SiC基的高性能紫外光电探测器

用宽禁带半导体n-4H-SiC和金属Au作肖特基接触,Ti,Ni,Ag合金作背底形成欧姆接触,研制出Au/n4H-SiC肖特基紫外探测器.测试分析了器件在高温高压下的光谱响应特性,响应范围在200～400nm之间,室温无偏压下,响应峰值在320nm,响应半宽为82nm.在高反压下(100V以上)探测器的光谱响应曲线出现了锐上升和锐截止,在260～380nm之间有非常平稳的光谱响应;在高温533K无偏压下,紫外响应特性仍然保持良好.     

SiC基的高性能紫外光电探测器

用宽禁带半导体n-4H-SiC和金属Au作肖特基接触,Ti,Ni,Ag合金作背底形成欧姆接触,研制出Au/n4H-SiC肖特基紫外探测器.测试分析了器件在高温高压下的光谱响应特性,响应范围在200～400nm之间,室温无偏压下,响应峰值在320nm,响应半宽为82nm.在高反压下(100V以上)探测器的光谱响应曲线出现了锐上升和锐截止,在260～380nm之间有非常平稳的光谱响应;在高温533K无偏压下,紫外响应特性仍然保持良好.     

SiC基的高性能紫外光电探测器

用宽禁带半导体n-4H-SiC和金属Au作肖特基接触，Ti, Ni, Ag合金作背底形成欧姆接触，研制出Au/n-4H-SiC肖特基紫外探测器. 测试分析了器件在高温高压下的光谱响应特性，响应范围在200～400nm之间，室温无偏压下，响应峰值在320nm，响应半宽为82nm. 在高反压下（100V以上）探测器的光谱响应曲线出现了锐上升和锐截止，在260～380nm之间有非常平稳的光谱响应；在高温533K无偏压下，紫外响应特性仍然保持良好.     

高响应度InGaAs PIN光电探测器的研制

分析了影响探测器响应度的各因素,在此基础上设计了InGaAs/InP PIN探测器的外延材料结构并优化了增透膜厚度和p-InP区欧姆接触电极图形的设计,以达到提高响应度的目的。采用MOCVD技术和闭管扩散等工艺制备了器件并测量了其响应度。结果显示,器件的光谱响应范围为1000~1600nm,在1500nm激光的辐照下,5V反向偏压时器件的响应度可达0.95A/W以上。     

Study and Fabrication of a Au/n-ZnO/p-Si Structure UV-Enhanced Phototransistor

研究和制作了一种新型Au/n-ZnO/p-Si结构的肖特基发射极、异质结集电极紫外增强双极型光电三极管.分析了器件原理,测试了I-V特性、C-V特性以及器件的光谱响应,从200到400nm的紫外光响应灵敏度得到明显增强而对大于400nm的可见光的响应特性得到保留.实验显示Au/n-ZnO/p-Si结构的紫外增强型的光电三极管对紫外光的响应明显增强,对371nm波长的紫外光的灵敏度是普通n-ZnO/p-Si异质结紫外光电二极管道的5～10倍.     

Au/n-znO/p-Si结构的紫外增强型光电三极管的研制

研究和制作了一种新型Au/n-ZnO/p-Si结构的肖特基发射极、异质结集电极紫外增强双极型光电三极管.分析了器件原理,测试了I-V特性、C-V特性以及器件的光谱响应,从200到400nm的紫外光响应灵敏度得到明显增强而对大于400nm的可见光的响应特性得到保留.实验显示Au/n-ZnO/p-Si结构的紫外增强型的光电三极管对紫外光的响应明显增强,对371nm波长的紫外光的灵敏度是普通n-ZnO/p-Si异质结紫外光电二极管道的5～10倍.     

高响应度InGaAs PIN光电探测器的研制

分析了影响探测器响应度的各因素,在此基础上设计了InGaAs/InP PIN探测器的外延材料结构并优化了增透膜厚度和p-InP区欧姆接触电极图形的设计,以达到提高响应度的目的.采用MOCVD技术和闭管扩散等工艺制备了器件并测量了其响应度.结果显示,器件的光谱响应范围为1000～1600 nm,在1500 nm激光的辐照下,5 V反向偏压时器件的响应度可达0.95 A/W以上.     

