图形化氧化锌阵列的制备及其场发射性能研究

为了减小场发射的屏蔽效应,采用图形化技术对氧化锌(ZnO)纳米枝阵列进行调控,并研究图形化ZnO枝阵列的性能。首先采用光刻法在ITO导电玻璃上制备图形化ZnO种子层,再用电沉积法在图形化种子层上生长ZnO纳米枝阵列。利用扫描电子显微镜(SEM)、X射线衍射(XRD)研究所制备的图形化ZnO阵列形貌、结构等,并测试其场发射性能。研究结果表明,制备的图形化ZnO纳米枝是圆阵列,直径为330μm左右,纳米ZnO主干平均直径为400~500nm,发现主干上有一些精细的类似锥状的纳米量级微细枝结构,并且具有良好的场发射性能,开启场强为2.15V/μm,场增强因子为16 109。该图形化生长ZnO阵列阴极的方法是一种能较好改善材料场发射性能的方法,在场发射应用领域表现出较好的前景。     

ZnO纳米线的快速生长机理及其场发射性能研究

为了快速制备具有优良场发射性能的ZnO纳米线,对ZnO纳米线的生长机理及场发射性能进行研究。首先采用优化的两步法制备出高长径比的ZnO纳米线,其次采用SEM对ZnO的微观形貌进行表征,然后,在分析形貌特点的基础上,说明了强碱体系下ZnO纳米线薄膜的快速生长机理。最后,对典型样品的场发射性能进行了测试。测试果表明,优化后的两步法,只需3h即可获得直径为40~50nm,长度为2.2~2.7μm,长径比高达54的纳米线。薄膜的开启电场为3.6V/μm,阈值场强为9.1V/um,场增强因子β高达3 391。研究表明,高pH值溶液可以加快ZnO纳米线沿C轴方向的择优生长,获得高长径比的ZnO纳米线,进而获得优良的场发射性能。     

衬底温度对氧化锌薄膜场发射性能的影响

利用射频磁控溅射法制备了不同衬底温度的氧化锌(ZnO)薄膜.研究了其场发射特性,分析了场发射特性和衬底温度的变化关系.实验结果表明, 开启电场随着衬底温度的增加呈先增大后减小的趋势,场发射特性的变化是由于衬底温度的改变引起表面形貌的变化所致.衬底温度为300 ℃时沉积的ZnO薄膜样品粗糙度最小,场发射性能最差,其开启场强为1.7 V/μm,场强为3.8 V/μm时电流密度仅为0.001 97 A/cm2;衬底温度为400 ℃时沉积的ZnO薄膜样品表面粗糙度最大,场发射特性也优于其他薄膜;开启场强为0.82 V/μm, 场强为3.8 V/μm时电流密度稳定在0.03 A/cm2.Fowler-Nordheim(F-N)曲线为直线表明, 电子是在外加电场的作用下隧穿表面势垒束缚发射到真空的.     

氧化钨纳米结构：可控制备及场发射性能

通过简单调控化学气相沉积反应气压制备了形貌尺寸可控的各种非化学计量比氧化钨纳米结构。场发射研究表明W18O49纳米线具有优异的场发射性能。对于10 μA/cm2的发射电流,其开启电压为7.1 V/μm。 实验中测得最高场发射电流密度4.05mA,对应场强为17.2 V/μm。场发射过程中的热蒸发和脱附测试表明该氧化钨纳米线的场发射再现性很高。     

电泳法制备四针状纳米ZnO场发射阴极

用电泳法成功地将四针状纳米ZnO沉降在透明导电玻璃ITO衬底上,制备出13cm×10cm面积的场发射阴极屏。使用扫描电子显微镜观察ZnO颗粒的表面形貌及分散均匀性。结果表明电泳法制得的ZnO场发射阴极屏透明且颗粒分布较均匀。讨论了电泳电压、沉降时间、电泳液浓度对阴极场发射电流的影响,通过实验得出用电泳法转移四针状纳米氧化锌制作阴极屏的最佳工艺条件,即直流电压75V、电泳时间为8min,两极距离2.5cm条件下制得的屏场发射性能较佳,显示效果较好。测试了ZnO阴极屏在1200V直流电压下长时间发射稳定性,测试过程电流波动范围小于5%。实验表明采用电泳法制备场发射阴极具有工艺简单、步骤少、易操作、成本低并能根据需要控制薄膜厚度及场发射屏面积等优点,对于大屏幕、低成本FED的研发具有实际应用意义。     

热敷法制备丝状阴极及其在场发射中的应用

采用热敷法将碳纳米管(CNT)浆料直接热敷在Ni丝上制备成丝状阴极,并在圆柱形灯管中采用二极结构测试其场发射性能.扫描电镜(SEM)测试表明,丝状阴极的表面有一层均匀的CNT材料;场发射结果表明,CNT-Ni丝状阴极与传统的场发射阴极相比具有更优良的场发射性能,开启电场为0.15 V/μm,当电压为2280V时发射电流达到4 mA.在腔体中测试其发光亮度,最高值达到了14000 cd/m2.     

