Growth and properties of Cu3SbS4 thin films prepared by a two-stage process for solar cell applications

Cu₃SbS₄ is a promising material for thin film heterojunction solar cells owing to its suitable optical and electrical properties. In this paper, we report the preparation of Cu₃SbS₄ thin films by annealing the Sb₂S₃/CuS stacks, produced by chemical bath deposition, in a graphite box held at different temperatures. The influence of annealing temperature on the growth and properties of these films is investigated. These films are systematically analyzed by evaluating their structural, microstructural, optical and electrical properties using suitable characterization techniques. X-ray diffraction analysis showed that these films exhibit tetragonal crystal structure with the lattice parameters a=0.537 nm and b=1.087 nm. Their crystallite size increases with increasing annealing temperature of the stacks. Raman spectroscopy analysis of these films exhibited modes at 132, 247, 273, 317, 344, 358 and 635 cm⁻¹ due to Cu₃SbS₄ phase. X-ray photoelectron spectroscopy analysis revealed that the films prepared by annealing the stack at 350 °C exhibit a Cu-poor and Sb-rich composition with +1, +5 and −2 oxidation states of Cu, Sb and S, respectively. Morphological studies showed an improvement in the grain size of the films on increasing the annealing temperature. The direct optical band gap of these films was in the range of 0.82–0.85 eV. Hall measurements showed that the films are p-type in nature and their electrical resistivity, hole mobility and hole concentration are in the ranges of 0.14–1.20 Ω-cm, 0.05–2.11 cm² V⁻¹ s⁻¹ and 9.4×10²⁰–1.4×10¹⁹ cm⁻³, respectively. These structural, morphological, optical and electrical properties suggest that Cu₃SbS₄ could be used as an absorber layer for bottom cell in multi-junction solar cells.     

Anode-supported SOFCs based on Sm0.2Ce0.8O2−δ electrolyte thin-films fabricated by co-pressing using microwave combustion synthesized powders

Decreasing the electrolyte thickness is an effective approach to improve solid oxide fuel cells (SOFCs) performance for intermediate-temperature applications. Sm_0.2Ce_0.8O_2−δ (SDC) powders with low apparent density of 32±0.3 mg cm⁻³ are synthesized by microwave combustion method, and SDC electrolyte films as thin as ~10 μm are fabricated by co-pressing the powders onto a porous NiO–SDC anode substrate. Dense SDC electrolyte thin films with grain size of 300–800 nm are achieved at a low co-firing temperature of 1200 °C. Single cells based on SDC thin films show peak power densities of 0.86 W cm⁻² at 650 °C using 3 vol% humidified H₂ as fuel and ambient air as oxidant. Both the thin thickness of electrolyte films and ultra-fine grained anode structure make contributions to the improved cell performance.     

Thermoelectric properties of copper-deficient Cu2-xSe (0.05 ≤ x ≤ 0.25) binary compounds

Recently, many novel superionic thermoelectric materials have been discovered along the concept of “phonon-liquid electron-crystal” (PLEC). Among them, Cu_2-xSe-based liquid-like materials are typical examples. In this study, a series of copper-deficient Cu_2-xSe (0.05 ≤ x ≤ 0.25) materials were synthesized and used to study the role of Cu vacancies on the electrical and thermal transport properties. The X-ray photoelectron spectroscopy (XPS) measurements suggest that the valence states of Cu and Se are independent on the Cu/Se atomic ratio. With increasing the content of Cu vacancies, the hole concentration is monotonously increased, leading to the improved electrical conductivity and reduced Seebeck coefficient. Based on the single parabolic band model analysis, it is found that changing the content of Cu vacancies does not obviously modify the material's electronic band structure and effective mass. Due to the presence of highly mobile Cu ions inside the crystal structure, the lattice thermal conductivities of all Cu_2-xSe (0.05 ≤ x ≤ 0.25) materials are very low with values around 0.39 W m⁻¹ K⁻¹ at 500 K. Because of the significantly reduced Seebeck coefficient and increased electronic thermal conductivity, the thermoelectric figure of merit zTs are decreased when increasing x from 0.05 to 0.25. At 750 K, a maximum zT of 0.46 is obtained in Cu_1.95Se among all Cu_2-xSe (0.05 ≤ x ≤ 0.25) materials.     

