类金刚石薄膜微观摩擦性能的FFM评价——针尖尺度效应

采用等离子体增强气相沉积制备了类金刚石薄膜，利用原子力显微镜的轻敲模式观察了它们的形貌，并在考虑外加载荷和扫描速度的基础上，用摩擦力显微镜（FFM）对比考察了尖端探针和平头探针对类金刚石薄膜摩擦性能评价的影响。结果表明：类金刚石薄膜的表面粗糙度随基底负偏压的增加而减小；存在于探针和类金刚石薄膜之间的水膜对尖端探针的剪切阻力贡献较大，且尖端探针测得的摩擦力变化趋势受扫描速度影响显著；水膜对平头探针起着不同形式的润滑作用，从而导致平头探针和类金刚石薄膜之间摩擦性能的速度效应存在差异；利用摩擦力显微镜考察类金刚石薄膜的摩擦性能时，存在着明显的针尖尺寸效应。     

无氢类金刚石薄膜的过滤式阴极电弧沉积

研制了一套过滤式阴极电弧沉积设备 ,并利用该设备成功地获得了类金刚石薄膜。扫描电镜分析表明 :获得的薄膜在硅基片上是光滑和致密的。喇曼光谱研究表明 ,这种薄膜是典型的无氢类金刚石薄膜。膜层的摩擦试验表明 :无氢类金刚石薄膜的摩擦系数较低 ,是一种理想的耐磨材料     

类金刚石薄膜水润滑摩擦学特性研究进展

综述类金刚石薄膜水润滑摩擦学特性的研究进展,评述薄膜在水环境中的摩擦磨损特性,分析薄膜种类、元素掺杂、对摩材料以及微结构对DLC薄膜水润滑摩擦学特性的影响,并阐述DLC薄膜在水中的摩擦磨损机制。指出:DLC薄膜水润滑摩擦学特性受薄膜制备参数和摩擦试验环境影响,通过与微结构的耦合可以进一步改善类金刚石薄膜的摩擦学特性。同时还展望了类金刚石薄膜水润滑摩擦学未来研究方向。     

不同气氛条件下类金刚石薄膜的合成

采用热处理涂覆在基体上的聚合物的方式得到类金刚石薄膜，所能得到的类金刚石薄膜的厚度是有限的。采用再次或多次涂覆的方法可以解决这个问题，但是薄膜的质量并不理想。采用惰性气体把溶于四氢呋喃的苯甲酸萘，二甲苯萘以及溶于四氢呋喃的聚合物带入反应室，作为碳源物质参与类金刚石薄膜的合成。结果表明，在热处理过程中通入的碳源物质在不同程度上都有利于类金刚石薄膜中sp2和sp3碳的增加，薄膜的质量得到提高。     

类金刚石薄膜涂层铣刀的磨损和寿命

类金刚石薄膜涂层铣刀的磨损和寿命近年来类金刚石薄膜涂层刀具在国外的使用日益广泛。这种薄膜涂层是用石墨在真空中以阴极喷涂法制成的，其硬度接近天然金刚石与钢的摩擦系数至少比工具钢低一个数量级涂覆温度一般不超过１８０Ｃ，可防止涂覆时刀具退火。为了研究这种涂...     

从欧洲真空镀膜会议分析光学薄膜及其技术的研究和发展

简要介绍了９６ 年欧洲真空镀膜会议概况,结合９４ 年第一届欧洲真空镀膜专题讨论会的内容,对欧洲各国在光学薄膜和薄膜技术的研究动向作了介绍;并介绍了广泛应用于激光、红外及航天等高技术中的类金刚石和金刚石薄膜、软Ｘ射线多层膜的研究成果。     

金刚石薄膜在轴承行业的应用研究

对金刚石薄膜成膜及应用技术进行研究,探讨金刚石薄膜在轴承行业应用的可能性。通过对金刚石薄膜成膜工艺的研究,认为轴承表面金刚石固体润滑膜宜采用物理气相沉积（PVD）工艺,该工艺沉积温度较低,镀膜后,不会改变轴承材料组织及性能,轴承精度基本不受损失。所得到的金刚石膜为类金刚石膜,具有膜面平整光滑、摩擦系数低、耐磨损、耐高温、耐腐蚀、薄膜与基体结合力较强等优良性能,能够满足特殊工况轴承固体润滑需要。同时进行了金刚石薄膜性能测试与评价技术的研究。     

