缺陷对β-Ga2O3薄膜的结构和光学特性的影响

采用射频磁控溅射技术和后期退火在蓝宝石衬底上成功制备了β-Ga₂O₃薄膜。借助于X射线衍射(XRD)、拉曼散射光谱(Raman)、X射线光电子能谱(XPS)、以及二次离子质谱(SIMS)研究了缺陷对β-Ga₂O₃薄膜的结构和光学特性的影响。结果表明,未退火的Ga₂O₃薄膜呈现非晶态,随高温退火时间逐渐增加,非晶Ga₂O₃薄膜逐步转变为沿(-201)方向择优生长的β-Ga₂O₃薄膜。所有Ga₂O₃薄膜在近紫外到可见光区的平均透过率都高达95%,β相Ga₂O₃薄膜的光学带隙比非晶态薄膜增加~0.3 eV,且随退火时间的增加,β-Ga₂O₃薄膜的光学带隙也随之变宽。此外,发现非晶Ga₂O₃薄膜富含氧空位缺陷,高温退火处理后,β-Ga₂O₃薄膜中的氧空位浓度明显降低,但蓝宝石衬底中的Al极易扩散至Ga₂O₃薄膜层,并随退火时间的增加Al浓度明显增加,氧空位的降低和Al杂质的增加是导致β-Ga₂O₃薄膜光学带隙变宽的主要原因。     

退火处理对Y2O3薄膜结构和光学性能的影响

采用射频磁控溅射法以Y2O3陶瓷为靶材在单晶si(Ⅲ)和石英表面制备了Y2O3薄膜.利用X射线衍射(XRD)仪、扫描电子显微镜(SEM)、紫外-可见(UV-VIS)光谱仪和傅立叶变换红外(FTIR)光谱仪对真空退火前后Y2O3薄膜的结构和光学性质进行了分析研究.结构研究表明,在200℃条件下制备的Y2O3薄膜为非晶态,经600℃退火后出现单斜相,经800℃退火后薄膜完全转化为立方多晶,同时得到了不同晶面的晶粒尺寸;沉积态的Y2O3薄膜由球状颗粒排列组成,经800℃真空退火后薄膜为柱状晶.光学性质研究发现,真空退火后Y2O3薄膜的红外透过率显著下降;使用Tauc作图法得到不同结晶条件下的光学带隙,发现薄膜的光学带隙与结晶条件有关,并且退火后薄膜的光学带隙明显减小.     

射频反应磁控溅射制备MoS_2薄膜结构及光学性能

采用射频反应磁控溅射技术,在不同气压下制备了二硫化钼薄膜。利用扫描电子显微镜、X射线衍射仪、紫外可见光光谱仪等对薄膜的表面形貌、结构和光学性能进行了表征、分析。结果表明:利用射频反应磁控溅射制备的MoS_2薄膜,表面平整、颗粒均匀、致密,缺陷少;沉积气压1.2Pa条件下制备的薄膜结晶度最好;薄膜的光学带隙随沉积气压先增大后减小,1.2Pa时光学带隙最大,为1.69e V。薄膜光学带隙的变化是由沉积气压引起薄膜结晶度变化和形成缺陷不同所致。     

原子层沉积低温制备高取向锐钛矿TiO_2薄膜

利用原子层沉积(ALD)法分别在Si和石英衬底上制备了Ti O_2薄膜,并在N2氛围下对Ti O_2薄膜样品进行退火处理。采用X射线衍射、原子力显微镜和场发扫描电子显微镜对不同退火温度下样品晶体结构、表面形貌进行了分析。利用紫外-可见分光光度计对不同退火温度下的Ti O_2薄膜进行了光学性能测试,并分析了退火温度对其光学带隙的影响。发现利用ALD方法制备的沉积态Ti O_2薄膜为高度择优取向的锐钛矿结构;当退火温度升高到600℃时,Ti O_2薄膜晶体结构类型仍为锐钛矿型,晶粒略有变大;退火态Ti O_2薄膜粗糙度比沉积态Ti O_2薄膜的粗糙度大,而且粗糙度随退火温度升高而增大。根据薄膜的透射光谱拟合了光学带隙,退火后薄膜禁带宽度略有变宽,吸收边缘发生蓝移。     

