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1.
介绍了GaAs,InP和GaN等几种重要化合物半导体电子器件的特点、应用和发展前景。回顾了GaAs,InP和GaN材料的材料特性及其器件发展历程与现状。分别讨论了GaAs基HEMT由PHEMT渐变为MHEMT结构和性能的变化,GaAs基HBT在不同电路应用中器件的特性,InP基HEMT与HBT的器件结构及工作特性,GaN基HEMT与HBT的器件特性参数。总体而言,化合物半导体器件与电路在高功率和高频电子器件方面发展较快,GaAs,InP和GaN材料所制得的各种器件电路工作在不同的频率波段,其在相关领域发展潜力巨大。  相似文献   

2.
InP基器件与电路的应用备受瞩目   总被引:1,自引:0,他引:1  
本文概述InP基HEMT与HBT器件与电路,在微波与毫米微波范围由于低噪声.功率应用的优越性能。而Inp基器件与电路在高速光通信和高频无线通信领域日趋成熟,备受瞩目。  相似文献   

3.
固态微波器件与电路的新进展   总被引:1,自引:1,他引:1  
描述了固态微波器件与电路五个发展阶段,并重点就当前发展的InP HEMT、窄禁带材料HEMT和HBT、宽禁带材料MESFET和HEMT、RF CMOS、InP HBT、SiGe HBT、RF MEMS等七个领域的发展特点、2006年最新进展,以及未来发展趋势进行了介绍.并就我国发展固态微波器件与电路提出发展建议.  相似文献   

4.
通过研究基于临时键合与解键合工艺的GaN、InP等材料无损剥离和晶圆级柔性集成等关键技术,提出了解决当前柔性化合物半导体器件普遍存在的转移后器件性能退化严重和大面积批量制造困难等问题的方案,制备出100 mm(4英寸)柔性GaN HEMT器件和75 mm (3英寸)InP HBT器件。其中,柔性GaN HEMT器件的饱和电流衰减仅为8.6%,柔性InP HBT器件的电流增益截止频率和最高振荡频率分别达到了358 GHz和530 GHz。表明采用本文介绍的柔性化方法制备的柔性电子器件在高频大功率等领域具有较好的应用前景。  相似文献   

5.
苏里曼 《半导体情报》1992,29(6):18-21,17
提出了准平面构成的InP HBT新结构,用Si离子注入在半绝缘InP:Fe上形成隐埋n型区来代替通常采用的外延n型收集区,可有效降低器件的高度,减小寄生参数,提高器件的可靠性,测量结果表明,晶体管的hfe=100,VCE=3-4V,fT=10GHz。  相似文献   

6.
报道了热应力下InGaAs/InP双异质结双极性晶体管(DHBT)的可靠性。对钝化与未钝化器件进行了应力温度为250℃、应力时间达到1 000h的存储加速寿命试验。从Gummel曲线可以发现,未钝化器件的电流增益在48h应力时间时降低了18.3%,而钝化器件在1 000h应力时间时仅下降了1.6%,说明基于SiN介质薄膜的表面钝化工艺有效提高了InP HBT的可靠性,这对于InP基器件和电路的实际应用具有重要意义。  相似文献   

7.
采用减小栅长(Lg)的方法可以显著提高磷化铟基高电子迁移率晶体管(InP HEMT)器件的直流和微波性能,并使器件的工作频率上升到太赫兹频段。采用T形栅工艺制备了70 nm栅长的InP HEMT器件,器件的直流跨导达到了2.87 S/mm,截止频率ft和最大振荡频率fmax分别为230 GHz和310 GHz。对器件的寄生参数进行了提取和去嵌入,得到了器件的本征S参数。采用经典的9参数模型拓扑结构对器件进行了小信号建模,模型仿真与测试结果拟合良好。针对电流的短沟道效应,采用电流分段的方法来拟合I-V曲线,取得了较好的拟合结果。最后采用Angelov模型对器件的电容进行建模,并最终建立了器件的大信号模型。  相似文献   

