共查询到19条相似文献,搜索用时 46 毫秒
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非接触压电马达驱动机理分析 总被引:3,自引:0,他引:3
主要研究行波型非接触压电马达的驱动机理,该文引入边界层概念,对振动体产生的边界层进行分析,探讨行波型超声波非接触驱动机理。给出在振于产生的边界层内超声波非接触驱动主要为声流驱动,而在边界层外是由壁面行波产生的斜向声辐射压力驱动。 相似文献
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行波非接触压电马达的声波传播分析 总被引:1,自引:0,他引:1
以行波非接触压电马达为对象,对其工作情况进行了分析,指出通过超声波由固体气体固体的传递,使得压电振子产生的机械振动能传到从动件上,并推动从动件运动。因此,进一步从声波传递特性入手,分析了声波的传递过程及作用,并说明行波非接触压电马达是通过超声波的辐射压力,推动从动件运动的;同时,由于声波在不同介质中传递时,介质的界面有反射作用,因而当超声波穿过空气介质传递到从动件时,能量大部分被反射。所以,目前这种行波非接触压电马达难以产生较大的输出能力。 相似文献
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SU-8胶及其在MEMS中的应用 总被引:3,自引:0,他引:3
SU-8胶是一种负性、环氧树脂型、近紫外线光刻胶。它适于制超厚、高深宽比的MEMS微结构。SU-8胶在近紫外光范围内光吸收度低,故整个光刻胶层所获得的曝光量均匀一致,可得到具有垂直侧壁和高深宽比的厚膜图形;它还具有良好的力学性能、抗化学腐蚀性和热稳定性;SU-8胶不导电,在电镀时可以直接作为绝缘体使用。由于它具有较多优点,被逐渐应用于MEMS的多个研究领域。本文主要分析SU-8胶的特点,介绍其在MEMS的一些主要应用,总结了我们研究的经验,以及面临的一些问题,并对厚胶技术在我国的应用提出建议和意见。 相似文献
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SU-8胶及其在MEMS中的应用 总被引:1,自引:0,他引:1
SU 8胶是一种负性、环氧树脂型、近紫外线光刻胶。它适于制超厚、高深宽比的MEMS微结构。SU 8胶在近紫外光范围内光吸收度低 ,故整个光刻胶层所获得的曝光量均匀一致 ,可得到具有垂直侧壁和高深宽比的厚膜图形 ;它还具有良好的力学性能、抗化学腐蚀性和热稳定性 ;SU 8胶不导电 ,在电镀时可以直接作为绝缘体使用。由于它具有较多优点 ,被逐渐应用于MEMS的多个研究领域。本文主要分析SU 8胶的特点 ,介绍其在MEMS的一些主要应用 ,总结了我们研究的经验 ,以及面临的一些问题 ,并对厚胶技术在我国的应用提出建议和意见 相似文献
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SU-8胶及其在MEMS中的应用 总被引:1,自引:0,他引:1
SU-8胶是一种负性、环氧树脂型、近紫外线光刻胶.它适于制超厚、高深宽比的MEMS微结构.SU-8胶在近紫外光范围内光吸收度低,故整个光刻胶层所获得的曝光量均匀一致,可得到具有垂直侧壁和高深宽比的厚膜图形;它还具有良好的力学性能、抗化学腐蚀性和热稳定性; SU-8胶不导电,在电镀时可以直接作为绝缘体使用.由于它具有较多优点,被逐渐应用于MEMS的多个研究领域.本文主要分析SU-8胶的特点,介绍其在MEMS的一些主要应用,总结了我们研究的经验,以及面临的一些问题,并对厚胶技术在我国的应用提出建议和意见. 相似文献
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突破了传统深宽比概念,提出金属基底上基于图形特征的光刻胶显影技术,对采用SU-8胶加工高分辨率和高深宽比微结构的显影工艺进行了讨论,分析了120~340μm厚具有不同图形特征的SU-8胶显影规律,认为在同样条件下,凸型图形显影效果优于凹型非连通性图形;曲线型显影效果优于直线型图形与点状图形;圆弧连接的图形显影效果优于尖角型图形。显影时辅助适当功率的超声搅拌显著改善图形质量,凸型结构最佳超声功率小于10W;凹型结构超声功率为15W左右;深宽比为5~7的凸型胶膜结构适宜显影时间为10min以内,凹型结构显影时间达25min。 相似文献
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Thermal Soft UV nanoimprint lithography (NIL) was performed to replicate nanostructures in SU-8 resist. The SU-8 resist was structured with a PDMS stamp molded against an original silicon master which comported gratings of lines (500 nm width/1 μm pitch). The patterns obtained in SU-8 were used in a second step as a template for PDMS molding of daughter stamps. Pattern transfer quality and dimension control were achieved on these second generation PDMS stamps using AFM measurements. As a final validation of the whole duplication processes, these second generation PDMS stamps were finally employed to perform μCP of streptavidin molecules on a glass slide activated by plasma O2 treatment. AFM observation and fluorescence microscopy reveal that molecular patterns produced with SU8-molded PDMS stamps are not discernable from those obtained with a PDMS stamp directly molded on the original silicon master. Coupling Thermal Soft UV NIL and microcontact printing opens a new method for generating a large quantity of SU-8 templates on which functional PDMS stamps can be replicated in a reduced time. We thus propose a functional duplication process for soft-lithography implementation which may further reduce the cost of this technology for industrial development. 相似文献
