双周期光量子阱中的共振透射谱

用传输矩阵法研究了一维双周期光量子阱中的共振透射谱,揭示了光子隧穿双周期光量子阱时共振透射谱线的规律.研究发现,该结构拓宽了光子禁带区域,同时禁带中出现了多个共振透射谱,光子晶体的垒区通带频率范围内共振透射谱线的个数主要与光量子阱中垒区的周期数有关,而光子晶体的阱区通带频率范围内共振透射谱线的个数主要与光量子阱中阱区的周期数有关.同时也发现当双周期光量子阱结构的周期数为N时,适当调节垒区和阱区的周期数,可使每个共振透射谱分裂为N-1条,且各分裂谱线互不交叠,这样在有限的禁带区域可以成倍增加光子束缚态,使信道密度增大,能有效地优化光波带宽的使用,有望在光通信超密集波分复用和光学精密测量中获得广泛应用.     

二维磁性光量子阱对共振隧穿光谱特性的影响

基于非磁性材料开腔光量子阱结构设计了非磁性闭腔光量子阱和磁性材料光量子阱结构。用时域有限差分法(FDTD)计算了这三种量子阱结构的透射谱和光场分布,研究了各量子阱中的量子化能态,论证了完全依靠自身结构在很大程度上增强透射光谱强度的可行性。研究发现,光子隧穿磁性光量子阱结构时透射率接近1,能量损失小;与非磁性闭腔光量子阱结构相比,能够减小器件体积,增加能带工程的自由调节度,获得更加丰富的光子束缚态,因而更具优越性。计算结果表明,开腔光量子阱为行波阱,这种阱俘获光子的能力较弱;闭腔光量子阱和磁性材料光量子阱均为驻波阱,局域光子的能力很强,且磁性材料光量子阱可以产生更大的光场梯度。     

ZnCdSe量子阱/CdSe量子点耦合结构中的激子复合

采用MOCVD方法制备了ZnCdSe量子阱/CdSe量子点耦合结构,利用低温(5K)光致发光光谱和变密度发光光谱研究了该结构中的激子隧穿和复合.观察到在该结构中存在由量子阱到量子点的激子隧穿现象.改变垒层厚度会对量子阱和量子点的发光产生显著影响.在垒层较薄的阱/点耦合结构中,隧穿效应可以有效地抑制量子阱中的带填充和饱和效应.     

ZnCdSe量子阱/CdSe量子点耦合结构中的激子复合

采用MOCVD方法制备了ZnCdSe量子阱/CdSe量子点耦合结构，利用低温(5K)光致发光光谱和变密度发光光谱研究了该结构中的激子隧穿和复合. 观察到在该结构中存在由量子阱到量子点的激子隧穿现象. 改变垒层厚度会对量子阱和量子点的发光产生显著影响. 在垒层较薄的阱/点耦合结构中，隧穿效应可以有效地抑制量子阱中的带填充和饱和效应.     

氢离子注入法提高InAsP/InP应变多量子阱发光特性

采用气态源分子束外延系统生长了InAsP/InP应变多量子阱,研究了H 注入对量子阱光致发光谱的影响以及高温快速退火对离子注入后的量子阱发光谱的影响.发现采用较低H 注入能量(剂量)时,量子阱发光强度得到增强;随着H 注入能量(剂量)的增大,量子阱发光强度随之减小.H 注入过程中,部分隧穿H 会湮灭掉量子阱结构界面缺陷,同时H 也会对量子阱结构带来损伤,两者的竞争影响量子阱发光强度的变化.高温快速退火处理后,离子注入后的量子阱样品发光峰位在低温10K相对于未注入样品发生蓝移,蓝移量随着H 注入能量或剂量的增大而增加.退火过程中缺陷扩散以及缺陷扩散导致的阱层和垒层之间不同元素互混是量子阱发光峰位蓝移的原因.     