Effects of yttrium additions on the microstructure and charge transport properties of indium tin oxide semiconductors

The effects of yttrium (Y) additions (x=0, 0.05, 0.1, and 0.2) on the microstructure, chemical structure, and electrical properties of Y_xInSnO_y (YITO) thin films, prepared using a sol-gel process were examined. The transmission electron microscopy (TEM) observations showed that the undoped InSnO (ITO) film consisted of an amorphous structure with local crystalline domains on the film surface, whereas the Y additions (x=0.05, 0.1, and 0.2) to ITO suppressed the formation of the crystalline phase. X-ray photoelectron spectroscopy (XPS) analysis showed that the Y content decreased the concentration of oxygen vacancies owing to the strong incorporation of Y with oxygen. As a result of the Y incorporation, the carrier concentration of ITO films decreased. The saturation mobility (μ_sat), the on-off ratios (I_on/off), and the sub-threshold swing (S.S) of YITO films were 1.1 cm² V⁻¹ s⁻¹, ~10⁶, and ~0.5 V decade⁻¹, respectively, which are comparable with 1.7 cm² V⁻¹ s⁻¹, ~10⁵, and ~1.17 V decade⁻¹ of ITO film. Additionally, the initial threshold voltage (V_TH) was positive shift with increased of Y addition and V_TH shift (ΔV_TH) under the positive bias stress (PBS) results decreased by Y addition.     

Tunable multiferroic properties of Mn substituted BiFeO3 thin films

The current study explored the influence of Mn substitution on the electrical and magnetic properties of BiFeO₃ (BFO) thin films synthesized using low cost chemical solution deposition technique. X-ray diffraction analysis revealed that pure rhombohedral phase of BiFeO₃ was transformed to the tetragonal structure with P4mm symmetry on Mn substitution. A leakage current density of 5.7×10⁻⁴ A/cm² which is about two orders of magnitude lower than pure BFO was observed in 3% Mn doped BFO thin film at an external electric field >400 kV/cm. A well saturated (p-E) loops with saturation polarization (P_sat) and remanent polarization (2P_r) as high as 60.34 µC/cm² and 25.06 µC/cm² were observed in 10% Mn substituted BFO thin films. An escalation in dielectric tunability (n_r), figure of merit (K) and quality factor (Q) were observed in suitable Mn doped BFO thin films. The magnetic measurement revealed that Mn substituted BFO thin films showed a large saturation magnetization compared to pure BFO thin film. The highest saturation ~31 emu/cc was observed for 3% Mn substituted BFO thin films.     

Room-temperature UV-ozone assisted solution process for zirconium oxide films with high dielectric properties

A facile, low-cost, and room-temperature UV-ozone (UVO) assisted solution process was employed to prepare zirconium oxide (ZrO_x) films with high dielectric properties. ZrO_x films were deposited by a simple spin-coating of zirconium acetylacetonate (ZrAcAc) precursor in the environment-friendly solvent of ethanol. The smooth and amorphous ZrO_x films by UVO exhibit average visible transmittances over 90% and energy bandgap of 5.7 eV. Low leakage current of 6.0 × 10⁻⁸ A/cm² at 3 MV/cm and high dielectric constant of 13 (100 Hz) were achieved for ZrO_x dielectrics at the nearly room temperature. Moreover, a fully room-temperature solution-processed oxide thin films transistor (TFT) with UVO assisted ZrO_x dielectric films achieved acceptable performances, such as a low operating voltage of 3 V, high carrier mobility of 1.65 cm² V⁻¹ s⁻¹, and on/off current ratio about 10⁴–10⁵. Our work indicates that simple room-temperature UVO is highly potential for low-temperature, solution-processed and high-performance oxide films and devices.     