8.
于进勇  刘新宇  夏洋 《半导体学报》2009,30(11):114001-3
文章报道了几种具有不同微空气桥结构的InP HBT。由于微空气桥减小了寄生,发射极尺寸为2×12.5 um2 的InP/InGaAs HBT的截止频率和最大震荡频率都接近160GHz。论文将具有不同微空气桥结构的器件高频特性与传统InP HBT进行对比。对比表明,微空气结构明显降低了寄生,且双指微空气桥结构可以更有效的提高器件的射频特性。试验结果同时表明,微空气桥结构对于提高小尺寸发射极InP HBT的高频特性更有潜力。  相似文献   

9.
赵小宁 《半导体情报》2009,46(7):441-445
阐述了目前InP DHBT器件技术的研究进展,介绍了I型InP/InGaAs DHBT技术的研究水平和Ⅱ型InP/GaAsSb DHBT技术的开发现状。综述了InP DHBT在功率放大器、分布放大器、静态分频器和压控振荡器领域的应用,指出了其在高速数据传输系统中的重要性。为了适应高速数据传输系统的飞速发展,满足10/40/100Gbit/s高速系统的技术需求,对我国研发InPDHBT技术提出初步建议。  相似文献   

10.
InP DHBT技术的最新进展   总被引:1,自引:0,他引:1  
阐述了目前InP DHBT器件技术的研究进展,介绍了I型InP/InGaAs DHBT技术的研究水平和Ⅱ型InP/GaAsSb DHBT技术的开发现状。综述了InP DHBT在功率放大器、分布放大器、静态分频器和压控振荡器领域的应用,指出了其在高速数据传输系统中的重要性。为了适应高速数据传输系统的飞速发展,满足10/40/100Gbit/s高速系统的技术需求,对我国研发InPDHBT技术提出初步建议。  相似文献   

11.
This paper presents a comprehensive comparison of three state-of-the-art heterojunction bipolar transistors (HBTs); the AlGaAs/GaAs HBT, the Si/SiGe HBT and the InGaAs/InP HBT. Our aim in this paper is to find the potentials and limitations of these devices and analyze them under common Figure of Merit (FOM) definitions as well as to make a meaningful comparison which is necessary for a technology choice especially in RF-circuit and system level applications such as power amplifier, low noise amplifier circuits and transceiver/receiver systems. Simulation of an HBT device with an HBT model instead of traditional BJT models is also presented for the AlGaAs/GaAs HBT. To the best of our knowledge, this work covers the most extensive FOM analysis for these devices such as I-V behavior, stability, power gain analysis, characteristic frequencies and minimum noise figure. DC and bias point simulations of the devices are performed using Agilent's ADS design tool and a comparison is given for a wide range of FOM specifications. Based on our literature survey and simulation results, we have concluded that GaAs based HBTs are suitable for high-power applications due to their high-breakdown voltages, SiGe based HBTs are promising for low noise applications due to their low noise figures and InP will be the choice if very high-data rates is of primary importance since InP based HBT transistors have superior material properties leading to Terahertz frequency operation.  相似文献   

12.
This paper reviews the rapid advancements being made in the development of high electron mobility transistors (HEMTs) on InP substrates for future sub-millimetre wave (30–300 GHz) and terahertz (300 GHz to 3.5 THz) frequency applications. The InP HEMTs exhibits outstanding 2-DEG properties in InAlAs/InGaAs heterostructure. This paper highlights the rapid growths in the developments of enhancement mode (E-Mode) and depletion mode (D-Mode) InP HEMTs over the last 40 years, the use of InP HEMTs for cryogenic applications, reliability issues and kink effects in InP HEMTs in detail and it also highlights the impact of geometrical dimensions and their scaling on the performance of InP HEMTs. Their uniqueness in terms of low noise, low power dissipation, high gain and high frequency of operation has fuelled the incorporation of InP HEMTs in a wide variety of applications such as high speed wireless and optical communication systems, sub-millimetre wave (S-MMW) and THz receivers and transmitters, radio astronomy and radiometry, flight communications and sensing applications, material spectroscopy, active and passive imaging applications, biomedical instrumentation applications and high speed ICs such as low noise amplifiers (LNAs), multiplier chains, switches, multiplexers and flip-flops.  相似文献   

