杂相结构.禁带宽度Eg在303 K是3.25 e V,临界点Ea是3.93 e V,临界点Eb是4.65 e V,它们随着温度的上升而下降,在453 K禁带宽度Eg是3.05 eV,临界点Ea是3.57 eV,临界点Eb是4.56 eV.这三个跃迁能量Eg、Ea、Eb分别对应从O 2p到Ti d、Ni d、Pb 6p轨道跃迁.它们随温度上升而下降的变化规律可以用晶格热膨胀和电子声子相互作用理论来解释.通过Tauc-Lorentz色散模型拟合得到了303 K到453 K温度范围的Pb(Mg_(1/3)Nb_(2/3))O3-0.3PbTiO_3单晶光学常数及其随温度的变化规律,发现折射率n随着温度的升高而升高.     

不同浓度Ti掺杂Ca2Si电子结构及光学性质的研究

采用第一性原理方法计算不同Ti含量Ca_2Si的几何结构、能带结构、电子态密度及光学性质。几何结构和电子结构的计算结果表明,Ti掺杂使Ca_2Si的晶格常数a增大,b、c减小,晶胞体积减小。Ca_(2-x)Ti_xSi的带隙变宽,其中掺杂浓度为4.2%时带隙最大为0.55 eV,费米面进入导带,导电类型为n型。Ti的掺入削弱了Ca的3d态电子贡献,费米能级附近电子态密度仍主要由Ca-3d态电子贡献。光学性质的计算结果表明,Ti掺入后介电函数虚部、吸收系数向低能端偏移,光学跃迁强度减弱,反射率在E=0 eV处增大。     

NaPd3O4的电子结构和光学性质

用第一性原理对金属化合物NaPd3O4进行了电子结构与光学性质的理论研究.结果表明该材料导电的主要原因是由于Pd原子d轨道电子的贡献,氧原子P轨道电子对导电性也有影响,实质上钠原子对这种材料的导电性几乎没起作用,并且在O原子和Pd原子之间存在着离子键.基于电子能带结构并对介电函数的虚部作相应的解释,同时对NaPd3O4的反射系数、吸收系数、能量损失系数、折射系数和湮灭系数等光学性质进行了研究.     

Zn掺杂β-Ga2O3薄膜的结构和光学性质

用射频磁控溅射制备了本征β-Ga2O3薄膜及Zn掺杂β-Ga2O3薄膜,研究了Zn掺杂和热退火对薄膜结构和光学性质的影响。与本征β-Ga2O3薄膜相比, Zn掺杂β-Ga2O3薄膜的微结构、光学透过、光学吸收、光学带隙以及光致发光等都发生了显著的变化。退火后的β-Ga2O3薄膜为多晶结构,Zn掺杂以后β-Ga2O3薄膜的光学带隙变窄,薄膜的结晶性变差,薄膜的光学透过降低,薄膜的紫外、蓝光及绿光发射加强。     

Pd/Sb(Mn)薄膜的光学性质研究

本文系统地研究了用固相反应再生长法在Ｐ型ＧａＡｓ衬底上制备的Ｐｄ／Ｓｂ（Ｍｎ）薄膜的光学性质．通过对不同薄膜厚度、材料组分、退火温度和时间下的反射与透射率谱的研究表明,在近红外区存在一个较强的反射峰;当薄膜厚度为５０ｎｍ左右,退火温度在３００℃到３５０℃,钯与锑原子比为１∶１时,可以得到较大的反射和一定的透射,有可能用作垂直腔面发射半导体激光器的Ｐ型边谐振腔镜兼注入电极．     

氧退火对SiO2/Si衬底BST薄膜特性的影响

利用氩离子束镀膜技术和硅平面工艺在经过干氧氧化的硅衬底上制备一层钛酸锶钡薄膜 ,并在氧气中进行不同条件的退火处理 ,然后蒸铝及利用光刻技术制作铝电极而形成 MIOS电容结构 ,研究其物理及电学特性。结果表明 ,氧退火条件对衬底的钛酸锶钡薄膜的物理及电学特性有较为明显的影响。     