过滤式阴极电弧沉积类金刚石薄膜的碳弧稳定性研究

介绍自行研制的一套过滤式阴极电弧沉积设备,并以石墨作为靶材进行类金刚石薄膜的沉积研究,碳弧本身的惰性限制了电弧的稳定性。电弧电压,磁场等对弧的稳定性有很大的作用。试验得到表面光滑的类金刚石薄膜,并对其进行了形貌分析。     

金刚石薄膜的制备及应用

综合叙述了金刚石薄膜的制备方法,并比较了他们的优缺点,金刚石薄膜的形成和生长情况及在各个领域的应用前景     

类金刚石薄膜厚度的测量

采用真空等离子休沉积法沉积了类金刚石膜,采用椭圆偏振光测量法测定了薄膜的厚度,在测量薄膜厚度的同时也可知道所沉积膜的均匀性情况。     

Structure analysis of sputter-coated and ion-beam sputter-coated films: a comparative study

Gold, platinum and tungsten films were deposited by low energy input (7 mA, 450 V), or high deposition rate (80 mA, 1500 V), diode sputter coating and by ion beam sputter coating. Film structures on Formvar coated grids and on the surface of coated erythrocytes, resin embedded, sectioned, and recorded at high magnification in a TEM were compared using computer-assisted measurements and analysis of film thickness and grain size. The average grain size of the thinnest gold and platinum films was relatively independent of the mode or rate of deposition but as the film thickness increased, significant differences in grain size and film structure were observed. Thick platinum or gold films deposited by low energy input sputter coating contained large grain size and electron transparent cracks; however, more even films with narrower cracks but larger grain size were produced at high deposition rates. Ion beam sputter coated gold had relatively large grain size in 10 nm thick films, but beyond this thickness the grains coalesced to form a continuous film. Platinum films deposited by ion beam sputter coating were even and free of electron transparent cracks and had a very small grain size (1–2 nm), which was relatively independent of the film thickness. Tungsten deposition either by low energy input or ion beam sputter coating resulted in fine grained even films which were free of electron transparent cracks. Such films remained granular in substructure and had a grain size of about 1 nm which was relatively independent of film thickness. Tungsten films produced at high deposition rates were of poorer quality. We conclude that thick diode sputter coated platinum and gold films are best deposited at high deposition rates provided the specimens are not heat sensitive, the improvement in film structure being more significant than the slight increase in grain size. Thick diode or ion beam sputter coated gold films should be suitable for low resolution SEM, and thin discontinuous gold films for medium resolution SEM. Diode sputter coated platinum should be suitable for medium resolution SEM and ion beam sputter coated platinum for medium and some high resolution SEM. 1–5 nm thick tungsten films, deposited by low energy input or ion beam sputter coating should be suitable for high resolution SEM, particularly where contrast is of less importance than resolution.     

Amorphous hydrogenated carbon films for tribological applications II. Films deposited on aluminium alloys and steel

This paper describes the methods for the deposition of AHC films on aluminium alloys (2024, 7075 and an additional Al-Si alloy) and AISI 4340 steel. Both unmodified and silicon modified AHC films were deposited. AHC films could be deposited on aluminium alloys without any interlayer. The deposition of AHC films on steel required an interlayer which could be aluminium, silicon or chromium. Thin films (1–2 μm) deposited on aluminium alloys and steel influenced durability of films and friction coefficients in contact with steel. These were believed to be due to plastic deformation of substrates. Deposition of a thicker coating system (interlayer + AHC) reduced friction coefficients and also improved film durability. The durability of films deposited on steel substrates was evaluated under both unlubricated and lubricated conditions for 5.5 million cycles under 4.4 N load and up to 2.5 m/s sliding speed. Although there was wear, the films survived 5.5 million test cycles under unlubricated sliding, but in the presence of two lubricants, the film wear was very small and could not be measured. It was observed that the wear of the steel counterface in contact with silicon-containing AHC films could be higher than that against an uncoated steel in the presence of certain lubricants.     

Tribological experience with hard coats on soft metallic substrates

TiN films were deposited on an aluminum alloy substrate by magnetron reactive sputtering. Tribological evaluations conducted show the feasibility of wear control with the deposition of hard films on soft substrates.     

