偏压对电弧离子镀CrNx薄膜结构和机械性能的影响

采用电弧离子镀技术在不锈钢基体表面制备了CrNx薄膜,并采用场发射扫描电镜、X射线衍射仪、显微硬度仪、球-盘式摩擦磨损试验机等手段对在不同偏压下沉积的CrNx薄膜的表面形貌、相结构、显微硬度和摩擦学性能进行考察.结果表明:随着偏压的增加, CrNx薄膜沉积率下降,厚度降低,CrNx薄膜表面颗粒逐渐变少,表面粗糙度降低,结晶度增大,晶粒尺寸增加;CrNx薄膜由Cr2N相和CrN相组成,薄膜的择优取向发生较大变化.当偏压为-100V时,CrNx薄膜的表面结构最致密,硬度最高,抗磨损性能最强.     

65Mn钢基体CrTiAlN微纳米复合膜的制备与抗高温磨损性能研究

采用多弧离子镀在活塞环65Mn钢基体表面制备CrTiAlN微纳米复合膜,研究了CrNx过渡缓冲层与工作负偏压对CrTiAlN微纳米复合膜性能的影响规律,采用X射线衍射(XRD)、扫描电子显微镜(SEM)、划痕仪、纳米硬度仪和发动机台架试验装置,系统分析了薄膜相结构、表面形貌、纳米硬度和抗高温摩擦磨损性能。结果表明:当N2含量为45%时,CrNx薄膜中主要以CrN(220)相为主,此时复合膜结合强度相对较高;复合膜厚度随负偏压增大而减小,纳米硬度随负偏压增大而增大,当偏压为–200V时,CrTiAlN微纳米复合膜的晶粒较为细小。采用优化工艺沉积的CrTiAlN复合膜具有优异的抗高温粘着磨损性能,优于CrN膜和电镀Cr,最后对3种活塞环涂层的抗高温磨损机理进行了分析讨论。     

氦气流量对中频非平衡反应磁控溅射制备CrAlN薄膜性能的影响

采用中频非平衡反应磁控溅射技术制备CrAlN薄膜,研究了氮气分压对CrAlN薄膜的沉积速率、薄膜成分、微观结构、机械性能和耐腐蚀性能的影响,并与CrN薄膜的性能进行了比较.研究表明,相比较CrN薄膜而言,CrAlN薄膜的硬度高,结构致密,耐腐蚀性好.随着氮气流量的升高,CrAlN薄膜沉积速率降低,Cr/Al比率升高;薄膜中CrN(200)衍射峰强度逐渐增强,六方结构的AlN相逐渐消失;薄膜的粗糙度由39 nm降低至10 nm,并且腐蚀电位升高,耐腐性增强.当氮气流量为53 mL/min时,CrAlN薄膜具有最佳的硬度和优良的耐腐蚀性能.     

氮气流量对中频非平衡反应磁控溅射制备CrAlN薄膜性能的影响

采用中频非平衡反应磁控溅射技术制备CrAlN薄膜,研究了氮气分压对CrAlN薄膜的沉积速率、薄膜成分、微观结构、机械性能和耐腐蚀性能的影响,并与CrN薄膜的性能进行了比较。研究表明,相比较CrN薄膜而言,CrAlN薄膜的硬度高,结构致密,耐腐蚀性好。随着氮气流量的升高,CrAlN薄膜沉积速率降低,Cr/Al比率升高;薄膜中CrN(200)衍射峰强度逐渐增强,六方结构的AlN相逐渐消失;薄膜的粗糙度由39 nm降低至10 nm,并且腐蚀电位升高,耐腐性增强。当氮气流量为53 mL/min时,CrAlN薄膜具有最佳的硬度和优良的耐腐蚀性能。     

氮化铬梯度膜的制备和电化学性能研究

在H13钢基体上制备了几种成分的CrNx双层膜和梯度膜。使用X光电子能谱(XPS)分析了膜层的成分，使用X射线衍射仪(XRD)分析膜层的主要相结构：同时检测了膜层的硬度与工艺参数的关系。系统地研究了膜层的动电位极化曲线，梯度膜能够明显降低膜层的腐蚀电流密度。使用扫描电子显微镜(SEM)，研究了膜层显微结构和性能之间的关系，并提出了双层膜和梯度膜的结构模型。膜层的主要成分、结构都随着氮气分压而改变。随着氮气分压从0．05Pa提高到2Pa，CrNx膜层中的N／Cr原子比从0．08提高到0．67。氮气分压0．05Pa时，双层膜的成分包括Cr(bcc)和Cr2N(hex)，在分压达到2Pa时，膜层主要成分为CrN(fcc)，在梯度膜中有一个CrN(220)择优取向。相对于CrN／Cr／H13双层膜，梯度薄膜的抗腐蚀性能有明显提高。在双层膜上有较多较深的微孔，而在梯度膜表面比较鲜见。     

