Epitaxial growth of Ge thin film on Si (001) by DC magnetron sputtering

We have demonstrated that sub-10 nm-thick heteroepitaxial Ge films on Si (001) having smooth surfaces can be obtained by DC magnetron sputtering. Ge films grown at 350 °C preserve the smooth surfaces with a roughness root mean square (RMS) of 0.39 nm, whereas, the Ge films grown at 500 °C show significant roughness with an island-like morphology. In samples grown at 350 °C, it is confirmed that the Ge films are grown epitaxially by cross-section transmission electron microscopy (TEM) and X-ray diffraction (XRD) rocking curve measurements. Rapid thermal annealing (RTA) at 720 °C is effective in improving the crystalline quality and the degradation in the roughness is negligible. Raman spectra and an XRD reciprocal space map reveal that the epitaxial Ge grown at 350 °C show an in-plane compressive strain and that the strain continues to remain after a 720 °C RTA.     

Synthesis of ZnO: Ge nanocomposite thin films by plasma gas condensation

In this work, we introduce a new method for the synthesis of Ge nanoparticles embedded ZnO thin films that are considered to be a potential candidate for photovoltaic applications. As opposed to current techniques, for the independent preparation of Ge nanoparticles, we propose using Cluster Deposition Source (CDS), which utilizes gas condensation of sputtered Ge atoms. For the synthesis of ZnO thin film host material conventional sputtering technique is employed. In the proposed technique independently synthesized Ge nanoparticles and ZnO thin films are combined into a composite structure on (100) oriented Si substrates. X-ray diffraction (XRD) patterns of the samples have revealed that Ge nanoparticles preferentially settle on (113) planes on top of the (002) oriented ZnO layer. It is realized that Ge nanoparticles with sizes ranging from 16 nm to 20 nm could be embedded into a well-defined ZnO matrix. In fact, transmission electron microscopy (TEM) studies performed on Ge nanoparticles captured on a Cu grids placed just above the substrate during deposition for about 60 s have manifested that Ge nanoparticles reach to ZnO matrix as clusters composed of particles with sizes of about 7–8 nm and then eventually grow larger due to substrate heating implemented during capping layer deposition. Optical absorption measurements have revealed that Ge nanoparticle inclusion lead to an additional absorption edge at about 2.75 eV along with 3.17 eV edge resulting from ZnO host.     

Synthesis of highly selective and sensitive Cu-doped ZnO thin film sensor for detection of H2S gas

Copper (Cu) doped zinc oxide (ZnO) thin films were successfully prepared by a simple sol-gel spin coating technique. The effect of Cu doping on the structural, morphology, compositional, microstructural, optical, electrical and H₂S gas sensing properties of the films were investigated by using XRD, FESEM, EDS, FTIR, XPS, Raman, HRTEM, and UV–vis techniques. XRD analysis shows that the films are nanocrystalline zinc oxide with the hexagonal wurtzite structure and FESEM result shows a porous structured morphology. The gas response of Cu-doped ZnO thin films was measured by the variation in the electrical resistance of the film, in the absence and presence of H₂S gas. The gas response in relation to operating temperature, Cu doping concentration, and the H₂S gas concentration has been systematically investigated. The maximum H₂S gas response was achieved for 3 at% Cu-doped ZnO thin film for 50 ppm gas concentration, at 250 °C operating temperature.     

Fabrication of Ag nanoparticle/ZnO thin films using dual-plasma-enhanced metal-organic chemical vapor deposition (DPEMOCVD) system incorporated with photoreduction method and its application

We report a novel method to grow silver nanoparticle/zinc oxide (Ag NP/ZnO) thin films using a dual-plasma-enhanced metal-organic chemical vapor deposition (DPEMOCVD) system incorporated with a photoreduction method. The crystalline quality, optical properties, and electrical characteristics of Ag NP/ZnO thin films depend on the AgNO₃ concentration or Ag content and annealing temperature. Optimal Ag NP/ZnO thin films have been grown with a AgNO₃ concentration of 0.12 M or 2.54 at%- Ag content and 500 °C- rapid thermal annealing (RTA); these films show orientation peaks of hexagonal-wurtzite-structured ZnO (002) and face-center-cubic-crystalline Ag (111), respectively. The transmittance and resistivity for optimal Ag NP/ZnO thin films are 85% and 6.9×10⁻⁴ Ω cm. Some Ag NP/ZnO transparent conducting oxide (TCO) films were applied to InGaN/GaN LEDs as transparent conductive layers. The InGaN/GaN LEDs with optimal Ag NP/ZnO TCO films showed electric and optical performance levels similar to those of devices fabricated with indium tin oxide.     

