(La、Nb)共掺杂TiO2压敏陶瓷第二相形成机理

研究了(La、Nb)共掺杂TiO2压敏陶瓷第二相的形成机理.以锐钛矿TiO2、Nb2Os和La2 O3氧化物粉体为原料,采用传统固相烧结工艺制备了( La、Nb)共掺杂TiO2压敏陶瓷,采用SEM、EDS、XRD、AFM和TEM检测了(La、Nb)共掺杂TiO2压敏陶瓷样品的显微结构、化学组成、物相组成、热蚀沟和显微形貌;通过点缺陷热力学分析、晶界能和材料结构检测分析讨论了(La、Nb)共掺杂TiO2压敏陶瓷第二相的形成机理.研究结果表明,第二相的形成起源于掺杂La3+和Nb5+在晶界的偏析,偏析驱动力为弹性应变能.偏析离子在高能量晶粒表面或晶界面成核,并逐渐长大形成第二相.第二相主要在能量较高的晶面上生长,这有利于使整个材料体系的能量最低.     

La_2O_3掺杂对TiO_2系压敏陶瓷结构和性能的影响

采用传统的固相法制备了La2O3掺杂的TiO2系压敏陶瓷,通过XRD和SEM分析,测试其结构及压敏性能、介电常数和晶界势垒特性。结果表明:La2O3掺杂对所获陶瓷的结构和性能有显著的影响,在1380℃烧结条件下,掺杂x(La2O3)为0.70%的陶瓷表现出优良的综合电性能,其压敏电压为7.6V/mm,非线性系数为5.2,相对介电常数εr为9.96×104,介电损耗tanδ为0.32,这与该陶瓷具有最高的晶界势垒高度相一致。     

CeO_2掺杂TiO_2基压敏陶瓷的性能研究

该文在TiO2压敏陶瓷中掺杂CeO2,研究了烧结温度和CeO2掺杂量对TiO2基压敏陶瓷的电学性能的影响。结果表明,烧结温度为1 400℃、CeO2掺杂摩尔分数为1.0%时,TiO2基压敏陶瓷表现出较好的综合电学性能:压敏电压为7.7V/mm,非线性系数为3.8,漏电流为0.1A,且具有优的介电常数和介电损耗。     

TiO2掺杂导致的SnO2压敏陶瓷晶粒尺寸效应

研究了TiO2掺杂对SnO2-Co2O3-Nb2O5系压敏陶瓷材料电学性能的影响。掺入x(TiO2)为1.00%的陶瓷样品具有最高的密度(r = 6.82 g/cm3),最高的视在势垒电场(EB= 476 V/mm),最高的非线性系数(a = 11.0),最小的相对介电常数。未掺杂的样品阻抗最大。随TiO2掺杂量的增加晶粒逐渐变小,晶粒尺寸的减小归因于未固溶于SnO2晶格而偏析在晶界上的TiO2阻碍相邻SnO2晶粒融合。为了解释SnO2-Co2O3-Nb2O5-TiO2系电学非线性性质的根源,对前人的晶界缺陷势垒模型进行了修正。     

Bi_2O_3对TiO_2系压敏陶瓷性能的影响

采用传统电子陶瓷工艺制作了TiO2系压敏陶瓷。通过测试其I-V特性、复阻抗特性、晶界电阻、晶粒电阻及势垒高度,研究了Bi2O3对TiO2-Bi2O3-Nb2O5-SrO系压敏陶瓷微结构及电性能的影响。结果表明,Bi2O3的适当掺杂范围在0.3%~0.5%(摩尔分数)。其掺杂量的变化,可显著改变TiO2-Bi2O3-Nb2O5-SrO系压敏陶瓷的晶界电阻及势垒高度,进而对压敏陶瓷的电学非线性特性产生影响。当x(Bi2O3)为0.4%时,压敏陶瓷的V1mA与α分别为40V/mm与6.2。     

SiO_2掺杂SnO_2-ZnO-Nb_2O_5压敏陶瓷的电学特性

研究了 Si O2 掺杂对 Sn O2 - Zn O- Nb2 O5 压敏陶瓷的影响。实验结果表明 ,Si O2 可以十分显著地影响Sn O2 - Zn O- Nb2 O5 压敏陶瓷的物理和电子性质。掺杂范围为 0 .0 5 %～ 0 .40 % (摩尔分数 )时 ,材料密度在 6.2 1～ 6.5 6g/ cm3之间变动 ,非线性系数在 7.42～ 12 .80之间。烧失率、势垒电压和非线性系数的测量均表明 :掺有x (Si O2 ) =0 .2 %的 Sn O2 - Zn O- Nb2 O5 压敏陶瓷的非线性最好 ,其势垒电压为 0 .67e V,非线性系数达 12 .80     

