Effects of Annealing Temperature on Properties of ZnO Thin Films Grown by Pulsed Laser Deposition

ZnO thin films are deposited on n-Si（111） substrates by pulsed laser deposition（PLD） system. Then the samples are annealed at different temperatures in air ambient and their properties are investigated particularly as a function of annealing temperature. The microstructure, morphology and optical properties of the as-grown ZnO films are studied by X-ray diffraetion（XRD）. atomic force mieroseope（AFM）, Fourier transform infrared spectroscopy（FTIR） and photoluminescence（PL） spectra. The results show that the as- grown ZnO films have a hexagonal wurtzite structure with a preferred c-axis orientation. Moreover, the diameters of the ZnO crystallites become larger and the crystal quality of the ZnO fihns is improved with the increase of annealing temperature.     

Influence of deposition rate on the structural,optical and electrical properties of electron beam evaporated SnO2 thin films for transparent conducting electrode applications

The role of deposition rate in the structural,optical and electrical properties of SnO2 thin films deposited by electron beam evaporation method is investigated by varying the deposition powers viz.50,75,and 100 W.The structural characterization of the films is done by X-ray diffraction (XRD) technique.The surface morphology of the films is studied by scanning electron microscopy (SEM).Rutherford back scattering (RBS) measurements revealed the thickness of the films ranging from 200 nm to 400 and also a change in the concentration of oxygen vacancies which is found to be the maximum in the film deposited at the lowest deposition rate.Optical absorption spectrum is recorded using the UV-V is spectroscopy and the films are found to be transparent in nature.A shift in the absorption edge is observed and is attributed to a different level of allowed energy states in conduction band minimum.The Hall effect and electrical measurements show a variation in the carrier concentrations,mobility and resistivity of the films.In order to explore a better compromise in electrical and optical properties for transparent electrode applications,skin depths calculations are also done to find the optimized values of carrier concentration and mobility.     

Optical properties of electrochemically synthesized polypyrrole thin films:the electrolyte effect

Polypyrrole thin films are prepared by the potentiostatic mode of electrodeposition at ＋0.7 V versus a saturated calomel electrode （SCE）. The polypyrrole films are prepared in the presence of different electrolytes such as： p-toluene sulphonic acid （PTS）, oxalic acid and H2SO4. The prepared films are characterized by UV- vis absorption spectroscopy and normal reflectance measurements. The electrochemically synthesized films are semiconductor in nature. The band gap energy ofpolypyrrole thin films is found to be 1.95, 1.92 and 1.79 eV for H2 SO4, oxalic acid and p-toluene sulphonic acid, respectively. The normal reflectance spectroscopy of polypyrrole films shows that the maximum reflectance is in the presence of p-toluene sulphonic acid; this is may be due to a more distinct microstructure than the others. The optical constants such as the extinction coefficient, refractive index, optical conductivity, etc. are calculated and studied with various electrolytes.     

硼掺杂硅薄膜及其在叠层电池隧道结中的应用

Boron-doped hydrogenated silicon films with different gaseous doping ratios（B2H6/SiH4） were deposited in a plasma-enhanced chemical vapor deposition（PECVD） system.The microstructure of the films was investigated by atomic force microscopy（AFM） and Raman scattering spectroscopy.The electrical properties of the films were characterized by their room temperature electrical conductivity（σ） and the activation energy（Ea）.The results show that with an increasing gaseous doping ratio,the silicon films transfer from a microcrystalline to an amorphous phase,and corresponding changes in the electrical properties were observed.The thin boron-doped silicon layers were fabricated as recombination layers in tunnel junctions.The measurements of the I-V characteristics and the transparency spectra of the junctions indicate that the best gaseous doping ratio of the recombination layer is 0.04,and the film deposited under that condition is amorphous silicon with a small amount of crystallites embedded in it.The junction with such a recombination layer has a small resistance,a nearly ohmic contact,and a negligible optical absorption.     