Preparation and characterization of transparent indium- doped TiO2 films deposited by MOCVD

Titanium dioxide (TiO₂) films doped with different indium (In) concentrations have been prepared on SrTiO₃ (STO) substrates by high vacuum metalorganic chemical vapor deposition (MOCVD). X-ray diffraction (XRD) analyses revealed the TiO₂ films doped with low In concentrations to be [001] oriented anatase phase and the films with high In concentrations to present polycrystalline structures. The 1.8% In-doped TiO₂ film exhibited the best electrical conductivity properties with the lowest resistivity of 8.68×10⁻² Ω cm, a Hall mobility of 10.9 cm² V⁻¹ s⁻¹ and a carrier concentration of 6.5×10¹⁸ cm⁻³. The films showed excellent transparency with average transmittances of over 85% in the visible range.     

The effect of annealing on electrical properties of fluorinated amorphous carbon films

Fluorinated amorphous carbon (a–C:F) films have been deposited by electron cyclotron resonance chemical vapor deposition (ECR–CVD) at room temperature using C₄F₈ and CH₄ as precursor gases. The chemical compositions and electrical properties of a–C:F films have been studied by X-ray photoelectron spectroscopy (XPS), capacitance–voltage (C–V) and current-voltage (I–V) measurements. The results show that C–CF_x and C–C species of a–C:F films increase and fluorine content decreases after annealing. The dielectric constant of the annealed a–C:F films increases as a result of enhancement of film density and reduction of electronic polarization. The densities of fixed charges and interface states decrease from 1.6 × 10¹⁰ cm^− 2 and (5–9) × 10¹¹ eV^− 1 cm^− 2 to 3.2 × 10⁹ cm^− 2 and (4–6) × 10¹¹ eV^− 1 cm^− 2 respectively when a–C:F films are annealed at 300 °C. The magnitude of C–V hysteresis decreases due to reduced dangling bonds at the a–C:F/Si interfaces after heat treatment. The conduction of a–C:F films shows ohmic behavior at lower electric fields and is explained by Poole–Frankel (PF) mechanism at higher electric fields. The PF current increases indicative of reduced trap energy when a–C:F films are subjected to higher annealing temperatures.     

CIGS absorbing layers prepared by RF magnetron sputtering from a single quaternary target

Cu(In_1−xGa_x)Se₂ (CIGS) thin films were prepared by RF magnetron sputtering from a single quaternary target at multiple processing parameters. The structural, compositional, and electrical properties of the as-deposited films were systematically investigated by XRD, Raman, SEM, and Hall effects analysis. The results demonstrate that by adjusting the processing parameters, the CIGS thin films with a preferential orientation along the (112) direction which exhibited single chalcopyrite phase were obtained. The films deposited at relatively higher substrate temperature, sputtering power, and Ar pressure exhibited favorable stoichiometric ratio (Cu/(In+Ga):0.8–0.9 and Ga/(In+Ga):0.25–0.36) with grain size of about 1–1.5 µm, and desirable electrical properties with p-type carrier concentration of 10¹⁶−10¹⁷ cm⁻³ and carrier mobility of 10–60 cm²/Vs. The CIGS layers are expected to fabricate high efficiency thin film solar cells.     

Improving electrical conductivity and wear resistance of hafnium nitride films via tantalum incorporation

Transition metal nitrides are being widely applied, as durable sensors, semiconductor and superconductor devices, their electrical conductivity and wear resistance having a significant influence on these applications. However, there are few reports about how to improve above properties. In this paper, tantalum was incorporated into hafnium nitride films through Hf_1-xTa_xN_y [x=Ta/(Hf+Ta), y=N/(Hf+Ta)] solid solution. The electrical conductivity and wear resistance of the films were significantly improved, due to the increase of the electron concentration (tantalum has one more valence electron than hafnium) and the increase in H/E and H³/E² ratios caused by the effect of solid solution hardening, respectively. The highest electrical conductivity of Hf_1-xTa_xN_y films is 8.3×10⁵ S m⁻¹, which is 1.7 times and 5.2 times of that of hafnium nitride and tantalum nitride films, respectively. In addition, the lowest wear rate of films is 1.2×10⁻⁶ mm³/N m, which is only 10% and 48% of that of hafnium nitride and tantalum nitride films, respectively. These results indicate that alloying with another transition metal is an effective method to improve electrical conductivity and wear resistance of transition metal nitrides.     

