Mn含量对低碳中锰TRIP钢组织性能的影响

为研究连续退火工艺生产中锰TRIP钢汽车板的可行性,采用CCT-AY-Ⅱ型钢板连续退火机模拟分析了不同锰含量对中锰TRIP钢组织性能的影响规律.采用SEM、TEM和EBSD等微观分析方法观察不同锰含量中锰TRIP的微观组织,利用XRD法测量了残留奥氏体量,实验测量其力学性能.结果表明:试验钢在650℃保温3 min时,随着锰质量分数(4.8%≤w(Mn)≤8%)的增加,屈服强度先增加后降低,抗拉强度持续升高,断后延伸率则基本不变,维持在20%左右,残余奥氏体含量也随着锰含量的增加而增加;当锰质量分数超过6%(含6%)时,真实应力-应变曲线由于动态应变时效而呈锯齿状,且加工硬化指数远大于5Mn钢.试验钢的高塑性由亚稳奥氏体的TRIP效应和超细晶铁素体或马氏体共同提供.     

退火温度对冷轧超细晶亚稳钢组织性能的影响

通过热处理实验,研究了不同退火温度对冷轧汽车用超细晶亚稳钢组织和力学性能的影响。通过单向拉伸试验研究试验钢力学性能,采用SEM、TEM等分析方法表征试验钢的组织结构,利用XRD测量残余奥氏体量。结果表明:随着退火温度的升高,抗拉强度先略有降低再逐渐升高,断后延伸率和强塑积先逐渐升高再降低,残余奥氏体量先增加再减少;在650℃退火20min时抗拉强度为1012MPa,断后延伸率(33%)和强塑积(33.4%)获得最大值,综合力学性能最佳。分析认为,大量的超细晶组织和高含量的残余奥氏体的TRIP效应是实现高强塑积的原因。     

中锰Q&P钢残余奥氏体的稳定性及其TRIP效应

通过单向拉伸及平面应变实验研究了Mn含量为7%的中锰淬火-配分(QP)钢残余奥氏体的机械稳定性,利用X射线衍射仪(XRD)测定试验钢残余奥氏体的含量,通过观察试验钢的拉伸曲线及扫描电镜(SEM)、透射电镜(TEM)照片,分析变形前后的微观组织,研究中锰QP钢的变形机制。结果表明:应力状态对残余奥氏体稳定性有较大的影响,平面应变更有利于相变诱导塑性(TRIP)效应的发挥;中锰QP钢的拉伸变形特征是由超细晶硬化机制和TRIP效应相互作用产生的,通过微观组织观察发现中锰QP钢的塑性变形主要是残余奥氏体的TRIP效应,其中薄膜状的残余奥氏体的稳定性最高。     

TRIP钢板在单向拉伸变形下的相变行为研究

TRIP钢的塑性取决于残余奥氏体的含量及其相变速度.研究TRIP钢中残余奥氏体在单向拉伸变形下的相变行为,首先回顾了TRIP钢板的研究进展,然后对一种低碳硅锰系TRIP700钢板在单向拉伸变形下的力学性能和相变性能进行了试验研究,并用扫描电镜方法分析了该TRIP钢在变形过程中微观组织的变化.结果表明,该低碳硅锰系TRIP钢板兼有高强度和高韧性的特点,在单向拉伸变形中残余奥氏体的含量与等效应变的关系可用来logfγ0-logγ=kε.表示.     

不同热处理工艺对Fe-30Mn-3Si-4Al TWIP钢力学组织性能的影响

采用拉伸性能测试、金相观察、SEM和EDS等方法研究了不同热处理工艺对Fe-30Mn-3Si-4AlTWIP钢微观组织、拉伸力学性能及断口形貌的影响,并采用X射线衍射仪测定材料的物相组成。结果表明,冷却速度越快,TWIP钢的延伸率和强度越高;热处理后其室温组织为含有退火孪晶的单一奥氏体,冷却速度越小,奥氏体晶粒和退火孪晶的尺寸越大。拉伸时发生典型的延性断裂,在拉伸过程中退火孪晶转变成形变孪晶,使材料的塑性提高。     

热轧TRIP钢组织性能的研究

采用实验室热轧机对高硅和低硅TRIP钢(A钢和B钢)进行控制轧制试验,研究了热轧后等温淬火对热轧TRIP钢组织性能的影响.通过显微组织观察,力学性能分析,探讨了两种钢的应变诱导相变和相变诱发塑性行为.研究表明:A、B钢均能够获得铁素体、贝氏体和大量稳定残余奥氏体的混合组织,具有较高的力学性能;残余奥氏体稳定性是提供TRIP的重要因素,B钢中贝氏体和残余奥氏体较多,相变诱发塑性效果更好,其性能优于A钢;等温时间影响热轧TRIP钢的力学性能,随等温时间的延长,A、B钢的伸长率增加,等温时间超过120 min,导致碳化物析出,残余奥氏体的稳定性降低;B钢经热轧后在400 ℃等温25 min,抗拉强度和伸长率分别达到了784 MPa和36%的最高值.     