Improvement in crystal quality of ZnO film on Si substrate by using a homo-buffer layer

ZnO thin films without and with a homo-buffer layer have been prepared on Si(1 1 1) substrates by pulsed laser deposition (PLD) under various conditions. Photoluminescence (PL) measurement indicates that the optical quality of ZnO thin film is dramatically improved by introducing oxygen into the growth chamber. The sample deposited at 60 Pa possesses the best optical properties among the oxygen pressure range studied. X-ray diffraction (XRD) results show that the films directly deposited on Si are of polycrystalline ZnO structures. A low-temperature (500 °C) deposited ZnO buffer layer was used to enhance the crystal quality of the ZnO film. Compared to the film without the buffer layer, the film with the buffer layer exhibits aligned spotty reflection high-energy electron diffraction (RHEED) pattern and stronger near-band-edge emission (NBE) with a smaller full-width at half-maximum (FWHM) of 98 meV. The structural properties of ZnO buffer layers grown at different temperatures were investigated by RHEED patterns. It is suggested that the present characteristics of the ZnO epilayer may be raised further by elevating the growth temperature of buffer layer to 600 °C.     

Ge-rich SiGe thin film deposition by co-sputtering in in-situ and ex-situ solid phase crystallization for photovoltaic applications

This study investigates the properties of high Ge content silicon-germanium thin films in the non-hydrogenated state (Ge-rich SiGe) deposited on glass by RF magnetron co-sputtering in both in-situ and ex-situ solid phase crystallization (SPC) at various temperatures, such as RT to 550 °C. The structural and optical characteristics of SiGe films have been explored systematically by optimizing growth temperature. Atomic composition of films was determined by EDX, which showed up to 77 at% of Ge. Structural properties were characterized by XRD, which revealed all samples to be in amorphous nature. The results from Raman and UV–VIS–IR transmittance measurements showed that the properties of amorphous Si_0.23Ge_0.77 films improved at 450 °C in both in-situ and ex-situ SPC processes. In addition, EDX exposed an advantage of in-situ process over ex-situ due to the incorporation of oxygen during ex-situ thermal annealing. Possible deposition at low substrate temperature as found here suggests that these Si_0.23Ge_0.77 films have a substantial potential to be used in thin film Si-based solar cells.     

Multifunctional device based on ZnO:Fe nanostructured films with enhanced UV and ultra-fast ethanol vapour sensing

Extensive application requests on high-performance gas sensors and photodetectors reveal the importance of controlling semiconducting oxide properties. Sensing properties of ZnO nano- and micro-structures can be tuned and their functional performances can be enhanced more efficiently by metal-doping. Here, we report the synthesis of crystalline Fe-doped ZnO (ZnO:Fe) nanostructured films via a cost-effective and simple synthesis from chemical solutions (SCS) approach followed by rapid thermal annealing (RTA) with excellent potential for the development of multifunctional devices for UV and ethanol (C₂H₅OH) vapour sensing. The effects of two types of thermal annealing on the ZnO:Fe morphology, the crystallinity, the electronic and the vibrational properties, the UV radiation and the gas sensing properties are investigated. The experimental results indicate an increase in UV response (I_UV/I_DARK~10⁷) of as-grown ZnO nanostructured films by Fe-doping, as well as an essential improvement in rise and decay times due to RTA effects at 725 °C for 60 s. In comparison with un-doped samples, ZnO:Fe (0.24 at%) specimens showed a response to ethanol which is enhanced by a factor of two, R_air/R_gas~61. It was demonstrated that by using Fe-doping of ZnO it is possible to reduce essentially the response τ_r and recovery times τ_d of the multifunctional device. The involved gas sensing mechanism is discussed in detail in this paper. The presented results could be of great importance for the application of RTA and doping effects for further enhancement of UV detection and gas sensing performances of the ZnO:Fe nanomaterial-based multifunctional device.     

