Investigation on the passivation,band alignment,gate charge,and mobility degradation of the Ge MOSFET with a GeO/Al;O;gate stack by ozone oxidation

Ge has been an alternative channel material for the performance enhancement of complementary metal-oxide-semiconductor(CMOS)technology applications because of its high carrier mobility and superior compatibility with Si CMOS technology.The gate structure plays a key role on the electrical property.In this paper,the property of Ge MOSFET with Al₂O₃/GeO_x/Ge stack by ozone oxidation is reviewed.The GeO_xpassivation mechanism by ozone oxidation and band align-ment of Al2O3/GeO_x/Ge stack is described.In addition,the charge distribution in the gate stack and remote Coulomb scatter-ing on carrier mobility is also presented.The surface passivation is mainly attributed to the high oxidation state of Ge.The en-ergy band alignment is well explained by the gap state theory.The charge distribution is quantitatively characterized and it is found that the gate charges make a great degradation on carrier mobility.These investigations help to provide an impressive un-derstanding and a possible instructive method to improve the performance of Ge devices.     

特制多孔硅的较低的反射率和较高的少数载流子寿命

Solar cell grade crystalline silicon with very low reflectivity has been obtained by electrochemically selective erosion.The porous silicon（PS） structure with a mixture of nano-and micro-crystals shows good antireflection properties on the surface layer, which has potential for application in commercial silicon photovoltaic devices after optimization.The morphology and reflectivity of the PS layers are easily modulated by controlling the electrochemical formation conditions（i.e., the current density and the anodization time）.It has been shown that much a lower reflectivity of approximately 1.42% in the range 380-1100 nm is realized by using optimized conditions.In addition, the minority carrier lifetime of the PS after removing the phosphorus silicon layer is measured to be ～3.19 μs.These values are very close to the reflectivity and the minority carrier lifetime of Si3N4 as a passivation layer on a bulk silicon-based solar cell（0.33% and 3.03 μs, respectively）.     

STUDY ON THE RELATION BETWEEN STRUCTURE AND HOT CARRIER EFFECT IMMUNITY FOR DEEP SUB-MICRON GROOVED GATE NMOSFET’s

Grooved gate structure Metal-Oxide-Semiconductor(MOS) device is considered as the most promising candidate used in deep and super-deep sub-micron region,for it can suppress hot carrier effect and short channel effect deeply.Based on the hydrodynamic energy transoprt model,using two-dimensional device simulator Medici,the relation between structure parameters and hot carrier effect immunity for deep-sub-micron N-channel Mosfet‘s is studied and compared with that of counterpart conventional planar device in this paper.The examined structure parameters include negative junction depth,conventinal planar device in this paper.The examined structure parameters include negative junction depth,concave corner and effective channel length.Simulation results show that grooved gate device can suppress hot carrier effect is strongly influenced by the concave corner and channel length for grooved gate device.With the increase of concave corner,the hot carrier effect in groovd gate MOSFET decreases sharply,and with the reducing of effective channel length,the hot carrier effect becomes large.     

The Influence of Carrier Phase Error on the Performances of Digital Image m-QAM Transmission System

The effect of carrier phase error in digital image transmission system is discussed.Code error rate and SNR with carrier phase error in Gauss white noise channel are calculated,and the transmission system is simuated on computer.     

Analytical Modeling of Source-to-Drain Tunneling in Nanoscale Silicon MOSFET

Sub-10-nm bulk n-MOSFET(metal-oxide-semiconductor field effect transistor) direct source-todrain tunneling current density using Wentzel-Krammers-Brillouin(WKB) transmission tunneling theory has been simulated.The dependence of the source-to-drain tunneling current on channel length and barrier height is examined.Inversion layer quantization,band-gap narrowing,and drain induced barrier lowering effects have been included in the model.It has been observed that the leakage current density increases severely below 4 nm channel lengths,thus putting a limit to the scaling down of the MOSFETs.The results match closely with the numerical results already reported in literatures.     