Characterization of spray pyrolytically deposited high mobility praseodymium doped CdO thin films

Praseodymium (Pr) doped CdO thin films with high transparency and high mobility were deposited, using a homemade spray pyrolysis setup, on micro-slide glass substrates preheated at 300 °C. Polycrystalline nature and Cd-O bond vibration of deposited films were confirmed by X-ray diffraction, micro-Raman and Fourier transform infrared spectroscopy analyses. The oxidation state of Cd²⁺, O²⁻, and Pr³⁺ was confirmed by X-ray photoelectron spectroscopy analysis. The highest average particle size (92 nm-FESEM) and high RMS (13.48 nm-AFM) values are obtained for 0.50 wt% Pr doped CdO thin film. The optical band gap is varied between 2.38 eV and 2.52 eV, depending on the Pr doping concentration. Photoluminescence spectra revealed that Pr doped CdO thin film exhibits strong green emission at 582 nm. High mobility (82 cm²/V s), high charge carrier concentration (2.19×10²⁰ cm⁻³) and high transmittance (83%) were observed for 0.50 wt% Pr doped CdO film. A high figure of merit (9.79×10⁻³ Ω⁻¹) was obtained for 0.50 wt% Pr doped CdO thin films. The mechanism behind the above results is discussed in detail in this paper.     

Alkoxo- and carboxylato-bridged hexanuclear copper(II) complex: Synthesis,structure and magnetic properties

Reaction of copper(II) nitrate trihydrate with N,N-dimethylethanolamine (dmea) and pivalic acid in methanol led to the hexanuclear copper(II) complex Cu₆(η¹:μ₂-C₄H₁₀NO)₄(η¹:η¹:μ₂-C₅H₉O₂)₄(η¹:μ₁-C₅H₉O₂)₂(μ₃-OH)₂ (1). The crystal structure of 1 indicates that hexametallic centers are bridged by the μ₃-alkoxo, dmea oxygens, and the μ₂-dicarboxylato oxygen atoms of pivalate ions. Furthermore, in the asymmetric unit, three types of copper ions have been found labeled as Cu₁, Cu₂ and Cu₃. The Cu₂ takes a distorted octahedral shape, whereas Cu₁ and Cu₃ adopt square pyramidal geometries. The complex 1 shows strong antiferromagnetic interactions through the oxo groups within the dimeric units (J = − 82.6 to − 25.8 cm^− 1) and weak antiferromagnetic couplings between the dimers (J = − 10.9 and 0.8 cm^− 1).     

Characterization of Cu(In,Ga)Se2 thin films prepared by RF magnetron sputtering using a single target without selenization

Cu(In_1?xGa_x)Se₂ (CIGS) thin films were prepared using a single quaternary target by RF magnetron sputtering. The effects of deposition parameters on the structural, compositional and electrical properties of the films were examined in order to develop the deposition process without post-deposition selenization. From X-ray diffraction analysis, as the substrate temperature and Ar pressure increased and RF power decreased, the crystallinity of the films improved. The scanning electron microscopy revealed that the grains became uniform and circular shape with columnar structure with increasing the substrate temperature and Ar pressure, and decreasing the RF power. The carrier concentration of CIGS films deposited at the substrate temperature of 500 °C was 2.1 × 10¹⁷ cm^?3 and the resistivity was 27 Ω cm. At the substrate temperature above 500 °C, In and Se contents in CIGS films decreased due to the evaporation and it led to the deterioration of crystallinity. It was confirmed that CIGS thin films deposited at optimal condition had similar atomic ratio to the target value even without post-deposition selenization process.     