Defects in Zn1−x−yCoxMgyO nanoparticles: Probed by XRD,RAMAN and PAS techniques

Wurtzite Zn_1?x?yMg_xCo_yO nanoparticles of size 14–20 nm are synthesized by the conventional coprecipitation route and are analyzed using XRD, FESEM, UV–visible, Raman, and Positron annihilation spectroscopic techniques. XRD patterns reveal formation of a single wurtzite phase of ZnO on adding Mg, Co or both. In addition to six Raman active modes corresponding to the wurtzite structure of space group C_6ν⁴, we also observe additional Raman modes at 519, 544 and 673 cm^?1 irrespective of the dopant type and concentration. These modes exactly match with the silent vibrational modes of ZnO lattice as calculated by the ab initio calculations. From positron life time measurements, we observe that while the shortest lifetime τ₁, the lifetime of positrons that annihilate in the grain boundary regions match well with the lifetime of positrons in a defect free ZnO (τ₁～158 ps), the intermediate lifetime, τ₂ of all three samples match with the life time of positron annihilating at the cluster of (Zn+O) di-vacancies. We conclude that the origin of additional Raman modes is not due to impurities as reported in the literature rather is due to host lattice defects.     

Characterization of n-type Ge layers on Si (100) substrates grown by rapid thermal chemical vapor deposition

Phosphorus-doped n-type Ge layers were grown on p-type Si (100) wafers (8 in. in diameter, resistivity 5–15 Ω cm) using rapid thermal chemical vapor deposition (RTCVD). The surface morphology was very smooth, with a root mean square (RMS) surface roughness of 0.29 nm. The in-plane lattice constant calculated from high-resolution X-ray diffraction (HR-XRD) data was 0.5664 nm, corresponding to in-plane tensile strain of ～0.47%. The Raman Ge peak for each location indicates tensile strain from the Ge wafer. We estimated the in-plane strain as tensile strain of ～0.45%, in excellent agreement with the XRD analysis. Initial photocurrent spectrum experiments on the sample confirm valence band splitting of the direct gap induced by tensile strain. The temperature dependence of the direct bandgap energy E_Γ1 of Ge can be described by the empirical Varshni expression E_Γ1(T)=0.864–5.49×10^–4T ²/(T+296).     

Control of the Ti diffusion in Pt/Ti bottom electrodes for the fabrication of PZT thin film transducers

For the achievement of microactuators based on piezoelectric thin films, a Pt/Ti/Si bottom electrode is widely used. This study presents the experimental results for Ti out-diffusion in Pt and Si for both sputtered Pt/Ti and Pt/TiO_x electrodes. These results have been compared before and after a rapid thermal annealing (RTA). The diffusion has been characterized by secondary ion mass spectroscopy (SIMS) analysis using Cs⁺ as a primary ion source. The Pt orientation has been observed by XRD measurements. Ti thin films (20 nm) have been sputtered in pure Ar whereas TiO_x films have been obtained by reactive sputtering in a mixture of Ar/O₂ (90/10). Finally, the Pt (100 nm) has been sputtered without vacuum breaking. After RTA (400°C, 30 s, in N₂), the Pt film exhibited a (1 1 1) orientation for both Ti and TiO_x adhesion films. The roughness of the Pt film measured by AFM with TiO_x underlayer was 80% less than that of the Pt/Ti bi-layer. The TiO_x film, as shown by SIMS analysis, has drastically reduced the diffusion of Ti in both Pt and Si. This phenomenon is accompanied by a very low Pt roughness. These results are analyzed in terms of diffusion and regrowth mechanisms inside the Pt film.     

