MQ树脂改性UV固化涂料的制备及其在体育器材中的应用

为促进UV固化涂料在体育器材中的应用,用MQ树脂改性有机硅光固化树脂和聚酯丙烯酸酯齐聚物材料,以此分别制备UV固化涂料,分析MQ树脂对UV涂料的补强效果,并探究其在体育器材中的潜在应用特性.试验采用通过加入不同比例用量的试验原料进行了2组不同改性路线的UV涂料制备,并研究了改性后对样品的铅笔硬度、透光率和水接触角的影响.结果 表明:涂层表面硬度方面,MQ树脂改性有机硅光固化树脂会得到增强的效果,而MQ树脂对于聚酯丙烯酸酯的补强效果有限;涂层透光率方面,有机硅改性光固化树脂体系的透光率优于聚酯丙烯酸齐聚物体系,并且涂层透光率随着MQ树脂含量的增加而逐渐降低并趋近于0;涂层亲水性方面,MQ树脂含量一定时,随着有机硅光固化树脂和聚酯丙烯酸酯齐聚物用量的增加,涂层的亲水性增加;改变MQ树脂添加量时,在有机硅改性光固化树脂体系中几乎没有影响,在聚酯丙烯酸酯齐聚物体系中随着MQ树脂用量的增加,接触角度数逐渐减小,涂层的亲水性增加.     

光敏性聚氨酯低聚物改性纳米二氧化硅及在光固化聚氨酯体系的应用

设计合成了异氰酸酯基(NCO)半封端光敏性聚氨酯低聚物,将其接枝到氨基硅氧烷改性的二氧化硅表面,制备了光固化聚氨酯/二氧化硅纳米复合膜。红外光谱和热重分析分析表明低聚物成功接枝到二氧化硅表面,透射电镜和扫描电镜分析表明低聚物改性的二氧化硅在甲苯、聚氨酯树脂中均匀分散,流变、动态力学分析和应力-应变分析表明纳米二氧化硅表面接枝的低聚物与聚氨酯分子之间存在较强相互作用,复合膜的弹性模量、储能模量和拉伸强度得到显著提高。     

光固化聚氨酯丙烯酸酯/SiO_2杂化涂层的制备及性能

以六亚甲基二异氰酸酯(HDI)或甲苯-2,4-二异氰酸酯(TDI)分别与不同相对分子质量的聚乙二醇(PEG)反应制备聚氨酯预聚体,再以预聚体对纳米SiO2进行表面接枝改性,将改性纳米SiO2分散到聚氨酯丙烯酸酯(PUA)中,光固化制备了PUA/SiO2纳米杂化涂层。场发射扫描电子显微镜和差示扫描量热法研究表明,与未改性的纳米SiO2相比,以聚氨酯分子链改性的纳米SiO2可显著提高与PUA树脂相容性及杂化涂层的热稳定性能。以摆杆阻尼试验仪及漆膜冲击器研究了杂化涂层的力学性能,研究表明通过调整预聚体的分子链结构可在提高杂化涂层硬度的同时,不损失涂层的冲击性能。     

有机硅改性水性聚氨酯的合成及其光固化动力学的研究

将异佛尔酮二异氰酸酯(IPDI)加到端羟基聚二甲基硅氧烷(PDMS)和聚乙二醇(PEG600)混合物中进行反应,生成端基为异氰酸酯基的聚氨酯预聚体,用二羟甲基丙酸(DMPA)进行亲水扩链,季戊四醇三丙烯酸酯(PETA)引入光固化基团,然后用三乙胺中和,最后加水乳化,合成了一种有机硅改性水性聚氨酯乳液(WPUA-Si)。通过FT-IR、TG、吸水率测试对其进行了研究。结果表明,有机硅改性的水性聚氨酯树脂的耐水性和热稳定性均有所提高。采用实时(real time)红外光谱原位(in situ)跟踪监测了该树脂的光固化动力学行为,结果表明,当光引发剂Darocur1173含量为树脂质量的5%(质量分数),体系光固化速率为最优。此外,增大辐照光强也有利于树脂的光固化。     

改性环氧树脂的合成及在低红外发射率涂层上的应用

合成了聚氨酯改性环氧树脂,研究了合成改性环氧树脂的最佳反应时间,通过红外光谱(IR)研究了聚氨酯预聚体和环氧树脂之间的化学反应,不同聚氨酯预聚物添加量对改性树脂固化物冲击韧性和拉伸强度的影响,并以该树脂制备了低红外发射率涂层,研究了聚氨酯不同添加量及固化剂种类对涂层柔韧性和硬度的影响。结果表明,制备改性环氧树脂的最佳反应时间为3h,红外谱图显示聚氨酯预聚体成功接枝到环氧树脂上。当聚氨酯预聚体的添加量为环氧树脂质量的10%时,改性树脂冲击韧性和拉伸强度达到最大值;选用聚酰胺为固化剂时,涂层的柔韧性可达1mm,铅笔硬度始终保持在3H。     