Ca_2P_xSi_(1-x)能带结构及光学性质的第一性原理计算

采用基于第一性原理的贋势平面波方法,对不同P掺杂浓度正交相Ca2Si的几何结构、能带结构、态密度和光学性质进行计算,比较不同浓度P掺杂的几何结构、电子结构和光学性质。对不同P含量下Ca2PxSi1-x的几何结构比较研究得出:随着P浓度增加Ca2PxSi1-x的晶格常数a、c减小,b增加,体积减小;掺杂浓度对电子结构的影响主要体现在P掺杂Ca2Si使得费米面向导带偏移,且随着掺杂浓度的增加而更深入地嵌入导带中,费米面附近由Ca-d Si-p及P-p电子构成的导带和价带均向低能方向移动,带隙随着掺杂浓度的增大而增大;掺杂浓度对光学性质同样有较大的影响,Ca2PxSi1-x的静态介电函数、折射率随着P掺杂浓度的增加而增加,而反射谱随着P掺杂浓度的增加而减小。适当的P掺杂能够提高Ca2Si对光的吸收系数和折射率,降低光的反射,提高了Ca2Si的光电转换效率。     

The annealing effect for structural, optical and electrical properties of dysprosium–manganese oxide films grown on Si substrate

Samples of (Dy–Mn) oxide thin films were prepared on quartz and Si(p) substrates for optical and electrical investigations. These samples were annealed at different temperatures and characterised by UV–VIS absorption spectroscopy, X-ray fluorescence (XRF) and X-ray diffraction (XRD). The XRF spectrum was used to determine the weight fraction ratio of Mn to Dy in the prepared samples. The XRD shows that Dy oxide and Mn oxide prevent each other to crystallise alone or making a solid solution even at 600 °C. However, compound of DyMnO₃ was formed through the solid-state reaction for T > 800 °C. The ac-conductance and capacitance were studied, as a function of frequency and gate voltage and the fixed and interface charge densities were determined. It was found that the “correlated barrier hopping” CBH model controls the frequency dependence of the conductivity, while the Kramers–Kronig (KK) relations explain the frequency dependence of the capacitance. The parameters of CBH model were determined and show that the ac-conduction in crystalline (Dy–Mn) oxide is realised by bipolaron mechanism, where the barrier height of hopping is equal to the bandgap determined the UV–VIS absorption spectroscopy.     

紫外─远红外宽波段NiMn2O4及Mn1.56Co0.96Ni0.48O4光学性质的研究

Mn-Co-Ni-O作为一种重要的热探测材料被广泛应用于各类领域。作者使用研磨和烧结的方法制备了NiMn2O4和Mn1.56Co0.96Ni0.48O4块体材料。通过X射线衍射实验研究了两种块体的结晶情况,发现半径较大的Co阳离子的加入会导致块体结晶性变差。通过椭圆偏振光谱测试分别获得了NiMn2O4和Mn1.56Co0.96Ni0.48O4在紫外-远红外宽波段的光学常数和介电常数,发现添加离子后二者光学性质(光学常数的强度和峰位)具有一定区别。利用傅里叶光谱仪得到了两种材料的反射光谱,并与用光学常数计算出的数值进行了比较,最后评估了表面粗糙度对反射谱的影响。     

衬底温度对CZTSSe薄膜结构特性的影响

采用热蒸发法制备铟锌锡硫(CZTSSe)薄膜。采用低 温一步 法在300℃衬底温度下制备CZTSSe薄膜;采用两步法,即在衬底温度 分别为300℃制备CZTSSe 薄膜;将衬底温度设定为480℃不变,一步蒸发沉积CZTSSe薄膜。通 过对X射线衍射(XRD)、 扫描电镜(SEM)、拉曼谱对比发现,在300℃低温下一步法和300℃ 、480℃两 步法沉积的薄膜表面粗糙,碎小晶粒较多;在480℃一步高温法制备 的薄膜表面平整, 晶粒大小均匀,3个衍射峰的半高峰宽变窄,薄膜的结晶质量得到 改善,且没有发现其它杂相的拉曼特征峰,沉积出适合作为制备CZTSSe薄膜太阳电池的 吸收层。     

