一种用于制备纳米SiC/Si_3N_4复合粉体的CVD新工艺的热力学分析(英文)

综述了SiC/Si3 N4 复合粉体的力学性能和制备方法 ,提出了一种制备纳米级SiC/Si3 N4 复合粉体的新方法 ,并通过热力学分析提出了合成条件     

理想化学计量纳米氮化硅的制备

本文研究了激光诱导化学气相沉积纳米氮化硅的制备工艺过程，提出了减少游离硅的措施，利用光学二步激励法得到了理想化学计量的高纯纳米氮化硅粉末，其Ｎ／Ｓｉ比 １．３２１，非常接近于理想值４／３（１．３３３）。     

激光诱导化学气相沉积法制备纳米氮化硅及粉体光谱特性研究

研究了激光诱导化学气相沉积法制备纳米氮化硅的工作原理,提出了减少游离硅的措施,利用双光束激发制备得到了超微的、非晶纳米氮化硅粉体。实验证明,纳米氮化硅粉体具有很多奇异物理性能和光谱特性。     

APCVD制备氮化硅薄膜的微观结构

以ＳｉＨ４和ＮＨ３作为反应气体,用常压化学气相沉积（ＡＰＣＶＤ）法在平板玻璃表面制备出了氮化硅薄膜,研究氮化硅薄膜的形貌和微观结构,研究结果表明：在６６０℃温度所获得的氮化硅薄膜为非晶态,氮化硅薄膜与平板玻璃基板之间的界有熔焊现象,结合牢固。     

定向碳纳米管的化学气相沉积制备法

报道了一种简便有效的合成定向碳纳米管 (CNTs)的化学气相沉积 (CVD)制备方法。以铁为催化剂 ,乙炔为碳源 ,采用单一反应炉 ,直接在石英基底上沉积催化剂颗粒薄膜 ,成功合成了定向性好、管径均匀的高质量大密度的碳纳米管     

CVD法制备SiC先进陶瓷材料研究进展

SiC陶瓷材料具有许多优异的性能如高比强度、高比模量、低密度、高导热系数，低的热膨胀系数、耐腐蚀、抗氧化等，从而被广泛用作高温结构部件，CVD工艺灵活，制备的SiC陶瓷具有很高纯度和致密度，因而是制备先进SiC陶瓷的最有希望的工艺之一。对CVD法制备SiC涂层和SiC基复合材料的研究及应用进行了综述。     

石墨烯的化学气相沉积法制备及其表征

石墨烯是由sp2杂化的碳原子键合而成的具有六边形蜂窝状晶格结构的二维原子晶体,其具有电学、力学和光学等方面一系列优良性能,使得它在各个领域的应用一直被人们所关注。然而,石墨烯的工业化制备仍然面临着巨大的挑战。本文采用化学气相沉积法(CVD)制备石墨烯,并用拉曼光谱、高分辨率扫描电镜和X射线多晶衍射对其进行了分析和表征。研究结果表明,用CVD法制备石墨烯具有工业化的可能。     

用ECRCVD方法制备优质氮化硅钝化膜

利用电子回旋共振等离子体化学气相沉积(ECR—CVD)技术，以SiH4和N2为反应气体进行了氮化硅钝化薄膜的低温沉积技术的研究。采用原子力显微镜、傅立叶变换红外光谱和椭圆偏振光检测等技术对薄膜的表面形貌、结构、厚度和折射率等性质进行了测量。结果表明，采用ECR—CVD技术能够在较低的衬底温度条件下以较高的沉积速率制备厚度均匀的氮化硅薄膜，薄膜中H含量很低。薄膜沉积速率随微波功率和混合气体中硅烷比例的增加而增大。折射率随微波功率的增大而减小，随混合气体中硅炕比例的增大而增大。在相同气体混合比和微波功率条件下，较高衬底温度条件下制备的薄膜折射率较大。     

氮化镓纳米片的制备及测试表征

二维GaN纳米结构的制备对二维GaN基电子、光电子等纳米器件具有重要意义。文章用化学气相沉积（CVD）制备二维GaN纳米片时用了液态金属催化剂,成功制备二维GaN纳米片,得到制备GaN纳米片的最佳工艺条件。通过对制备的GaN纳米片进行扫描电子显微镜(SEM)、能谱仪(EDS)以及X射线衍射仪(XRD)测试表征,结果表明制备的GaN纳米片是表面光滑、大小薄厚均匀、结晶度良好的六方钎锌矿结构GaN纳米片。     

氮化镓纳米片的制备及测试表征

二维GaN纳米结构的制备对二维GaN基电子、光电子等纳米器件具有重要意义。本文采用化学气相沉积(CVD)制备二维GaN纳米片时,使用液态金属催化剂,成功制备了二维GaN纳米片,得到制备GaN纳米片的最佳工艺条件。通过对制备的GaN纳米片进行扫描电子显微镜(SEM)、能谱仪(EDS)以及X射线衍射仪(XRD)测试表征,结果表明：制备的GaN纳米片是表面光滑、大小薄厚均匀、结晶度良好的六方钎锌矿结构GaN纳米片。     