热CVD法制备的碳纳米管线阵列的场发射特性

采用半导体光刻技术在硅衬底上获得图形化掩膜,然后用热化学气相淀积(T-CVD)的方法制备了图形化的碳纳米管线阵列,用扫描电镜和拉曼光谱仪对碳纳米管进行了表征.研究了图形化碳纳米管线阵列的场发射特性,并与无图形化处理的碳纳米管薄膜样品的场发射特性进行了比较.当发射电流密度达到10 μA/cm2时,无图形化处理的碳纳米管薄膜、10 μm碳纳米管线阵列以及2 μm碳纳米管线阵列样品的开启电场分别为3 V/μm、2.1 V/μm和1.7 V/μm;而当电场强度达3.67 V/μm时,相应的电流密度分别为2.57 mA/cm2、4.65 mA/cm2和7.87 mA/cm2. 实验结果表明,图形化处理后的碳纳米管作为场发射体,其场发射特性得到了明显的改善.对改善的原因进行了分析和讨论.     

图案化氧化钨纳米线阵列的低温制备工艺及其场发射特性研究

氧化钨纳米线由于具有长径比较大、导电性好、阈值电场较低、可承受的电流较高等优点,因此在场致电子发射器件中受到人们的广泛关注。但是在氧化钨纳米结构研究发展的过程中,出现了一些技术难题,比如制备温度高(>800℃),制备的氧化钨通常混合多种化学相而导致物性不均匀等,所以束缚了氧化钨纳米线在场发射领域的快速发展。本文采用磁控溅射技术结合化学气相沉积技术在500℃下分别实现了高纯相的WO2和WO3纳米线阵列的定域生长。场发射特性研究结果表明:所制备的WO3纳米线阵列的开启电场低至0.65MV/m,阈值电场约为2.9MV/m,最大电流密度达到18.3A/cm2;WO2纳米线阵列的开启电场低至0.8MV/m,阈值电场为2.46MV/m,最大电流密度达到12.1mA/cm2。这表明在低温下制备的氧化钨纳米线阵列在场致电子发射领域具有非常广阔的应用前景。     

电流法改善碳纳米管阴极场发射特性

针对丝网印刷碳纳米管阴极,提出电流法进行表面后处理,有效改善碳纳米管阴极场发射特性.利用扫描电子显微镜表征电流法处理前后CNTs阴极表面形貌变化,并对处理前后CNTs阴极进行场发射特性测试.结果表明,电流法处理后CNTs阴极表面残留有机物被破坏,开启电场从2.4 V/μm降低到1.6 V/μm,同样面积的薄膜(印制面积为1 cm×1 cm)在2.6 V/μm场强下的发射电流由30 μA提高到了800 μA,说明电流处理对于提高薄膜的场发射特性有明显作用.该方法在碳纳米管场发射显示器的制作中具有很好的实际应用价值.     

ZnO纳米棒的图形化生长及其场发射特性

介绍了用氢离子注入技术和阳极腐蚀方法在硼掺杂p-(100)型硅晶片上制备图形化的纳米硅(SiNC)薄膜工艺,并在这种图形化衬底上成功生长了图形化的ZnO纳米棒.场发射测试表明制备的ZnO纳米棒具有良好的场发射性能,即具有较低的开启电场和阈值电场,较高的发射点密度.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.     

Curved crystal spectrometer for the measurement of X-ray lines from laser-produced plasmas

In order to diagnose the laser-produced plasmas, a focusing curved crystal spectrometer has been developed for measuring the X-ray lines radiated from a laser-produced plasmas. The design is based on the fact that the ray emitted from a source located at one focus of an ellipse will converge on the other focus by the reflection of the elliptical surface. The focal length and the eccentricity of the ellipse are 1350 mm and 0.9586, respectively. The spectrometer can be used to measure the X- ray lines in the wavelength range of 0.2-0.37 nm, and a LiF crystal （200） （2d = 0.4027 nm） is used as dispersive element covering Bragg angle from 30° to 67.5°. The spectrometer was tested on Shengnang- Ⅱ which can deliver laser energy of 60-80 J/pulse and the laser wavelength is 0.35 μm. Photographs of spectra including the 1 s2p ^1P1-1s^2 ^1S0 resonance line（w）, the 1s2p ^3P2-1s^2 1S0 magnetic quadrupole line（x）, the 1s2p ^3P1-1 s^2 ^1S0 intercombination lines（y）, the 1 s2p ^3S~1-1 s^2 ^1S0 forbidden line（z） in helium-like Ti Ⅹ Ⅺ and the 1 s2s2p ^2P3/2-1 s622s ^2S1/2 line（q） in lithium-like Ti Ⅹ Ⅹhave been recorded with a X-ray CCD camera. The experimental result shows that the wavelength resolution（λ/△ 2） is above 1000 and the elliptical crystal spectrometer is suitable for X-ray spectroscopy.     

