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1.
利用MBE设备制备GaAs/AlGaAs超晶格材料,在低温(T=77K)下测量样品的光电流谱,从电子波动的观点出发,通过考虑电子波在超晶格阱层/势垒层的反射和干涉,讨论了超晶格的电子态.提出了一种计算超晶格微带带宽的方法,并计算了GaAs/AlGaAs超晶格的微带带宽.理论计算结果和实验结果符合得相当好.  相似文献   

2.
朱文章 《半导体光电》1992,13(2):165-169
在18~300K 度范围内测量了 GaAs/AlGaAs 超晶格和 Ge_xSi_(1-x)/Si 应变层超晶格在不同温度下的光伏谱。在200K 以下,在 GaAs/AlGaAs 超晶格中观测到6个子带间光跃迁激子峰;在100K 以下,GaAs/AlGaAs 的光伏谱反映了超晶格台阶状态密度分布。在 Ge_xSi_1-x/Si 应变层超晶格中,观测到子带和连续带间的光跃迁。并对两类超晶格的光伏特性进行了比较分析。  相似文献   

3.
在分析型透射电子显微镜(TEM)上,利用反射电子显微术(REM)我们系统地研完了用分子束外延法生长的AlGaAs/GaAs异质多层材料及应变InGaAs/GaAs超晶格材料。在对AlGaAs/GaAs超晶格截面的观察中,REM的空间分辨率达到了20(?),并可分辨化学组分变化0.5%的AlGaAs/GaAs异质结界面。在对表面形貌的研究中,REM可观察到用Nomarski相衬显微镜都无法观察到的InGaAs/GaAs应变超晶格表面crosshatch条纹,显示其对表面不平整性的极高灵敏度。我们还发展了一种新方法,用以准确、直观地观察多层膜材料的腐蚀深度,从而控制器件制作过程中的腐蚀工艺。  相似文献   

4.
测量了GaAs/AlGaAs超晶格在T=77K时的光电流谱,发现在波数~↑υ=1589cm^-1存在一个强电流峰,理论分析认为,该电流峰与超晶格界面的电子反射有关,据此算出的电流峰位置与实验观测结果一致。  相似文献   

5.
本文研究了GaInPAs/InP晶格匹配超晶格材料<110>方向的电子结构,对薄层超晶格和与之具有相同化学组份的混晶的色散关系作了比较。研究了带边状态密度在超晶格每一层的分布情况,计算了GaInPAs/InP晶格匹配超晶格的能隙随厚度、组份的变化趋势。研究结果表明:薄层超晶格与具有相同化学组份的混晶的电子结构基本相同,能隙边状态密度偏重于分布在超晶格的GaInPAs原子层内。  相似文献   

6.
由A晶格和B晶格超薄层构成一维周期性结构称为超晶格。根据超晶格中应变量的大小可对超晶格进行分类,当应变量很小,各层的原子散射振幅相差甚远时,则为成份调制的超晶格,如AlAs/GaAs超晶格:若应变量显著,而各层的原子散射振幅相差不大时,则为也变调制的超晶恪,如In_xGa_(1-x)As/GaAs超晶格。最近我们用会聚束电子衍射(CBED)研究了成份调制的超晶格AlAs/GaAs和应变调制的超晶格In、Ga_(1-x)As/GaAs的运动学和动力学衍射效应。  相似文献   

7.
本文用半经验紧束缚法计算了ZnSe/GaAs(001)超晶格的能带结构,研究了其能隙与有效质量随层厚的变化.计算了(ZnSe)_5/(GaAs)_5超晶格中与杂质有关的芯态激子,其结果能说明相应异质结中束缚在Ga上的激子峰.本文还提出了该材料中导带底存在界面态.  相似文献   