Effect of temperature on the intensity and carrier lifetime of an AlGaAs based red light emitting diode

The influence of temperature on the intensity of light emitted by as well as the carrier life time of a standard AlGaAs based light emitting diode has been investigated in the temperature range from 345 to 136 K. The open-circuit voltage decay(OCVD) technique has been used for measured the carrier lifetime. Our experimental results reveal a 16% average increase in intensity and a 163.482-19.765 ns variation in carrier lifetime in the above temperature range. Further, theoretical and experimental analysis show that for negligible carrier density the intensity is inversely proportional to carrier lifetime for this sample.     

STUDY ON THE RELATION BETWEEN STRUCTURE AND HOT CARRIER EFFECT IMMUNITY FOR DEEP SUB-MICRON GROOVED GATE NMOSFET''''s

Grooved gate structure Metal-Oxide-Semiconductor (MOS) device is considered as the most promising candidate used in deep and super-deep sub-micron region, for it can suppress hot carrier effect and short channel effect deeply. Based on the hydrodynamic energy transport model, using two-dimensional device simulator Medici, the relation between structure parameters and hot carrier effect immunity for deep-sub-micron N-channel MOSFET's is studied and compared with that of counterpart conventional planar device in this paper. The examined structure parameters include negative junction depth, concave corner and effective channel length. Simulation results show that grooved gate device can suppress hot carrier effect deeply even in deep sub-micron region. The studies also indicate that hot carrier effect is strongly influenced by the concave corner and channel length for grooved gate device. With the increase of concave corner, the hot carrier effect in grooved gate MOSFET decreases sharply, and with the redu     

Interference-Cancellation Scheme for Multilayer Cellular Systems

A 5G network must be heterogeneous and support the co-existence of multilayer cells, multiple standards, and multiple application systems. This greatly improves link performance and increases link capacity. A network with co-existing macro and pico cells can alleviate traffic congestion caused by multicast or unicast subscribers, help satisfy huge traffic demands, and further extend converge. In order to practically implement advanced 5G technology, a number of technical problems have to be solved, one of which is inter-cell interference. A method called Almost Blank Subframe(ABS) has been proposed to mitigate interference; however, the reference signal in ABS still causes interference. This paper describes how interference can be cancelled by using the information in the ABS. First, the interference-signal model, which takes into account channel effect, time and frequency error, is presented. Then, an interference-cancellation scheme based on this model is studied. The timing and carrier frequency offset of the interference signal is compensated. Afterwards, the reference signal of the interfering cell is generated locally and the channel response is estimated using channel statistics. Then, the interference signal is reconstructed according to previous estimation of channel, timing, and carrier frequency offset. The interference is mitigated by subtracting the estimated interference signal. Computer simulation shows that this interference-cancellation algorithm significantly improves performance under different channel conditions.     

Analytical modeling of subthreshold current and subthreshold swing of Gaussiandoped strained-Si-on-insulator MOSFETs

This paper presents the analytical modeling of subthreshold current and subthreshold swing of short- channel fully-depleted （FD） strained-Si-on-insulator （SSOI） MOSFETs having vertical Gaussian-like doping pro- file in the channel. The subthreshold current and subthreshold swing have been derived using the parabolic approx- imation method. In addition to the effect of strain on silicon layer, various other device parameters such as channel length （L）, gate-oxide thickness （tox）, strained-Si channel thickness （ts_Si）, peak doping concentration （Np）, project range （Rp） and straggle （op） of the Gaussian profile have been considered while predicting the device characteris- tics. The present work may help to overcome the degradation in subthreshold characteristics with strain engineering. These subthreshold current and swing models provide valuable information for strained-Si MOSFET design. Ac- curacy of the proposed models is verified using the commercially available ATLASTM, a two-dimensional （2D） device simulator from SILVACO.     