(La0.44Sr0.33)TiO3对MgTiO3系高频高Q MLCC瓷料性能的影响

采用传统固相反应法制备了(1-x)(Mg0.95Zn0.05)TiO3-x(La0.44Sr0.33)TiO3(MZLST)介质陶瓷。系统研究了(La0.44Sr0.33)TiO3掺杂量对MZLST陶瓷烧结特性、相构成、微观结构和微波介电性能的影响。结果表明,掺杂少量的(La0.44Sr0.33)TiO3后,MZLST陶瓷的主晶相为(Mg0.95Zn0.05)TiO3和(La0.44Sr0.33)TiO3,随着烧结温度的升高,第二相(Mg0.95Zn0.05)Ti2O5的含量增加。当x=0.10时,MZLST陶瓷在1 285℃烧结2h获得最佳的介电常数εr=22.17,品质因数Q.f=48 471GHz(6.72GHz),谐振频率温度系数τf=-7.99×10-6/℃。     

掺杂La2O_3的ZnO-Pr_6O_(11)系压敏陶瓷材料

研究了掺杂La2O3对ZnO-Pr6O11系压敏陶瓷的电性能和衰变特性的影响。试验结果表明:随La2O3添加量的增加,压敏电压(V1mA)和非线性系数(α)增加,漏电流(IL)减少。掺杂La2O3的ZnO-Pr6O11系压敏陶瓷性能稳定,具有良好的抗老化作用。     

烧结温度对TiO2压敏陶瓷结构和性能的影响

研究了烧结温度对TiO2压敏陶瓷显微结构、晶界势垒结构和电学性能的影响。采用扫描电镜(SEM)测试了不同烧结温度对TiO2陶瓷的显微结构;根据热电子发射理论,采用电学性能数据计算了不同烧结温度的晶界势垒结构;讨论了显微结构和势垒结构对TiO2压敏陶瓷电学性能的影响。实验结果表明:烧结温度必须高于致密化的初始温度,但烧结温度过高会形成大量氧空位而在晶粒中形成气孔,影响显微结构的均匀性和致密性,较适合的烧结温度为1 350℃。随烧结温度的增加,TiO2压敏陶瓷的晶粒尺寸长大,Nb5 的固溶度增加,势垒高度与势垒宽度增加,压敏电压降低,而非线性系数和介电常数增加。     

TiO_2压敏陶瓷的显微分析和电学性能

研究了烧结温度对TiO2压敏陶瓷的显微结构、显微成分、势垒结构和电学性能的影响。采用SEM和EDS测试其显微结构和晶粒的化学组成。根据热电子发射理论和电学性能计算了势垒结构。在1350℃烧结的TiO2压敏陶瓷具有均匀而致密的显微结构,其晶粒大小为15μm左右,施主掺杂Nb5+在TiO2晶粒中的固溶度为1.49%;势垒高度?B为0.28eV,势垒宽度xD为48nm;压敏电压V1mA为5.25V/mm,非线性系数α为4.2,εr为1.1×104。     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.     

Curved crystal spectrometer for the measurement of X-ray lines from laser-produced plasmas

In order to diagnose the laser-produced plasmas, a focusing curved crystal spectrometer has been developed for measuring the X-ray lines radiated from a laser-produced plasmas. The design is based on the fact that the ray emitted from a source located at one focus of an ellipse will converge on the other focus by the reflection of the elliptical surface. The focal length and the eccentricity of the ellipse are 1350 mm and 0.9586, respectively. The spectrometer can be used to measure the X- ray lines in the wavelength range of 0.2-0.37 nm, and a LiF crystal （200） （2d = 0.4027 nm） is used as dispersive element covering Bragg angle from 30° to 67.5°. The spectrometer was tested on Shengnang- Ⅱ which can deliver laser energy of 60-80 J/pulse and the laser wavelength is 0.35 μm. Photographs of spectra including the 1 s2p ^1P1-1s^2 ^1S0 resonance line（w）, the 1s2p ^3P2-1s^2 1S0 magnetic quadrupole line（x）, the 1s2p ^3P1-1 s^2 ^1S0 intercombination lines（y）, the 1 s2p ^3S~1-1 s^2 ^1S0 forbidden line（z） in helium-like Ti Ⅹ Ⅺ and the 1 s2s2p ^2P3/2-1 s622s ^2S1/2 line（q） in lithium-like Ti Ⅹ Ⅹhave been recorded with a X-ray CCD camera. The experimental result shows that the wavelength resolution（λ/△ 2） is above 1000 and the elliptical crystal spectrometer is suitable for X-ray spectroscopy.     

