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1.
The energy levels of neodymium in the Nd3+:Ca2Al2SiO7 (CAS) laser material with gehlenite structure are reported. As the Nd3+:Ca2Al2SiO7 compound presents a broad absorption around 806 nm, it is a good candidate for diode pumped laser. The 4F3/24I9/2 and 4F3/24I11/2 emission have been recorded and the fluorescence branching ratios calculated from the Judd-Ofelt analysis are 0.41 and 0.47 respectively. The emission cross section at 1.06 μm (4F3/24I11/2 transition) is 5 × 10-20 cm2. The decay profiles of the Nd3+ emission have been analyzed for several Nd3+ concentrations using the kinetic microparameters related to the cross relaxation ( and R0≈6 Å) and the energy migration probabilities ( ). In the Nd:CAS laser material, the optimal concentration corresponding to the maximum of the fluorescence intensity is determined to be around 2.7 × 1020 Nd3+ ions cm-3. The Nd3+-Nd3+ interactions are not very strong in this material as the optical concentration value is two times higher than in the Nd:YAG laser material.  相似文献   

2.
The optical properties of the rare elements Tm3+, Ho3+ and Yb3+ were systematically investigated in various glasses. The Tm3+ doped aluminozircofluoride glass shows higher quantum efficiency, longer lifetime and stronger fluorescence intensity than Tm3+ doped YSGG crystal and other Tm3+ doped glasses for the 3H43H6 transition. Similar quantum efficiency, longer lifetime and stronger fluorescence intensity were also found in Ho3+ doped aluminozircofluoride glass for the 5I75I8 transition. The higher quantum efficiencies of Tm3+ and Ho3+ in aluminozircofluoride glass are due to the longer lifetime and the lower phonon energy. The fluorescence mechanisms and energy transfer in the Yb3+ -Tm3+ system, Yb3+ -Ho3+ system and Yb3+ - Tm3+ -Ho3+ system were studied. The very strong fluorescence intensities in the Yb3+ -Tm3+ system for Tm3+ and the Yb3+ -Tm3+ -Ho3+ system for Ho3+ which are 1.68 times that of Tm3+ doped YSGG crystal and 2.25 times that of Tm3+---Ho3+ codoped YSGG crystal are attributed to the efficient Yb3+ → Tm3+, Yb3+ → Ho3+ and Tm3+ → Ho3+ energy transfer processes. The fluorescence processes are described by cross relaxations of 2F5/23H53H43H62F7/2 and2F5/23H5 (or 2F5/25I63H5) → 3H45I75I83H62F7/2.  相似文献   

3.
We describe a new way of determining the strength of the superallowed branch of the β-decay of 10C, 10C(0+, gs) → 10B(0+, 1.74 MeV) + e+ + ν. Precise knowledge of the branching ratio is needed to compute the experimental ft-value and the weak vector coupling constant.  相似文献   

4.
We report measurements of the energy transfer between Er3+ and Ce3+ in Y2O3. The transition between the Er3+ 4I11/2 and 4I13/2 excited states can be stimulated by energy transfer to Ce3+, augmenting the population in the 4I13/2 state at the expense of that in the 4I11/2 state. Experiments were performed on Y2O3 planar waveguides doped with 0.2 at.% erbium and 0–0.42 at.% cerium by ion implantation. From measurements of Er3+ decay rates as a function of cerium concentration we derive an energy transfer rate constant of 1.3×10−18 cm3/s. The efficiency of the energy transfer amounts to 0.47 at 0.42 at.% cerium. The energy transfer rate constant measured in Y2O3 is two times smaller for Er3+→Ce3+ than that for Er3+→Eu3+ in the same material.  相似文献   

5.
Single-crystal ZnWO4:Dy3+ was grown by Czochralski technique. The XRD, absorption spectra as well as fluorescence spectrum are investigated and the Judd–Ofelt intensity parameters Ω2, Ω4, Ω6 are obtained to be 7.76 × 10−20 cm2, 0.57 × 10−20 cm2, 0.31 × 10−20 cm2, respectively. Calculated radiative transition rate, branching ratios and radiative lifetime for different transition levels of ZnWO4:Dy3+ crystals are presented. Fluorescence lifetime of 4F9/2 level is 158 μs and quantum efficiency is 66%.The most intense fluorescence line at 575 nm correlative with transition 4F9/2 → 6H13/2 is potentially for application of yellow lasers.  相似文献   