Electrical properties of chemical solution deposited (Bi0.9RE0.1)(Fe0.975Cu0.025)O3−δ (RE=Ho and Tb) thin films

Pure BiFeO₃ (BFO) and (Bi_0.9RE_0.1)(Fe_0.975Cu_0.025)O_3?δ (RE=Ho and Tb, denoted by BHFCu and BTFCu) thin films were prepared on Pt(111)/Ti/SiO₂/Si(100) substrates by using a chemical solution deposition method. The BHFCu and BTFCu thin films showed improved electrical and ferroelectric properties compared to pure BFO thin film. Among them, the BTFCu thin film exhibited large remnant polarization (2P_r), low coercive field (2E_c) and reduced leakage current density, which are 89.15 C/cm² and 345 kV/cm at 1000 kV/cm and 5.38×10^?5 A/cm² at 100 kV/cm, respectively.     

Oxygen ionic transport in SrFe1−yAlyO3−δ and Sr1−xCaxFe0.5Al0.5O3−δ ceramics

The oxygen permeability of mixed-conducting Sr_1−xCa_xFe_1−yAl_yO_3−δ (x=0–1.0; y=0.3–0.5) ceramics at 850–1000 °C, with an apparent activation energy of 120–206 kJ/mol, is mainly limited by the bulk ionic conduction. When the membrane thickness is 1.0 mm, the oxygen permeation fluxes under pO₂ gradient of 0.21/0.021 atm vary from 3.7×10⁻¹⁰ mol s⁻¹ cm⁻² to 1.5×10⁻⁷ mol s⁻¹ cm⁻² at 950 °C. The maximum solubility of Al³⁺ cations in the perovskite lattice of SrFe_1−yAl_yO_3−δ is approximately 40%, whilst the brownmillerite-type solid solution formation range in Sr_1−xCa_xFe_0.5Al_0.5O_3−δ system corresponds to x>0.75. The oxygen ionic conductivity of SrFeO₃-based perovskites decreases moderately on Al doping, but is 100–300 times higher than that of brownmillerites derived from CaFe_0.5Al_0.5O_2.5+δ. Temperature-activated character and relatively low values of hole mobility in SrFe_0.7Al_0.3O_3−δ, estimated from the total conductivity and Seebeck coefficient data, suggest a small-polaron mechanism of p-type electronic conduction under oxidising conditions. Reducing oxygen partial pressure results in increasing ionic conductivity and in the transition from dominant p- to n-type electronic transport, followed by decomposition. The low-pO₂ stability limits of Sr_1−xCa_xFe_1−yAl_yO_3−δ seem essentially independent of composition, varying between that of LaFeO_3−δ and the Fe/Fe_1−γO boundary. Thermal expansion coefficients of Sr_1−xCa_xFe_1−yAl_yO_3−δ ceramics in air are 9×10⁻⁶ K⁻¹ to 16×10⁻⁶ K⁻¹ at 100–650 °C and 12×10⁻⁶ K⁻¹ to 24×10⁻⁶ K⁻¹ at 650–950 °C. Doping of SrFe_1−yAl_yO_3−δ with aluminum decreases thermal expansion due to decreasing oxygen nonstoichiometry variations.     

Structural characterization of ferromagnetic bridged-acetato and -dichlorido copper(II) complexes based on bicompartmental 4-t-butylphenol

The reaction of Cu(II) salts with 2,6-bis[bis(2-pyridylmethyl)aminomethyl]-4-t-butylphenol (L^t-Bu-OH) afforded two bridged-phenoxido/hydroxido complexes. The dinuclear bridged acetate species [Cu₂(μ-L^t-Bu-O)(μ-CH₃COO)](PF₆)₂ (1) and the 1D polymeric doubly-bridged-chlorido {[Cu₂(μ-L^t-Bu-OH)(μ-Cl)₂](ClO₄)₂·4H₂O}_n (2). The two complexes were structurally characterized. Both complexes revealed ferromagnetic interactions; moderate in complex 1 (J = + 30.8 cm^− 1) and very weak (J = + 2.25 cm⁻¹) in 2.     

Synthesis,crystal structure and magnetic properties of a new cyanide-bridged mixed-valence copper(I)/copper(II) clathrate

A unique cyanide-bridge mixed-valence Cu^I/Cu^II clathrate of formula [Cu^I₂(CN)₃][{Cu^II(tren)}₂(μ-CN)](CF₃SO₃)₂ [tren = tris(2-aminoethyl)amine] containing cyanide-bridged [{Cu^II(tren)}₂(μ-CN)]^3 + binuclear cations stacked between anionic honeycomb layered copper(I) cyanide networks, was synthesized and structurally characterized by single crystal X-ray diffraction. Variable-temperature magnetic susceptibility studies showed that the cyanide bridge mediates a strong antiferromagnetic interaction between the copper(II) centers (J = − 160 cm^− 1, the spin Hamiltonian being defined as H = −J S_A⋅S_B).     