Biosynthesis of zinc oxide nanoparticles from Azadirachta indica for antibacterial and photocatalytic applications

Green synthesis of nanoparticles is gaining importance and has been suggested as possible alternatives to chemical and physical methods. The present work reports low-cost, green synthesis of zinc oxide (ZnO) nanoparticles using 25% (w/v) of Azadirachta indica (Neem) leaf extract. The biosynthesized nanoparticles were characterized by transmission electron microscopy (TEM), energy-dispersive X-ray spectroscopy (EDX), UV–visible spectroscopy (UV–vis), X-ray diffraction (XRD) and fourier transform infrared spectroscopy (FTIR). The synthesized ZnO nanoparticles were pure, predominantly spherical in shape with size ranging from 9.6 to 25.5 nm. In the present work, the biosynthesized ZnO nanoparticles have been used for antibacterial and photocatalytic applications. The antibacterial activity of characterized samples was determined using different concentrations of biosynthesized ZnO nanoparticles (20 µg/mL, 40 µg/mL, 60 µg/mL, 80 µg/mL and 100 µg/mL) against Gram-positive and Gram-negative bacteria: Staphylococcus aureus, Streptococcus pyogenes and Escherichia coli using shake flask method. The obtained results revealed that the bacterial growth decreases with increase in concentration of biosynthesized ZnO nanoparticles. In Addition, Gram-positive bacteria seemed to be more sensitive to ZnO nanoparticles than Gram-negative bacteria. The biosynthesized ZnO nanoparticles showed photocatalytic activity under the UV light enhancing the degradation rate of methylene blue (MB), which is one of the main water-pollutant released by textile industries.     

Magnetron-sputtered high performance Y-doped ZnO thin film transistors fabricated at room temperature

In this report, sputtered-grown undoped ZnO and Y-doped ZnO (ZnO:Y) thin film transistors (TFTs) are presented. Both undoped ZnO and ZnO:Y thin films exhibited highly preferred c-axis oriented (002) diffraction peaks. The ZnO:Y thin film crystallinity was improved with an increase of (002) peak intensity and grain size. The electrical properties of ZnO:Y TFTs were significantly enhanced relative to undoped ZnO TFTs. ZnO:Y TFTs exhibited excellent performance with high mobility of 38.79 cm² V⁻¹ s⁻¹, small subthreshold swing of 0.15 V/decade, and high I_on/I_off current ratio of the order of 8.17 × 10⁷. The O_1s X-ray photoelectron spectra (XPS) showed oxygen vacancy-related defects present in the ZnO:Y TFTs, which contributed to enhancing the mobility of the TFTs.     

GISAXS analysis of Ge nanoparticles embedded ZnO thin films: The effect of oxygen partial pressure and thermal process on the nanostructured aggregations

Ge nanoparticles embedded in ZnO thin films (synthesized on p-type Si substrates) were investigated to explore their potential usage possibilities as diodes for opto-electronic devices and photovoltaics, thin-film transistors, and solar cells. Nano scale structural details under the effect of different gas pressure of O₂ may include some hints to understand and develop structure-property correlations of the focused type materials. With this purpose, GISAXS (Grazing-incidence small-angle X–ray scattering) was used for 3D structural analysis of the films according to the thermal process (Rapid Thermal Annealing: RTA and Absence of Thermal Effect: AS-MADE) and O₂ partial pressure during the deposition of ZnO matrix.As a result of the study, it may be said that size and shape controlled growth processes are possible for these types of films. Especially, increase in pressure indicates orthogonal like prismatic morphology at 1 mTorr, cylindrical at 3 mTorr and more compact spherical formation at 5 mTorr. That way, morphology controlled nanoscale growth can be achieved by changing the oxygen partial pressure for the oxide matrices. On the other hand, size of the nano aggregations decreases with increased partial pressure for both of RTA processed and AS-MADE samples. Decreasing ratio in the size of AS-MADE sample is bigger than that of RTA samples.     

Structural and electrical characterization of platinum (~15 at%) doped nickel silicides on Si(100) and SiGe/Si(100) substrates