6.
Crystalline β-SiC surface layers with strong (111) preferred orientation were synthesized by direct ion implantation into Si(111) substrates at a low temperature of 400°C using a metal vapor vacuum arc ion source. Both X-ray diffraction and Fourier transform infrared spectroscopy reveal an augment in the amount of β-SiC with increasing implantation doses at 400°C. Scanning electron microscopy shows the formation of an almost continuous SiC surface layer after implantation at 400°C with a dose of 7×1017/cm2. The full width at half maximum of the X-ray rocking curve of β-SiC(111) was measured to be 1.4° for the sample implanted at a dose of 2×1017/cm2 at 700°C, revealing a good alignment of β-SiC with the Si matrix.  相似文献   

7.
Here, we bring out an infrared transmitting new optical glass based on TeO2 added with AlF3 and LiF, containing dual rare earth ions (Eu3+,Nd3+) as the dopants with a purpose to examine their luminescence and also the decay times pertaining to a prominent transition of Eu3+ (5D0 → 7F2 at 615 nm) as a function of temperature both in the presence and absence of Nd3+ ions. The energy transfer rates (Wtr), critical distances (R0) and transfer efficiencies (ηtr) have been evaluated based on the measured lifetime data of this glass.  相似文献   

8.
The Fe/Si multilayers were prepared by electron beam evaporation in a cryo-pumped vacuum deposition system. Ag+ and Au+ ions of 100 MeV at two different fluencies such as 1 × 1012 ions/cm2 and 1 × 1013 ions/cm2 at a pressure of 10− 7 torr were used to irradiate the Fe/Si samples. The irradiated samples were analyzed by High-Resolution XRD and it reveals that the irradiated films are having polycrystalline nature and it confirms the formation of the β-FeSi2. The structural parameters such as crystallite size (D), strain (ε) and dislocation density (δ) have been evaluated from the XRD spectrum. The role of the substrates and the influence of swift heavy ions on the formation of β-FeSi2 have been discussed in this paper.  相似文献   

9.
The temperature dependences of the d.c. electrical conductivity (σ) and thermoelectric power (TEP) of low-dimensional Cu(COOH)2 single crystal have been studied. The electrical conductivity is highly anisotropic (σ = 3.0 × 102) and the crystal undergoes a Peierls transition at 208 K and two polymorphous phase transitions, namely → β and β → at 327 and 377 K respectively. The conductivity in this crystal is found to be mainly due to a non-adiabatic hopping mechanism. TEP measurements carried out at various temperatures show that the conductivity is due to the mobility of holes.  相似文献   

10.
The synthesis and photoluminescent (PL) properties of calcium stannate crystals doped with europium grown by mechanically activated in a high energy vibro-mill have been investigated. The characteristics of Ca2SnO4:Eu3+ phosphors were found to depend on the amounts of europium ions. The XRD profiles revealed that the system, (Ca1−xEux)2SnO4, could form stable solid solutions in the composition range of x = 0–7% after being calcined at 1200 °C. The calcined powders emit bright red luminescence centered at 618 nm due to 5D0 → 7F2 electric dipole transition. Both XRD data and the emission ratio of (5D0 → 7F2)/(5D0 → 7F1) reveal that the site symmetry of Eu3+ ions decreases with increasing doping concentration. The maximum PL intensity has been obtained for 7 mol% concentration of Eu3+ in Ca2SnO4.  相似文献   

11.
This short paper reports both the photoluminescence and the lifetime measurements of a prominent emission transition (5D07F2) of Eu3+ both in the presence and absence of the codopant rare earth ion (Dy3+) in an optical glass of the composition (79−x)TeO2+6AlF3+15LiF+xLn2O3 as a function of temperature down to 10 K.  相似文献   