预奥氏体化对中Mn TRIP钢组织及力学性能的影响

为了提高钢的综合力学性能,用盐浴法对中Mn TRIP钢进行了热处理.采用SEM、TEM、XRD和拉伸测试研究了预奥氏体化处理对中Mn TRIP钢显微组织及力学性能的影响.实验结果表明:全马氏体冷轧态组织经两相区退火处理后,会析出大量渗碳体颗粒,随着退火时间延长,渗碳体颗粒逐渐溶解,马氏体组织逐渐转变为奥氏体和铁素体双相片层状组织;而在两相区退火处理前添加两相区预奥氏体化处理后,渗碳体析出被有效抑制,双相片层组织迅速形成;相比于常规两相区退火处理,预奥氏体化处理能够提高组织中残余奥氏体体积分数和综合力学性能.     

Mn含量对中锰钢微观组织及力学性能的影响

通过金相观察、X射线衍射、透射分析及力学性能测试,探索了Mn含量对中锰钢微观组织及力学性能的影响。结果表明,通过临界区退火处理,不同锰含量的中锰钢(w(Mn):3.86%～5.4%)在室温下均可获得铁素体和奥氏体复相组织,奥氏体含量随Mn含量的增加而增多,而其稳定性呈相反的变化趋势。试验钢强度随Mn含量的增加而增加,断后伸长率及断面收缩率两塑性指标随Mn含量变化呈相反的变化趋势,冲击韧性随Mn的增加而降低。试验钢力学性能随Mn含量的变化与试验钢中Mn的存在形式、逆转奥氏体的含量及稳定性相关。     

Si对中锰钢淬火配分组织和性能的影响

将20Mn5钢和20Mn5Si2钢进行淬火和配分(Q&P)工艺处理,用扫描电镜观测其微观组织,用X射线法测量残余奥氏体量,研究了Si对其微观组织和力学性能的影响.结果表明,试验钢中的奥氏体含量明显高于传统的TRIP钢和Q&P 工艺处理钢;在相同Q＆P工艺条件下,20Mn5Si2钢比20Mn5有较多的残余奥氏体,析出物数...     

贝氏体区等温时间对TRIP钢残奥及力学性能影响

为研究贝氏体区等温时间对热轧TRIP钢残余奥氏体和力学性能的影响,采用金相显微镜、X射线衍射、拉伸实验等方法对3种不同贝氏体区等温时间下制备的热轧TRIP钢进行分析.结果表明:随着贝氏体等温时间的延长,残余奥氏体量减少而残余奥氏体碳含量增加,残余奥氏体晶粒尺寸及残余奥氏体形貌变化不大;热轧TRIP钢的力学性能随着贝氏体...     

Influence of different annealing processes under various atmospheres on the oxidation behaviour of γ-TiAl

Abstract

A detailed study of the oxidation behaviour of bare γ-TiAl based alloy Ti–45Al–8Nb under various conditions, such as different atmospheres, pressures, temperatures (900°C, 1000°C) and times (100–200 h) is presented. Under high vacuum conditions (10^–6 mbar) a continuous zone of α-₂Ti₃Al was formed at the surface with an oxygen-enriched phase on top. No oxide scale formation was obvious. During thermal treatment under Ar-atmosphere at low vacuum pressure (approximately 50 mbar) mainly nitrides (TiN, Ti₂AlN) and Al₂O₃ particles were formed at the surface with an α-₂layer below. Annealing γ-TiAl in hydrogen atmosphere (about 1040 mbar) led to the formation of a thick reaction zone. A TiO₂ layer was formed on top, followed by a mixed oxide scale. Beneath that scale a thick region with alumina, σ–Nb₂Al and α-₂Ti₃Al was observed.

Moreover, the oxidation behaviour of several thermally pre-treated samples was tested by cyclic oxidation at 900°C in air. The microstructure of the oxide scale formed after testing can be compared with that of non pre-treated material. γ-TiAl annealed under high vacuum conditions exhibits the lowest oxidation rate, while the mass gain of specimens pre-treated under Ar-atmosphere increased rapidly in the first cycles. All pre-treated specimens exceeded a lifetime of 600 cycles at minimum. The reference material failed after 520 cycles.     

铁电薄膜退火方法的研究

以锆钛酸铅薄膜（PZT）为例，分析了国内外铁电薄膜退火的各种方法。针对解决铁电薄膜基底高温生长工艺与硅集成电路承受温度较低的不兼容及器件性质劣化的难题，分别对普通炉子退火、快速热退火及激光退火进行了详细的分析比较。激光低温退火技术有望成功地在未来应用PZT铁电薄膜制作组件时，增加其制备工艺设计的弹性和可行性。     