锡掺杂对碲化镉多晶薄膜形貌和光学性能的影响

Sn-doped CdTe polycrystalline films were successfully deposited on ITO glass substrates by close space sublimation. The effects of Sn-doping on the microstructure, surface morphology, and optical properties of polycrys- talline films were studied using X-ray diffraction, scanning electron microscopy, and ultraviolet-visible spectrophotometry, respectively. The results show that the lower molar ratio of Sn and CdTe conduces to a strongly preferential orientation of （111） in films and a larger grain size, which indicates that the crystallinity of films can be improved by appropriate Sn-doping. As the molar ratio of Sn and CdTe increases, the preferential orientation of （111） in films becomes weaker, the grain size becomes smaller, and the crystal boundary becomes indistinct, which indicates that the crystallization growth of films is incomplete. However, as the Sn content increases, optical absorption becomes stronger in the visible region. In summary, a strongly preferential orientation of （111） in films and a larger grain size can be obtained by appropriate Sn-doping （molar ratio of Sn ： CdTe = 0.06 ： 1）, while the film retains a relatively high optical absorption in the visible region. However, Sn-doping has no obvious influence on the energy gap of CdTe films.     

Optimization of n/i and i/p buffer layers in n-i-p hydrogenated microcrystalline silicon solar cells

Hydrogenated microcrystalline silicon （μc-Si：H） intrinsic films and solar cells with n-i-p configuration were prepared by plasma enhanced chemical vapor deposition （PECVD）. The influence of n/i and i/p buffer layers on the μc-Si：H cell performance was studied in detail. The experimental results demonstrated that the efficiency is much improved when there is a higher crystallinity at n/i interface and an optimized a-Si：H buffer layer at i/p interface. By combining the above methods, the performance of μc-Si：H single-junction and a-Si：H/μc-Si：H tandem solar cells has been significantly improved.     

Preparation and characterization of transparent conducting ZnO:W films by DC magnetron sputtering

Tungsten-doped zinc oxide（ZnO:W） films with low resistivity and high transmittance were successfully deposited on glass substrates by direct current magnetron sputtering at low temperature.The deposition pressure is varied from 12 to 21 Pa.The X-ray diffraction results show that all of the deposited films are polycrystalline and have a hexagonal structure with a preferred c-axis orientation.The crystallinity,morphologies and resistivity of ZnO:W films greatly depend on deposition pressure while the optical properties including optical transmittance, optical band gap as well as refractive index are not sensitive to deposition pressure.The deposited films with an electrical resistivity as low as 1.5×10^-4Ω·cm,sheet resistance of 6.8Ω/□and an average transmittance of 91.3% in the visible range were obtained at a deposition pressure of 21 Pa and sputtering power of 130 W.     

Deposition of Silicon Nitride Films by Silane Hydrazine Process

A new catalytic chemical vapor process for depositing silicon nitride films using silane hydrazine gaseous mixture is described.This system can be useful at a temperature of lower than 400 ℃.The catalytic process gives more rapid deposition rate than 10nm/min.The atomic composition ration.N/Si,which is evaluated by Rutherfold backattering method is about 1.4under a given experimental conditions more than the stoiciometric value of 1.33 in Si3N4.The infrared transmission spectra show a large dip at 850cm^-1 due to Si-N bonds and no clear dip due to Si-O bonds.High N-H bond density is the evidence that the deposition mechanism is limited by N-N bond breaking of the hydrazine.The H contents,evaluated from Si-H and N-H bonds in the infrared absorption spectra,and the deposition rate are measured as a function of the substrate temperature.In addition some film properties such as the reistivity and the breakdown electric field are presented.     

Effects of modulation frequency on the structure and electrical characteristics of μc-Si:H films prepared by pulsed VHF-PECVD

Modulation frequency and pulse duty cycle are two key parameters of pulsed VHF-PECVD technology. An experimental study on the mierocrystalline silicon materials prepared by pulsed VHF-PECVD technology in high deposition rate is presented. And combining the diagnosis of plasma process with optical emission spectroscopy （OES）, the dependence of microstructure and electrical properties of thin films on the pulse modulation frequency is discussed in detail.     