8.
双色QWIP是一类重要的第三代红外探测器,但很少有研究报道对其有源区结构以及耦合光栅参数进行系统的计算分析和优化设计。文中基于包络函数近似、传输矩阵模型、经典光学原理等理论对中波-长波红外双色QWIP探测器的多周期有源区以及二维耦合光栅进行了较为详细的优化设计。长波红外(LWIR)有源区采用GaAs/AlGaAs准匹配体系的多量子阱结构,峰值响应波长为8.5 m;中波红外(MWIR)有源区采用InGaAs/GaAs/AlGaAs应变体系的微带超晶格结构,峰值响应波长为4.5 m;子带间跃迁类型均设计为束缚态-准束缚态(B-QB)以降低暗电流,提高探测率。此外,通过折衷优化设计,采用单周期二维光栅以有效实现LWIR与MWIR的双色耦合。上述设计对双色QWIP器件的研制具有较好的实际指导意义。  相似文献   

9.
运用X射线衍射运动学理论研究了[(Ga_(1-x)Al_xAs)_m(GaAs)_n ]_N/GaAs(001)-维超晶格的结构,通过模拟计算,精确确定了超晶格的结构参数.本方法可用于各种超晶格结构,具有普遍意义.另外,还对超晶格卫星峰强度的非称性和超晶格中叠层界面处存在过渡层的影响进行了讨论.  相似文献   

10.
In_xGa_(1-x)As/GaAs应变超晶格的电子结构   总被引:2,自引:0,他引:2  
用有效质量理论研究了[001]和[111]方向生长的In_xGa_(1-x)As/GaAs应变超晶格的电子结构.具体计算了价带能级的色散曲线和光吸收曲线.沿[001]方向生长的光吸收曲线与实验进行了比较.内应变使重轻空穴能级发生上升和下降.由于压电效应,[111]方向生长的超晶格应变层内存在很强的内电场(1.5×10~5V/cm),而对[001]方向生长的应变超晶格不产生内电场.  相似文献   

11.
Molecular beam epitaxy (MBE) growth, device fabrication, and reliable operation of high-power InAlGaAs/GaAs and GaAlAs/GaAs laser arrays are described. Both InAlGaAs/GaAs and AlGaAs/GaAs laser arrays reached maximum continuous wave output powers of 40 W at room temperature. The external quantum efficiency was 50% and 45% for the InAlGaAs/GaAs and AlGaAs/GaAs laser arrays, respectively. Threshold current density for InAlGaAs/GaAs and AlGaAs/GaAs lasers was 303 A/cm/sup 2/ and 379 A/cm/sup 2/, respectively. While the current of AlGaAs laser arrays went up significantly after 1000 h of operation at a constant power of 40 W, InAlGaAs laser arrays had an increase in the injection current of less than 4% after 3000 h at 40 W.  相似文献   

12.
Photoluminescence, optical reflectance and electro-reflectance spectroscopies were employed to study an AlGaAs/GaAs multiple-quantum-well based resonant Bragg structure, which was designed to match optical Bragg resonance with the exciton-polariton resonance at the second quantum state in the GaAs quantum wells. The structure with 60 periods of AlGaAs/GaAs quantum wells was grown on a semi-insulating substrate by molecular beam epitaxy. Broad and enhanced optical and electro-reflectance features were observed when the Bragg resonance was tuned to the second quantum state of the GaAs quantum well excitons manifesting an enhancement of the light-matter interaction under double-resonance conditions. By applying an alternating electric field, we revealed electro-reflectance features related to the x(e2-hh2) and x(e2-hh1) excitons. The excitonic transition x(e2-hh1), which is prohibited at zero electric field, was allowed by a DC bias due to brake of symmetry and increased overlap of the electron and hole wave functions caused by electric field.  相似文献   

13.
《Microelectronics Journal》2002,33(7):553-557
InGaAs/GaAs-based lasers require thick AlGaAs cladding layers to provide optical confinement. Although the lattice mismatch between GaAs and AlGaAs is very low, relaxation may occur due to the thickness requirement for an AlGaAs waveguide of the order of microns. We have studied the relaxation of InGaAs/GaAs lasers with AlGaAs waveguides grown on GaAs (111)B substrates. We have observed by transmission electron microscopy (TEM) that certain AlGaAs layers show a high density of threading dislocations (TDs), whilst other AlGaAs layers remain essentially dislocation free. To explain the experimental results a model based on dislocation multiplication has been developed. TDs in the AlGaAs cladding layers are observed when the critical layer thickness (CLT) for dislocation multiplication has been overcome. Consequently, a design rule based on a modified CLT model for AlGaAs/GaAs (111)B is proposed.  相似文献   

