真空电弧沉积多元膜复合靶成分离析效应的研究

用Ｔｉ／Ｍｏ，Ｔｉ／Ｗ和Ｔｉ／Ｍｅ（Ｍｅ为Ｆｅ－Ｃｒ－Ａｌ合金）复合靶采用真空电弧技术沉积了多元膜，并对成分离析效应及组织和性能进行了研究。结果表明，工作弧电流和阴极镶嵌体的弧斑平均电流对成分离析效应影响程度较大，Ｔｉ／Ｍｅ复合靶存在一个无成分离析效应的平衡点，多元膜结构主要为组元原子固溶于Ｔｉ２Ｎ中的结构形式，并具有较高的显微硬度。     

Ti-Mo-N三元多层膜的结构与性能

采用 Ti/ Mo复合靶 ,用多弧离子镀技术沉积了 Ti-Mo-N多元多层膜 ,并对其组织结构与性能进行了研究。结果表明 :在本试验条件下多元膜的结构形式为 (Ti,Mo) 2 N,最佳多层膜的结构形式为基体 / Ti/ Ti N/ (Tiy Mo1-y) N/ (Ti,Mo) 2 N,并具有较高的显微硬度、耐磨性和极低的孔隙率 ,在 80 0℃具有很好的抗氧化性能。在沉积过程中存在着多元合金膜层与复合靶的成分离析现象 ,这与靶材的结构有关。     

多弧离子镀（Ti,W）xN合涂层组织与性能

采用Ti/W复合靶用多弧离子镀技术沉积了（Ti,W)xN合金涂层,并对该涂层的组织与性能进行了研究。结果表明,涂层组织致密,孔隙率极低,主要结构为（Ti,W)2n,并具有较高的显微硬度和抗氧化性。在沉积过程中存在着多元合金涂层与复合靶的成分离析现象,这与靶材的结构有关。     

多弧离子镀(Ti,W)xN合金涂层组织与性能

采用Ti/W复合靶用多弧离子镀技术沉积了(Ti,W)xN合金涂层,并对该涂层的组织与性能进行了研究.结果表明,涂层组织致密,孔隙率极低,主要结构为(Ti,W)2N,并具有较高的显微硬度和抗氧化性.在沉积过程中存在着多元合金涂层与复合靶的成分离析现象,这与靶材的结构有关.     

多弧离子镀合金涂层成分离析效应的物理机制研究

提出了一种关于多弧离子镀合金涂层成分离析效应的物理模型。利用该模型，从理论上较为圆满地解释了成分离析的影响因素及其作用机制。     

多弧离子镀合金涂层成分离析效应的物理机制研究

提出了一种关于多弧离子镀合金涂层成分离析效应的物理模型。利用该模型，从理论上较为圆满地解释了成分离析的影响因素及其作用机制。     

Al/Ti摩尔比对(CrTiAl)N硬质膜相结构和硬度的影响

采用多弧离子镀技术,设计沉积工艺和调整阴极弧源靶组合以及对应的弧源电流,制备出以CrN为基形貌和厚度相同、A1/Ti摩尔比不同的系列(CrTiAl)N硬质膜.测试膜的成分、组织形貌、相组成和表面硬度,研究了A1/Ti摩尔比对其相结构和硬度的影响.结果 表明:不同A1/Ti摩尔比的(CrTiAl)N膜其相组成相同,都呈现...     

多弧离子镀Ti-W-N多元多层膜的研究

采用Ｔｉ／Ｗ复合靶,用多弧离子镀技术沉积了Ｔｉ－Ｗ－Ｎ多元多层膜,并对其组织结构与性能进行了研究,结果表明：在本试验我元膜的结构形式为（Ｔｉ,Ｗ）２Ｎ最佳多层膜的结构形式为基体／Ｔｉ／ＴｉＮ／（ＴＹｉｙＷ１－ｙ）Ｎ／（Ｔｉ,Ｗ）２Ｎ,并具有较高的显微硬度和极低的孔隙率,在８００℃具有很好的抗氧化性能,在沉积过程中存在着多元合金膜层与复合靶的成分离析现象,这与靶材的结构有关。     