直流反应磁控溅射CrNX功能装饰涂层的研究

采用反应磁控溅射制备不同氮气流量下的CrNX膜,观察薄膜颜色的变化,采用球盘式摩擦磨损仪、台阶仪、金相显微镜测试薄膜的耐磨性能,并采用X射线衍射技术、场发射扫描电镜观测薄膜的相成份以及微观形貌.研究结果表明,随着氮气含量的增加,薄膜颜色由银灰色逐渐过渡为深灰色,薄膜相结构由单相Cr2N转变为Cr2N和CrN混合相继而转变为单相CrN,当氮气流量为20 cm3·min-1以及30 cm3·min-1时薄膜表现出良好的耐磨性.采用高氮气流量的工艺镀中间层,低氮气流量的工艺镀表面层,复合薄膜的耐磨性大幅度提高,同时能够获得美观的银灰色外观.     

CrN薄膜掺杂Mo元素改性研究

利用多弧离子镀技术,在4Cr13不锈钢表面制备CrN薄膜,并掺杂不同含量的Mo原子,制备CrMoN复合薄膜。用XRD、附着力划痕仪、显微硬度计和电化学测量仪分别检测复合薄膜的相结构、结合力、硬度以及在3.5%NaCl溶液、1 mol·L~(-1) NaOH溶液和1 mol·L~(-1) H_2SO_4溶液中的电化学腐蚀性能。结果表明;CrMoN复合薄膜形成了以NaCl型面心立方CrN结构为基础的(Cr,Mo)N结构;当Mo含量达到31.08%(原子分数)时,在(311)、(111)方向上出现Mo_2N的衍射峰,此时薄膜出现了CrN、(Cr,Mo)N和Mo_2N相结构并存的情况。当Mo的原子分数为7.09%时,结合力最大为57 N,显微硬度(HV)达到最大值29623 MPa;当Mo含量为14.26%时,在H_2SO_4溶液和NaOH溶液中耐蚀性能最好;当Mo含量为5.15%时,在NaCl溶液中耐蚀性能最好。复合薄膜腐蚀机理主要是局部腐蚀中的小孔腐蚀,缝隙腐蚀和电偶腐蚀也会发生。     

不同掺杂Mo含量对CrMoN薄膜耐腐蚀性能的影响研究

利用多弧离子镀技术,在4Cr13不锈钢表面制备CrN薄膜,并掺杂不同含量的Mo原子,制备CrMoN复合薄膜。用XRD、附着力划痕仪、显微硬度计和电化学测量仪分别检测复合薄膜的相结构、结合力、硬度以及在3.5% NaCl溶液、1 mol?L-1 NaOH溶液和1 mol?L-1 H2SO4溶液中的电化学腐蚀性能。结果表明;CrMoN复合薄膜形成了以NaCl型面心立方CrN结构为基础的（Cr,Mo）N结构;当Mo含量达到31.08%时,在（311）、(111)方向上出现Mo2N的衍射峰,此时薄膜出现了CrN、(Cr,Mo)N和Mo2N相结构并存的情况。当Mo的原子百分比为7.09% 时,结合力最大为57N,显微硬度达到最大值2962.3 HV;当Mo含量为14.26%时,在H2SO4溶液和NaOH溶液中耐蚀性能最好;当Mo含量为5.15%时,在NaCl溶液中耐蚀性能最好。复合薄膜腐蚀机理主要是局部腐蚀中的小孔腐蚀,缝隙腐蚀和电偶腐蚀也会发生。     

电弧等离子体辅助渗氮处理Cr12MoV钢的组织结构及硬度

采用不同温度对Crl2MoV钢进行电弧等离子体辅助渗氮处理.采用X射线衍射(XRD)分析渗氮层的相组成,采用扫描电子显微镜(SEM)及光学显微镜分别观察渗氮样品表面形貌及横截面形貌,利用显微硬度计测试渗氮层的硬度分布.结果表明:实验钢渗氮层的结构由CrN+γ'-Fe4N+ε-Fe3N的化合物层及由含氮马氏体相α-Fe (N)组成,渗氮层的厚度随处理温度的升高而增加.渗氮处理后能明显提高Cr12MoV钢基体的显微硬度.     