散射对量子阱隧穿电流的影响

本文从单带双谷模型出发研究了电子在量子阱内遭到散射时电子状态及隧穿几率的变化。弹性散射使用δ散射势来计算,非弹性散射则用虚散射势来描述。前者使隧穿电流峰向高电压端移动,后者减弱了电流峰的谐振强度。分别讨论了位于势阱和势垒层中的散射中心的不同散射作用。隧穿电流的变化趋势同中子辐照实验数据相吻合。     

长波带间级联探测器结构设计

针对带间级联结构在长波探测上的设计应用,采用包络函数近似下的二带模型和传输矩阵方法,考虑电子和轻空穴耦合,计算了带间级联结构多量子阱弛豫区的E-k关系和详细能带信息.特别优化了弛豫区结构,在保证光生载流子在弛豫区中隧穿几率的前提下首次利用周期性量子阱结构拓展弛豫区厚度,降低吸收区中电场强度,抑制产生复合电流和隧穿电流,提高器件电学性能.制备的该两级结构长波带间级联探测器10. 5μm处量子效率达到了20%,证实了弛豫区与隧穿区具有良好的光生载流子输运.器件在80 K下50%截止波长为11. 5μm,是目前所见报道中带间级联结构在80 K工作温度下所获得最长波长的红外探测器.     

980 nm应变单量子阱的理论设计

研究了应变单量子阱势阱宽度的计算方法 ,为应变单量子阱的设计提供了理论依据 .对于确定的材料组份 ,根据应变理论及有限深势阱的处理方法 ,系统地计算了 980 nm应变单量子阱宽度 ,理论计算与实验结果相吻合     

类W-势阱与应变超晶格量子阱的带间跃迁

假设量子阱是类W-势阱,应变效应表现为势阱底部出现了类抛物线鼓包。在量子力学框架下,讨论了应变效应对输出波长的影响。结果表明,在应变作用下,量子阱出现了能级分裂,正是这种分裂为高性能量子阱光学器件的研制提供了更大的设计空间,为量子阱激光器件输出波长的调节提供了理论基础。     

多重散射理论对光子晶体量子阱结构光子共振透射的研究

用球面波展开的多重散射理论计算了光子量子阱的透射系数.光子量子阱由两层光子势垒之间夹置一层均匀介质构成,由于光子带隙的失配,类似于电子量子阱,形成所谓光子量子阱.对透射峰位置的计算结果表明某些光子态以量子化的形式存在,满足量子化频率关系.同时证明有限高的光子势垒在不同光子能级中起到不同的限制作用.共振峰的位置和数量可通过改变阱宽而实现人工调控,通过适当选择阱和垒的参数能够实现高质量的多通道滤波.对光子晶体耦合双量子阱的计算表明,当阱间的垒宽度增加时,两个模式的耦合减弱,模式分裂的间距减小.     

Critical layer thickness of strained-layer InGaAs/GaAs multiple quantum wells determined by double-crystal x-ray diffraction

Double-crystal x-ray diffraction (DCXD) is shown to reveal the onset of relaxation in strained-layer InGaAs/GaAs multiple quantum well (MQW) structures. The MQW structures contain 10 nm thick In_0.16Ga_0.84As quantum wells and 55 nm thick GaAs barrier layers. As the number of periods in the structure was increased from to 3 to 15, the x-ray rocking curves were characterized by increasing distortion of superlattice interference fringes, broadening of superlattice peaks, and reduction in peak intensity. The x-ray diffraction data are correlated with an asymmetric crosshatched surface pattern as observed under Nomarski contrast microscopy. By using DCXD and Nomarski microscopy, the onset of strain relaxation in InGaAs/GaAs MQW structures was established for samples with various GaAs barrier layer thicknesses. For MQW structures in which the thickness of the barrier layers is the same or greater than that of the strained quantum wells, the critical layer thickness can be calculated according to the Matthews and Blakeslee force-balance model with dislocation formation by the single-kink mechanism.     

Si掺杂的AlGaInP/GaInP多量子阱光学特性

低压MOCVD方法生长了掺Si与不掺Si的AlGaInP/GaInP多量子阱结构,运用X射线双晶衍射与光荧光技术研究了掺Si对量子阱性能的影响.测试结果表明掺Si使量子阱的生长速度增加,掺Si量子阱的光荧光强度比未掺Si量子阱的光荧光强度改善了一个数量级.     