GaN-based FETs using Cat-CVD SiN passivation for millimeter-wave applications

We have found that SiN passivation by catalytic chemical vapor deposition (Cat-CVD) can significantly increase an electron density of an AlGaN/GaN heterostructure field-effect transistor (HFET). This effect enables thin-barrier HFET structures to have a high-density two-dimensional electron gas and leads to suppression of short-channel effects. We fabricated 30-nm-gate Al_0.4Ga_0.6N(8 nm)/GaN HFETs using Cat-CVD SiN. The maximum drain current density and extrinsic transconductance were 1.49 A/mm and 402 mS/mm, respectively. Current-gain cutoff frequency and maximum oscillation frequency of the HFETs were 181 and 186 GHz, respectively. These high-frequency device characteristics are sufficiently high enough for millimeter-wave applications.     

Fluidized bed micro-machining and HFCVD of diamond films onto Co-cemented tungsten carbide (WC-Co) hardmetal slabs

The effect of fluidized bed (FB) treatment upon hot filament chemical vapor deposition (HFCVD) of polycrystalline diamond films onto WC-Co hardmetal substrates was investigated. Several scenarios to make the substrates ready for HFCVD were, comparatively, evaluated and the resulting diamond films were examined in terms of their morphology and adhesion. The diamond grain density was measured by scanning electron microscopy. The adhesion of continuous diamond film to substrate was evaluated by the reciprocal of the slope of crack radius-indentation load functions. Surface binder dissolution followed by FB treatment (PF pretreatment) allowed very high diamond nucleation density and smaller grain size. The adhesion of films grown on PF pretreated substrates was found to be very close to that of films deposited on hardmetal slabs pretreated by Murakami's reagent followed by Co etching with Caro's acid and seeded with diamond suspension in an ultrasonic vessel (MPS pretreatment). However, diamond coatings on MPS pretreated samples exhibited a rougher surface morphology as a result of both lower diamond nucleation density and larger substrate surface roughening by Murakami's etching. Based upon experimental findings, our newly developed PF pretreatment was found to be a very promising technique in substrates conditioning as well as in promoting adherent, uniform and smooth diamond coatings onto hardmetal tools and wear parts.     

n-C7H16/CCl4体系CVD-热解炭的形貌与形成机理

控制CVD工艺条件得到球状热解炭, 通过对沉积中间体的定性分析,证实了此过程中存在"缩聚机理". 运用热力学和晶体成核-长大理论,解释了温度对热解炭形貌和沉积过程的影响.     

Synthesis of silicon carbide nanowires by solid phase source chemical vapor deposition

In this paper, we report a simple approach to synthesize silicon carbide (SiC) nanowires by solid phase source chemical vapor deposition (CVD) at relatively low temperatures. 3C-SiC nanowires covered by an amorphous shell were obtained on a thin film which was first deposited on silicon substrates, and the nanowires are 20–80 nm in diameter and several μm in length, with a growth direction of [200]. The growth of the nanowires agrees well on vapor-liquid-solid (VLS) process and the film deposited on the substrates plays an important role in the formation of nanowires.     

HWP-CVD氮化硅薄膜的结构和光学特性

采用傅立叶红外吸收谱和紫外-可见透射谱研究了螺旋波等离子体增强化学气相沉积法制备的氢化非晶氮化硅薄膜的原子间键合结构和光学特性。结果表明,在不同硅、氮活性气体配比R下,薄膜表现出不同的Si/N比和H原子键合方式,富氮样品中H原子主要和N原子结合,而富硅样品中主要和Si原子结合。随着R的增加,薄膜的光学带隙E_g和E₀₄逐渐减小,此结果关联于薄膜结构无序性程度的增加,而薄膜的(E₀₄-E_g)和Tauc斜率B值之间存在着相互制约关系。     

Boron Nitride Nanosheets for Metal Protection

Although the high impermeability of graphene makes it an excellent barrier to inhibit metal oxidation and corrosion, graphene can form a galvanic cell with the underlying metal that promotes corrosion of the metal in the long term. Boron nitride (BN) nanosheets which have a similar impermeability could be a better choice as protective barrier, because they are more thermally and chemically stable than graphene and, more importantly, do not cause galvanic corrosion due to their electrical insulation. In this study, the performance of commercially available BN nanosheets grown by chemical vapor deposition as a protective coating on metal has been investigated. The heating of the copper foil covered with the BN nanosheet at 250 °C in air over 100 h results in dramatically less oxidation than the bare copper foil heated for 2 h under the same conditions. The electrochemical analyses reveal that the BN nanosheet coating can increase open circuit potential and possibly reduce oxidation of the underlying copper foil in sodium chloride solution. These results indicate that BN nanosheets are a good candidate for oxidation and corrosion protection, although conductive atomic force microscopy analyses show that the effectiveness of the protection relies on the quality of BN nanosheets.