Nano-ZnO film preparation at low temperature and the optical indices calculation

The refractive indices of thin films based on Kramers-Kronig theory are corrected. And the correction theory is used to determine the optical indices of nano-ZnO thin films prepared by low temperature sol-gel method. The calculated results indicate that in the visible （Vis） range, the refractive indices of nano-ZnO thin films exhibit a slight abnormal dispersion, while in the ultraviolet （UV） region, the refractive indices increase with wavelengths increasing （normal dispersion）. But the refractive indices show complex change near the absorption edge. The maximum refractive index （1.95） of nano-ZnO thin films within UV range at low temperature annealing is much lower than that of the films annealed at high temperature. The absorption and refractive indices are closely related to the defects in nano-ZnO thin films.     

VHF-PFLWD法制备μc-SiGe薄膜的研究

分别以Si2 H6和GeH4及SiH4和GeH4两种组合气体为源气体,用甚高频等离子增强化学气相沉积(VHF-PECVD)制备μc-SiGe薄膜.用Raman散射光谱和原子力显微镜(AFM)对薄膜的结构进行研究.结果表明:与SiH4和GeH4制备的薄膜系列相比,Si2H6和GeH4制备的薄膜中Ge的融入速率相对较慢;用...     

Investigation of Laser-Assisted Microcrystalline SiGe Films Deposited at Low Temperature

SiGe films deposited by conventional plasma-enhanced chemical vapor deposition (PECVD) were compared with microcrystalline SiGe (μc-SiGe) films deposited at a low temperature using a laser-assisted plasma-enhanced chemical vapor deposition (LAPECVD). In the LAPECVD system, a CO₂ laser was used to assist the pyrolytic decomposition of SiH₄ and GeH₄ reactant gases. The μc-SiGe structure was identified using electron diffraction patterns from high-resolution transmission electron microscopy images. Microcrystalline SiGe films were analyzed using various measurements.     

本征微晶硅薄膜的结构演变及其对太阳电池光伏性能的影响

采用高压射频等离子体增强化学气相沉积(RF-PECVD)方法制备本征硅薄膜和n-i-P结构太阳电池,研究了氢稀释率对本征硅薄膜的电学特性和结构特性的影响.采用光发射谱(OES)和喇曼(Raman)散射光谱研究了处于过渡区的本征硅薄膜的纵向结构演变过程.结果表明:光发射谱和喇曼散射光谱可以作为研究硅薄膜的纵向结构演变有效手段.随着氢稀释率的增加,硅薄膜从非晶相向微晶相过渡时,其纵向结构的改变会严重影响硅薄膜太阳电池的光伏性能.     

非晶硅薄膜的LF-PECVD制备及椭偏表征

以SiH4为先驱气体,采用低频等离子体增强化学气相沉积（LF-PECVD）方法在Si衬底上制备了氢化非晶硅（a-Si∶H）薄膜。在薄膜沉积过程中,工艺参数将会影响非晶硅薄膜的沉积速率和光学性能。通过反射式椭圆偏振光谱仪（SE）研究了SiH4气体流量、工作压强和衬底温度等条件对氢化非晶硅沉积速率和光学性质的影响。实验结果表明,氢化非晶硅沉积速率随着SiH4流量、工作压强和衬底温度的改变而规律地变化。相比于SiH4流量和工作压强,衬底温度对折射率、吸收系数和折射率的影响更大。各工艺条件下所制备的非晶硅薄膜光学禁带宽度在1.61～1.77eV。     

a-GaP薄膜的制备及其光学性质研究(英文)