光固化树脂部分（20051099～20051107）

20051099 具有良好耐污性的抗反射膜的制备方法 题述膜不易被指纹或杂质弄脏，易于大量生产，可用于平板显示设备，制备步骤如下：1）制备涂料液，即混和UV固化树脂组分（包括UV固化丙烯酸-聚氨酯基树脂、光聚合引发剂及溶剂）、二氧化硅分散体组分（包括丙烯酸基树脂、SiO2粒子、分散剂及溶剂）及稀释荆；2）将涂料液涂于基片上，使涂层干燥，在UV下曝露固化并在其上涂覆氟基硅烷偶联剂形成含氟涂层。（CA137：7599）     

阻燃型丙烯酸聚氨酯绝缘涂料的研制

以环氧改性丙烯酸树脂为基料，氯化石蜡和Sb2O3，为阻燃改性剂，制得了阻燃型丙烯酸聚氨酯绝缘涂料。研究了不同丙烯酸树脂、氯化石蜡及协同剂Sb2O3用量对涂料电气性能、阻燃性能和漆膜硬度、光泽度的影响。结果表明，用环氧改性丙烯酸树脂制成的涂料具有较好的阻燃性能和电气绝缘性能。其体积电阻率为9．6×10^25Ω·m。电气强度达32MV／m。当氯化石蜡用量为8％，在3％的Sb2O3协同作用下，可将聚氨酯涂料的极限氧指数（LOI）从18提高到31，同时能保证聚氨酯涂料优良的物理机械性能。     

光固化氨酯改性丙烯酸系阴极电泳漆的合成及性能

采用甲基丙烯酸甲酯(MMA)、丙烯酸丁酯(BTA)、甲基丙烯酸-β-羟乙酯(HEMA)、甲基丙烯酸-N,N-二甲胺乙酯(DMAEMA)共聚合成了具有羟基侧基的丙烯酸树脂,再用异佛尔酮二异氰酸酯(IPDI)与HEMA的半加成物对其进行接枝改性合成了电泳基体树脂.研究了催化剂、温度、反应时间等对接枝反应的影响,结果表明,催化剂加速了接枝反应,两种催化剂复合后具有更好的催化作用,这可能与两者的协同作用有关.温度升高有利于接枝反应的进行,并研究了光固化阴极电泳漆膜的基本性能.     

氟/硅丙烯酸树脂防污涂层的制备及性能研究

以全氟烷基乙基甲基丙烯酸酯为功能单体,采用自由基聚合法制备了具有防污性能的低表面能氟/硅丙烯酸树脂涂层,重点探讨了有机氟含量对树脂涂层的接触角、玻璃化转变温度、附着力、硬度等性能及单体转化率的影响,确定了氟/硅丙烯酸涂层的最佳制备条件。结果表明,氟/硅单体成功与丙烯酸单体发生共聚,当氟/硅丙烯酸涂层中的氟质量分数为14.60%时,树脂涂膜的接触角为103.7°,与基体结合力优异,同时具有良好的防腐性能。     

纳米SiO_2的光敏改性及在光固化复合涂层中的应用

以六亚甲基二异氰酸酯(HDI)、4,4′-二羟基二苯甲酮(DHBP)、N-甲基二乙醇胺(MDEA)为原料,合成出主链含有夺氢型光引发剂以及共引发剂胺结构的NCO封端的聚氨酯预聚体,将预聚体接枝到纳米SiO_2表面,得到具有聚氨酯结构的光敏性纳米SiO_2(PU-photo-SiO_2),然后将其添加到聚氨酯丙烯酸酯树脂(PUA)中制备出光固化复合膜。红外光谱证实了PU-photo-SiO_2的成功合成;扫描电镜、热重分析、冲击强度等研究表明,PU-photo-SiO_2与光固化PUA树脂的相容性较好,利于提高光固化膜的热稳定性和力学性能。     

新型海洋涂料技术

本文综述了符合时代要求的海洋涂料新技术及其发展趋势。     

Optical black coatings for space applications

The durability properties of PTX-205 optical black coatings deposited on metallic and non-metallic substrates are studied. The coatings are stable against adverse environmental requirements for space applications. Typically, coatings with 8–11 μ thickness are opaque and have an average reflectance loss (<5%) in the spectral range of 200–1500 nm. The absorption to emission ratio is 1·01.     