高响应度InGaAs PIN光电探测器的研制

分析了影响探测器响应度的各因素，在此基础上设计了InGaAs/InP PIN探测器的外延材料结构并优化了增透膜厚度和p-InP区欧姆接触电极图形的设计，以达到提高响应度的目的。采用MOCVD技术和闭管扩散等工艺制备了器件并测量了其响应度。结果显示，器件的光谱响应范围为1000-1600nm，在1500nm激光的辐照下，5V反向偏压时器件的响应度可达0.95A/W以上。     

基于银纳米薄膜欧姆接触的高波长选择性紫外探测器研究

常规的半导体紫外探测器波长响应范围宽,而紫外光的应用具有较强的波长选择性,如320nm波段的紫外光在医学方面有重要的应用,因此,具有高波长选择性的紫外探测器的研制有重要意义。文章采用GaN基p-i-n探测器结构,通过在p区覆盖银纳米薄膜作为欧姆接触层和波长选择透射层,成功制备了对320nm波段紫外光高选择性探测的紫外探测器,器件性能如下:70nm银层的紫外光透射率峰值超过30%,器件在-5V偏压下的暗电流为10-12 A量级,响应峰值为0.06A/W,响应峰发生在325nm处,光谱响应峰半高宽约30nm。     

Au/4H-SiC肖特基UV光电二极管的温度特性

采用微电子平面工艺,高真空电子束蒸发金属Au做肖特基接触,多层金属Ni、Ti、Ag合金在背底上做欧姆接触,制作出Au/n-4H-SiC肖特基势垒紫外光电二极管(UV-SBD).测试并分析了在不同温度下该器件的I-V特性及光谱响应特性.实验表明:器件高温下有较低的反向漏电流,正向开启电压下降速度为-1.2 mV/℃;波长响应范围为200～400 nm,在23℃和260℃时,光谱响应峰值分别出现在320 nm和330 nm,每100℃波长红移约4 nm;响应灵敏度随温度升高而降低,平均每100℃降低2倍.     

Photoelectric conversion characteristics of ZnO/SiC/Si heterojunctions

A series ofn-ZnO/n-SiC/p-Si and n-ZnO/p-Si heterojunctions were prepared by DC sputtering. Their struc-tural properties, Ⅰ-Ⅴ curves, photovoltaic effects and photo-response spectra were studied. The photoelectric conver-sion characteristics of n-ZnO/n-SiC/p-Si and n-ZnO/p-Si heterojunctions were investigated. It is found that the pho-toelectric conversion efficiency of the n-ZnO/n-SiC/p-Si heterojunction is about four times higher than that of the n-ZnO/p-Si heterojunction. The photovoltaic response spectrum indicated that the photoresponse curve of n-ZnO/n-SiC/p-Si increased more strongly than that of n-ZnO/p-Si with the wavelength increasing. It shows that the photore-sponse ofn-ZnO/p-Si can be enhanced when inserting a 3C-SiC layer between ZnO and Si. There is one inflexion in the photocurrent response curve of the n-ZnO/p-Si heterojunction and two inflexions in that of the n-ZnO/n-SiC/p-Si het-erojunction. It is clear that the 3C-SiC plays an important role in the photoelectric conversion of the n-ZnO/n-SiC/p-Si heterojunction.     

ZnO/SiC/Si异质结的光电转换特性

我们利用直流溅射制备了一系列的n-ZnO/n-SiC/p-Si和n-ZnO/p-Si异质结,通过研究他们的结构、I-V曲线、光生伏特效应和光响应谱。并且研究了他们的光电转换特性。发现n-ZnO/n-SiC/p-Si异质结的光电转换效率大约是n-ZnO/p-Si异质结的四倍。n-ZnO/n-SiC/p-Si异质结的光响应曲线也比n-ZnO/p-Si异质结强,表明n-ZnO/p-Si异质结加入3C-SiC中间层后光响应明显增强。在表面光电流谱中n-ZnO/n-SiC/p-Si异质结观察到两个拐点,而n-ZnO/p-Si异质结只观察到一个。通过以上研究可以看出3C-SiC在n-ZnO/n-SiC/p-Si异质结的光电转换中起了很大的作用.     

ZnO薄膜器件欧姆电极的高掺杂接触法制备

利用脉冲激光沉积方法在Al/Si衬底上生长出了高质量的n型ZnO单晶薄膜。研究并总结了以金属Al材料制备ZnO薄膜器件欧姆电极的方法。选择功函数合适的金属作为电极材料,比如In、Ti和Al等,可以在n型ZnO薄膜上制作良好的欧姆电极。研究发现,在金属Al和n型ZnO膜之间生长一层高掺杂的AZO层,可得到比Al与n型ZnO直接接触更优良的欧姆性能。并且,通过高温退火可以有效提高金属Al电极的结晶质量和电导率,降低电极与n型ZnO界面处的接触势垒,从而实现优良的欧姆接触性能。     