Structural and electrical properties of sol–gel-derived Al-doped bismuth ferrite thin films

Al-doped BiFeO₃ (BiFe_(1?x)Al_xO₃) thin films with small doping content (x=0, 0.05, and 0.1) were grown on Pt(111)/TiO₂/SiO₂/Si substrates at the annealing temperature of 550 °C for 5 min in air by the sol–gel method. The crystalline structure, as well as surface and cross section morphology were studied by X-ray diffraction and scanning electron microscope, respectively. The dielectric constant of BiFeO₃ film was approximately 71 at 100 kHz, and it increased to 91 and 96 in the 5% and 10% Al-doped BiFeO₃ films, respectively. The substitution of Al atoms in BiFeO₃ thin films reduced the leakage current obviously. At an applied electric field of 260 kV/cm, the leakage current density of the undoped BiFeO₃ films was 3.97×10^?4 A/cm², while in the 10% Al-substitution BiFeO₃ thin films it was reduced to 8.4×10^?7 A/cm². The obtained values of 2P_r were 63 μC/cm² and 54 μC/cm² in the 5% and 10% Al-doped BiFeO₃ films at 2 kHz, respectively.     

Heteroepitaxial growth of Cu2O films on Nb-SrTiO3 substrates and their photovoltaic properties

In this paper, p-type Cu₂O thin films have been epitaxially grown on n-type semiconducting (001) oriented Nb-SrTiO₃ (NSTO) substrates with different Nb doping concentration by pulsed laser deposition technique. X-ray diffraction and high resolution transmission electron microscopy reveal a cube-on-cube epitaxial relationship between Cu₂O and NSTO. It is found that the deposition temperature, the thickness of Cu₂O films and the Nb doping concentration of NSTO substrates have critical impact on the photovoltaic (PV) properties of the Cu₂O/NSTO heterojunction devices. A maximum PV performance is observed in ITO/Cu₂O/NSTO device when the deposition temperature, film thickness and Nb doping concentration of NSTO are 550 °C, 76 nm, and 0.7 wt% NSTO, respectively. The optimized PV output corresponds to the open circuit voltage, short-circuit current density, fill factor and photovoltaic conversion efficiency about 0.45 V, 1.1 mA/cm², 46% and 0.23%,respectively. This work offers an insight into the strategy for developing and designing novel optoelectronics of NSTO-based oxide heterostructures.     

Enhanced thermoelectric properties and electronic structures of p-type BiCu1−xAgxSeO ceramics

The thermoelectric properties and electronic structures were investigated on p-type BiCu_1-xAg_xSeO (x=0, 0.02, 0.05, 0.08) ceramics prepared using a two-step solid state reaction followed by inductively hot pressing. All the samples consist of single BiCuSeO phase with lamella structure and no preferential orientation exists in the crystallites. Upon replacing Cu⁺ by Ag⁺, maximum values of electrical conductivity of 36.6 S cm⁻¹ and Seebeck coefficient of 350 μV K⁻¹ are obtained in BiCu_0.98Ag_0.02SeO and BiCu_0.92Ag_0.08SeO, respectively. Nevertheless, a maximum power factor of 3.67 μW cm⁻¹K⁻² is achieved for BiCu_0.95Ag_0.05SeO at 750 K owing to the moderate electrical conductivity and Seebeck coefficient. Simultaneously, this oxyselenide exhibits a thermal conductivity as low as 0.38 W m⁻¹ K⁻¹ and a high ZT value of 0.72 at 750 K, which is nearly 1.85 times as large as that of the pristine BiCuSeO. The enhancement of thermoelectric performance is mainly attributed to the increased density of states near the Fermi level as indicated by the calculated results.