电化学沉积制备Bi2Se3薄膜及其光电性能研究

作为量子物质的奇异态，拓扑绝缘体在新一代电子和光电子器件领域得到了广泛应用。因其金属表面态共存和较窄的带隙(0.3 eV),导致Bi₂Se₃具有超快电荷传输能力和红外光吸收能力，使其成为新体制光电器件的研究热点。采用恒电位沉积法在酸性电解质溶液中ITO基底上进行电化学沉积Bi₂Se₃薄膜，通过控制变量法确定Bi₂Se₃薄膜的生长条件是溶液pH值为0.2～0.8、沉积电位-0.15 V vs. Ag/AgCl和沉积时间1 h;同时，采用场发射透射电子显微镜、X射线衍射仪等表征技术对Bi₂Se₃薄膜的结构与形貌进行了研究。最后，研究了基于Bi₂Se₃薄膜光电探测器的性能，并考察了退火工艺对其光响应特性影响规律，测试结果表明退火后Bi₂Se₃薄膜在近红外波段具有良好的光电性能，响应度和比探测率分别约为6.3×10^-5     

脉冲激光沉积ZnSe:Cox纳米晶薄膜的微结构及光学性质研究

采用脉冲激光沉积技术在基片温度为800℃条件下制备了不同Co含量的ZnSe:Co_x(x=0.1,0.3,0.5)微晶薄膜。通过X射线衍射、原子力显微镜、X射线光电子能谱、红外透射光谱及光致发光光谱分析了薄膜的微结构及光学特性。结果表明：所制备的纳米晶薄膜结晶质量优秀,具有(111)择优取向,薄膜结晶质量、光谱透射率和光学带隙均随Co含量的增加而减小;薄膜在波长约700～850 nm处存在一吸收带,这源于Co²⁺在周围Se^2-构成的四面体晶场中⁴A₂(4F)→⁴T₁(4P)能级之间的跃迁;当Co掺入量x=0.5时,薄膜达到过掺杂状态,α-Co杂质相出现,薄膜红外光致发光谱大幅降低。     

氧控In2O3薄膜的光电性能

对比在控氧条件下制备态和退火态In₂O₃薄膜的微观结构和光电性能,分析两种状态中不同的氧作用机制。两种控氧行为都能够有效提高In₂O₃薄膜的晶格有序度和降低氧空位浓度,使其载流子浓度下降、迁移率提高和光学带隙变窄;等离子体制备过程中氧以高活性非平衡方式注入晶格,而退火时氧以低活性平衡态扩散的方式进入晶格;不同的氧作用机制使得退火态薄膜比制备态薄膜具有更少的结构缺陷、更高的氧空位浓度和更佳的透光导电性。     

真空退火对a-C:F:H薄膜的结构与光学带隙的影响

使用CF4和CH4为源气体,利用射频等离子体增强化学气相沉积(RF-PECVD)法制备了掺氟非晶碳(a-C:F:H)薄膜,并在N2气氛中进行了不同温度的退火.用原子力显微镜(AFM)观察了薄膜在退火前后表面形貌的变化,发现退火后薄膜表面变得平坦,疏松.用紫外-可见光透射光谱(UV-VIS)并结合傅里叶变换红外光谱(FTIR)和喇曼(Raman)光谱对薄膜进行了分析,获得了薄膜化学键结构和光学带隙的变化情况;发现薄膜的化学键结构和光学带隙与真空退火密切相关,高温退火后薄膜化学键结构:CHx(x=1,2,3下同)、F-芳基、CF2和CF等基团的含量改变;薄膜的光学带隙决定于CHx、退火后CHx含量减少导致薄膜光学带隙的减小.     

磁控溅射SiC薄膜及其光电特性研究

用射频磁控溅射法制备了SiC薄膜,并对其进行了退火处理.用AFM观察了薄膜的表面形貌,测量了薄膜的厚度与透射光谱.用J.C.Manifacier提出并由R.Swanepoel加以修正和完善的包络线法对薄膜透射光谱进行了分析计算,并结合Tuac公式确定了薄膜的光学带隙.结果表明:在不同射频功率下制备的薄膜均有较强的蓝紫光吸收特性,在低功率下可制备出表面平整,吸收系数小,光学带隙大的薄膜;退火处理后薄膜的吸收系数减小,光学带隙增大,晶粒向圆形转化且尺寸变大.     