Ni(Pt~15 at%)Si/Si(100) and Ni(Pt~15 at%)SiGe/SiGe/Si(100) films corresponding to rapid thermal annealing (RTA1) temperatures of 220, 230 and 240 °C with constant RTA2 (at 420 °C) have been investigated for sub 20 nm devices. X-ray reflectometry (XRR), X-ray diffraction (XRD), four point probe, and atomic force microscopy (AFM) techniques were employed for the characterization of NiSi and NiSiGe films. XRR results indicated that NiSi and NiSiGe film thicknesses increased with RTA1 temperatures. NiSi films densities increased with layer thickness but NiSiGe films displayed an opposite trend. The diffractograms revealed that NiSi and NiSiGe layers contain identical phases and possessed fiber texture at 220 °C. Whereas, the peaks shift were observed for NiSi (211) and NiSi (021) at higher RTA1 temperatures which appear due to Pt diffusion (hexagonal structures of larger grain size were noted). NiSiGe crystallites self-alignment was observed because of strained SiGe/Si(100) substrate. At 240 °C, NiSiGe layer showed the smallest crystallites. This is believed to be due to Pt distributed along the silicide grain boundaries which obstructs silicide grain growth. NiSi and NiSiGe sheet resistance decreased significantly with increase in RTA1 temperatures and found to correlate with multiple grain orientation. AFM revealed a smooth-stable surface morphology for all films.     

Rapid thermal annealing of cerium dioxide thin films sputtered onto silicon (111) substrates: Influence of heating rate on microstructure and electrical properties

The impact of the heating rate (HR) of a Rapid Thermal Annealing (RTA) on the crystallinity and on the morphology of CeO₂ thin films has been investigated by Raman Spectroscopy (RS), Photoluminescence (PL), Scanning Electron Microscopy (SEM), Energy Dispersive Spectroscopy (EDS), and tapping mode Atomic Force Microscopy (AFM). The electrical properties of CeO₂ thin films have also been studied with the Conductive AFM mode. This paper highlights the importance of the heating rate value used during an RTA on crystalline quality, morphology and on the electrical properties of the CeO₂ layer. In fact, the best crystallinity with a good morphology and a high resistivity has been obtained for a CeO₂ layer sputtered on (111) Si substrate and post-annealed at 1000 °C for 30 s with an HR of 25 °C/s.     

Temperature dependent study of basal plane stacking faults in Ag:ZnO nanorods by Raman and photoluminescence spectroscopy

We report the specific features of basal plane stacking faults (BSFs) in ZnO nanorods (NRs), studied by temperature dependent photoluminescence and Raman spectroscopy. At low temperature (4 K) the intense band of emission at 3.321 eV is attributed to the presence of BSFs defects and Ag as an acceptor dopant in ZnO. This specific peak red-shifts with the temperature increase, occupying the position 3.210 eV at RT. The nature of the emission is explained as exciton recombination of the electrons, confined in the homo-heterojunction QW, with the holes, localized near the Ag atoms close to SFs. Raman spectroscopy revealed that Ag:ZnO nanorods have slightly downshifted positions of the modes 330 cm⁻¹ and 440 cm⁻¹ by 4 cm⁻¹, which we explain as due to the presence of BSFs. It was also observed, that the longitudinal optical phonon mode A^LO, which is common polar mode for ZnO, was not detected by Raman spectroscopy in the samples with high BSFs density. This feature can be explained as due to existence of the bound charge induced by the BSFs in the NRs.     

Investigations on phosphorus doped amorphous/nanocrystalline silicon films deposited by a filtered cathodic vacuum arc technique in the presence of hydrogen gas

Phosphorus doped amorphous/nanocrystalline silicon (a-Si:H/nc-Si:H) thin films have been deposited by a filtered cathodic vacuum arc (FCVA) technique in the presence of hydrogen gas at different substrate temperatures (T_s) ranging from room temperature (RT) to 350 °C. The films have been characterized by using X-ray diffraction (XRD), Raman spectroscopy, Fourier transform infrared (FTIR) spectroscopy, dark conductivity (σ_D), activation energy (ΔE), optical band gap (E_g) and secondary ion mass spectroscopy. The XRD patterns show that RT grown film is amorphous in nature but high temperature (225 and 350 °C) deposited films exhibit nanocrystalline structure with (111) and (220) crystal orientations. The crystallite size of higher temperature grown silicon film evaluated was between 13 and 25 nm. Raman spectra reveal the amorphous nature of the film deposited at RT, whereas higher temperature deposited films show crystalline nature. The crystalline volume fraction of the silicon film deposited at higher temperatures (225 and 350 °C) was estimated to be 58 and 72%. With the increase of T_s, the bonding configuration changes from mono-hydride to di-hydride as revealed by the FTIR spectra. The values of σ_D, ΔE and E_g of silicon films deposited at different T_s were found to be in the range of 5.37×10⁻⁴–1.04 Ω⁻¹ cm⁻¹, 0.05–0.45 eV and 1.42–1.83 eV, respectively. Photoconduction of 3.5% has also been observed in n-type nc-Si:H films with the response and recovery times of 9 and 12 s, respectively. A n-type nc-Si:H/p-type c-Si heterojunction diode was fabricated which showed the diode quality factor between 1.6 and 1.8.     