A Novel Event Model for Performance Analysis of IEEE 802.11 DCF

After considering the memory effect among series events occurring on the channel, we propose a novel event model to analyze the channel status more precisely. The memory effect is caused by the backoff freezing regulation of IEEE 802.11 Distributed coordination function （DCF）, which has been ignored before and thus resulted in the inaccurate evaluation of the network performance. Based on our new event model, the network performance of IEEE 802.11 DCF, including throughput, packet delay distribution and energy efficiency is analyzed. Simulation results show that our model is highly accurate.     

沟道电势分布对静电感应晶闸管瞬态特性的影响

本论文从理论和实验上研究了由几何参数与偏置电压决定的沟道电势分布对静电感应晶闸管(SITH)瞬态性能的影响。从理论上推导出了SITH势垒高度和I-V特性的数学表达式。论文深入研究了影响器件在阻断态和导通态瞬态性能的主要因素和机理。研究结果对SITH的设计、制造、性能优化和应用有一定的指导意义。     

埋栅型电力静电感应晶闸管的I-V特性反向转折机理

研究了静电感应晶闸管的反向转折特性．当工作在正向阻断态的阳极电压增大到某一临界值时,静电感应晶闸管的I-V曲线呈现出反向转折特性,甚至转向导通态．在综合考虑了工作机理、双注入效应、空间电荷效应、沟道中的电子一空穴等离子体和载流子寿命变化的基础上分析了静电感应晶闸管的反向转折特性．首次给出了反向转折机理的理论解释,并给出了估算转折电压和电流的数学表达式,在常用工艺参数范围内,计算结果和实验测量值基本一致．     

埋栅型电力静电感应晶闸管的Ⅰ-Ⅴ特性反向转折机理

研究了静电感应晶闸管的反向转折特性.当工作在正向阻断态的阳极电压增大到某一临界值时,静电感应晶闸管的Ⅰ-Ⅴ曲线呈现出反向转折特性,甚至转向导通态.在综合考虑了工作机理、双注入效应、空间电荷效应、沟道中的电子-空穴等离子体和载流子寿命变化的基础上分析了静电感应晶闸管的反向转折特性.首次给出了反向转折机理的理论解释,并给出了估算转折电压和电流的数学表达式,在常用工艺参数范围内,计算结果和实验测量值基本一致.     

开管扩锌InP的液结光伏谱和少子扩散长度

用电化学液结方法测量了在４７０℃于氢气氛下开管扩锌ＩｎＰ样品的载流子浓度分布、不同深度的光伏谱和少于扩散长度。结果表明：在扩散区形成浓度为１０１７～１０１８ｃｍ－３较平坦的空穴分布；少于扩散长度由衬底的８～１０μｍ降至表面的０．２９μｍ以下；若轻微腐蚀去严重损伤的样品表层，将较大地提高新表层的少子扩散长度。     

Carrier mobility in inversion layers of Si–thin Ta2O5 structures

The behaviour of carrier mobility in the inversion channel of gateless p-MOSFETs with thin (7-50 nm) Ta₂O₅ layers, having a dielectric constant of (23-27) and prepared by rf sputtering of Ta in an Ar-O₂ mixture, has been investigated. It is shown that independently of the high dielectric constant of the layers, the transport properties in the channel are strongly affected by defects in Ta₂O₅/Si system in the form of oxide charge and interface states. These defects act as scattering centers and are responsible for the observed minority carrier mobility degradation. Both, the oxide and the interface state charges are virtually independent on the oxygen content (in the range 10-30%) during the sputtering process. A reduction of the oxide charge and the density of interface states with increasing Ta₂O₅ film thickness was found, which results in the observed increase of the inversion channel mobility with thickness. It is assumed that the bond defects (broken or strained Ta-bonds as well as weak Si-O bonds in the transition region between Ta₂O₅ and Si) are much more probable sources of defect centers rather than Ta and O vacancies or impurities.     