13.
利用90-nm InAlAs/InGaAs/InP HEMT工艺设计实现了两款D波段(110~170 GHz)单片微波集成电路放大器。两款放大器均采用共源结构,布线选取微带线。基于器件A设计的三级放大器A在片测试结果表明:最大小信号增益为11.2 dB@140 GHz,3 dB带宽为16 GHz,芯片面积2.6×1.2 mm2。基于器件B设计的两级放大器B在片测试结果表明:最大小信号增益为15.8 dB@139 GHz,3dB带宽12 GHz,在130~150 GHz频带范围内增益大于10 dB,芯片面积1.7×0.8 mm2,带内最小噪声为4.4 dB、相关增益15 dB@141 GHz,平均噪声系数约为5.2 dB。放大器B具有高的单级增益、相对高的增益面积比以及较好的噪声系数。该放大器芯片的设计实现对于构建D波段接收前端具有借鉴意义。  相似文献   

14.
从结构和性能两个方面阐述了 In P-HEMT的发展现状 ,并对其应用进行了简单描述。  相似文献   

15.
State-of-the-art power performance of a V-band InP HEMT MMIC is reported using a slot via process for reducing source inductance and a fully selective gate recess process for uniformity and high yield. The 0.1 μm gate length, high performance InGaAs/InAlAs/InP HEMTs that were utilized in the circuit exhibited a maximum power density of 530 mW/mm, power added efficiency of 39%, and a gain of 7.1 dB. At 60 GHz, a single-stage monolithic power amplifier achieved an output power of 224 mW with a PAE of 43%. The associated gain was 7.5 dB. These results are the best combination of output power and efficiency reported for an InP device and a MMIC at V-band, and clearly demonstrates the potential of the InP HEMT technology for very high efficiency, millimeter wave power applications  相似文献   

16.
Several μ-bridge structures for InP-based heterojunction bipolar transistors (HBTs) are reported. The radio frequency measurement results of these InP HBTs are compared with each other. The comparison shows that μ-bridge structures reduce the parasites and double μ-bridge structures have a better effect. Due to the utilization of the double μ-bridges, both the cutoff frequency f_T and also the maximum oscillation frequency f_(max) of the 2×12.5 μm~2 InP/InGaAs HBT reach nearly 160 GHz. The results also show that the μ-bridge has a better effect in increasing the high frequency performance of a narrow emitter InP HBT.  相似文献   

17.
Millimeterwave transistor technology is very important for MMIC design and fabrication.An InP HEMT with sawtoothed source and drain is described.The pattern distortion due to the proximity effect of lithography is avoided.High yield InP HEMT with good DC and RF performances is obtained.The device transconductance is 1050mS/mm,threshold voltage is -1.0V,and current gain cut off frequency is 120GHz.  相似文献   

18.
针对毫米波电路对大电流、高截止频率器件的要求,利用平坦化技术,设计并制作成功了结构紧凑的四指合成InGaAs/InP异质结双极晶体管.实验结果表明发射极的宽度可减小到1μm.Kirk电流可达到110wA,电流增益截止频率达到176GI-Iz.这种器件有望在中等功率的毫米波电路中有所应用.  相似文献   

19.
毫米波晶体管的制作技术是微波电路设计和制造的基础.从优化器件结构的角度,提出了一种锯齿型源漏的新型InP基HEMT器件.实验证明,采用这种结构可以减少光刻过程中临近效应的影响,改善源漏的图形形貌,提高器件制做的成品率.获得了具有良好直流和微波特性的晶体管,其跨导达到1050mS/mm,阈值电压为-1.0V,截止频率达到120GHz.  相似文献   

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