14.
Electron concentration and undoped AlGaAs spacer thickness dependencies of the mobility of a two-dimensional electron gas in a GaAs/AlGaAs single heterostructure are calculated at 4.2 K. The results predict extremely high electron mobility in this structure and agree quite well with very recent experimental data.  相似文献   

15.
Low ballistic mobility in submicron HEMTs   总被引:1,自引:0,他引:1  
Ballistic effects in short channel high electron mobility transistors (HEMTs) greatly reduce the field effect mobility compared to that in long gate structures. This reduction is related to a finite electron acceleration time in the channel under the device gate. As an example, the field effect mobility at room temperature in 0.15-μm gate AlGaAs/GaAs HEMTs cannot exceed 3000 cm2/V-s. These predictions are consistent with the values of the field effect mobility extracted from the measured AlGaAs/GaAs HEMT current-voltage characteristics  相似文献   

16.
We report on the elimination of collapse of drain I/V characteristics in modulation-doped field-effect transistors at 77 K by replacing the doped AlGaAs with a thin GaAs/AlGaAs superlattice where only the GaAs is doped. Such thin barriers (10 ?/15 ?) are transparent to the electrons making the electron transfer into the bulk GaAs (undoped) possible. Room-temperature transconductances of 180 mS/mm which increased to 210 mS/mm at 77 K under both dark and light conditions were obtained. Furthermore, the threshold voltage of these devices did not shift appreciably on cooling (+0.12 V), and no noticeable light sensitivity at 77 K was observed for this device structure.  相似文献   

17.
A Monte Carlo simulation of the electron impact ionization enhancement by a Kronig-Penney superlattice is presented. The results are compared to measured ionization coefficients of a GaAs/AlGaAs superlattice structure. The theory confirms the predicted and measured enhancement of the electron ionization rate. A quantitative fit of the theoretical data to the experimental results suggests a conduction-band offset in the GaAs/AlGaAs system which is roughly equal to 75 percent.  相似文献   

18.
AlInGaAs/AlGaAs应变量子阱增益特性研究   总被引:2,自引:0,他引:2  
采用Shu Lien Chuang方法计算了AlInGaAs/AlGaAs应变引起价带中重、轻空穴能量变化曲线,在Harrison模型的基础上详细地计算了AlInGaAs/AlGaAs和GaAs/AlGaAs量子阱电子、空穴子能级分布并且进一步研究了这两种材料在不同注入条件下的线性光增益.进一步计算比较可以得出AlInGaAs/AlGaAs应变量子阱光增益特性要优于GaAs/AlGaAs非应变量子阱增益特性,因此AlInGaAs/AlGaAs应变量子阱半导体材料应用于半导体激光器比传统GaAs/AlGaAs材料更具优势.  相似文献   

19.
A new type of heterotransistor based on an AlGaAs/GaAs/InAs/GaAs/InAs structure with a layer of InAs quantum dots embedded directly into the GaAs channel is fabricated. High values of the maximum saturation current (up to 35 A/cm) and transconductance (up to 1300 mS/mm) are attained. The specific features of the current-voltage characteristics of the new device are explained in the context of a model that takes into account the ionization of quantum dots in high electric fields and tenfold enhancement of the electron drift velocity in a structure with an InAs quantum-dot layer in the vicinity of an AlGaAs/GaAs heterojunction.  相似文献   

20.
The fabrication of Se-doped AlGaAs/GaAs high electron mobility transistors (HEMTs) is discussed. Because the DX center concentration in Se-doped AlGaAs layers is lower than in Si-doped layers, the drain-current collapses much less at 77 K. The Se-doped HEMTs are therefore suitable for application in low-temperature LSI  相似文献   

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