Experiments and simulations of directionally annealed ODS MA 754

Both directional and isothermal annealing experiments have been performed on the hot-rolled ODS nickel-based superalloy MA 754. Directional annealing of MA 754 produced an elongated, coarse grain structure with a {1 1 0}1 0 0 texture for all hot-zone velocities examined, with the grain aspect ratio and twin boundary density decreasing with increasing hot-zone velocity. Isothermal annealing also produced elongated structures, but with larger grain aspect ratios and a stronger {1 1 0}1 0 0 texture. In order to elucidate the results of the experimental studies, a front-tracking computer-based model [H.J. Frost, C.V. Thompson, C.L. Howe, J.H. Whang, Scripta Metall. 22 (1988) 65–70] was modified to simulate the directional/isothermal annealing processes for materials with particles. Simulations of directional annealing with particles aligned in the direction of hot-zone movement could produce (at the appropriate hot-zone velocities) columnar grain structures with some finer grains clustered around the particles. Contrary to experimental observations, simulations of isothermal annealing in similar particle-containing material did not produce columnar grain structures, but equi-axed grains whose size was defined by the spacing between the lines of particles. Thus, the simulation results suggest that it is the texture, and not the particles, of the hot-rolled MA 754 that leads to a columnar grain structure.     

Task assignment problems in distributed computing systems by simulated annealing

Abstract

The stochastic, heuristic search algorithm called simulated annealing is considered for the problems of static task assignment in distributed computing systems. The purposes of task assignment problems are to assign modules of programs over a set of interconnected processors in order to both maximize the utilization of processors and minimize interprocessor communication costs. This problem has been proven to be NP‐hard. Although simulated annealing has been applied to a broad class of combinatorial optimization problems, but it requires a long computation time in order to converge to the globally optimal solution. In this paper, we design a very efficient annealing schedule with good move generation strategies and use the concept of specific heat and the frozen condition to obtain near‐optimal solutions for task assignment problems with a significantly large reduction in the number of iterations.     

Laser annealing of silicon

In recent years laser processing has attracted much attention in view of its potential use in basic solid-state and material science research as well as in new processing technologies. The dominant feature of laser processing being the deposition of large amounts of energy (a few J/cm²) over very short time scales (a few tens of nanoseconds), it leads to melting of surface layers of solid followed by rapid resolidification. In this article, a few basic consequences of such laser-induced phenomena in silicon are reviewed.     

热处理对WO3薄膜的结构和气致变色性能的影响

用溶胶－凝胶法在普通钠钙玻璃上制备了WO3薄膜，并分别在250℃，360℃，450℃的空气环境中对薄膜进行了热处理，用SEM，XRD观察了薄膜的表面形貌，分析了薄膜的微观结构及热处理温度和催化剂含量对薄膜的结构和气致变色性能的影响。     

富Ni的NiAl退火组织和室温力学性能

快速凝固Ｎｉ－３４．６ａ．％Ａｌ薄带经１５２３Ｋ退火２ｈ并以较快速度冷却扣形成以ＮｉＡｌ马氏体为基体，γ－Ｎｉ３Ａｌ沿晶界网状分布和少量残β－ＮｉＡｌ的组织，退火，室温弯曲延性良好。     

热蒸发制备CdSe薄膜的退火工艺研究

采用真空热蒸发技术在光学玻璃基底上制备了CdSe薄膜,研究了真空下不同退火温度和退火时间对CdSe薄膜晶体结构和表面形貌的影响。XRD结果表明,在400~500℃范围下退火2h、5h的CdSe薄膜晶型不发生改变,结晶性随退火温度升高而增强,其晶粒尺寸从32nm增加至50nm。SEM结果表明,在450℃下退火2h后的CdSe薄膜表面颗粒分布均匀且排列规则、无裂纹。AFM结果表明,在450℃下退火2h后的CdSe薄膜致密性好,表面粗糙度低(5.19nm)。因此采用真空热蒸发制备的CdSe薄膜的热处理条件确定为:退火温度450℃,退火时间2h。     

Thin-film polycrystalline silicon solar cells formed by flash lamp annealing of a-Si films

We have fabricated thin-film solar cells using polycrystalline silicon (poly-Si) films formed by flash lamp annealing (FLA) of 4.5-µm-thick amorphous Si (a-Si) films deposited on Cr-coated glass substrates. High-pressure water-vapor annealing (HPWVA) is effective to improve the minority carrier lifetime of poly-Si films up to 10 µs long. Diode and solar cell characteristics can be seen only in the solar cells formed using poly-Si films after HPWVA, indicating the need for defect termination. The actual solar cell operation demonstrated indicates feasibility of using poly-Si films formed through FLA on glass substrates as a thin-film solar cell material.     

Giant Stress—impedance Effect in Amorphous and Current Annealed Fe73.5Cu1Nb3Si13.5B9 Ribbons

The giant stress-impedance(GSl) effect in amorphous and current annealed Fe73.5Cu1Nb3Si13.5B9 ribbons has been investigated .The results showed that the GSl effect changed drastically with annealing techniques and the maximum stress impedance ratio of 350% was obtained after optimal conditions of current annealing .The behaviors of the stress impedance vary with densities of annealing current and the stress longitudinally applied during current annealing.The maximum change of stress impedance existed in the sample annealed by high-current-density electropulsing under applied stress of 100MPa.