12.
We have investigated the stress behaviors and a mechanism of void formation in TiSix films during annealing. TiSix thin films were prepared by DC magnetron sputtering using a TiSi2.1 target in the substrate temperature range of 200–500 °C. The as-deposited TiSix films at low substrate temperature (<300 °C) have an amorphous structure with low stress of 1×108 dynes/cm2. When the substrate temperature increases to 500 °C, the as-deposited TiSix film has a mixture of C49 and C54 TiSi2 phase with stress of 8×109 dynes/cm2. No void was observed in the as-deposited TiSix film. Amorphous TiSix film transforms to C54 TiSi2 phase with a random orientation of (311) and (040) after annealing at 750 °C. The C49 and C54 TiSi2 mixture phase transforms to (040) preferred C54 TiSi2 phase after annealing over 650 °C. By increasing substrate temperature, the transformation temperature for C54 TiSi2 can be reduced, resulting in relieved stress of TiSi2 film. The easy nucleation of the C54 phase was attributed to an avoidance of amorphous TiSix phase. We found that amorphous TiSix→C54 TiSi2 transformation caused higher tensile stress of 2×1010 dynes/cm2, resulting in more voids in the films, than C49→C54 transformation. It was observed that void formation was increased with thermal treatment. The high tensile stress caused by volume decreases in the silicide must be relieved to retard voids and cracks during C54 TiSi2 formation.  相似文献   

13.
Bi2Ti2O7 thin films have been grown directly on n-type GaAs (1 0 0) by the chemical solution decomposition technique. X-ray diffraction analysis shows that the Bi2Ti2O7 thin films are polycrystalline. The optical properties of the thin films are investigated using infrared spectroscopic ellipsometry (3.0–12.5 μm). By fitting the measured ellipsometric parameter (Ψ and Δ) data with a three-phase model (air/Bi2Ti2O7/GaAs), and Lorentz–Drude dispersion relation, the optical constants and thickness of the thin films have been obtained simultaneously. The refractive index and extinction coefficient increase with increasing wavelength. The fitted plasma frequency ωp is 1.64×1014 Hz, and the electron collision frequency γ is 1.05×1014 Hz, and it states that the electron average scattering time is 0.95×10−14 s. The absorption coefficient variation with respect to increasing wavelength has been obtained.  相似文献   

14.
Rate equations formalism is used to predict the population ratio of the Er3+ 4I13/2 levels involved in the 1.55 μm laser transition in the Yb:Er:CAS laser materials. An effective Yb → Er energy transfer, favourable to the Er3+ 1.55 μm laser emission, is demonstrated in this laser host. Indeed, the Yb → Er transfer and the Er → Yb back transfer rates are calculated to be 6 x 10−16 and 0.45 x 10−16 cm3 s−1, respectively. Attempts of codoping the system with Nd3+, Eu3+ and Ce3+ have been realised in order to increase the population of the Er3+ 4I13/2 laser emitting level. Best results are obtained with Ce3+ ion since in the sample containing 6 x 1020 Ce3+/cm3, the Er3+ 4I11/2 level lifetime is divided by a factor of 3 while the Er3+ 4I13/2 fluorescence lifetime remains unaffected. On the contrary, codoping with Nd3+ or Eu3+ ions simultaneously decreases the Er3+ 4I11/2 and 4I13/2 kinetics parameters. The role of the other parameters such as Yb/Er concentrations ratios is also discussed.  相似文献   

15.
The central region of the silicon microstrip detector used in Fermilab experiment E771 was subjected to a peak fluence of 9.5 × 1013 p/cm2 induced by 800 GeV protons over a two-month period. Fourteen 300 μm thick planes manufactured by Micron Semiconductor were operated at bias voltages ranging from 84 to 109 V. Analysis of data from low intensity beam triggers taken near the end of the run shows that the mean pulse height from our amplifiers began to decline at a fluence of approximately 2 × 1013 p/cm2 and fell to near zero by 6 × 1013 p/cm2. We show that the use of fast amplifiers contributed to this early loss of signal.  相似文献   

16.
Optically active Er3+:Yb3+ codoped Y2O3 films have been produced on c-cut sapphire substrates by pulsed laser deposition from ceramic Er:Yb:Y2O3 targets having different rare-earth concentrations. Stoichiometic films with very high rare-earth concentrations (up to 5.5 × 1021 at cm− 3) have been achieved by using a low oxygen pressure (1 Pa) during deposition whereas higher pressures lead to films having excess of oxygen. The crystalline structure of such stoichiometric films was found to worsen the thicker the films are. Their luminescence at 1.53 μm and up-conversion effects have been studied by pumping the Yb3+ at 0.974 μm. The highest lifetime value (up to 4.6 ms) is achieved in films having Er concentrations of ≈ 3.5 × 1020 at cm− 3 and total rare-earth concentration ≈ 1.8 × 1021 at cm− 3. All the stoichiometric films irrespective of their rare-earth concentration or crystalline quality have shown no significant up-conversion.  相似文献   