多弧离子镀制备的大厚度Cr/Cr_2N/CrN多层涂层的结构和力学性能（英文）

采用多弧离子镀制备一种厚度为24.4μm的Cr/Cr2N/CrN多层结构涂层。采用场发射扫描电子显微镜(FESEM)、X射线光电子能谱(XPS)、能量散射谱(EDS)、X射线衍射(XRD)和透射电镜(TEM)对涂层进行表征,并用纳米压痕和划痕仪测试其硬度和结合力。用UMT-3MT往复式摩擦磨损试验机对涂层在大气和海水环境中的摩擦性能进行测试。结果表明,该涂层由3种相结构组成,分别是Cr相、Cr2N相和CrN相。相对于单层CrN涂层,多层涂层的结合力明显提高,该涂层的硬度为(21±2)GPa。多层结构涂层在人工海水中的耐蚀性能显著优于单层CrN涂层的耐蚀性能,且在大气和海水中多层结构涂层的摩擦因数均低于单层CrN涂层的摩擦因数。     

离子束增强沉积CrN膜层及其微动摩擦学性能研究

以不同氮离子辅助轰击能量制备CrN膜层．利用纳米压入仪及显微硬度计分别测试单晶Si片上膜层的硬度及断裂韧度K1C．使用XRD、XPS及EPMA分析离子轰击能量对镀层组织结构的影响。结果表明，采用能量较低的氮离子轰击得到的涂层，由于金属Cr的存在，涂层硬度虽有所降低，但断裂韧度K1C数值较高。选择较低的4keV辅助轰击能量，在M2高速钢基体上沉积CrN涂层，膜层在空气介质中表现出优异的耐磨减摩特性.但在水介质条件下，由于膜层接触区域的去钝化，再钝化使腐蚀和磨损相互加速，导致CrN膜层摩擦系数，尤其是磨损量明显高于基材。     

Thermal stability behaviors of Cr(N,O)/CrN double-layered coatings by TGA/DTA analysis

In this study, Cr(N,O)/CrN double-layered coatings were synthesized using the cathodic arc deposition (CAD) process. CrN film was first deposited onto a substrate as an interlayer to ensure better adhesion, and Cr(N,O) film was subsequently deposited on top of the CrN layer as the surface layer. Variation in the Cr(N,O) coating composition was achieved through changing the O₂/N₂ flow ratio during the last stage of processing. Phase structure, chemical composition, and morphology of the resulting coatings were analyzed and observed using the X-ray diffractometer, Auger electron spectrometer and SEM. In addition, oxidation behavior of the coatings was investigated using TGA/DTA methods. The tests were carried out by increasing temperature up to 1000 °C in ambient air. With the introduction of oxygen gas during the CAD process, a superficial layer was produced in the Cr(N,O) constituent containing CrN and Cr₂O₃ phases. The formation of the oxide phase attributed to the reaction of chromium and oxygen was more favorable than that of chromium and nitrogen. The results also showed that Cr(N,O)/CrN double-layered coatings exhibited superior oxidation resistance at elevated temperature than that of CrN single-layer coated specimen (870 °C vs. 750 °C).     

直流溅射沉积CrN薄膜组织结构与摩擦性能分析研究

采用直流反应溅射在304不锈钢表面沉积CrN薄膜。利用X射线衍射仪（XRD）,扫描电子显微镜（SEM）,原子力显微镜（AFM）,显微硬度计,磨损试验机与三维轮廓仪等表征氮气流量对CrN薄膜组织结构与摩擦性能的影响。研究结果表明,随着氮气流量的增加,CrN (200)晶面呈择优取向,薄膜的沉积速率随着氮气流量的增加逐渐降低。另外,薄膜的表面粗糙度随着氮气流量的增加呈先降低后增加的趋势。随着氮气流量从15 sccm增加至30 sccm时,薄膜的显微硬度先从527.34 HV增加至1042.26 HV,当氮气流量再增加至35 sccm时,薄膜的显微硬度却降低至918 HV。磨损试验表明,当氮气流量为30 sccm 时薄膜具有最小的摩擦系数0.93和磨损率2.02×10-15m3·(N·m)-1,显示最佳的磨损性能。     