ZnO缓冲层和退火处理对MgO薄膜结构的影响

采用直流反应磁控溅射法在Si衬底上引入ZnO缓冲层制备了沿(200)晶面择优取向生长的MgO薄膜,然后分别采用快速退火和常规退火两种不同的方式对MgO薄膜进行晶化处理。利用X射线衍射仪(XRD)以及原子力显微镜(AFM)研究了ZnO缓冲层以及两种不同的退火方式对MgO薄膜的结构和形貌的影响。结果表明:具有合适厚度的ZnO缓冲层可以显著地提高MgO薄膜的结晶质量。另外,与快速退火相比,常规退火处理后得到的MgO晶粒均匀圆润,有着较大的(200)衍射峰强度以及较小的表面粗糙度。     

Sol–gel derived nanocrystalline ZnO photoanode film for dye sensitized solar cells

Nanocrystalline ZnO was synthesized from zinc (II) acetate/oxalate mixture using a facile sol–gel synthesis and is characterized by techniques such as powder XRD, FTIR and Raman spectroscopy, TEM and SEM. The TEM and SEM study showed that the nanocrystalline ZnO powder and film have an average particle size of 25 nm. This material has been successfully applied as photoanodes in dye sensitized solar cells (DSCs) constructed with standard N719 dye and conventional iodide/triiodide (I⁻/I₃⁻) electrolytes. A systematic investigation of the performance of DSCs with film thickness and dyeing time had also been carried out. Among the five different film thicknesses 4, 8, 12, 16 and 20 μm prepared, the best result was obtained for the film thickness of 16 μm for 2 h dying showing an efficiency of 2.2% with a J_SC of 4.7 mA cm⁻² and a very high fill factor of >73%.     

Effect of pH on the properties of electrochemically prepared ZnO thin films

Zinc Oxide (ZnO) thin films have been electrochemically deposited on fluorine doped tin oxide (FTO) coated glass substrates from an aqueous electrolyte. Deposition potential −0.96 V was optimized by cyclic voltammetry experiment for slow scan rate 5 mV/s with moderate agitation of electrolyte. The effect of pH on the electrodeposition of ZnO is studied by cyclic voltammetry, X-ray diffraction (XRD), scanning electron microscopy (SEM), optical spectroscopy and photoelectrochemical I-t transient characteristics. It is revealed that the pH of the electrolyte has significant influence on the surface morphology and structural properties. Highly crystalline ZnO layers with hexagonal crystal structure deposited for all pH of the solutions. A systematic shift observed in the reflections (002) and (101) is correlated with an effective tensile strain developed in the crystal lattice. A remarkable improvement in the crystallinity was noticed in the as-deposited ZnO samples with increasing pH and upon heat treatment. Optical direct band gap ~ 3.26–3.33 eV and transmittance ~70 −80% was measured by optical spectroscopy. PL measurement showed the band edge emission at 375–382 nm and a visible light emission at 410–550 nm. The intensities of emission peaks are found to be affected by the pH of bath. The compact, densely packed and well adherent thin films of ZnO electrodeposited in zinc nitrate bath for pH 2.0, 3.5 and 6.0. The surface morphology has been changed from granular to disc shaped and finally a large hexagonal sheets were obtained with an increase in the pH of bath. Nearly stoichiometric ZnO thin films are electrodeposited at −0.96 V versus Ag/AgCl reference electrode for pH 6.0. The photoelectrochemical (PEC) measurement (I-t transient curve) shows the enhancement in photocurrent with increasing the pH of zinc nitrate solution. After heat treatment the photocurrent is increased by 54%, 98% and 130% in the samples deposited from 2.0, 3.5 and 6.0 pH of the bath. I-V measurements were further confirmed the current enhancement in all samples after heat treatment.