Photoluminescent properties of ZnO thin films grown on SiO2/Si(100) by metal-organic chemical vapor deposition

We report on the photoluminescent (PL) properties of ZnO thin films grown on SiO₂/Si(100) substrates using low pressure metal-organic chemical vapor deposition. The growth temperature of the films was as low as 400°C. From the PL spectra of the films at 10–300 K, strong PL peaks due to free and bound excitons were observed. The origin of the near bandedge emission peaks was investigated measuring temperature-dependent PL spectra. In addition, the Zn O films demonstrated a stimulated emission peak at room temperature. Upon illumination with an excitation density of 1 MW/cm², a strong, sharp peak was observed at 3.181 eV.     

LiNi0.5Mn1.5O4/Li4Ti5O12电池体系的性能研究

采用高温固相法合成了锂离子电池用正极材料LiNi0.5Mn1.5O4和负极材料Li4Ti5O12。通过XRD和SEM分析,并借恒电流充放电和循环伏安法测试了LiNi0.5Mn1.5O4/Li4Ti5O12电池体系的电化学性能。结果表明:LiNi0.5Mn1.5O4和Li4Ti5O12均为尖晶石结构,LiNi0.5Mn1.5O4/Li4Ti5O12电池具有良好的充放电循环可逆性,以0.5C倍率充放电,首次放电比容量可达124.31mAh·g–1,充放电循环50次后,放电比容量在116mAh·g–1以上,容量保持率为93.32%。     

Structural, optical and electrical properties of SnxSy thin films grown by spray ultrasonic

Tin sulfide(Sn_xS_y) thin films were prepared by a spray ultrasonic technique on glass substrate at 300℃. The influence of deposition time t=2, 4, 6, 8 and 10 min on different properties of thin films, such as(XRD), photoluminescence(PL) and(UV) spectroscopy visible spectrum and four-point were investigated. X-ray diffraction showed that thin films crystallized in SnS₂, SnS, and Sn₂S₃ phases, but the most prominent one is SnS₂. The results of the(UV) spectroscopy visible spectrum show that the film which was deposited at 4 min has a large transmittance of 60% in the visible region. The photoluminescence spectra exhibited the luminescent peaks in the visible region, which shows its potential application in photovoltaic devices. The electrical resistivity(ρ) values of Sn_xS_y films have changed from 8.1×10^-4 to 1.62Ω·cm with deposition time.     

Optical properties of thick-film GaN grown by hydride vapor phase epitaxy on MgAl2O4 substrate

A hydride vapor phase epitaxy was employed to grow the 10∼240 μm thick GaN films on a (111) MgAl₂O₄ substrate. The GaN films on a MgAl₂O₄ substrate revealed characteristics of photoluminescence (PL) in impurity doped GaN, which may be due to the out-diffusion and auto-doping of Mg from the MgAl₂O₄ substrate during GaN growth. The PL peak energy of neutral donor bound exciton emission and the frequency of Raman E₂ mode were decreased by increasing the GaN thickness, due to the residual strain relaxation in the epilayers. The dependence of Raman E₂ mode of GaN films on residual strain can be estimated as Δ ω/Δ σ=3.93 (cm⁻¹/GPa).     

Pb_(0.88)La_(0.08)(Zr_xTi_(1–x))O_3铁电厚膜介电与储能性能研究

采用溶胶-凝胶法在La Ni O3/Si(100)底电极上成功制备了厚度为1μm的Pb0.88La0.08(Zrx Ti1–x)O3(PLZT,x=0.30,0.55,0.80)铁电厚膜。研究了不同Zr/Ti比对PLZT铁电厚膜的介电与储能性能的影响。结果表明,随着PLZT中Zr含量的增加,厚膜材料的储能密度与储能效率均增大,Pb0.88La0.08(Zr0.8Ti0.2)O3厚膜在1 400×103V/cm的储能密度为23.8 J/cm3,储能效率为60%。