We present a new deposition method of amorphous GaP films-Plasma Enhanced Chemical Transport Deposition (PECTD) and have successfully obtained a series of a-GaP films with a mirror-like surface and a stable chemical structure. The character of structure and composition ratio of a-GaP films have been investigated by XRD-spectra, IR absorption spectra and XPS. The results indicate that the stoichiometric composition of a-GaP films can be controlled by changing the deposition conditions such as the pressure in the deposition region, the temperature in the source region and the density of r.f. power.The optical properties of a-GaP films have been also studied systematically. The value of Egopt is aboat 1.6eV -which is greater than that reported by other group. We temporarily interpret this phenomenon by means of the existence of H and Cl atoms in a-GaP structure network. A long absorption band-tail in the energy band gap of a-GaP films was discovered.     

用标度理论和蒙特卡洛方法研究微晶硅薄膜的生长机制

使用热丝化学气相沉积技术制备微晶硅薄膜(沉积速度为1.2nm/s),通过原子力显微镜研究了薄膜前期生长的粗糙化过程.按照标度理论获得微晶硅薄膜的生长因子为β≈O.67,粗糙度因子为α≈O.80,动力学因子为1/z=0.40.这些标度指数不能用一般的生长模型来解释.通过蒙特卡罗模拟给出与实验一致的结果.模拟表明,入射流方向、生长基元的类型和浓度、生长基元的粘滞、再发射和影蔽过程都对微晶硅薄膜的表面形貌有比较重要的影响.     

p型微晶硅薄膜的沉积及其在微晶硅薄膜太阳电池中的应用

采用等离子体化学气相沉积(PECVD)方法制备了硼掺杂微晶硅薄膜和微晶硅薄膜太阳电池.研究了乙硼烷含量、p型膜厚度及沉积温度对硼掺杂薄膜生长特性和高沉积速率的电池性能的影响.通过对p型微晶硅薄膜沉积参数的优化,在本征层沉积速率为0.78nm/s的高沉积速率下,制备了效率为5.5%的单结微晶硅薄膜太阳电池.另外,对P型微晶硅薄膜的载流子疏输运机理进行了讨论.     

Highly efficient light emitters based on the spiro concept

We present a comparison of different molecular glasses based on the spiro-concept with respect to their photoemission properties. The absorption and emission spectra as well as the photoluminescence quantum yields in solution are characterized. For thin amorphous films, prepared by vacuum vapor deposition, we examined amplified spontaneous emission (ASE) by optical pumping with picosecond pulses at 337 nm. Efficient ASE emission with thresholds of down to 1 μJ/cm² was observed.     

S枪磁控溅射淀积非晶硅光电导薄膜的制备工艺及特性研究

本文介绍用直流磁控S枪在H_2/Ar混合气体中反应溅射单晶硅靶淀积a-Si:H光电导薄膜的制备工艺。研究了用这种技术制备的a-Si:H薄膜的光学特性(透射率光谱、光学常数和光学带隙等)、晶相结构(用电子衍射图谱)、红外吸收光谱和光电导性能。并讨论了制备工艺条件与薄膜微结构和性能的关系。     

Photoluminescence properties and chemical bond variations of SiN x :H films with silicon quantum dots

Hydrogenated silicon nitride(SiNx :H) thin films are deposited on p-type silicon substrates by plasma enhanced chemical vapor deposition(PECVD) using a gas mixture of ammonia and silane at 230 °C.The chemical compositions and optical properties of these films,which are dealt at different annealing temperatures,are investigated by Fourier transform infrared(FTIR) absorption spectroscopy and photoluminescence(PL) spectroscopy,respectively.It is shown that the FTIR presents an asymmetric Si-N stretching mode,whose magnitude is enhanced and position is shifted towards higher frequencies gradually with the increase of the annealing temperature.Meanwhile,it is found that the PL peak shows red shift with its magnitude decreasing,and disappears at 1100 °C.The FTIR and PL spectra characteristics suggest that the light emission is attributed to the quantum confinement effect of the carriers inside silicon quantum dots embedded in SiNx : H thin films.