YSZ薄膜的制备及应用

研究了在ＮＡＳＩＣＯＮ基板上使用溅射法制备的ＹＳＺ薄膜的结构,晶相和导电性,实验表明,刚制备的ＹＳＺ薄膜７５０℃常规退火处理后,薄膜表面致密、均匀、无裂纹,具备良好的导电性能,ＹＳＺ／ＮＡＳＩＣＯＮ组合再加上Ｂａ（ＮＯ３）２辅助电极构成的ＮＯｘ气体传感器在４５０℃下响应迅速（响应时间约为３ｍｉｎ）、稳定、能检测到１０ｐｐｍ量级的ＮＯ２气体。     

不同空穴注入电极对有机薄膜电致发光性能的影响

成功地制备了用铝掺杂的氧化锌（ＡＺＯ）透明导电膜作阳极的有机薄膜电致发光器件，并对单层和双层结构的ＡＺＯ器件以及以两种不同ＩＴＯ作阳极器件的电致发光光谱，电流电压特性，亮度电压特性以及电致发光量子效率进行了详细的比较分析和讨论。     

氧离子束辅助激光制备具有组构的YBCO薄膜

应用氧离子束辅助准分子脉冲激光沉积薄膜技术,先在ＮｉＣｒ合金（Ｈａｓｔｅｌｌｏｙ ｃ－２７５）基底上在室温下淀积具有平面织构的钇稳锆（ＹＳＺ） 缓冲层薄膜,再在 ＹＳＺ／ＮｉＣｒ基底上在 ７５０℃下制备具有平面织构和高临界电流密度的 ＹＢａ２Ｃｕ３Ｏ７－Ｘ（ＹＢＣＯ）薄膜、 ＹＳＺ和 ＹＢＣＯ薄膜都为 ｃ－轴取向和平面织构的, ＹＳＺ（２０２）和 ＹＢＣＯ（１０３）的 Ｘ射线扫描衍射峰的全宽半峰值分别为 １８＇和 １１＇．ＹＢＣＯ薄膜的临界温度和临界电流密度分别为 ９０Ｋ（Ｒ＝０）和 ７．９ｘ１０５Ａ／ｃｍ２（７７Ｋ,零磁场）．     

不锈钢基底上离子源辅助激光制备CeO2薄膜及其结构分析

室温下在不锈钢基底上应用Ａｒ＾＋离子源辅助,准分子脉冲激光沉积了ＣｅＯ２薄膜。研究结果表明：在合适的工艺条件下,直接在不锈钢基底上可以制备出ｃ轴取向的ＣｅＯ２薄膜,但这时的ＣｅＯ２薄膜在其ａ－ｂ平面内没有观察到织构的信息,进一步在相同的条件下,首先在不锈钢基底上制备一层ＹＳＺ,再在ＹＳＺ／不锈钢上制备ＣｅＯ２薄膜,实验结果显示出这时的ＣｅＯ２薄膜不但是ｃ轴取向,同时在其ａ－ｂ平面内织构。ＣｅＯ２（     

美能达RIVA系列中的佼佼者（下）

美能达ＲＩＶＡ系列中的佼佼者（下）翟继栋美能达ＲＩＶＡＺＯＯＭ７０Ｗ是ＲＩＶＡ系列中ＡＦ广角变焦小型相机中最新开发的品种之一，在该机推出之前已有同样变焦范围的另一款小型机问世，型号为ＭｉｎｏｌｔａＰａｎｏｒａｍａＺＯＯＭ２８，设有全景模式转换，但不属...     