等离子体增强磁控溅射CrSiN涂层摩擦磨损行为

目的基于细晶强化理论,借助新型涂层制备技术获得综合性能优良的CrSiN涂层,研究Si含量对涂层微观结构、力学性能及耐磨性能的影响规律。方法采用等离子体增强磁控溅射技术,制备四种含有不同Si含量的Cr Si N涂层。使用X射线能谱仪(EDS)、X射线衍射仪(XRD)、场发射扫描电子显微镜(FE-SEM)和原子力显微镜(AFM),分析涂层的化学成分、晶体结构、微观形貌和表面粗糙度。使用纳米压痕/划痕仪测试涂层的显微硬度、杨氏模量和结合力。使用摩擦磨损试验仪考察涂层的摩擦磨损行为。结果 Cr Si N涂层中Si含量随着Si靶功率的增加而增加。所有涂层中均未检测到含Si物相,主要由Cr N相组成。随着Si含量的增加,CrN(111)衍射峰逐渐减弱直至消失,涂层由疏松的三角锥结构逐渐变为致密平整的CrN纳米晶和Si3N4非晶共存的复合结构,涂层表面粗糙度显著降低,涂层的显微硬度、杨氏模量、结合力及耐磨性能均呈现先增后降的趋势。结论 Si含量为18.5%的Cr Si N涂层具有最佳的耐磨性能,此时涂层的硬度、杨氏模量、结合力和平均摩擦系数分别约为27 GPa、327 GPa、30 N和0.289。     

TC4钛合金表面涂层改性:CrN素多层

目的 提高TC4钛合金的硬度和耐磨损性,改善CrN硬质涂层与TC4钛合金的适应性.方法 采用等离子体增强磁控溅射系统,通过调节热丝放电电流,在TC4钛合金基体表面沉积疏密CrN单层和素多层涂层.利用X射线衍射仪(XRD)、扫描电子显微镜(SEM)、能谱仪(EDS)、纳米压痕仪、洛氏压痕仪、摩擦磨损仪以及台阶仪,表征涂层形貌、成分、物相及性能.采用动电位极化法表征涂层的耐腐蚀性.结果 当热丝放电电流为较低的4 A×4时,沉积的CrN单层涂层为具有针孔、孔洞等缺陷的疏松结构,8 A×4沉积的CrN单层涂层具有致密结构,周期性调节热丝放电电流则获得疏密交替的CrN素多层涂层.CrN涂层均由单一面心立方结构的CrN相组成,疏松CrN单层涂层的衍射晶面为(111)、(200)、(220)及(222),致密CrN单层涂层沿(111)晶面择优生长,随着疏密子层调制比的增大,CrN素多层涂层的(111)衍射峰不断增强.疏松CrN单层涂层的最小H和最大E分别为13.0 GPa和207.5 GPa,调制比为1:4的疏密CrN素多层涂层的最小H和最大E分别为17.0 GPa和257.4 GP.在1470 N载荷下洛式压痕法表明,致密CrN单层涂层的结合强度最低,等级为HF5,其余涂层均为HF1—HF4.CrN涂层的自腐蚀电位较TC4钛合金均发生了正移.结论 CrN硬质涂层可以有效提高TC4钛合金的硬度和耐磨损性,表面得到明显强化.周期性调节等离子体密度所沉积的疏密CrN素多层涂层与单层相比,涂层性能明显改善.     

Mechanical and tribological properties evaluation of cathodic arc deposited CrN/ZrN multilayer coatings

Five nanostructured CrN/ZrN multilayer coatings were deposited periodically by cathodic arc evaporation. The bilayer periods of the CrN/ZrN multilayer coatings were controlled in the range of 5 to 30 nm. The structures and bilayer period of the multilayer coatings were characterized by an X-ray diffractometer. The microstructures of thin films were examined by scanning electron microscopy (SEM) and transmission electron microscopy (TEM), respectively. Nanoindentation, scratch tests, Daimler–Benz Rockwell-C (HRC-DB) adhesion tests, microhardness and pin-on-disk wear tests were used to evaluate the hardness, adhesion, indentation toughness and tribological properties of thin films, respectively. It was found that the hardness and tribological properties were strongly influenced by the bilayer period of the CrN/ZrN multilayer coatings. An optimal combination of mechanical properties and excellent tribological behavior was found for a coating with a critical bilayer period of 30 nm.     