Ge_(15)Ga_(10)Te_(75)薄膜的磁控溅射制备及性能的可控研究

采用磁控溅射法制备了Ge_(15)Ga_(10)Te_(75)薄膜,研究溅射工艺对薄膜结构与性能的影响,并分析了在不同热处理温度(200~280℃)退火后薄膜光学特性的变化。通过扫描电子显微镜、X射线衍射仪、显微拉曼光谱仪、分光光度计等测试手段对热处理前后薄膜样品的微观结构和光学特性进行了表征,结果表明,3次不同工艺下制备的沉积态薄膜组分与靶材偏差较小,且均是非晶态。沉积态薄膜的短波截止波长均在1μm左右;当退火温度(Ta)大于薄膜的玻璃转化温度(Tg)时,薄膜的光学带隙(Egopt)随着退火温度的增加而逐渐减小,沉积态薄膜的光学带隙分别为1.05,1.06和1.07eV,而在280℃退火后薄膜光学带隙分别降至0.38,0.42和0.45eV,以上3次实验结果表明,不同工艺下制备的Ge_(15)Ga_(10)Te_(75)薄膜组分均匀可控,热学和光学参数较一致。     

Enhanced photoluminescence from polycrystalline ZnO films resulting from oxygen processing

We report studies of photoluminescence from polycrystalline ZnO films deposited on sapphire as a function of the in situ oxygen pressure during growth and ex situ annealing. The ultraviolet photoluminescence was observed to increase by more than two orders of magnitude as a result of the annealing treatment. Enhanced cathodoluminescence was observed from the same films. The role of oxygen defects is discussed.     

CuGaSe2 thin films for photovoltaic applications

Of the I-III-VI₂ group chalcopyrites, CuInSe₂ has already proved its suitability for thin film solar cells owing to its excellent optical and transport properties. CuGaSe₂ is expected to exhibit comparable properties from this point of view. With its band gap of 1.7 eV it is a candidate for use in photovoltaic tandem systems.

The preparation of CuGaSe₂ thin films by means of the vacuum evaporation of the constituent elements (four-temperature method) is described. The structural, electrical and optical properties of these films were investigated. Secondary electron microscopy, energy-dispersive X-ray analysis, X-ray diffraction examination and measurements of the optical transmission, resistivity and thermoelectric power were used to determine the film properties relative to the preparation parameters and stoichiometry. The growth conditions were optimized for solar cell applications. Heterojunctions were prepared by the in situ evaporation of Zn_xCd_1−xS onto the CuGaSe₂ films. The characteristic data of the cells are a short-circuit current of 6 mA and an open-circuit voltage of 620 mV at an illumination at air mass 1.5 on an area of 1 cm².     

Optical Properties of Pb(Zr,Ti)O/sub 3/Films Prepared by Aerosol Deposition

The optical properties and related band structure of ferroelectric lead zirconate titanate [PZT, Pb(Zr_0.6Ti_0.4)O₃] films prepared on glass substrates at room temperature by aerosol deposition were investigated. The reflectance and transmittance of the PZT films were measured in the wavelength range from UV to near-infrared. The measured optical spectra were analyzed using dielectric function models that describe optical transitions in the band gap region. Optical absorption of the as-deposited PZT films was found to be larger than that of the annealed PZT films in the near-infrared wavelength range. The analyzed results indicated that post-deposition annealing increased the band gap energy of the PZT films, corresponding to a decrease in optical absorption.     

Optical properties of pb(Zr,Ti)O(3) films prepared by aerosol deposition

The optical properties and related band structure of ferroelectric lead zirconate titanate [PZT, Pb(Zr0(0.6)Ti0(0.4))O(3)] films prepared on glass substrates at room temperature by aerosol deposition were investigated. The reflectance and transmittance of the PZT films were measured in the wavelength range from UV to nearinfrared. The measured optical spectra were analyzed using dielectric function models that describe optical transitions in the band gap region. Optical absorption of the as-deposited PZT films was found to be larger than that of the annealed PZT films in the near-infrared wavelength range. The analyzed results indicated that post-deposition annealing increased the band gap energy of the PZT films, corresponding to a decrease in optical absorption.     