溅射PZT薄膜的晶体结构和快速热处理

采用常温射频（ＲＦ）溅射法和快速热处理相结合的技术，在Ｐｔ／Ｔｉ／ＳｉＯ２／Ｓｉ衬底上，制备出具有铁电性的ＰＺＴ薄膜。研究了快速热处理工艺条件对ＰＺＴ薄膜性能的影响。通过Ｚ射线衍射法、ＳＥＭ和ＡＥＳ等方法，分析了ＰＺＴ薄膜的晶体结构、微结构、薄膜和电极间的界面效应。     

多孔陶瓷薄膜表面形貌研究

用原子力显微镜（ＡＦＭ）观察Ａｌ２Ｏ３、Ａｌ２Ｏ３－ＳｉＯ２及Ａｌ２Ｏ３－ＳｉＯ２－ＴｉＯ２复合陶瓷薄膜的表面形貌,Ｘ射线衍射（ＸＲＤ）分析表明,Ａｌ２Ｏ３薄膜的上为γ－Ａｌ２Ｏ３;Ａｌ２Ｏ３－ＳｉＯ２薄由γ－Ａｌ２Ｏ３和非晶诚ＳｉＯ２组成;而Ａｌ２Ｏ３－ＳｉＯ２－ＴｉＯ２薄膜的相成分为Ａｌ２Ｏ３、ＴｉＯ２、Ａｌ４Ｔｉ２ＳｉＯ１２和非晶态ＳｉＯ２,各相的含量随化学成分变化而变化,ＡＦＭ观察结果表明     

金属／YSZ多晶陶瓷电极交流阻抗特性

本文测量了以Ｙ２Ｏ３稳定的ＺｒＯ２（ＹＳＺ）电池：Ａｉｒ，Ｍ（ｐｔ、Ａｕ、Ｐｄ－Ａｇ）｜ＹＳＺ）｜Ｍ（ｐｔ、Ａｕ、Ｐｄ－Ａｇ），Ａｉｒ在２５０～５００°Ｃ、１２Ｈｚ～１００ＫＨｚ之间的交流阻抗．从作出阻抗谱分析，计算了ＹＳＺ多品陶瓷的晶内、晶界电阻及其对温度的依从性．晶界阻抗半圆的特征频率和温度的关系同样服从于Ａｒｒｈｅｎｉｕｓ公式．比较了Ｐｔ、Ａｕ和Ｐｄ－Ａｇ电极在ＹＳＺ氧化物电解质上的极化特性，并对氧通过各个电极扩散的电极过程中氧浓度－扩散率的积ＣＯ作了计算．     

35mm相机最新设计的主、被动混合式自动对焦功能

在最新设计的主、被动混合式自动对焦功能出现之前,新一代35ｍｍ自动对焦轻便相机要么是采用发射红外线的主动式自动对焦功能,如尼康ＺＯＯＭ310ＡＦＱＤ型、欧林帕斯μ105型等相机;要么是采用依靠相位差检测原理进行的被动式自动对焦功能,如美能达ＲＩＶＡＺＯＯＭ115ＥＸ型、ＲＩＶＡＺＯＯＭ135ＥＸ型,理光ＲＺ-1000型、Ｍｙｐｏｒｔ330Ｓｕｐｅｒ型,西格玛ＭＩＮＩＺＯＯＭＭＡＣＲＯ105型等相机。1、红外线主动式自动对焦红外线主动式自动对焦的基本工作原理是,相机上的红外线发射装置在摄影者按下快门释放钮的一瞬间向被摄物发射出一…     

掺入Al2O3对固体氧化物电解质材料YSZ性能影响的研究

在立方相的钇稳定化氧化锆〖（ＺｒＯ２）０．９２（Ｙ２Ｏ３）０．０８〗（ＹＳＺ）中,掺入少许不同量的Ｚｌ２Ｏ３,研究其对基体材料ＹＳＺ的烧结性能、机械强度和导电性能的影响,并对其机理进行了分析。实验结果表明,掺入Ａｌ２Ｏ３能够明显降低电解质烧结温度,改善烧结性能。在１３００℃烧结１ｈ后,少量掺杂Ａｌ２Ｏ３的样品晶粒尺寸明显比纯ＹＳＺ样品的小;从阻抗谱图上可以看出,随着Ａｌ２Ｏ３含量的增加,晶界电阻不     