Microstructure and mechanical property evaluation of pulsed DC magnetron sputtered Cr–B and Cr–B–N films

CrB₂ and four Cr–B–N films with high Cr/B ratio and various nitrogen contents were deposited by a co-sputtering process using a bipolar asymmetric pulsed DC reactive magnetron sputtering system. The structures and BN bonding nature of the thin films were characterized by X-ray diffraction (XRD) and Fourier transform infrared spectroscopy (FTIR), respectively. The surface and cross sectional morphologies of the thin films were examined by scanning electron microscopy (SEM) and transmission electron microscopy (TEM). The surface roughness of the thin films was explored by atomic force microscopy (AFM). Nanoindentation, microscratch and ball-on-disk wear techniques were used to evaluate the hardness, and tribological properties of the thin films, respectively.The microstructure of the Cr–B–N thin films changed from a coarse columnar structure to a glassy and featureless morphology as the nitrogen content increased from 15.2 at.% to 54.5 at.%, whereas the corresponding structure developed from an amorphous state to a nanocomposite structure consisting of CrN nanograins and amorphous BN phases. It was found that high hardness, good tribological and brittle properties were obtained for the CrB₂ coating. The hardness and elastic modulus of the Cr–B–N thin films decreased with increasing nitrogen content until the nanocomposite structure of nanocrystalline CrN grains and an amorphous BN matrix was formed. However, the hardening effect induced by the nanocomposite structure was limited due to the fact that the small CrN nanograins were surrounded by a thick intergranular soft amorphous BN layer. On the other hand, the fracture toughness and resistance against elastic strain to failure of the Cr–B–N coatings were effectively enhanced by the addition of nitrogen.     

Effects of nitrogen pressure and pulse bias voltage on the properties of Cr-N coatings deposited by arc ion plating

Cr-N coatings were deposited on 1Cr18Ni9Ti stainless steel in the pure N₂ atmosphere by arc ion plating (AIP). The relationships between deposition parameters and coating properties were investigated. X-ray diffraction showed a phase transformation from CrN + Cr₂N + Cr → CrN + Cr → CrN and the CrN preferred orientation changed from (200) to (220) as N₂ pressure increased. Increasing bias voltage led to CrN preferred orientation changed from (200) to (220) and the formation of Cr₂N. XPS results indicated that chemical composition of the coatings changed as N₂ pressure increased but it changed little with bias voltage. The lower melting point of chromium nitride formed on target surface induced the increase of macroparticles and deposition rate with increasing N₂ pressure; and bias voltage had an obvious effect on reducing macroparticles of the Cr-N coatings. Residual stresses were measured by substrate curvature technique, and the changing tendency coincided with the microhardness of the coatings.     

Tribological behavior of CrN/WN multilayer coatings grown by ion-beam assisted deposition

CrN monolayer coating and CrN/WN multilayer coatings were deposited on the silicon (100) substrate by ion-beam assisted deposition process. The bilayer period of these coatings was controlled at 8 nm and 30 nm. The cross-sectional morphology of nanoscaled multilayer coatings was characterized by scanning electron microscopy and transmission electron microscopy. The wear resistance of CrN/WN multilayer coatings and CrN monolayer coating was investigated using a pin-on-disc tribometer. The surface roughness (Ra) of the coatings was evaluated by atomic force microscopy, and that of CrN and WN monolayer coating was 6.7 and 5.9 nm, respectively. The employment of multilayer configuration in CrN/WN coating with bilayer period of 8 nm and 30 nm effectively reduced the surface roughness down to 1.9 and 2.2 nm, respectively. The friction coefficient of CrN monolayer coating and CrN/WN multilayer film with a bilayer period of 30 nm was 0.63 and 0.31, respectively. Owing to the high hardness/elastic modulus ratio, as well as the dense structure and the smooth surface roughness, the CrN/WN multilayer coatings exhibited better wear resistance in the consideration of friction coefficient and the worn surface morphology.     

Ti靶电流对CrTiAlN镀层组织结构及硬度的影响

利用磁控溅射技术在高速钢和单晶硅基体上沉积CrTiAlN梯度镀层,研究Ti靶电流对CrTiAlN镀层组织、相结构及硬度的影响.利用EDS、XRD和SEM分析镀层的成分、相结构及形貌,采用显微硬度计测量镀层的硬度.结果表明:随着Ti靶电流的增大,镀层中的Ti原子逐渐置换CrN中的Cr原子形成Cr-Ti-N体系,同时出现少量的TiN相;镀层生长的择优取向由(111)晶面逐渐转变为(200)晶面;镀层柱状晶的结构更为致密,其表面形貌由三棱锥结构逐步变为胞状结构;随Ti靶电流的增大,镀层硬度逐渐由1267HV升至1876HV.