Application of Taguchi approach to optimize the sol–gel process of the quaternary Cu2ZnSnS4 with good optical properties

Present research deals with the optimal deposition parameters configuration for the synthesis of Cu₂ZnSnS₄ (CZTS) thin films using the sol–gel method associated to spin coating on ordinary glass substrates without sulfurization. The Taguchi design with a L9 (3⁴) orthogonal array, a signal-to-noise (S/N) ratio and an analysis of variance (ANOVA) are used to optimize the performance characteristic (optical band gap) of CZTS thin films. Four deposition parameters called factors namely the annealing temperature, the annealing time, the ratios Cu/(Zn + Sn) and Zn/Sn were chosen. To conduct the tests using the Taguchi method, three levels were chosen for each factor. The effects of the deposition parameters on structural and optical properties are studied. The determination of the most significant factors of the deposition process on optical properties of as-prepared films is also done. The results showed that the significant parameters are Zn/Sn ratio and the annealing temperature by applying the Taguchi method.     

Effects of deposition time and temperature on the optical properties of air-annealed chemical bath deposited CdS films

CdS films of over 1-μm thickness were deposited onto glass substrates by chemical bath deposition (CBD). Deposition temperature and time were varied from 40 °C to 60 °C and from 30 min to 4 h, respectively. The highest deposition rate, 6.39 nm/min, was obtained with samples deposited for 90 min at 60 °C. The films deposited at 60 °C for 4 h were found to have the best adhesion and without defects. The optical properties, in particular the optical band gap, depended on film thickness, the deposition and annealing temperatures. Annealing in air resulted in a shift of the absorption edge towards higher wavelengths, i.e., a decrease in the gap value from 2.45 eV to 2.38 eV. The optical band edges of the films were not constant but depended on the annealing temperature. The refractive index, calculated by applying the envelope method on the transmission of the films in wavelengths from 550 nm to 850 nm, was in the range 1.95-2.26. The resistivity determined from dark conductivity measurement, as a function of the annealing temperature, was found to be in the order of 10⁵ Ω cm for samples annealed in air at 250 °C, 3 h, and the activation energy was about 0.22 eV.     

化学水浴沉积时间对CdS薄膜性质的影响

采用CBD法在醋酸镉溶液体系中制备CdS半导体薄膜,通过XRD、XRF、SEM和光学透过率谱等测试手段研究了沉积时间对CdS薄膜沉积过程和性质的影响.结果表明,随着沉积时间的增加,薄膜增厚;S/Cd原子比增加,但都为富Cd的CdS薄膜;XRD研究表明,薄膜结构由立方、六方混合相向立方相转变,(111)方向成为择优生长方向;SEM研究表明,随沉积时间增加,薄膜变致密,薄膜表面出现的白色附着颗粒增多,尺寸增大;沉积时间对薄膜的光学性质也有很大的影响,随着沉积时间的增加薄膜透过率减小,而禁带宽度值增大.     

Synthesis and properties of zirconia thin films

Thin films of zirconia have been synthesized using reactive DC magnetron sputtering. It has been found that films with good optical constants, high refractive index (1·9 at 600 nm) and low extinction coefficient can be prepared at ambient temperatures. The optical constants and band gap and hence the composition are dependent on the deposition parameters such as target power, rate of deposition and oxygen background pressure. Thermal annealing of the films revealed that the films showed optical and crystalline inhomogeneity and also large variations in optical constants.     

Development of artificial neural networks for real time, in situ ellipsometry data reduction

Development of real time in situ monitoring and control of thin film depositions using ellipsometry requires both data acquisition and processing to be rapid. Present speeds of measurement and computation of basic parameters, Ψ and Δ, are sufficient for data acquisition which is essentially real time. However, computation of film parameters, such as thickness and optical properties, generally cannot keep up with the incoming data and must be performed in a batch mode after the deposition.

This work describes the development of enhanced, high speed data reduction algorithms using artificial neural networks (ANN). The networks are trained using computed data and subsequently give values of film parameters in the millisecond time regime. The ANN outputs are used as initial estimates in a variably damped least squares algorithm for accuracy improvement. The combination of these two algorithms provides very accurate solutions in 75 ms per point on a DEC VAX 8800 multiprocessor system running at a combined 12 Mips. This speed is suitable for real time film monitoring and control for growth rates up to 10 nm per second. Results for fixed angle of incidence, single wavelength, in situ data for Ni deposited on BK7 substrates are presented.     

Structural transformation of dip coated CdS thin films during annealing

The present paper discusses structural transformation of CdS thin films during annealing and the consequent changes in their optical properties. CdS thin films are grown by the chemical bath deposition technique. The optical band gap is found to reduce on annealing and the change is attributed to the structural transformation of CdS from cubic to hexagonal phase. This revised version was published online in November 2006 with corrections to the Cover Date.