Investigation of strain-compensated lnGaAs(P)/lnGaAs(P)/lnP multiple quantum well structures grown by LP-MOVPE

A controversy exists regarding the effectiveness, in the high strain case, of the strain-compensated InGaAs(P)/InGaAs(P)/InP multiple quantum well (MQW) structures. In this paper, the mechanism of the crystal quality degradation in the high strain case is analyzed. Based on our experiments and analysis, we suggest that the crystal quality degradation is predominately affected by the growth temperature and V/III ratios in the gas phase. We demonstrate that, in the case of high strain in the wells, high quality and stable strain-compensated MQW structures can be grown at relatively low growth temperature and relatively high V/III ratios in the gas phase through decreasing the strain in barriers and increasing the thicknesses of barriers simultaneously to achieve zero net strain.     

Hole distribution in InGaAsP 1.3-μm multiple-quantum-well laserstructures with different hole confinement energies

We have investigated the hole distribution in strained InGaAsP multiple-quantum-well (MQW) structures by direct hole transport measurements with time-resolved photoluminescence spectroscopy. The results show that the hole transport time over the MQW primarily depends on the hole confinement energy in the wells and increases sharply with the well depth. A simple thermionic emission model indicates that the heavy holes escape predominantly over the light-hole barrier edge for strain-compensated MQW structures. The results are corroborated with observed laser performance data     

The effects of laser irradiation on InGaAs/GaAs multiple quantum wells grown by metalorganic molecular beam epitaxy

We studied the effects of Ar ion laser irradiation during the growth of InGaAs/ GaAs multiple quantum wells (MQW) structures by metalorganic molecular beam epitaxy. Structural and optical properties were characterized by Nomarski microscopy, Dektak stylus profiler, and low-temperature photoluminescence (PL) measurements. For MQW structures grown at a relatively low substrate temperature (500°C), the laser irradiation influences greatly the growth process of the In^Ga^^As well and results in a large blue shift of about 2000à in the PL peak. Such a large blue shift suggests that laser modification during growth could have some novel applications in optoelectronics. On the other hand, the laser irradiation has relatively small effects on samples grown at a higher substrate temperature (550°C).     

Study of the optical and structural properties of multi quantum well structures grown on high-index surfaces

The MOVPE overgrowth of high [0 1¯ 1]-oriented ridges confined at sides by facets related to {n 1 1} crystallographic planes is reported. We studied the influence of the side tilt on the thickness of the AlGaAs and GaAs epitaxial layers grown under the condition of the kinetic growth mode. The multi quantum well (MQW) structures were prepared on the sides of ridges tilted at 54.7°, 45° and 30° to (1 0 0). The sidewall surface morphologies before and after epitaxial growth were evaluated and compared. We observed no tendency towards planarization towards a neighbouring high-index crystallographic plane, such as (2 1 1) and (3 1 1). We also showed that the quantum wells of the MQW structure make a smooth transition over the edge between the top surface and the facet as both AlGaAs and GaAs grew at similar rates on the surfaces.     

预应变InGaN/GaN多量子阱发光特性调控研究

为了减弱InGaN/GaN量子阱内的压电极化场,在蓝紫光InGaN/GaN多量子阱激光器结构中采用了预应变InGaN插入层,通过变温电致发光和高分辨X射线衍射测量研究了预应变插入层对量子阱晶体质量和发光特性的影响。实验结果显示,常温下有预应变层的量子阱电致发光谱积分强度显著提高。模拟计算进一步表明,预应变层对量子阱内压电极化场有调制效果,有利于量子阱中的应力弛豫,可以有效减弱量子限制斯塔克效应,有助于提高量子阱的发光效率。     

High quality compressively strained InP-based GaInAs(P)/GaInAsP multi-quantum well laser structures grown by metalorganic vapor phase epitaxy

The growth and characterization of strained GaInAs and GaInAsP multiquantum well (MQW) laser structures has been investigated. The use of triple axis x-ray diffraction (XRD), in addition to the conventional high resolution double crystal XRD, yields further information about the structural integrity of these complex structures. Buried heterostructure lasers with eight GaInAsP wells (+1.0% strain, 80Å thick) exhibit a record low threshold current of 3.1 mA. By using a constant As/P ratio in the wells and barriers of an MQW laser structure, we have shown that the structure can be annealed at 700°C for 1 h with only a minimal shift (-4 nm) in the photoluminescence emission wavelength. Conventional lattice-matched GaInAs/GaInAsP MQW structures exhibit a shift of-46 nm under the same conditions.