多弧离子镀弧源靶工作条件对氮化钛薄膜中钛液滴的影响

本文研究了阴极靶弧电流大小、阴极靶表面热弧斑运动轨迹的电磁场控制、以及阴极靶脉冲弧沉积对多弧离子镀TiN薄膜中Ti液滴的影响。通过优化镀膜参数,可以有效地减少Ti液滴的数量和尺寸,提高TiN薄膜／工件基体之间的结合力。     

结构调制超硬Ti/TiN纳米多层膜的制备及其尺寸效应

使用多弧离子镀技术在高速钢基体上制备了调制周期为5~40 nm的Ti/TiN纳米多层膜,用扫描电子显微镜(SEM)、X射线能谱仪(EDS)、X射线衍射仪(XRD)、纳米压痕仪和划痕仪等手段表征薄膜的微观结构和性能,研究了调制周期对Ti/TiN纳米多层膜性能的影响,并讨论了在小调制周期条件下Ti/TiN纳米多层膜的超硬效应和多弧离子镀技术对纳米多层膜硬度的强化作用。结果表明,与单层TiN相比,本文制备的Ti/TiN纳米多层膜分层情况良好,薄膜均匀致密,没有明显的柱状晶结构,TiN以面心立方结构沿(111)方向择优生长。随着调制周期的减小薄膜的硬度呈现先增大后减小的趋势,并在调制周期为7.5 nm时具有最大的硬度42.9 GPa和H/E值。这表明,Ti/TiN在具有最大硬度的同时仍然具有良好的耐磨性和韧性。Ti/TiN纳米多层膜的附着力均比单层TiN薄膜的附着力高,调制周期为7.5 nm时多层膜的附着力为(58±0.9) N。     

Cathodic arc plasma deposited TiAlSiN thin films using an Al-15 at.% Si cathode

Thin films of TiAlSiN were deposited on SKD 11 tool steel substrates using two cathodes, of Ti and Al-15 at.% Si, in a cathodic arc plasma deposition system. The influence of AlSi cathode arc current and substrate bias voltage on the mechanical and structural properties of the films was investigated. The TiAlSiN films had a multilayered structure in which nanocrystalline cubic TiN layers alternated with nanocrystalline hexagonal AlSiN layers. The hardness of the films decreased with the increase of the AlSi cathode arc current. The hardness of the films also decreased as the bias voltage was raised from − 50 V to − 200 V. The maximum hardness of 43 GPa was observed at the films deposited at the pressure 0.4 Pa, Ti cathode arc current 55 A, Al cathode arc current 35 A, temperature 250 °C and bias voltage of − 50 V.     

Microstructure characterization of multilayered TiSiN/CrN thin films

Monolayered TiSiN and multilayered TiSiN/CrN coatings were synthesized by a cathodic arc deposition process. The chromium and Ti/Si (80/20 at.%) alloy targets were adopted as the cathode materials, altering the ratio of cathode current (I[TiSi]/I[Cr]) to obtain various multilayer periodic thicknesses of multilayered TiSiN/CrN coatings. X-ray diffraction and TEM analyses showed that all the deposited monolayered TiSiN and multilayered TiSiN/CrN films possessed the B1-NaCl structure. In this study, it was shown that the multilayer periods (Lambda) of the TiSiN/CrN deposited at I[TiSi]/I[Cr] cathode current ratios of 1.8, 1.0, and 0.55 were 8.3 nm, 6.2 nm, and 4.2 nm, respectively, with multilayer periodic thicknesses decreasing with smaller I[TiSi]/I[Cr] cathode current ratios. An amorphous phase was found at the boundaries of the TiN/CrN column grains. In addition, the multilayered TiSiN/CrN coatings displayed a lamellar structure that was well-defined and nonplanar between each TiN and CrN layer.     