The production of porous and chemically reactive coatings by magnetron sputtering

High surface area materials can have a number of applications including use as pyrophoric devices, sensors, laser mirrors, filters, thermal barriers and catalysts. The aim of this work was to deposit highly porous thin films capable of undergoing a spontaneous pyrophoric reaction and igniting a suitable substrate material. Magnetron sputtering was the chosen deposition technique as it enables reproducible deposition of coatings, with closely controlled, almost uniform, thickness and morphologies over extended surfaces.A number of magnetron magnetic configurations were investigated and deposition conditions were varied in order to control the surface area of the films and, thereby, optimise the pyrophoric behaviour. As a consequence, pyrophoric coatings were produced with ignition temperatures dependent on the deposition conditions and substrate material/topography. When deposited on combustible substrates, these coating/substrate systems formed simple pyrotechnic devices in a one-stage process. The main thermal signal emitted by these devices was dependent on the substrate material only.     

Deposition of photocatalytic titania coatings on polymeric substrates by HiPIMS

Titania coatings have been deposited onto PET substrates by reactive magnetron sputtering in the HiPIMS (high power impulse magnetron sputtering) mode and for comparison, pulsed DC mode. In the latter case, the substrate showed evidence of melting, but the HiPIMS results were dependent on the characteristics of the power supply when operating under nominally identical conditions. A coating deposited by one of the HiPIMS supplies was found to have a mixed phase structure and to demonstrate a level of photocatalytic activity comparable to conventional coatings which had been post-deposition annealed.     

低温PVD法制备多组分超硬薄膜相组成研究

回顾了多组分硬质薄膜的发展，指出了多组分薄膜低温淀积时相组成研究与预测存在的问题。对多组分硬质薄膜，包括类质同晶体系与多组分共熔体，低共熔体系、转熔体系、亚稳定固熔体与非晶固熔体，化合物，梯度薄膜，多相薄膜材料，多层薄膜和超晶格薄膜等可能的相组成与相关性质进行了讨论。对淀积速率与薄膜厚度，相组成与薄膜均质性，超晶格薄膜硬度与超晶格周期等的计算模型进行了评述。     

Photocatalytic activity of reactively sputtered and directly sputtered titania coatings

It is well known that, depending on deposition conditions, the structure of titania coatings may be amorphous, anatase or rutile, or a mixture of phases, and that the anatase phase is the most promising photocatalyst for the degradation of organic pollutants. The formation of anatase depends on the energy delivered to the growing film, which in turn depends on the operating parameters chosen. In this study, titania coatings have been deposited onto glass substrates by pulsed magnetron sputtering both from metallic targets in reactive mode and directly from oxide powder targets. The as-deposited coatings were analysed by scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDX) and micro-Raman spectroscopy. Selected coatings were then annealed at temperatures in the range of 400–700 °C and re-analysed. The photocatalytic activity of the coatings has been investigated through measurements of the degradation of organic dyes, such as methyl orange, under the influence of UV and fluorescent light sources. Further sets of coatings have been produced both from metallic and powder targets in which the titania is doped with tungsten. These coatings have also been analysed and the influence of the dopant element on photocatalytic activity has been investigated. It has been found that, after annealing, both sputtering processes produced photo-active surfaces and that activity increased with increasing tungsten content over the range tested. Furthermore, the activity of these coatings under exposure to fluorescent lamps was some 50–60% of that observed under exposure to UV lamps.     

冷气动力喷涂技术研究进展

作为一种新的涂层方法－冷气动力喷涂因能在较低的温度下喷涂金属、合金以及复合涂层而受到人们的关注。综述了国内外冷气动力喷涂技术领域的最新研究进展，主要包括冷气动力喷涂技术研究、冷喷涂涂层的结构性能和涂层特点及其应用。     

Characterization of Zinc-phthalocyanine-CdS composite thin films for photovoltaic applications

The optical properties of ZnPc-CdS composite thin films have been measured. The composite layers were prepared by vacuum evaporation. The electrical conduction mechanism prevailing in these junctions was of Poole-Frenkel type and the activation energy was found to have a linear dependence with applied field. The maximum photoconductivity occurred at an energy gap around 1.5 to 1.7 eV. The photosensitivity is found to increase with increase in applied voltage.     

Influence of the aluminum incorporation on the structure of sputtered ZrNx films deposited at low temperatures

We have studied the influence of the Al incorporation in the crystalline structure of ZrN thin films deposited by dc magnetron sputtering processes at low temperature. The incorporation of the aluminum in the films depends directly on the Ar/N₂ ratio in the gas mixture and the power applied to the aluminum cathode during the deposition. The chemical composition and the crystalline structure of the films were analyzed by Energy Dispersive X-ray (EDX) spectroscopy and X-ray Diffraction (XRD), respectively. When Al atoms are incorporated into the ZrN coatings, the strong ZrN (200) preferred orientation is modified to a combination of phases related to (111) ZrN with a contribution of cubic (111) AlN and possibly (211) Zr₃N_4, which are detected by XRD for high aluminum concentrations. Fourier Transform Infrared (FTIR)spectroscopy allowed us to complete the identification of the nitrides and oxides incorporated into the deposited films. The effect of a bias voltage applied to the substrate has also been investigated and related to the changes in the microstructure and in the nanohardness values of the ZrAlN films.