Role of Dislocation Scattering on the Electron Mobility of n-Type Long Wave Length Infrared HgCdTe on Silicon

It has been reported that the basic electrical properties of n-type long wave length infrared (LWIR) HgCdTe grown on silicon, including the majority carrier mobility (μ _e) and minority carrier lifetime (τ), are qualitatively comparable to those reported for LWIR HgCdTe grown on bulk CdZnTe by molecular beam epitaxy (MBE). Detailed measurements of the majority carrier mobility have revealed important differences between the values measured for HgCdTe grown on bulk CdZnTe and those measured for HgCdTe grown on buffered silicon substrates. The mobility of LWIR HgCdTe grown on buffered silicon by MBE is reported over a large temperature range and is analyzed in terms of standard electron scattering mechanisms. The role of dislocation scattering is addressed for high dislocation density HgCdTe grown on lattice-mismatched silicon. Differences between the low temperature mobility data of HgCdTe grown on bulk CdZnTe and HgCdTe grown on silicon are partially explained in terms of the dislocation scattering contribution to the total mobility.     

Energy level of minority carrier trap centers induced by light illumination in B-doped Cz-Si solar cells

The conversion efficiency of boron (B)-doped Czochralski silicon (Cz-Si) solar cells decreased by light illumination or minority carrier injection. Defects are induced by illumination and they act as trap centers, shorten the minority carrier (electron) lifetime. The energy level of this minority carrier trap center was determined by analyzing the open-circuit voltage (V_OC) changes as a function of substrate temperature. When substrate temperature is low, all electrons which are captured by the trap centers recombine with holes and they do not contribute to the generation of electric power. However, as the substrate temperature is increasing, some of the captured electrons are thermally excited to the conduction band before recombination. Hence, the lifetime of minority carriers are improved and V_OC is recovered. Based on this result, the energy level of trap center induced by light illumination is estimated to be 0.26 eV, which corresponds to the boron–oxygen-related defect (E_C-0.26 eV).     

Study of minority carrier diffusion lengths in photoactive layers of multijunction solar cells

A technique for determining a minority carrier’s diffusion length in photoactive III–V layers of solar cells by approximating their spectral characteristics is presented. Single-junction GaAs, Ge and multi-junction GaAs/Ge, GaInP/GaAs, and GaInP/GaInAs/Ge solar cells fabricated by hydride metal-organic vapor-phase epitaxy (H-MOVPE) have been studied. The dependences of the minority carrier diffusion length on the doping level of p-Ge and n-GaAs are determined. It is shown that the parameters of solid-state diffusion of phosphorus atoms to the p-Ge substrate from the n-GaInP nucleation layer are independent of the thickness of the latter within 35–300 nm. It is found that the diffusion length of subcells of multijunction structures in Ga(In)As layers is smaller in comparison with that of single-junction structures.     

A First-Principles Study of the Role of Na Vacancies in the Thermoelectricity of Na<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>CoO<Subscript>2</Subscript>

First principles calculations using the generalized gradient approximation to density functional theory have been carried out to evaluate formation energies of defects and the resultant changes in electronic structure of NaCoO₂ and Na_0.5CoO₂. The calculated formation energies confirm that Na vacancies form readily in this material, particularly through volatilization at elevated temperatures, consistent with experimentally observed behavior. Numerical analysis of the change in charge distribution upon Na vacancy formation shows that the vacancy plays a crucial role in modifying the electronic properties of the material. In these p-type thermoelectric materials, Na vacancies act as a reservoir for the minority carrier (electrons), removing them from the CoO₂ layer while simultaneously increasing the concentration of majority carriers (holes) available for conduction in the CoO₂ layer.     

静电感应晶闸管的负阻转折特性

针对静电感应晶闸管SITH在正向阻断态下加负栅压,当阳极电压增加到一定程度后Ⅰ-Ⅴ特性出现负阻转折的特性,以一种全新的角度,从SITH的作用机理出发,考虑双注入效应,考虑载流子寿命的变化,对负阻现象进行了物理分析,并计算了负阻转折电压和转折电流.