Laser Cladding of Layered Ti/Nb/Cu Cathode with Homogeneous Arc Ablation Behaviors

Arc ablation threatens the cathode operating time and restricts the development of high-power arc heaters. Surface modification is an effective strategy in improving cathode ablation resistance without reducing matrix conductivities. Herein, Nb layer and Ti layer are laser clad on Cu matrix to decrease the arc ablation of Cu cathode. The total thickness of laser-clad Nb/Ti layer reaches 1850 μm. The Nb layer restrains Cu from diluting into surface cladding and no detrimental Ti–Cu intermetallic is formed. The surface Ti content is as high as 98.34 at%, guaranteeing the arc discharge homogeneity. The arc ablation behaviors of Ti/Nb/Cu cathodes are investigated in air atmosphere. The layered cathode discharges and ablates homogeneously. The arc discharge center is shallow with no appearance of deep pits or craters. The maximum ablation depth (72.1 μm) after 30 s discharging is ≈33.4% lower than that of Cu cathode. Besides, the cathode ablation rate, 1.61 μg C⁻¹, is ≈27.5% lower than Cu cathode. The improved arc ablation resistance is interpreted in the protective effect of refractory TiO₂ layer formed during air arc discharging.     

Experimental study of the transition to high-current regime of discharge with a hollow self-heated titanium cathode in nitrogen

It is established that rapid formation of a nitride layer on the surface of a self-heated hollow titanium cathode in arc discharge in nitrogen leads to an increase in the thermal stability and emissive properties of the cathode. Optimum regimes of cathode training that ensures rapid Ti → TiN transition over the entire cathode wall thickness in the active zone are determined, which allows the operation temperature to be increased above 2200 K at a discharge current of up to 50 A for the cathode with an inner diameter of 8 mm and a wall thickness of 1 mm. Results of measurements of the current-voltage characteristics of discharge, thermal regimes of operation, and chemical composition of the cathode are presented. The rates of erosion of the cathode operating in nitrogen and argon have been determined.     

铝含量对（Ti,Al）N镀层结构及耐磨性的影响

运用多弧离子镀在Ｗ６Ｍｏ５Ｃ４Ｖ２高速钢表面沉积了（Ｔｉ,Ａｌ）Ｎ镀层,并经ＳＥＭ,ＸＲＤ和ＥＤＳ等方法分析表明,多靶联合工作获得的（Ｔｉ,Ａｌ）Ｎ镀层,其成分可连续变化,随弧流增大,铝含量增多;随负偏压增大,铝含是降低。弧流与偏压二者对镀层的成分均有影响,其中弧流较为显著。     

Effect of deposition conditions on the characteristics of ZnO-SnO2 thin films deposited by filtered vacuum arc

ZnO-SnO₂ thin films were deposited on microscope glass substrates by filtered vacuum arc deposition system. The effects of deposition conditions on film characteristics were studied using cathodes prepared with three different ratios of atomic concentrations of Zn to Sn. The micro and the macro properties of the films were investigated as a function of cathode composition, arc current, background oxygen deposition pressure, and deposition time. X-ray diffraction analysis indicated that deposited films were amorphous, independent of the cathode composition. The atomic concentration ratio of Zn to Sn in the film as determined by XPS analysis were 33.9%: 10.6%, 43.9%: 3.8%, 44.7%: 4.7% for 50%: 50%, 70%: 30% and 90%: 10% Zn-Sn alloy cathodes, respectively. Film transmission in the visible was 70 to 90%, affected by interference effects. The maximal and minimal values of the refractive index n and the absorption coefficient k in the visible were 2.11 to 1.94 and 0.07 to 0.001, respectively. The optical band gap was in the range of 3.13 to 3.59 eV. All films were highly resistive independent of deposition conditions used.     

富氮MeNx(Me=Ti,Zr,Hf)薄膜的结构与红外光学性能

用射频反应磁控溅射方法制备了MeNx(Me=Ti、Zr、Hf)薄膜,研究了在富N2条件下不同的N2/Ar流量比对薄膜结构和光学性能的影响.掠角X射线衍射的分析结果表明,所制得的富氮的TiNx薄膜主要由TiN所组成,而富氮的ZrNx、HfNx薄膜则具有非晶态的结构.用分光光度计和傅里叶红外仪对薄膜的光学透过率的测试表明,...