Electronic Structure of Semiconductor Nanocrystals

This paper reviews our recent development of the use of the large-scale pseudopotential method to calculate the electronic structure of semiconductor nanocrystals, such as quantum dots and wires, which often contain tens of thousands of atoms. The calculated size-dependent exciton energies and absorption spectra of quantum dots and wires are in good agreement with experiments. We show that the electronic structure of a nanocrystal can be tuned not only by its size,but also by its shape. Finally,we show that defect properties in quantum dots can be significantly different from those in bulk semiconductors.     

Critical Stage Rule-Based Real Time Dispatch（RTD）System in Highly-Mixed-Products （HMP） FAB

An improving utilization and efficiency of critical equipments in semiconductor wafer fabrication facilities are concerned. Semiconductor manufacturing FAB is one of the most complicated and cost sensitive environments. A good dispatching tool will make big difference in equipment utilization and FAB output as a whole. The equipment in this paper is In-Line DUV Scanner. There are many factors impacting utilization and output on this equipment group. In HMP environment one of the issues is changing of reticule in this area and idle counts due to load unbalance between equipments. Here we'll introduce a rule-based RTD system which aiming at decreasing the number of recipe change and idle counts among a group of scanner equipment in a high-mixed-products FAB.     

GaAsSb/InAlAs PA DHBTs Grown by Production MBE

The epi material growth of GaAsSb based DHBTs with InAlAs emitters are investigated using a 4 × 100mm multi-wafer production Riber 49 MBE reactor fully equipped with real-time in-situ sensors including an absorption band edge spectroscope and an optical-based flux monitor. The state-of-the-art hole mobilities are obtained from 100nm thick carbon-doped GaAsSb. A Sb composition variation of less than ± 0.1 atomic percent across a 4 × 100mm platen configuration has been achieved. The large area InAlAs/GaAsSb/InP DHBT device demonstrates excellent DC characteristics,such as BVCEO＞6V and a DC current gain of 45 at 1kA/cm2 for an emitter size of 50μm × 50μm. The devices have a 40nm thick GaAsSb base with p-doping of 4. 5 × 1019cm-3 . Devices with an emitter size of 4μm × 30μm have a current gain variation less than 2% across the fully processed 100mm wafer. ft and fmax are over 50GHz,with a power efficiency of 50% ,which are comparable to standard power GaAs HBT results. These results demonstrate the potential application of GaAsSb/InP DHBT for power amplifiers and the feasibility of multi-wafer MBE for mass production of GaAsSb-based HBTs.     

Propagation of hermite-cosh-gaussian beams passing through ABCD optical system with an annular aperture

By using the expansion of the aperture function into a finte sum of complex Gaussian functions, the corresponding analytical expressions of Hermite-cosh-Gaussian beams passing through annular apertured paraxially and symmetrically optical systems written in terms of ABCD matrix were derived, and they could reduce to the cases with squared aperture. In a similar way, the corresponding analytical expressions of cosh-Gaussian beams through annular apertured ABCD matrix were also given. The method could save more calculation time than that by using the diffraction integral formula directly.     

Noise character analysis and the restraint of self-pulsation laser diodes

We calculate the Langevin noise sources of self-pulsation laser diodes, analyze the effects of active region noise and saturable-absorption region noise on the power fluctuation as well as period fluctuation, and propose a novel method to restrain the noise effects. A visible SIMULINK model is established to simulate the system, The results indicate that the effects of noise in absorption region can be ignored; that with the increase of DC injecting current, the noise effects enhance power jitter, and nevertheless, the period jitter is decreased; and that with external sinusoidal current modulating the self-pulsation laser diode, the noise-induced power jitter and period jitter can be suppressed greatly. This work is valuable for clock recovery in all-optical network.     

Influence of polarization extinction ratio on distributed polarization coupling detection

Distributed polarization coupling in polarization-maintaining fibers can be detected by using a white light Michelson interferometer. This technique usually requires that only one polarization mode is excited. However, in practical measurement, the injection polarization direction could not be exactly aligned to one of the principal axes of the PMF, so the influence of the polarization extinction ratio should be considered. Based on the polarization coupling theory, the influence of the incident polarization extinction on the measurement result is evaluated and analyzed, and a method for distributed polarization coupling detection is developed when both two orthogonal eigenmodes are excited.     

High-quality single-crystal CdSe nanoribbons and their optical properties

Large-scale synthesis of single-crystal CdSe nanoribbons is achieved by a modified thermal evaporation method, in which two-step-thermal-evaporation is used to control CdSe sources＇ evaporation. The synthesized CdSe nanoribbons are usually several micrometers in width, 50 nm in thickness, and tens to several hundred micrometers in length. Studies have shown that high-quality CdSe nanoribbons with regular shapes can be obtained by this method. Room-temperature photolumines-cence indicates that the lasing emission at 710 nm has been observed under optical pumping （266 nm） at power densities of 25-153 kW/cm^2. The full width half maximum （FWHM） of the lasing mode is 0.67 nm     

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