Electronic Structure of Semiconductor Nanocrystals

This paper reviews our recent development of the use of the large-scale pseudopotential method to calculate the electronic structure of semiconductor nanocrystals, such as quantum dots and wires, which often contain tens of thousands of atoms. The calculated size-dependent exciton energies and absorption spectra of quantum dots and wires are in good agreement with experiments. We show that the electronic structure of a nanocrystal can be tuned not only by its size,but also by its shape. Finally,we show that defect properties in quantum dots can be significantly different from those in bulk semiconductors.     

Critical Stage Rule-Based Real Time Dispatch（RTD）System in Highly-Mixed-Products （HMP） FAB

An improving utilization and efficiency of critical equipments in semiconductor wafer fabrication facilities are concerned. Semiconductor manufacturing FAB is one of the most complicated and cost sensitive environments. A good dispatching tool will make big difference in equipment utilization and FAB output as a whole. The equipment in this paper is In-Line DUV Scanner. There are many factors impacting utilization and output on this equipment group. In HMP environment one of the issues is changing of reticule in this area and idle counts due to load unbalance between equipments. Here we'll introduce a rule-based RTD system which aiming at decreasing the number of recipe change and idle counts among a group of scanner equipment in a high-mixed-products FAB.     

GaAsSb/InAlAs PA DHBTs Grown by Production MBE

The epi material growth of GaAsSb based DHBTs with InAlAs emitters are investigated using a 4 × 100mm multi-wafer production Riber 49 MBE reactor fully equipped with real-time in-situ sensors including an absorption band edge spectroscope and an optical-based flux monitor. The state-of-the-art hole mobilities are obtained from 100nm thick carbon-doped GaAsSb. A Sb composition variation of less than ± 0.1 atomic percent across a 4 × 100mm platen configuration has been achieved. The large area InAlAs/GaAsSb/InP DHBT device demonstrates excellent DC characteristics,such as BVCEO＞6V and a DC current gain of 45 at 1kA/cm2 for an emitter size of 50μm × 50μm. The devices have a 40nm thick GaAsSb base with p-doping of 4. 5 × 1019cm-3 . Devices with an emitter size of 4μm × 30μm have a current gain variation less than 2% across the fully processed 100mm wafer. ft and fmax are over 50GHz,with a power efficiency of 50% ,which are comparable to standard power GaAs HBT results. These results demonstrate the potential application of GaAsSb/InP DHBT for power amplifiers and the feasibility of multi-wafer MBE for mass production of GaAsSb-based HBTs.     

Propagation of hermite-cosh-gaussian beams passing through ABCD optical system with an annular aperture

By using the expansion of the aperture function into a finte sum of complex Gaussian functions, the corresponding analytical expressions of Hermite-cosh-Gaussian beams passing through annular apertured paraxially and symmetrically optical systems written in terms of ABCD matrix were derived, and they could reduce to the cases with squared aperture. In a similar way, the corresponding analytical expressions of cosh-Gaussian beams through annular apertured ABCD matrix were also given. The method could save more calculation time than that by using the diffraction integral formula directly.     

Noise character analysis and the restraint of self-pulsation laser diodes

We calculate the Langevin noise sources of self-pulsation laser diodes, analyze the effects of active region noise and saturable-absorption region noise on the power fluctuation as well as period fluctuation, and propose a novel method to restrain the noise effects. A visible SIMULINK model is established to simulate the system, The results indicate that the effects of noise in absorption region can be ignored; that with the increase of DC injecting current, the noise effects enhance power jitter, and nevertheless, the period jitter is decreased; and that with external sinusoidal current modulating the self-pulsation laser diode, the noise-induced power jitter and period jitter can be suppressed greatly. This work is valuable for clock recovery in all-optical network.     

Influence of polarization extinction ratio on distributed polarization coupling detection

Distributed polarization coupling in polarization-maintaining fibers can be detected by using a white light Michelson interferometer. This technique usually requires that only one polarization mode is excited. However, in practical measurement, the injection polarization direction could not be exactly aligned to one of the principal axes of the PMF, so the influence of the polarization extinction ratio should be considered. Based on the polarization coupling theory, the influence of the incident polarization extinction on the measurement result is evaluated and analyzed, and a method for distributed polarization coupling detection is developed when both two orthogonal eigenmodes are excited.     

High-quality single-crystal CdSe nanoribbons and their optical properties

Large-scale synthesis of single-crystal CdSe nanoribbons is achieved by a modified thermal evaporation method, in which two-step-thermal-evaporation is used to control CdSe sources＇ evaporation. The synthesized CdSe nanoribbons are usually several micrometers in width, 50 nm in thickness, and tens to several hundred micrometers in length. Studies have shown that high-quality CdSe nanoribbons with regular shapes can be obtained by this method. Room-temperature photolumines-cence indicates that the lasing emission at 710 nm has been observed under optical pumping （266 nm） at power densities of 25-153 kW/cm^2. The full width half maximum （FWHM） of the lasing mode is 0.67 nm     

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