类富勒烯碳薄膜的结构演变及摩擦学性能研究

通过等离子体增强化学气相沉积技术,以不同沉积时间在硅表面上制备类富勒烯碳薄膜,探究类富勒烯碳薄膜结构演变和摩擦学性能随沉积时间变化规律。利用拉曼光谱和透射电子显微镜,考察类富勒烯碳薄膜微结构和表面形貌随沉积时间的变化。结果表明:碳薄膜内类富勒烯结构含量随沉积时间先增加后保持不变;采用沉积时间为3 h的类富勒烯碳薄膜组成摩擦配伍对,当载荷从8 N增加到14 N时,摩擦因数从0.013降至0.006,即随载荷的增加实现了由低摩擦向超滑的转变。这是因为摩擦诱使类富勒烯碳薄膜发生结构转变,并形成有利于减少摩擦的类球状或外部石墨壳层闭合的纳米颗粒。     

刀具表面CVD法金刚石薄膜剥离及其结合性能

在硬质合金和Si3N4陶瓷刀具表面采用热丝CVD法合成金刚石薄膜的结合性能具有明显差异。在沉积金刚石过程中，根据碳源通入系统中的时机不同，硬质合金表面容易形成石墨、WC等松散层，膜的结合性能变差，由于热应力大，在无外力作用下膜有时发生自动剥落现象；而Si3N4陶瓷表面上金刚石膜具有良好结合性能。在压应力作用下，两衬底上的金刚石薄膜剥离过程也不同，硬质合金上膜支接以剥落形式失效，而Si3N4上膜以产生裂纹及其扩展失效。     

用射频PCVD法沉积Si-B-N复合薄膜

使用工业射频等离子体化学气相沉积（RF－PCVD）设备，通过控制合理的工艺参数，在不同的基体负偏压下，分别制备出了Si-B-N非晶以及含有h-BN,c-BN显著结晶相的Si-B-N复合薄膜。提出了这两种不同晶形薄膜的形成模型。     

MoSx/MoSx-Mo纳米多层膜的制备及其环境摩擦学特性

用直流磁控溅射在钢基体上交替溅射制备了MoSx/MoSx-Mo纳米多层膜。采用划痕仪测试薄膜与基体的结合力;采用SEM和XRD分析了纳米多层膜的形貌和显微结构;在球-盘式微摩擦试验机上测试了纳米多层膜在真空和潮湿空气中的摩擦学性能。结果表明,纳米多层膜的结合力优于纯MoS2膜。随着溅射沉积气压的升高,MoSx(002)面择优取向减弱,纳米多层膜的结合力下降。溅射气压0.24 Pa沉积的纳米多层膜在真空和潮湿空气中都呈现出最低的摩擦因数和磨损率,具有优异的环境摩擦磨损特性。     

负偏压对DLC薄膜结构和摩擦学性能的影响

采用离子束溅射沉积镀膜法制备了DLC薄膜,研究了偏压对薄膜性能的影响。通过原子力显微镜(AFM)和拉曼光谱对DLC薄膜的表面形貌以及内部结构进行了分析表征。并用UTM-2摩擦磨损仪对其摩擦学性能进行了测试。结果表明,利用离子束溅射沉积制备的DLC薄膜具有良好的减摩抗磨性能。随着偏压的增加薄膜的摩擦因数先减小后增加,在-150 V偏压时,薄膜的摩擦学性能最好。     

脉冲磁过滤阴极弧技术制备类金刚石薄膜研究

介绍了弯曲电弧磁过滤设备,并利用脉冲磁过滤阴极真空电弧沉积技术,在高速钢基体上制备了DLC膜.对制得的DLC薄膜表面形貌、Raman光谱及纳米硬度和弹性模量等进行了测试.结果表明,脉冲磁过滤阴极电弧法制备的DLC膜具有优良的性能.拉曼光谱分析显示,制得的薄膜为非晶结构,具有明显的sp2和sp3键杂化结构,符合DLC膜的特征,基体负偏压为50 V时,沉积的DLC膜Raman光谱的ID/IG值最小,sp3键含量最高,纳米硬度和弹性模量值达到最高,分别为29.94 GPa和333.9 GPa.     

反应性离化团束制备光学薄膜新技术

本文叙述了离化团束淀积光学薄膜的基本概念及特性,研制了离化团束淀积光学薄膜装置,开展了光学薄膜晶体结构与性能关系的研究。所研制的光学薄膜的牢固性相当好。基底不加温就可以得到ZnS、MgF₂的硬膜。反应性离化团束淀积的ZnO光学薄膜具有优良的织构,SiO₂光学薄膜呈现多晶结构。