添加剂元素对AZO薄膜性能的研究进展

近年来,国内外一些研究者对添加剂元素与铝元素共掺杂的ZnO薄膜开展了许多研究并发现在AZO薄膜掺入添加剂元素不仅会增强AZO薄膜的光电特性,而且还能优化其晶体结构和表面形貌,某些添加剂元素还可以提高AZO薄膜的多项性能和稳定性,这对研究AZO薄膜性能的提高提供了一个更具潜力的研究方向。介绍了AZ0薄膜的基本结构、基本特性以及光电性能原理。对添加剂元素对AZO薄膜结构的研究和光电性能的研究进行了归纳和总结,并且与AZO薄膜进行了对比。综述了添加剂元素掺人的AZO薄膜目前所采用的磁控溅射法、溶胶一凝胶法和脉冲激光法三种主要制备技术以及其优缺点,同时阐述了不同方法掺人添加剂元素的AZO薄膜的研究进展。最后介绍了添加剂元素掺入的AZO薄膜在光电领域的应用,展望了其未来发展与研究趋势。     

ZnO∶Al薄膜制备及光电性能研究

利用溶胶-凝胶法在玻璃基板上制备了Al/Zn原子掺杂比例为0～0.25的掺铝氧化锌(ZnO∶Al或AZO)薄膜,随后分别将其在空气,氧气和氮气3种不同气氛中退火处理,研究了薄膜的光学、电学与结构方面的性质.X射线衍射分析表明AZO薄膜是具有c轴择优取向的六方纤锌矿结构多晶体;通过紫外-可见光分光计测定表明该薄膜在可见光范围内具有>80%的高透过率,随着铝掺杂比例的增大光学能隙增大且吸收边向短波方向移动.     

掺铝氧化锌(AZO)薄膜的应用及研究评述

掺铝氧化锌(AZO)薄膜具有较高的透过率,较小的电阻率等优良的光电性能,使其在太阳能电池电极及各种显示器中具有广阔的应用前景。本文概述了AZO薄膜的结构、光电性能的表征方法,重点介绍了单层AZO膜以及AZO基多层复合薄膜的设计理论基础、影响薄膜性能的因素以及研究现状,除此之外,还对AZO薄膜的应用情况进行了概述,并对AZO薄膜发展前景进行了展望。     

氢化及沉积温度对掺铝ZnO透明导电薄膜性能影响

采用射频磁控溅射方法在玻璃衬底上制备了掺铝ZnO透明导电薄膜(AZO)。为了降低AZO薄膜的电阻率, 采用在溅射气氛中通入一定比例H₂的方法对AZO薄膜进行氢化处理, 并研究了溅射气氛中H₂含量及衬底温度对AZO薄膜氢化效果的影响。结果表明: 在低温条件下, 氢化处理能有效降低AZO薄膜的电阻率; 在衬底温度为100℃的低温条件下, 通过调节溅射气氛中H₂的比例, 制备了电阻率为6.0×10^-4 Ω·cm的高质量氢化AZO薄膜, 该电阻值低于同等条件下未氢化AZO薄膜电阻值的1/3; 但随着衬底温度的升高, 氢化处理对薄膜电学性能的改善效果逐渐减弱。     

热处理温度和掺杂浓度对AZO薄膜微结构的影响

采用溶胶-凝胶法在普通裁玻片上制备了（002）择优取向的AZO薄膜,研究了不同的热处理温度和掺杂浓度对薄膜微结构的影响。利用XRD和SEM表征了AZO薄膜晶体结构的择优取向和表面形貌。结果表明,热处理温度为450℃,择优取向最强,热处理温度高于或低于450℃时,择优取向都减弱;当掺杂浓度为2％时,AZO的择优取向最强,随着Al掺杂浓度的增大,薄膜的晶粒尺寸减小,薄膜变得更加致密。     

Improvements of spatial resistivity distribution in transparent conducting Al-doped ZnO thin films deposited by DC magnetron sputtering