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There is growing interest in the use of chemically-amplified resists (CARs) such as SU-8 in the field of microelectromechanical systems (MEMS) research. This is due to its outstanding lithographic performance and its ability for use in the fabrication of stable structures with very high aspect ratio. However, it is important to control the processing conditions for optimum results in the desired application. In this investigation, the thickness (10-25 μm) of SU-8 resist film, due to different spin coating speeds on silicon wafers, was measured using Fourier transform infrared (FT-IR) spectroscopy. The effect of thermal-initiated cross-linking at various temperatures (95-160 °C) for 15 min baking time on the 25 μm SU-8 resist was studied by monitoring the 914 cm−1 absorption peak in the FT-IR spectrum. Results of the experiments showed that the onset of thermal-initiated cross-linking begins at about 120 °C. Furthermore, 25 μm SU-8 resist was optimized for X-ray lithographic applications by studying the cross-linking process of the resist under different conditions of post-exposure bake (PEB) temperatures. The exposure dose of soft X-ray (SXR) irradiation with energies about 1 keV from a dense plasma focus (DPF) device was fixed at 2500 mJ/cm2 on the resist surface. Results showed that the optimum processing conditions consisted of an intermediate PEB at 65 °C for 5 min, with the PEB temperature ramped up to 95 °C over 1.5 min and then followed by a final PEB at 95 °C for 5 min. The scanning electron microscopy (SEM) images showed SU-8 test structures successfully imprinted, without affecting the resolution, and with aspect ratios of up to 20:1 on 25 μm SU-8 resist. 相似文献
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A. ZizzariV. Arima A. ZacheoG. Pascali P.A. SalvadoriE. Perrone D. MangiulloR. Rinaldi 《Microelectronic Engineering》2011,88(8):1664-1667
SU-8 is a very interesting material for the fabrication of lab-on-chip devices applied to organic synthesis because of its resistance to chemicals and solvents. Among the possible application fields of microreactor technology, radiochemistry is emerging because microfluidic apparatuses allow to perform radiosynthesis in a quicker, safer and more reliable way compared to traditional vessel-based approaches. Microreactors for synthesizing [18F]-labelled radiopharmaceuticals require the employment of materials that do not adsorb fluoride and are resistant to solvents and chemicals. Pyrex, glass and silicon adsorb fluoride ions, therefore they are not the best choice. SU-8 is stable towards chemicals and solvents but nothing is known about its behaviour with radioactive fluoride. Here we develop a simple fabrication procedure to make fully coated SU-8 microreactors and we demonstrate the potentiality of SU-8 microfluidic architectures to be used for radiosynthesis, giving a proof of their low tendency to trap radioactive fluoride if compared with traditional glass microchannels. 相似文献
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SU-8胶是一种负性、环氧树脂型、近紫外线光刻胶。它适于制作超厚、高深宽比的MEMS微结构。为电铸造出金属微结构,通常需要采用金属基底。但SU-8胶对金属基底的结合力通常不好,因而限制了其深宽比的提高。从SU-8胶与基底的浸润性、基底表面粗糙度以及基底对近光紫外光的折射特性入手,对SU-8胶与基底的结合力进行分析,首次指出:在近紫外光的折射率高的基底与SU-8胶有很好的结合性。经实验得出经过氧化处理的TI片的SU-8胶的结合性强。这有利于为MEMS提供低成本,高深宽比的金属微结构。 相似文献