在SiO2中掺Al对Au/纳米(SiO2/Si/SiO2)/p-Si 结构电致发光的影响

利用射频磁控溅射方法,制成纳米SiO2层厚度一定而纳米Si层厚度不同的纳米(SiO2/Si/SiO2)/p-Si结构和纳米(SiO2∶Al/Si/SiO2∶Al)/p-Si结构,用磁控溅射制备纳米SiO2∶Al时所用的SiO2/Al复合靶中的Al的面积百分比为1%．上述两种结构中Si层厚度均为1—3nm,间隔为0.2nm．为了对比研究,还制备了Si层厚度为零的样品．这两种结构在900℃氮气下退火30min,正面蒸半透明Au膜,背面蒸Al作欧姆接触后,都在正向偏置下观察到电致发光（EL）．在一定的正向偏置下,EL强度和峰位以及电流都随Si层厚度的增加而同步振荡,位相相同．但掺Al结构的发光强度普遍比不掺Al结构强．另外,这两种结构的EL具体振荡特性有明显不同．对这两种结构的电致发光的物理机制和SiO2中掺Al的作用进行了分析和讨论．     

MgO界面层对n-ZnO纳米棒/p-GaN异质结LED光电性能的影响

为了较好地实现n-ZnO的电致发光(EL),利用水热法在p-GaN外延片上制备了ZnO纳米棒阵列,构造了n-ZnO纳米棒/p-GaN异质结LED原型器件,并研究了MgO界面层对器件光电性能的影响。结果表明,n-ZnO纳米棒/p-GaN异质结器件具有明显的二极管整流效应。室温、正向偏压下,n-ZnO纳米棒/p-GaN异质结LED仅在430nm附近具有单一的发光峰,而n-ZnO纳米棒/MgO/p-GaN异质结LED的电致发光光谱由一个从近紫外到蓝绿光区的宽发光带组成。结合光致发光(PL)谱和Anderson能带模型,深入分析了n-ZnO纳米棒/p-GaN异质结的载流子复合机制。     

Facile fabrication of heterostructure with p-BiOCl nanoflakes and n-ZnO thin film for UV photodetectors

Herein,high-quality n-ZnO film layer on c-sapphire and well-crystallized tetragonal p-BiOCl nanoflakes on Cu foil are prepared,respectively.According to the absorption spectra,the bandgaps of n-ZnO and p-BiOCI are confirmed as ～3.3 and ～3.5 eV,respectively.Subsequently,a p-BiOCl/n-ZnO heterostructural photodetector is constructed after a facile mechanical bonding and post annealing process.At-5 V bias,the photocurrent of the device under 350 nm irradiation is ～800 times higher than that in dark,which indicates its strong UV light response characteristic.However,the on/off ratio of In-ZnO-In photodetector is ～20 and the Cu-BiOCl-Cu photodetector depicts very weak UV light response.The heterostructure device also shows a short decay time of 0.95 s,which is much shorter than those of the devices fabricated from pure ZnO thin film and BiOCl nanoflakes.The p-BiOCl/n-ZnO heterojunction photodetector provides a promising pathway to multifunctional UV photodetectors with fast response,high signal-to-noise ratio,and high selectivity.     

Mechanism Investigation of p-i-n ZnO-Based Light-Emitting Diodes

Using a cosputtering technique to deposit P-ZnO : AlN film and using a vapor cooling condensation system to deposit n-ZnO : In and i-ZnO films on sapphire substrates, thin-film-type ZnO-based light-emitting diodes (LEDs) were fabricated. A Nd : YAG laser with a wavelength of 413 nm is utilized to identify the defect-related emissions of p-ZnO, i-ZnO, and n-ZnO films. The characteristics of i-ZnO layer of ultraviolet (UV) emissions were analyzed using temperature-dependent photoluminescence. The mechanism of the UV electroluminescence emission peak at 3.20 eV observed from the p-i-n ZnO-based LEDs were attributed to the low deep-level defects and the radiative recombination occurred in the i-ZnO layer.     

Characteristics of Schottky Barrier Junction Based on Hexagonal Microtube ZnO

Hexagonal microtube ZnO was firstly grown on single crystal p-Si (111) substrates by hydrothermal method, and fabricated Ag/n-ZnO and Au/n-ZnO Schottky junction. Schottky effective barrier heights were calculated by I-V measurement. It is confirmed that the presence of a large amount of surface states related possibly to lattice imperfections existed near the surface leads to the pinning of the surface Fermi level at 0.35 eV below the conduction-band edge. Then the fabricated Schottky barrier junctions are evaluated for their use as UV photodetectors.