The relationship between two techniques developed for improving the resistivity distribution on the substrate surface in transparent conducting Al-doped ZnO (AZO) thin films prepared at a temperature of 200 °C by dc magnetron sputtering depositions (dc-MSD) using various sintered AZO targets has been investigated. One improvement method superimposes an rf component onto the dc-MSD (rf + dc-MSD). The other improvement method uses conventional dc-MSD with a low resistivity AZO target prepared under optimized conditions. An improvement of resistivity distribution resulted from a decrease in the resistivity of targets used in the preparation of AZO thin films by dc-MSD either with or without superimposing rf power. However, the resistivity distribution of AZO thin films resulting from depositions using rf-superimposed dc-MSD with lower-resistivity targets was not significantly improved over that of AZO thin films prepared by conventional dc-MSD using targets with the same low resistivities. The use of rf superimposition only resulted in improved resistivity distribution in thin films when the AZO targets had a resistivity higher than around 1 × 10^− 3 Ω cm. It should be noted that sintered AZO targets optimized for the preparation of AZO thin films with lower resistivity as well as more uniform resistivity distribution on the substrate surface tended to exhibit a lower resistivity.     

The properties of Al doped ZnO thin films deposited on various substrate materials by RF magnetron sputtering

Transparent conductive Al-doped ZnO (AZO) thin films were deposited on various substrates including glass, polyimide film (PI) and stainless steel, using radio frequency magnetron sputtering method. The structural, electrical and optical properties of AZO thin films grown on various substrates were systematically investigated. We observe that substrate materials play important roles in film crystallization and resistivity but little on optical transmittance. X-ray diffractometer study shows that all obtained AZO thin films have wurtzite phase with highly c-axis preferred orientation, and films on glass present the strongest (002) diffraction peaks. The presence of compression stress plays critical role in determining the crystalline structure of AZO films, which tends to stretch the lattice constant c and enlarge the (002) diffraction angle. Although the films on the glass present the finest electrical properties and the resistivity reaches 12.52 × 10-4 Ωm, AFM study manifests that films on flexible substrates, especially stainless steel, bestrew similar inverted pyramid structure which are suitable for window material and electrode of solar cells. The average optical transmittance of AZO thin films deposited on glass and PI are both around 85% in the visible light range (400–800 nm).     

Nonlinear optical investigations on Al doping ratio in ZnO thin film under pulsed Nd:YAG laser irradiation

In the present study, it has been reported on the effect of Al doping on linear and nonlinear optical properties of ZnO thin films synthesized by spray pyrolysis method. The structural properties of ZnO thin films with different Al doping levels (0–4 wt%) were analyzed using X-ray diffraction (XRD). The results obtained from XRD analysis indicated that the grain size decreased as the Al doping value increased. The UV–Vis diffused refraction spectroscopy was used for calculation of band gap. The optical band gap of Al-doped ZnO (AZO) thin films is increased from 3.26 to 3.31 eV with increasing the Al content from 0 to 4 wt%. The measurements of nonlinear optical properties of AZO thin films have been performed using a nanosecond Nd:YAG pulse laser at 532 nm by the Z-scan technique. The undoped ZnO thin film exhibits reverse saturation absorption (RSA) whereas the AZO thin films exhibit saturation absorption (SA) that shows RSA to SA process with adding Al to ZnO structure under laser irradiation. On the other hand, all the films showed a self-defocusing phenomenon because the photons of laser stay on below the absorption edge of the ZnO and AZO films. The third-order nonlinear optical susceptibility, χ⁽³⁾, of AZO thin films, was varied from of the order of 10^?5–10^?4 esu. The results suggest that AZO thin films may be promising candidates for nonlinear optical applications.     

AZO透明导电薄膜的制备技术及应用进展

概述了国内外AZO透明导电薄膜的多种制备技术和开发应用进展。详细介绍了磁控溅射、溶胶-凝胶、脉冲激光沉积、真空蒸镀、化学气相沉积等工艺在AZO薄膜制备中的研究现状,并且在对AZO膜与ITO膜性能比较的基础上,指出AZO薄膜的产业化前景好。     

溅射功率对AZO透明导电薄膜的影响

采用射频磁控溅射法在玻璃衬底上沉积了AZO透明导电薄膜,并用原子力显微镜观测了薄膜表面形貌,XRD测试了薄膜相结构和单色仪测试了薄膜透射率。结果表明,制备的薄膜具有高度c轴择优取向性,其表面平整,晶粒均匀致密。当溅射功率为180W、溅射气体流量为15sccm、基片温度为200℃时制得的薄膜方阻为10Ω/□,在可见光区平均透射率大于85%。