17.
Electrical properties of reactively sputtered carbon nitride films   总被引:1,自引:0,他引:1  
J. Wei  P. Hing 《Thin solid films》2002,410(1-2):21-27
Carbon nitride films with β-C3N4 crystals of 200 nm grain size were grown on Si (1 0 0) substrates using magnetron sputtering. These films were characterized by transmission electron microscopy, atomic force microscopy, and X-ray photoelectron spectroscopy. Carbon nitride films had low surface roughness. Maximum N/C ratio of 0.5 was achieved in the films. Chemical bonds of sp, sp2 and sp3 coexisted in the films. The fraction of each bond was related to the deposition conditions. The resistivities of the films were measured, which ranged from 1×103 to 1×107 Ω cm. The measured resistivity results indicated that the carbon nitride films had semiconductive properties. The resistivity largely depended on the sp3/sp2 ratio. Effects of N2 fraction, target current and substrate bias were investigated. All these deposition parameters had influence on the chemical bonds of the films, and on the resistivities too. High sp3/sp2 ratio resulted in high resistivity.  相似文献   

18.
The dielectric properties and electrical conductivity of AlN films deposited by laser-induced chemical vapour deposition (LCVD) are studied for a range of growth conditions. The static dielectric constant is 8.0 ± 0.2 over the frequency range 102−107 Hz and breakdown electric fields better than 106 V cm−1 are found for all films grown at temperatures above 130°C. The resistivity of the films grown under optimum conditions (substrate temperature above 170°C, NH3/TMA flow rate ratio greater than 300 and a deposition pressure of 1–2 Torr) is about 1014 Ω cm and two conduction mechanisms can be identified. At low fields, F < 5 × 105 V cm−1 and conductivity is ohmic with a temperature dependence showing a thermal activation energy of 50–100 meV, compatible with the presumed shallow donor-like states. At high fields, F > 1 × 106 V cm−1, a Poole-Frenkel (field-induced emission) process dominates, with electrons activated from traps at about 0.7–1.2 eV below the conduction band edge. A trap in this depth region is well-known in AlN. At fields between 4 and 7 × 105 V cm−1 both conduction paths contribute significantly. The degradation of properties under non-ideal growth conditions of low temperature or low precursor V/III ratio is described.  相似文献   

19.
A large-acceptance lead/gas sampling electromagnetic calorimeter (ECAL) was constructed for the CPLEAR experiment to detect photons from decays of π0s with momentum pπ0 ≤ 800 MeV/c. The main purpose of the ECAL is to determine the decay vertex of neutral-kaon decays K0 → π0π0 → 4γ and K0 → π0π0π0 → 6γ. This requires a position-sensitive photon detector with high spatial granularity in r−, −, and z−coordinates. The ECAL - a barrel without end-caps located inside a magnetic field of 0.44 T - consists of 18 identical concentric layers. Each layer of 1/3 radiation length (X0) contains a converter plate followed by small cross-section high-gain tubes of 2640 mm active length which are sandwiched by passive pick-up strip plates. The ECAL, with a total of 6X0 has an energy resolution of and a position resolution of 4.5 mm for the shower foot. The shower topology allows separation of electrons from pions. The design, construction, read-out electronics, and performance of the detector are described.  相似文献   

20.
Ohmic contacts to the top p-type layers of 4H-SiC p+–n–n+ epitaxial structures having an acceptor concentration lower than 1×1019 cm−3 were fabricated by the rapid thermal anneal of multilayer Al/Ti/Pt/Ni metal composition. The rapid thermal anneal of multilayer A1/Ti/Pt/Ni metal composition led to the formation of duplex cermet composition containing Ni2Si and TiC phases. The decomposition of the SiC under the contact was found to be down to a depth of about 100 nm. The contacts exhibited a contact resistivity Rc of 9×10−5 Ω cm−2 at 21°C, decreasing to 3.1×10−5 Ω cm−2 at 186°C. It was found that thermionic emission through the barrier having a height of 0.097 eV is the predominant current transport mechanism in the fabricated contacts.  相似文献   

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