扫描近场光学显微镜光纤探针的制作与分析

描述了制作扫描近场光学显微镜光纤探针的两种简便有效的方法－－带保护层的化学腐蚀法和光纤熔接机拉锥法,从实验中比较、分析了两种制作方法的优缺点,实验表明这两种方法均能制作出针尖直径为５０ｎｍ左右的光纤探针。     

扫描探针显微镜的发展与应用

扫描隧道显微镜和原子力显微镜的发明大大促进了扫描探针显微镜的发展。本文介绍扫描隧道显微镜和原子力显微镜的基本工作原理、发展背景以及以扫描隧道显微镜和原子力显微镜为基础衍生出来的各种扫描探针显微镜的应用。扫描探针显微镜是一种新的探测仪器，它在三维方向上的分辨率均可以达到原子量级的水平，因此在微电子学、微机械学、计量学、化学和生物医学等领域中有广泛的应用前景。     

基于互联网的扫描探针显微镜远程控制研究

在Ｉｎｔｅｒｎｅｔ信息传输的基础上,实现了数字化ＳＰＭ的远程控制。用户首先在连接ＳＰＭ的服务器上远程登陆,并取得不同的控制权。在得到主要操作人,协作者或旁观者的权力后,分别能远程直接控制ＳＰＭ的全部参数,部分参数,或不能控制参数。该系统已经在北京与上海两城市间进行了演示。     

大面积扫描探针显微镜研制

介绍了一种大面积扫描探针显微镜。仪器采用大范围扫描与高精度微动扫描相分离、X-Y扫描与纵向检测相分离的方案，同时具备较大扫描范围和较高的分辨率，扫描重复性好，大面积扫描范围220mm×290 mm×60 mm，重复性2～3 μm，并可实现探针的自动逼近、光学显微镜自动聚焦和图像自动拼接。     

扫描探针显微镜研究弛豫铁电体电畴生长

本文研究了典型弛豫铁电陶瓷0．9PMN－0．1PT中的电畴生长过程．用扫描探针显微镜的轻敲模式和抬举模式对驰豫铁电陶瓷的表面形貌和电场力像进行了观察．结果表明,在施加不同针尖电压（0．05、0．5、1V）的情况下,能够诱导材料中纳米尺度极化微区通过沿＜111＞方向180°反转,从而形成亚微米尺度电畴．     

基于石英音叉的扫描探针显微镜的设计与实现

介绍了基于石英音叉剪切力模式的扫描探针显微镜系统(Scanning Probe Microscope, SPM)的设计和实现.系统由基于PC104总线的工业主板、ATmega16电机控制模块、高压驱动模块、数据采集和前置信号处理模块组成,在TCP/IP和RS232通信协议的基础上通过自定义上层通信协议完成各模块之间的连接.由于采用了模块化设计和工业化标准,该系统可稳定工作于工业现场,用于加工件表面质量的测量、集成电路缺陷检测、材料瑕疵分析等.     

一种用于扫描力显微镜的微型干涉光探针

论证了氮化硅三角形微探针可以作为一个后向点衍射板的光学原理，并根据这一原理设计了一种用于扫描力显微镜的微型干涉光探针，它利用微探针表面向以射波与反向点衍射波之间的干涉来检测微探针的形变，其纵向分辨率达到了０．０１ｎｍ。     

利用扫描探针显微镜研究Co量子有序阵列的特性

采用交流电化学沉积法,在小孔径的阳极氧化铝模板里,成功制备了Co磁纳米线有序阵列。通过机械抛光、化学抛光工艺,样品表面平整度可达到±10nm/μm2左右。采用透射显微镜(TEM) 扫描探针显微镜(SPM)观察了样品的表面形貌、Co纳米线的微观形貌和与形貌对应的磁畴图像。结果表明,纳米磁记录阵列膜里的每一根Co纳米线均为单畴结构,磁畴分布非常有序且与氧化铝微孔的形貌分布一一对应,畴的大小随磁力针尖离样品的高度不同略有变化;在一定的高度范围内,磁针离样品的高度和扫描速度不影响观察到的磁畴分布。样品在2T的外场下磁化后,大多数磁矩发生了反转。发现了相邻位之间磁畴的磁矩取反现象,这种阵列膜具有量子磁盘的原型结构。制备的阵列结构孔密度可达1011/cm2,如果每一个单畴存储二进制单元的一个信息位,相应的存储密度应达100Gbit/in2以上。该纳米磁记录阵列,有望成为新型的超高密度量子磁盘。     

扫描探针显微镜下微纳结构深度测量的校准方法

扫描探针显微镜(SPM)是微纳结构三维测量中的一项重要技术。然而,在测量过程中台阶或沟槽样品的边缘附近会出现不准确的轮廓,这就造成了深度测量的精度损失。为了避免深度测量的精度损失,分别建立了机械探针和光学探针的两个分析模型,描述了不准确轮廓、样品深度和探针形状之间的耦合关系;在此基础上,提出了一种具有良好精度的深度测量标定方法。与现有的国际深度测量标准(W/3规则)进行比较,该方法提供了一个明确的边界来确定测量结果是否有效;此外,它还可以指导用户在执行测量之前选择适当的探针。     

Improved Probes for Scanning Near‐Field Optical Microscopy

Vastly improved fiber probes for SNOM microscopy are the result of a new chemical etching method. The optical fiber's protective polymer coating is left on during the etching process, which gives rise to greatly improved tip surfaces (see Figure, right). The tips have a much higher damage threshold, allowing brighter transmission and opening the door to Raman imaging (e.g. of DNA) and laser ablation.     

高频磁场标准的研制

本文介绍采用标准磁场法和标准环天线法研制完成的国家高频磁场标准装置。其工作频率为１０ｋＨｚ～３０ＭＨｚ；发射场强为１～１００ｍＶ／ｍ；不确定度为０．２５ｄＢ。标准磁场法装置与标准环天线法装置的比对一致性为０．４５ｄＢ；标准环天线装置与ＴＥＭ室标准场装置的比对一致性为０．４０ｄＢ。     

Cover Picture: Imaging the Fluorescence Decay Lifetime of a Conjugated‐Polymer Blend By Using a Scanning Near‐Field Optical Microscope (Adv. Mater. 1/2007)

The cover image shows the surface topography of a phase‐separated blend of two conjugated polymers. On p. 107, Lidzey and co‐workers show that the fluorescence decay lifetime of a conjugated polymer in such a blend can vary significantly between the different phase‐separated domains. This variation results in a marked dependence of the photoluminescence quantum efficiency on the relative blend composition.     

Modern Scattering‐Type Scanning Near‐Field Optical Microscopy for Advanced Material Research

Infrared and optical spectroscopy represents one of the most informative methods in advanced materials research. As an important branch of modern optical techniques that has blossomed in the past decade, scattering‐type scanning near‐field optical microscopy (s‐SNOM) promises deterministic characterization of optical properties over a broad spectral range at the nanoscale. It allows ultrabroadband optical (0.5–3000 µm) nanoimaging, and nanospectroscopy with fine spatial (<10 nm), spectral (<1 cm^?1), and temporal (<10 fs) resolution. The history of s‐SNOM is briefly introduced and recent advances which broaden the horizons of this technique in novel material research are summarized. In particular, this includes the pioneering efforts to study the nanoscale electrodynamic properties of plasmonic metamaterials, strongly correlated quantum materials, and polaritonic systems at room or cryogenic temperatures. Technical details, theoretical modeling, and new experimental methods are also discussed extensively, aiming to identify clear technology trends and unsolved challenges in this exciting field of research.     

国外光纤光纤带和带状光缆技术的最新发展

综合介绍了近年国外关于低衰耗的色散补偿光纤,非零色散位移光纤,用于恶劣环境的碳涂覆和氮化硅涂覆光纤的研究;光纤带制造技术包括光纤带的结构、涂层、性能、生产工艺,大芯数光纤带状光缆包括层绞式松管、中心松管式、骨架式、干缆芯带状光缆的设计制造技术的最新进展。     

光学电磁场探测探针标定技术研究

光学电磁场探测探针已逐渐开始在相控阵雷达天线测量等领域应用,它的幅度和相位测量准确度受到大家重视。为了实现对光学电磁场探测探针测量能力准确标定,本文引入电磁场测量探头的标定思路,提出利用矩形金属波导的电场产生标准幅度及相位实现对光学电磁场探测探针标定的方法,建立了标定装置,阐述标定实施过程。通过实验验证,该方法能实现对光学电磁场探测探针标定,精度满足使用要求。     

Combination of Instrumented Nanoindentation and Scanning Probe Microscopy for Adequate Mechanical Surface Testing

The elastic indentation modulus and hardness of standard bulk materials and advanced thin films were deter-mined by using the nanoindentation technique followed by the Oliver- Pharr post-treatment. After measure-ments with different loading/unloading schemes on chemically polished bulk titanium a substantial decrease of both modulus and hardness vs an increasing loading time was found, Then, hard nanostructured TiBN and TiCrBN thin films deposited by magnetron sputtering (using multiphase targets) on substrates of high roughness (sintered hard metal) and low roughness (silicon) were studied. Experimental modulus and hardness characterized by using two different nanoindenter tools were within the limits of standard deviation. However, a strong effect of roughness on the spread of the experimental values was observed and it was found that hard-ness and elastic indentation modulus obeyed a Gaussian distribution. The experimental data were discussed together with scanning probe microscopy (SPM) images of typical imprints taken after the nanoindentation tests and the local topography's strong correlation with the results of nanoindentation was described.